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1. 发明授权

US06827972B2 Container with a coating of barrier effect material, and method and apparatus for manufacturing the same 有权
标题翻译：具有阻隔效应材料涂层的容器及其制造方法和装置
公开(公告)号：US06827972B2
公开(公告)日：2004-12-07
申请号：US10194249
申请日：2002-07-15
申请人： David Darras , Jean-Michel Rius , Patrick Chollet , Naïma Boutroy , Nasser Beldi , Fabrice Oge
发明人： David Darras , Jean-Michel Rius , Patrick Chollet , Naïma Boutroy , Nasser Beldi , Fabrice Oge
IPC分类号： B05D722
CPC分类号： B05D1/62 , B65D23/02 , B65D23/0821 , C23C16/045 , C23C16/26 , C23C16/30 , C23C16/511 , H05H1/46 , H05H2001/4622 , H05H2001/463 , Y10T428/13 , Y10T428/1352 , Y10T428/1379 , Y10T428/1383 , Y10T428/30 , Y10T428/31855 , Y10T428/31909 , Y10T428/31913
摘要： The invention provides a container such as a bottle or flask, made heterogeneously from a material with a barrier effect and a polymer material, characterized in that the material with a barrier effect is an amorphous carbon material with a polymer tendency which is applied as a coating on a substrate of polymer material.
摘要翻译：本发明提供了一种由具有阻隔作用的材料和聚合物材料不均匀地制成的容器，例如瓶或烧瓶，其特征在于具有阻挡作用的材料是具有聚合物倾向的无定形碳材料，其被用作涂层在聚合物材料的基底上。

2. 发明授权

US06919114B1 Container with material coating having barrier effect and method and apparatus for making same 失效
标题翻译：具有阻隔效果的材料涂层的容器及其制造方法和装置
公开(公告)号：US06919114B1
公开(公告)日：2005-07-19
申请号：US09647005
申请日：1999-03-25
申请人： David Darras , Jean-Michel Rius , Patrick Chollet , Naïma Boutroy , Nasser Beldi , Fabrice Oge
发明人： David Darras , Jean-Michel Rius , Patrick Chollet , Naïma Boutroy , Nasser Beldi , Fabrice Oge
IPC分类号： B65D25/34 , B05D7/24 , B29C59/14 , B32B9/00 , B65D1/00 , B65D6/14 , B65D8/06 , B65D23/02 , B65D23/08 , B65D77/00 , B65D81/24 , C08G83/00 , C23C16/04 , C23C16/26 , C23C16/30 , C23C16/511 , C23C16/513 , H05H1/24 , B29D22/00 , B29D23/00 , B32B1/08 , B65D23/00 , B65D90/02
CPC分类号： B05D1/62 , B65D23/02 , B65D23/0821 , C23C16/045 , C23C16/26 , C23C16/30 , C23C16/511 , H05H1/46 , H05H2001/4622 , H05H2001/463 , Y10T428/13 , Y10T428/1352 , Y10T428/1379 , Y10T428/1383 , Y10T428/30 , Y10T428/31855 , Y10T428/31909 , Y10T428/31913
摘要： The invention provides a container such as a bottle or flask, made heterogeneously from a material with a barrier effect and a polymer material, characterised in that the material with a barrier effect is an amorphous carbon material with a polymer tendency which is applied as a coating on a substrate of polymer material.
摘要翻译：本发明提供了一种由具有阻隔作用的材料和聚合物材料不均匀地制成的容器，例如瓶或烧瓶，其特征在于具有阻挡作用的材料是具有聚合物倾向的无定形碳材料，其被用作涂层在聚合物材料的基底上。

3. 发明授权

US06800346B1 Container with material coating having barrier effect and method and apparatus for making same 有权
公开(公告)号：US06800346B1
公开(公告)日：2004-10-05
申请号：US09647005
申请日：2000-09-26
申请人： David Darras , Jean-Michel Rius , Patrick Chollet , Naïma Boutroy , Nasser Beldi , Fabrice Oge
发明人： David Darras , Jean-Michel Rius , Patrick Chollet , Naïma Boutroy , Nasser Beldi , Fabrice Oge
IPC分类号： B29D2200
摘要： The invention provides a container such as a bottle or flask, made heterogeneously from a material with a barrier effect and a polymer material, characterised in that the material with a barrier effect is an amorphous carbon material with a polymer tendency which is applied as a coating on a substrate of polymer material.

