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    • 3. 发明授权
    • Automated photomask inspection apparatus and method
    • 自动光掩模检查装置及方法
    • US5563702A
    • 1996-10-08
    • US274310
    • 1994-07-13
    • David G. EmeryZain K. SaidinMark J. WihlTao-Yi FuMarek ZywnoDamon F. KvammeMichael E. Fein
    • David G. EmeryZain K. SaidinMark J. WihlTao-Yi FuMarek ZywnoDamon F. KvammeMichael E. Fein
    • G01B11/30G01N21/88G01N21/93G01N21/94G01N21/956G03F1/00H01L21/027H01L21/66
    • G03F1/84G01N21/95607G01N2021/95676
    • A method and apparatus for inspecting patterned transmissive substrates, such as photomasks, for unwanted particles and features occurring on the transmissive, opaque portions and at the transition regions of the opaque and transmissive portions of the substrate. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate as the substrate is scanned repeatedly in one axis in a serpentine pattern by a laser beam which is focused on the patterned substrate surface. The defect identification of the substrate is performed using only those transmitted and reflected light signals, and other signals derived from them, such as the second derivative of each of them. The actual defect identification is then performed by comparing combinations of at least two of those measured and derived signals. Simultaneously, defect and particle inspection using the same measured transmitted and reflected light signals. Additionally, phase shift and line widths on the substrate can also be performed simultaneously using the same transmitted light signal that is collected for defect analysis.
    • 一种用于检查图案化的透射基底(例如光掩模)用于不期望的颗粒和特征的方法和装置,其出现在基底的不透明部分和透射部分的透射性不透明部分和过渡区域上。 透射基板由激光器通过包括激光扫描系统,单独的透射和反射光收集光学器件的光学系统照射,并且检测器收集并产生代表由衬底透射和反射的光的信号,因为衬底被一次扫描 通过聚焦在图案化衬底表面上的激光束以蛇形图案。 仅使用透射和反射光信号以及从它们得到的其他信号(例如它们的二次导数)来执行衬底的缺陷识别。 然后通过比较这些测量和导出的信号中的至少两个的组合来执行实际的缺陷识别。 同时,使用相同测量的透射和反射光信号进行缺陷和粒子检测。 此外,基板上的相移和线宽也可以使用用于缺陷分析收集的相同的透射光信号同时进行。
    • 5. 发明授权
    • Automated photomask inspection apparatus
    • 自动光掩模检测仪
    • US06363166B1
    • 2002-03-26
    • US09539672
    • 2000-03-30
    • Mark Joseph WihlTao-Yi FuMarek ZywnoDamon Floyd KvammeMichael E. Fein
    • Mark Joseph WihlTao-Yi FuMarek ZywnoDamon Floyd KvammeMichael E. Fein
    • G06K900
    • G03F1/84G01N21/95607G01N2021/95676
    • An automated photomask inspection apparatus including an XY state (12) for transporting a substrate (14) under test in a serpentine path in an XY plane, an optical system (16) comprising a laser (30), a transmission light detector (34), a reflected light detector (36), optical elements defining reference beam paths and illuminating beam paths between the laser, the substrate and the detectors and an acousto-optical beam scanner (40, 42) for reciprocatingly scanning the illuminating and reference beams relative to the substrate surface, and an electronic control, analysis and display system for controlling the operation of the stage and optical system and for interpreting and storing the signals output by the detectors. The apparatus can operate in a die-to-die comparison mode or a die-to-database mode.
    • 一种自动化光掩模检查装置,包括用于在XY平面中的蛇形路径中传送被测试的基板的XY状态(12),包括激光器(30),透射光检测器(34)的光学系统(16) ,反射光检测器(36),限定参考光束路径的光学元件和激光器,衬底和检测器之间的照明光束路径,以及用于相对于照射和参考光束往复扫描照射和参考光束的声光束扫描器(40,42) 基板表面,以及用于控制平台和光学系统的操作以及用于解释和存储由检测器输出的信号的电子控制,分析和显示系统。 该设备可以以管芯到管芯的比较模式或管芯到数据库模式工作。