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1. 发明授权

US06969447B2 Thin film protective layer with buffering interface 失效
标题翻译：具有缓冲接口的薄膜保护层
公开(公告)号：US06969447B2
公开(公告)日：2005-11-29
申请号：US10756556
申请日：2004-01-12
申请人： Daryl J. Pocker , Jan-Ulrich Thiele , Bond-Yen Ting , Richard Longstreth White , Bing K. Yen
发明人： Daryl J. Pocker , Jan-Ulrich Thiele , Bond-Yen Ting , Richard Longstreth White , Bing K. Yen
IPC分类号： C23C14/06 , C23C14/34 , G11B5/012 , G11B5/72 , G11B5/82 , G11B5/84 , H01F41/32 , B05D1/18
CPC分类号： C23C14/345 , C23C14/0658 , G11B5/012 , G11B5/72 , G11B5/82 , G11B5/8408 , H01F41/32
摘要： A method for sputtering a thin film protective layer with improved durability is disclosed. The method reduces kinetic energy of the ions of the overcoat material during the initial period of deposition to form a buffering interface which reduces the interpenetration of the atoms of the protective layer into the underlying film. In the method of the invention the sputtering of the overcoat preferably begins with zero (or very low) voltage applied to the underlying film resulting in minimal ion implantation in the underlying film. The “high energy” phase of the process begins with increases in the magnitude of the negative bias voltage applied to the underlying film. The higher energy imparted to ions in the plasma result in a denser and harder film being formed over the initial buffer layer. The protective layer preferably comprises carbon and nitrogen.
摘要翻译：公开了一种用于溅射具有改善的耐久性的薄膜保护层的方法。该方法在初始沉积期间降低外涂层材料的离子的动能，形成缓冲界面，从而减少保护层原子相互渗透到下面的膜中。在本发明的方法中，外涂层的溅射优选以施加到下面的膜的零（或非常低的）电压开始，导致在底层膜中的最小离子注入。该过程的“高能”阶段从施加到底层薄膜的负偏置电压的大小的增加开始。在等离子体中赋予离子的较高能量导致在初始缓冲层上形成更致密和更硬的膜。保护层优选包含碳和氮。

2. 发明授权

US06586070B1 Thin film TiSixNy protective layer 有权
标题翻译：薄膜TiSixNy保护层
公开(公告)号：US06586070B1
公开(公告)日：2003-07-01
申请号：US10119328
申请日：2002-04-08
申请人： Qing Dai , Bruno Marchon , Michael Andrew Scarpulla , Richard Longstreth White , Bing K. Yen
发明人： Qing Dai , Bruno Marchon , Michael Andrew Scarpulla , Richard Longstreth White , Bing K. Yen
IPC分类号： G11B572
CPC分类号： G11B5/72 , G11B5/82 , G11B5/8408 , G11B2005/001
摘要： A overcoat layer of TiSixNy for use on a magnetic thin film disk is disclosed. The overcoat of the invention has high hardness, provides corrosion protection and has low surface energy which reduces contaminant attraction. The TiSixNy film is conductive and, therefore, reduces the deleterious effects of tribocharging.
摘要翻译：公开了用于磁性薄膜盘上的TiSixNy的外涂层。本发明的外涂层具有高硬度，提供防腐蚀和低表面能，减少了污染物的吸引。 TiSixNy膜是导电的，因此减少摩擦带电的有害影响。

3. 发明申请

US20090148626A1 SYSTEM, METHOD AND APPARATUS FOR FILAMENT AND SUPPORT USED IN PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION FOR REDUCING CARBON VOIDS ON MEDIA DISKS IN DISK DRIVES 有权
标题翻译：系统，方法和装置，用于在等离子体增强化学气相沉积中用于减少介质盘中的碳氢化合物的磁性和支持
公开(公告)号：US20090148626A1
公开(公告)日：2009-06-11
申请号：US11951649
申请日：2007-12-06
申请人： Eric Hwang , Jinliu Wang , Richard Longstreth White
发明人： Eric Hwang , Jinliu Wang , Richard Longstreth White
IPC分类号： C23C16/513
CPC分类号： C23C16/26 , C23C16/503 , H01J37/32009 , H01J37/32541
摘要： A filament post used in plasma-enhanced chemical vapor deposition has an outer shell and an inner post. An electrical potential is applied only to the inner post to ensure that there is no impact on the plasma density and the carbon film properties. The inner post and the outer shell are electrically insulated by ceramic insulators, such that no electrical potential is applied to outer shell. The stress generated in the carbon film is directly related to the electrical potential of the surface to which the film is deposited. The carbon film deposited on the outer shell of the post is not highly stressed, which significantly reduces film delamination from the filament post surfaces.
摘要翻译：用于等离子体增强化学气相沉积的长丝柱具有外壳和内柱。电位仅施加到内部柱以确保不影响等离子体密度和碳膜性质。内部柱和外壳由陶瓷绝缘体电绝缘，使得不对外壳施加电势。在碳膜中产生的应力与膜沉积的表面的电位直接相关。沉积在柱的外壳上的碳膜不受高应力，这显着地减少了丝束表面的薄膜分层。