4. 发明申请

US20080081129A1 Method for Treating a Polymer Material, Device for Implementing this Method and Use of this Device for Treating Hollow Bodies 审中-公开
标题翻译：高分子材料的处理方法，实施本方法的装置和使用该装置处理中空体的方法
公开(公告)号：US20080081129A1
公开(公告)日：2008-04-03
申请号：US11793968
申请日：2005-12-23
申请人： Nasser Beldi , Patrick Chollet , Fabrice Oge
发明人： Nasser Beldi , Patrick Chollet , Fabrice Oge
IPC分类号： H05H1/24 , H05H1/46
CPC分类号： B05D1/62 , B05D3/144 , B05D7/52
摘要： A method and device for treating a polymer to coat the surface thereof with a barrier-effect coating. The method comprises a discharge plasma in a tetrafluoroethane-1,1,1,2. or pentafluoroethane gas. The invention also concerns a device for implementing said method for treating hollow bodies. The invention further concerns the use of such a device for treating a rigid or flexible hollow body made of HDPE.
摘要翻译：一种处理聚合物以用阻隔效应涂层涂覆其表面的方法和装置。该方法包括在四氟乙烷-1,1,1,2中的放电等离子体。或五氟乙烷气体。本发明还涉及一种用于实施上述处理中空体的方法的装置。本发明还涉及使用这种装置来处理由HDPE制成的刚性或柔性中空体。

5. 发明授权

US08715821B2 Polymer article having a thin coating formed on at least one of its sides by plasma and method for producing such an article 有权
标题翻译：具有通过等离子体在其至少一侧形成的薄涂层的聚合物制品和用于制造这种制品的方法
公开(公告)号：US08715821B2
公开(公告)日：2014-05-06
申请号：US11917620
申请日：2006-06-16
申请人： Nasser Beldi , Patrick Chollet
发明人： Nasser Beldi , Patrick Chollet
IPC分类号： H05H1/02 , H05H1/24 , C23C8/10 , G11B5/64
CPC分类号： B65D25/14 , C23C16/0245 , C23C16/30 , C23C16/505 , C23C16/54 , C23C28/04 , Y10T428/24975 , Y10T428/265
摘要： Polymer article having a thin coating on at least one of its side, characterized in that said coating comprises a first coating of SiOxCyH2 which is a plasma polymerized tetramethylsilane deposited on the surface on said polymer article, the x value being between 0 and 1.7, the y value being between 0.5 and 0.8, the z value being between 0.35 and 0.6 for said first SiOxCyHz coating and a second coating of SiOxCyHz which is a plasma polymerized tetramethylsilane deposited on the surface on said first coating, the x value being between 1.7 and 1.99, the y value being between 0.2 and 0.7, the z value being between 0.2 and 0.35 for said second SiOxCyHz coating and in that the thickness of said first coating is from about 1 nanometer to about 15 nanometers and in that the thickness of said second coating is from about 10 nanometers to about 100 nanometers, preferentially around 30 nanometers.
摘要翻译：聚合物制品在其至少一个侧面上具有薄涂层，其特征在于所述涂层包括沉积在所述聚合物制品的表面上的等离子体聚合的四甲基硅烷的SiO x C H 2 O的第一涂层，x值在0和1.7之间， y值在0.5和0.8之间，对于所述第一SiO x C y H y涂层，Z值在0.35和0.6之间，并且沉积在所述第一涂层的表面上的等离子体聚合的四甲基硅烷的SiO x C y H的第二涂层，x值在1.7和1.99之间，y值在0.2和0.7之间，对于所述第二SiO x C y H z涂层，z值在0.2和0.35之间，并且所述第一涂层的厚度为约1纳米至约15纳米，并且所述第二涂层的厚度为约10纳米至约100纳米，优选约30纳米。

