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1. 发明申请

US20060084187A1 Starved source diffusion for avalanche photodiode 有权
公开(公告)号：US20060084187A1
公开(公告)日：2006-04-20
申请号：US11151929
申请日：2005-06-14
申请人： Daniel Francis , Rashit Nabiev , Richard Ratowsky , David Young , Sunil Thomas , Roman Dimitrov
发明人： Daniel Francis , Rashit Nabiev , Richard Ratowsky , David Young , Sunil Thomas , Roman Dimitrov
IPC分类号： H01L21/00
CPC分类号： H01L31/107 , H01L31/03529 , H01L31/18 , Y02E10/50
摘要： This disclosure is concerned with starved source diffusion methods for forming avalanche photodiodes are provided for controlling an edge effect. In one example, a method for manufacturing an avalanche photodiode includes forming an absorber layer and an avalanche layer over a substrate. Next, a patterned mask defining one or more openings is formed over a surface of the avalanche layer. Finally, a dopant is deposited over the patterned mask and the avalanche layer such that the dopant is blocked by the patterned mask but diffuses into the avalanche layer in areas where the patterned mask defines an opening. The patterned mask is configured such that the depth to which the dopant diffuses into the avalanche layer varies so as to form a sloped diffusion front in the avalanche layer.

2. 发明申请

US20060081874A1 Starved source diffusion for avalanche photodiode 审中-公开
标题翻译：用于雪崩光电二极管的饥饿源扩散
公开(公告)号：US20060081874A1
公开(公告)日：2006-04-20
申请号：US10966491
申请日：2004-10-15
申请人： Daniel Francis , Rashit Nabiev , Richard Ratowsky , David Young , Sunil Thomas , Roman Dimitrov
发明人： Daniel Francis , Rashit Nabiev , Richard Ratowsky , David Young , Sunil Thomas , Roman Dimitrov
IPC分类号： H01L31/109
CPC分类号： H01L31/107 , H01L31/03529 , H01L31/18 , Y02E10/50
摘要： Starved source diffusion methods for forming avalanche photodiodes (APDs) are provided for controlling the edge effect. The edge effect is controlled by reducing edge gain near the edges of an APD active region. This is accomplished by creating a sloped diffusion front near the edges of the active region. The sloped diffusion front is advantageously formed in a single doping step by using a patterned mask during doping. The patterned mask reduces the depth to which dopants diffuse in areas where it only partly covers the underlying layer. By covering more of the underlying layer nearer the edge and progressively less towards the center, the sloped diffusion front is formed. The shallower diffusion depth near the edge reduces the edge gain, and therefore the edge effect. As a result, an APD to fiber misalignment is less likely, and possibility of edge breakdown is greatly reduced.
摘要翻译：用于形成雪崩光电二极管（APD）的饥饿源扩散方法用于控制边缘效应。边缘效应通过减少APD有效区域边缘附近的边缘增益来控制。这是通过在活动区域的边缘附近创建倾斜的扩散前端来实现的。倾斜的扩散前端有利地通过在掺杂期间使用图案化掩模在单个掺杂步骤中形成。图案化掩模减少掺杂剂在其仅部分覆盖下层的区域中扩散的深度。通过覆盖更靠近边缘的下层，并逐渐向中心倾斜，形成倾斜的扩散前沿。靠近边缘的较浅的扩散深度降低了边缘增益，因此降低了边缘效应。结果，APD对光纤的未对准不太可能，并且边缘击穿的可能性大大降低。

3. 发明授权

US07553690B2 Starved source diffusion for avalanche photodiode 有权
标题翻译：用于雪崩光电二极管的饥饿源扩散
公开(公告)号：US07553690B2
公开(公告)日：2009-06-30
申请号：US11151929
申请日：2005-06-14
申请人： Daniel Francis , Rashit Nabiev , Richard P. Ratowsky , David Bruce Young , Sunil Thomas , Roman Dimitrov
发明人： Daniel Francis , Rashit Nabiev , Richard P. Ratowsky , David Bruce Young , Sunil Thomas , Roman Dimitrov
IPC分类号： H01L21/00
CPC分类号： H01L31/107 , H01L31/03529 , H01L31/18 , Y02E10/50
摘要： This disclosure is concerned with starved source diffusion methods for forming avalanche photodiodes are provided for controlling an edge effect. In one example, a method for manufacturing an avalanche photodiode includes forming an absorber layer and an avalanche layer over a substrate. Next, a patterned mask defining one or more openings is formed over a surface of the avalanche layer. Finally, a dopant is deposited over the patterned mask and the avalanche layer such that the dopant is blocked by the patterned mask but diffuses into the avalanche layer in areas where the patterned mask defines an opening. The patterned mask is configured such that the depth to which the dopant diffuses into the avalanche layer varies so as to form a sloped diffusion front in the avalanche layer.
摘要翻译：本公开涉及用于形成用于控制边缘效应的雪崩光电二极管的饥饿源扩散方法。在一个示例中，制造雪崩光电二极管的方法包括在衬底上形成吸收层和雪崩层。接下来，在雪崩层的表面上形成限定一个或多个开口的图案化掩模。最后，掺杂剂沉积在图案化掩模和雪崩层上，使得掺杂剂被图案化掩模阻挡，但是在图案化掩模限定开口的区域中扩散到雪崩层中。图案化掩模被配置为使得掺杂剂扩散到雪崩层中的深度变化，以便在雪崩层中形成倾斜的扩散前沿。