4. 发明授权

US06338777B1 Method and apparatus for sputtering thin films 失效
标题翻译：溅射薄膜的方法和装置
公开(公告)号：US06338777B1
公开(公告)日：2002-01-15
申请号：US09178362
申请日：1998-10-23
申请人： Richard Longstreth White
发明人： Richard Longstreth White
IPC分类号： C23C1434
CPC分类号： C23C14/345 , C23C14/0605 , C23C14/3464 , G11B5/851
摘要： Improved apparatus and methods for depositing thin films are described. A sputtering system according to the invention enhances the effects normally achieved with negative voltage bias by having two electrodes driven alternately as anode and cathode by a midfrequency power supply in combination with pulsing a negative bias voltage source for the substrate where the film is being deposited. The invention may be embodied in a multiple disk in-line sputtering system or a single disk sputtering system. Although the invention is potentially useful with any thin film which benefits from being deposited using bias, the described embodiment using the sputtering system according to the invention is for depositing an overcoat on a magnetic disk which is carbon based and includes hydrogen and/or nitrogen.
摘要翻译：描述了用于沉积薄膜的改进的装置和方法。根据本发明的溅射系统通过使两个电极通过中频电源交替驱动作为阳极和阴极驱动，同时脉冲施加薄膜正在沉积的衬底的负偏置电压源来增强通常用负电压偏置实现的效果。本发明可以体现在多盘在线溅射系统或单个盘式溅射系统中。虽然本发明对于从利用偏压进行沉积而获益的任何薄膜是潜在有用的，但是使用根据本发明的溅射系统的所述实施例用于在基于碳的磁盘上沉积外涂层并且包括氢和/或氮。

5. 发明授权

US06576328B2 Magnetic thin film media with a protective layer of CNx having a plurality of compositions 失效
标题翻译：具有多个组成的具有CNx保护层的磁性薄膜介质
公开(公告)号：US06576328B2
公开(公告)日：2003-06-10
申请号：US09944787
申请日：2001-08-30
申请人： Hong Deng , George William Tyndall, III , Richard Longstreth White
发明人： Hong Deng , George William Tyndall, III , Richard Longstreth White
IPC分类号： G11B572
CPC分类号： G11B5/72 , G11B5/012 , G11B5/82 , G11B5/8408 , Y10T428/24942 , Y10T428/24975 , Y10T428/265 , Y10T428/30
摘要： A thin film structure comprising a protective layer structure having at least two different compositions of carbon and nitrogen with the surface of the protective layer having the lowest nitrogen content is disclosed. The protective layer structure of the invention is preferably used over the magnetic material in a thin film magnetic disk. In the protective layer structure of the invention, the durability of a relatively high nitrogen content CNx material is improved by the addition of a surface sublayer of CNx with a relatively low nitrogen concentration. The resulting protective layer structure provides superior durability to either of the thin film compositions used alone achieving a synergistic result. The protective layer structure of the invention has the additional benefit of decreasing the polar surface energy and therefore, improving the corrosion resistance of the film structure. In one embodiment the protective layer of the invention is implemented as two discrete sublayers with the surface sublayer having the lowest nitrogen concentration. In this embodiment the surface sublayer has from 0 to 8 at. % nitrogen and the higher nitrogen content is between 10 and 25 at. % nitrogen at the magnetic layer interface. The protective layer structure of the invention can also be implemented as a film in which the nitrogen content gradually decreases between the magnetic layer and the surface of the protective layer structure.
摘要翻译：公开了一种薄膜结构，其包括具有至少两种不同组成的碳和氮的保护层结构，其保护层的表面具有最低的氮含量。本发明的保护层结构优选在薄膜磁盘中的磁性材料上使用。在本发明的保护层结构中，通过添加相对低的氮浓度的CNx的表面子层，提高了相对高的氮含量CNx材料的耐久性。得到的保护层结构为单独使用的任何一种薄膜组合物提供优异的耐久性，达到协同效果。本发明的保护层结构具有降低极性表面能并因此提高膜结构的耐腐蚀性的附加益处。在一个实施例中，本发明的保护层被实现为具有最低氮浓度的表面子层的两个离散子层。在该实施例中，表面子层具有0至8at。氮和氮含量在10和25之间。磁性界面处的氮含量为％。本发明的保护层结构也可以实现为在磁性层和保护层结构的表面之间氮含量逐渐降低的膜。