6. 发明申请

US20090042025A1 POLYMER ARTICLE HAVING A THIN COATING FORMED ON AT LEAST ONE OF ITS SIDES BY PLASMA AND METHOD FOR PRODUCING SUCH AN ARTICLE 有权
标题翻译：具有通过等离子体形成的薄膜形成的薄膜的聚合物及其生产方法
公开(公告)号：US20090042025A1
公开(公告)日：2009-02-12
申请号：US11917620
申请日：2006-06-16
申请人： Nasser Beldi , Patrick Chollet
发明人： Nasser Beldi , Patrick Chollet
IPC分类号： B32B5/00 , B01J19/08
CPC分类号： B65D25/14 , C23C16/0245 , C23C16/30 , C23C16/505 , C23C16/54 , C23C28/04 , Y10T428/24975 , Y10T428/265
摘要： Polymer article having a thin coating on at least one of its side, characterized in that said coating comprises a first coating of SiOxCyH2 which is a plasma polymerized tetramethylsilane deposited on the surface on said polymer article, the x value being between 0 and 1.7, the y value being between 0.5 and 0.8, the z value being between 0.35 and 0.6 for said first SiOxCyHzcoating and a second coating of SiOxCyHz which is a plasma polymerized tetramethylsilane deposited on the surface on said first coating, the x value being between 1.7 and 1.99, the y value being between 0.2 and 0.7, the z value being between 0.2 and 0.35 for said second SiOxCyHz coating and in that the thickness of said first coating is from about 1 nanometer to about 15 nanometers and in that the thickness of said second coating is from about 10 nanometers to about 100 nanometers, preferentially around 30 nanometers.
摘要翻译：聚合物制品在其至少一个侧面上具有薄涂层，其特征在于所述涂层包括沉积在所述聚合物制品的表面上的等离子体聚合的四甲基硅烷的SiO x C H 2 O的第一涂层，x值在0和1.7之间， y值在0.5和0.8之间，对于所述第一SiO xCyH e涂层，z值在0.35和0.6之间，并且沉积在所述第一涂层的表面上的等离子聚合的四甲基硅烷的SiO x C y H的第二涂层，x值在1.7和1.99之间， y值在0.2和0.7之间，所述第二SiO x C y H z涂层的z值在0.2和0.35之间，并且所述第一涂层的厚度为约1纳米至约15纳米，并且所述第二涂层的厚度为约10纳米至约100纳米，优选约30纳米。

7. 发明授权

US09302816B2 Polymer article having a thin coating formed on at least one of its sides by plasma and method for producing such an article 有权
标题翻译：具有通过等离子体在其至少一侧形成的薄涂层的聚合物制品和用于制造这种制品的方法
公开(公告)号：US09302816B2
公开(公告)日：2016-04-05
申请号：US14195949
申请日：2014-03-04
申请人： Nasser Beldi , Patrick Chollet
发明人： Nasser Beldi , Patrick Chollet
IPC分类号： B65D25/14 , C23C16/02 , C23C16/30 , C23C16/505 , C23C16/54 , C23C28/04
CPC分类号： B65D25/14 , C23C16/0245 , C23C16/30 , C23C16/505 , C23C16/54 , C23C28/04 , Y10T428/24975 , Y10T428/265
摘要： Polymer article having a thin coating on at least one of its side, the coating including a first coating of SiOxCyHz which is a plasma polymerized tetramethylsilane deposited on the surface on the polymer article, the x value being between 0 and 1.7, the y value being between 0.5 and 0.8, the z value being between 0.35 and 0.6 for the first SiOxCyHz coating and a second coating of SiOxCyHz which is a plasma polymerized tetramethylsilane deposited on the surface on the first coating, the x value being between 1.7 and 1.99, the y value being between 0.2 and 0.7, the z value being between 0.2 and 0.35 for the second SiOxCyHz coating and in that the thickness of the first coating is from about 1 nanometer to about 15 nanometers and in that the thickness of the second coating is from about 10 nanometers to about 100 nanometers.
摘要翻译：聚合物制品在其至少一侧具有薄涂层，该涂层包括沉积在聚合物制品表面上的等离子体聚合四甲基硅烷的SiO x C H z的第一涂层，x值在0和1.7之间，y值为在0.5和0.8之间，对于第一SiO x C y H z涂层，z值在0.35和0.6之间，而沉积在第一涂层上的表面上的等离子聚合的四甲基硅烷的SiO x C y H的第二涂层，x值在1.7和1.99之间，y 值在0.2和0.7之间，对于第二SiO x C y H z涂层，z值在0.2和0.35之间，并且第一涂层的厚度为约1纳米至约15纳米，并且第二涂层的厚度为约 10纳米至约100纳米。