4. 发明申请

US20060121683A1 Point source diffusion for avalanche photodiodes 审中-公开
标题翻译：用于雪崩光电二极管的点源扩散
公开(公告)号：US20060121683A1
公开(公告)日：2006-06-08
申请号：US11007558
申请日：2004-12-08
申请人： Daniel Francis , Richard Ratowsky , Ashish Verma , Sunil Thomas , Roman Dimitrov
发明人： Daniel Francis , Richard Ratowsky , Ashish Verma , Sunil Thomas , Roman Dimitrov
IPC分类号： H01L21/20
CPC分类号： H01L31/107 , H01L31/18 , H01L31/1844 , Y02E10/544
摘要： Systems and methods for controlling edge gain in avalanche photodiodes. During fabrication of an avalanche photodiode, the photodiode is diffused with a dopant. The mask used for the dopant includes a plurality of openings such that the dopant diffuses within the photodiode to create a plurality of interconnected spheres. The diffusion front has a shape to introduce an edge effect into the center of the photodiode. The diffusion front ameliorates the edge effect by introducing the edge effect into the center of the photodiode.
摘要翻译：用于控制雪崩光电二极管边缘增益的系统和方法。在制造雪崩光电二极管期间，光电二极管被掺杂剂扩散。用于掺杂剂的掩模包括多个开口，使得掺杂剂在光电二极管内扩散以产生多个互连的球体。扩散前沿具有将边缘效应引入光电二极管的中心的形状。扩散前沿通过将边缘效应引入光电二极管的中心来改善边缘效应。

5. 发明授权

US10335476B2 Vaccine to protect against Ehrlichia infection 有权
公开(公告)号：US10335476B2
公开(公告)日：2019-07-02
申请号：US14919494
申请日：2015-10-21
申请人： Sunil Thomas , David H. Walker
发明人： Sunil Thomas , David H. Walker
IPC分类号： A61K39/02 , A61K39/00
摘要： Certain embodiments are direct to a vaccine composition comprising an immunizing amount of an Ehrlichia sonicate, wherein the Ehrlichia sonicate elicits a protective physiologic response. In certain aspects the Ehrlichia is one or more of E. canis, E. chaffeensis, E. muris, E. ruminantium, E. ewingii, and E. ovis.

6. 发明申请

US20080093689A1 FLIP-CHIP ASSEMBLY OF PROTECTED MICROMECHANICAL DEVICES 有权
标题翻译：保护性微生物装置的片芯组件
公开(公告)号：US20080093689A1
公开(公告)日：2008-04-24
申请号：US11963585
申请日：2007-12-21
申请人： Sunil Thomas
发明人： Sunil Thomas
IPC分类号： H01L29/84
CPC分类号： B81B7/0077 , A43B3/0026 , B81B2201/042 , B81B2207/012 , B81B2207/098 , B81C1/00301 , H01L24/11 , H01L2224/05568 , H01L2224/05573 , H01L2924/00014 , H01L2924/01322 , H01L2924/14 , H01L2924/15787 , H01L2924/00 , H01L2224/05599
摘要： A low-cost ceramic package, in land-grid array or ball-grid array configuration, for micromechanical components is fabricated by coating the whole integrated circuits wafer with a protective material, selectively etching the coating for solder ball attachment, singulating the chips, flip-chip assembling a chip onto the opening of a ceramic substrate, underfilling the gaps between the solder joints with a polymeric encapsulant, removing the protective material form the components, and attaching a lid to the substrate for sealing the package. It is an aspect of the present invention to be applicable to a variety of different semiconductor micromechanical devices, for instance actuators, motors, sensors, spatial light modulators, and deformable mirror devices. In all applications, the invention achieves technical advantages as well as significant cost reduction and yield increase.
摘要翻译：通过用保护材料涂覆整个集成电路晶片来制造用于微机电部件的陆地电网阵列或球栅阵列配置的低成本陶瓷封装，选择性地蚀刻用于焊球附着的涂层，切割芯片，翻转将芯片组装到陶瓷基板的开口上，用聚合物密封剂填充焊料接头之间的间隙，从组件中除去保护材料，并将盖子附着到基板上以密封封装。本发明的一个方面可应用于各种不同的半导体微机械装置，例如致动器，马达，传感器，空间光调制器和可变形反射镜装置。在所有应用中，本发明实现了技术优点以及显着的成本降低和产量增加。

7. 外观设计

USD937934S1 Chief executive officer game 有权
公开(公告)号：USD937934S1
公开(公告)日：2021-12-07
申请号：US29662039
申请日：2018-08-31
申请人： Sunil Thomas
设计人： Sunil Thomas