6. 发明授权

US5942317A Hydrogenated carbon thin films 失效
标题翻译：氢化碳薄膜
公开(公告)号：US5942317A
公开(公告)日：1999-08-24
申请号：US792592
申请日：1997-01-31
申请人： Richard Longstreth White
发明人： Richard Longstreth White
IPC分类号： C23C14/12 , B32B9/00 , C23C14/34 , G11B5/00 , G11B5/255 , G11B5/62 , G11B5/72 , G11B5/84
CPC分类号： G11B5/72 , C23C14/027 , C23C14/0605 , C23C14/34 , Y10T428/24942 , Y10T428/24975 , Y10T428/265 , Y10T428/30
摘要： The embodiments of the invention are one, two or three layer protective hydrogenated carbon (C:H) thin film coatings on a disk with hydrogenation levels that are higher at the surface and decrease from the surface downward toward the substrate. The hydrogen content of the various layers or zones of the overcoat are optimized to use the varying properties of C:H films such as good adhesion obtained with a low level of hydrogen, the high hardness of an intermediate level of hydrogen content and the low surface energy of a high hydrogen content film. In one embodiment the disk is coated with a sputtered C:H thin film with a gradient in the hydrogen concentration, with the concentration increasing toward the film surface. A second embodiment of the invention uses two layers in which the hydrogen content of bottom layer is lower than the surface layer. A third embodiment of the invention uses a three layer construction of the thin-film having a minimum hydrogenation level in the bottom layer, an intermediate hydrogenation level in the middle layer and a high hydrogenation level in the top layer.
摘要翻译：本发明的实施方案是在盘上具有氢化水平的一层，两层或三层保护氢化碳（C：H）薄膜涂层，其表面较高并且从表面向下朝向衬底减少。优化外涂层的各个层或区域的氢含量，以使用C：H膜的变化性质，例如用低水平的氢获得的良好粘合性，中间含量的氢含量的高硬度和低表面高氢含量薄膜的能量。在一个实施例中，盘用溅射的C：H薄膜涂覆，其具有氢浓度的梯度，其浓度朝向膜表面增加。本发明的第二实施方案使用两层，其中底层的含氢量低于表面层。本发明的第三实施方案使用底层中具有最低氢化水平的薄膜的三层结构，中间层中的中间氢化水平和顶层中的高氢化水平。

7. 发明授权

US08028653B2 System, method and apparatus for filament and support used in plasma-enhanced chemical vapor deposition for reducing carbon voids on media disks in disk drives 有权
标题翻译：用于等离子体增强化学气相沉积中用于减少磁盘驱动器中介质盘上的碳空隙的灯丝和支架的系统，方法和装置
公开(公告)号：US08028653B2
公开(公告)日：2011-10-04
申请号：US11951649
申请日：2007-12-06
申请人： Eric Hwang , Jinliu Wang , Richard Longstreth White
发明人： Eric Hwang , Jinliu Wang , Richard Longstreth White
IPC分类号： C23C16/00 , A21B1/00 , A21B1/22 , H05B1/02 , H01G5/01 , H01G5/38 , H01G5/06 , H01G4/228 , H01G9/10 , H02B1/00 , H01R9/00 , H05K5/03
CPC分类号： C23C16/26 , C23C16/503 , H01J37/32009 , H01J37/32541
摘要： A filament post used in plasma-enhanced chemical vapor deposition has an outer shell and an inner post. An electrical potential is applied only to the inner post to ensure that there is no impact on the plasma density and the carbon film properties. The inner post and the outer shell are electrically insulated by ceramic insulators, such that no electrical potential is applied to outer shell. The stress generated in the carbon film is directly related to the electrical potential of the surface to which the film is deposited. The carbon film deposited on the outer shell of the post is not highly stressed, which significantly reduces film delamination from the filament post surfaces.
摘要翻译：用于等离子体增强化学气相沉积的长丝柱具有外壳和内柱。电位仅施加到内部柱以确保不影响等离子体密度和碳膜性质。内部柱和外壳由陶瓷绝缘体电绝缘，使得不对外壳施加电势。在碳膜中产生的应力与膜沉积的表面的电位直接相关。沉积在柱的外壳上的碳膜不受高应力，这显着地减少了丝束表面的薄膜分层。