8. 发明申请

US20050003124A1 Barrier coating 审中-公开
标题翻译：阻隔涂层
公开(公告)号：US20050003124A1
公开(公告)日：2005-01-06
申请号：US10901957
申请日：2004-07-30
申请人： Nasser Beldi , Eric Adriansens
发明人： Nasser Beldi , Eric Adriansens
IPC分类号： B65D23/02 , B32B9/00 , B65D25/14 , B65D25/34 , C23C16/02 , C23C16/04 , C23C16/26 , C23C16/30 , C23C16/42 , B32B27/06 , B32B1/08 , B32B17/06 , B32B27/36 , C23C4/04
CPC分类号： C23C16/0272 , C23C16/045 , C23C16/26 , Y10T428/1352 , Y10T428/24975 , Y10T428/30 , Y10T428/31786
摘要： A barrier coating to gases deposited on a polymer substrate by low pressure plasma, wherein it includes a silicon oxide barrier which is coated with a protective hydrogenated amorphous carbon film.
摘要翻译：通过低压等离子体对沉积在聚合物基底上的气体进行阻挡涂层，其中包括用保护性氢化无定形碳膜涂覆的氧化硅屏障。

9. 发明申请

US20100193461A1 PLASMA-DEPOSITED BARRIER COATING INCLUDING AT LEAST THREE LAYERS, METHOD FOR OBTAINING ONE SUCH COATING AND CONTAINER COATED WITH SAME 审中-公开
标题翻译：包括至少三层的等离子体沉积障碍涂层，用于获得一个这样的涂层和用其涂覆的容器的方法
公开(公告)号：US20100193461A1
公开(公告)日：2010-08-05
申请号：US12667814
申请日：2008-07-03
申请人： Naima Boutroy , Nasser Beldi
发明人： Naima Boutroy , Nasser Beldi
IPC分类号： B65D23/02 , C23C16/513 , B32B17/06 , B32B1/02 , B32B7/02 , B65D90/00
CPC分类号： C23C16/401 , B05D1/62 , B05D7/56 , C23C16/0272 , C23C16/045 , C23C16/30 , Y10T428/1379 , Y10T428/24975
摘要： The invention relates to a method that uses a low-pressure plasma to deposit a barrier coating on a substrate, of the type in which the plasma is obtained by partial ionisation, under the influence of an electromagnetic field, of a reaction fluid injected at low pressure into a treatment zone. The method includes: at least a step in which a first layer, obtained in the plasma state bearing a mixture containing at least one organosilicon compound and one other compound, is deposited on the substrate; a step in which a second layer, essentially consisting of silicon oxide having formula SiOx, is deposited on the first layer; and at least a step in which a third layer, obtained in the plasma state bearing a mixture containing at least one organosilicon compound and one other compound, is deposited on the second layer, said aforementioned other compounds both taking the form of nitrogen compounds, such as nitrogen gas.
摘要翻译：本发明涉及一种使用低压等离子体在基板上沉积阻挡涂层的方法，其中等离子体在电磁场的影响下通过部分电离获得，反应流体在低温下注入压力进入治疗区。该方法包括：至少一个步骤，其中在等离子体状态下获得的含有至少一种有机硅化合物和一种其它化合物的混合物的第一层沉积在基底上; 在第一层上沉积基本上由具有式SiO x的氧化硅组成的第二层的步骤; 并且至少在第二层上沉积以等离子体状态获得的含有至少一种有机硅化合物和一种其它化合物的混合物的第三层的步骤，所述上述其它化合物都以氮化合物的形式存在，作为氮气。

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