8. 发明授权

US07362454B2 Method and system for measuring overcoat layer thickness on a thin film disk 失效
标题翻译：用于测量薄膜盘上的外涂层厚度的方法和系统
公开(公告)号：US07362454B2
公开(公告)日：2008-04-22
申请号：US11040376
申请日：2005-01-21
申请人： Richard Longstreth White
发明人： Richard Longstreth White
IPC分类号： G01B11/28
CPC分类号： G01B11/0641
摘要： A method for measuring the thickness of a thin film disk overcoat layer includes radiating x-rays on a thin film disk comprising at least one base layer and an overcoat layer, collecting fluorescence data on electromagnetic radiation fluoresced from the thin film disk, reflecting polarized light from a surface of the thin film disk corresponding to the overcoat layer, collecting ellipsometry data from the polarized light, and estimating the thickness of the overcoat layer using both the fluorescence data and the ellipsometry data. The method may further include providing a statistical model to determine optimal deposition and manufacturing parameters. A system to conduct the described method may include a data analyzer, an ellipsometry measurement device, and an x-ray fluorescence measurement device.
摘要翻译：用于测量薄膜盘外涂层的厚度的方法包括在包括至少一个基层和外涂层的薄膜盘上辐射X射线，在由薄膜盘发出的电磁辐射上收集荧光数据，反射偏振光从对应于外涂层的薄膜盘的表面收集偏振光的椭偏仪数据，并使用荧光数据和椭偏仪数据估计外涂层的厚度。该方法还可以包括提供统计模型以确定最佳沉积和制造参数。执行所述方法的系统可以包括数据分析器，椭偏仪测量装置和x射线荧光测量装置。

9. 发明授权

US6086949A Thin film protective coating with two thickness regions 失效
标题翻译：薄膜保护涂层有两个厚度区域
公开(公告)号：US6086949A
公开(公告)日：2000-07-11
申请号：US30643
申请日：1998-02-25
申请人： Cherngye Hwang , Charles C. H. Lee , Richard Longstreth White
发明人： Cherngye Hwang , Charles C. H. Lee , Richard Longstreth White
IPC分类号： G11B5/72 , G11B5/84 , B05D5/12
CPC分类号： G11B5/72 , G11B5/8408
摘要： A thin film disk and a method for producing the disk having an overcoat with two thickness regions. The thicker overcoat region can be used as a start/stop or loading zone and the thinner overcoat region can be used over the data recording area. This provides increased wear resistance while allowing improved magnetic performance through a reduction in the thickness of the overcoat over the data recording area. The dual thickness regions can be formed using different embodiments of the method. One method sputter deposits a relatively thick layer of overcoat material over the entire disk surface, masks off the portion of the disk for the thick layer, etches the unmasked area to reduce or eliminate the overcoat from the unmasked area, then deposits a second relatively thin layer of overcoat material over the entire surface.
摘要翻译：一种薄膜盘及其制造方法，该盘具有两层厚度的外涂层。较厚的外涂层区域可用作起始/停止或装载区域，并且可以在数据记录区域上使用较薄的外涂层区域。这提供了增加的耐磨性，同时通过减少数据记录区上的外涂层的厚度来改善磁性能。可以使用该方法的不同实施例来形成双重厚度区域。一种方法是在整个盘表面上溅射沉积相对较厚的外涂层材料层，掩盖了用于厚层的盘的部分，蚀刻未掩模区域以减少或消除未掩模区域的外涂层，然后沉积第二较薄整个表面上的覆盖层材料层。

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