8. 发明申请

US20170145367A1 IN VITRO BIOSIMULATOR TO INDUCE PATTERN FORMATION IN NON-ADHERENT CELLS 审中-公开
公开(公告)号：US20170145367A1
公开(公告)日：2017-05-25
申请号：US14948272
申请日：2015-11-21
申请人： Sunil Thomas
发明人： Sunil Thomas
IPC分类号： C12M1/12
CPC分类号： C12M25/06 , C12M23/10 , C12M23/20 , C12M33/00
摘要： It is not understood what causes or influences pattern formation in cells during the development of an organism. When animal/human cells are cultured in a Petri dish the adherent cells attach to the bottom of the dish, whereas the non-adherent cells float in the growing medium. Currently there are no specialized dishes for culturing non-adherent cells. We now show that non-adherent cells could be induced to form distinct patterns when cultured in an etched plastic dish (Biosimulator). The non-adherent cells showed polarity when cultured in the etched plate. The polarity/pattern formation could be reversed with inhibitors specific for adhesion proteins. The phenomenon of pattern formation by non-adherent cells has wide applications in cell and developmental biology, diagnostics, microbiome research, biofluidics, drug discovery, industrial production of biological products, and also in biotechnology and bioengineering.

9. 发明授权

US09151755B2 Methods for detecting Ehrlichia infection 有权
标题翻译：检测埃里克病毒感染的方法
公开(公告)号：US09151755B2
公开(公告)日：2015-10-06
申请号：US14174815
申请日：2014-02-06
申请人： David H. Walker , Sunil Thomas
发明人： David H. Walker , Sunil Thomas
IPC分类号： G01N33/53 , G01N33/569 , A61K39/02 , C07K14/29 , C07K16/12 , A61K38/00 , A61K39/00
CPC分类号： G01N33/56911 , A61K38/00 , A61K39/0233 , A61K2039/6081 , C07K14/29 , C07K16/1246 , C07K2317/34 , Y02A50/403
摘要： The present invention provides an isolated and purified heat shock protein 60 (Hsp60) peptide having the amino acid sequence of SEQ ID NO:2. The instant invention is also directed to a vaccine against Ehrlichia comprising a peptide homologous to the amino acid sequence of SEQ ID NO:2. The instant invention is also directed to an antibody directed against a peptide homologous to the amino acid sequence of SEQ ID NO:2. The instant invention is also directed to a method of determining whether a subject is infected with Ehrlichia, comprising the steps of: contacting a sample from a subject with the antibody described herein; and detecting a resulting antibody reaction, wherein a positive reaction indicates the subject is infected with Ehrlichia.
摘要翻译：本发明提供了具有SEQ ID NO：2的氨基酸序列的分离和纯化的热休克蛋白60（Hsp60）肽。本发明还涉及包含与SEQ ID NO：2的氨基酸序列同源的肽的抗埃利亚氏疫苗。本发明还涉及针对与SEQ ID NO：2的氨基酸序列同源的肽的抗体。本发明还涉及一种确定受试者是否感染埃里希氏菌的方法，包括以下步骤：使来自受试者的样品与本文所述的抗体接触; 并检测所得的抗体反应，其中阳性反应表明受试者被埃里希氏杆菌感染。

10. 发明授权

US06507082B2 Flip-chip assembly of protected micromechanical devices 有权
标题翻译：保护微机械装置的倒装芯片组装
公开(公告)号：US06507082B2
公开(公告)日：2003-01-14
申请号：US09779001
申请日：2001-02-08
申请人： Sunil Thomas
发明人： Sunil Thomas
IPC分类号： H01L2984
CPC分类号： A43B3/0026 , B81B2201/042 , B81C1/00317 , B81C1/00793 , B81C2203/035 , H01L2224/13 , H01L2224/45144 , H01L2924/15311 , H01L2924/00
摘要： A low-cost ceramic package, in land-grid array or ball-grid array configuration, for micromechanical components is fabricated by coating the whole integrated circuits wafer with a protective material, selectively etching the coating for solder ball attachment, singulating the chips, flip-chip assembling a chip onto the opening of a ceramic substrate, underfilling the gaps between the solder joints with a polymeric encapsulant, removing the protective material form the components, and attaching a lid to the substrate for sealing the package. It is an aspect of the present invention to be applicable to a variety of different semiconductor micromechanical devices, for instance actuators, motors, sensors, spatial light modulators, and deformable mirror devices. In all applications, the invention achieves technical advantages as well as significant cost reduction and yield increase.
摘要翻译：通过用保护材料涂覆整个集成电路晶片来制造用于微机电部件的陆地电网阵列或球栅阵列配置的低成本陶瓷封装，选择性地蚀刻用于焊球附着的涂层，切割芯片，翻转将芯片组装到陶瓷基板的开口上，用聚合物密封剂填充焊料接头之间的间隙，从组件中除去保护材料，并将盖子附着到基板上以密封封装。本发明的一个方面可应用于各种不同的半导体微机械装置，例如致动器，马达，传感器，空间光调制器和可变形反射镜装置。在所有应用中，本发明实现了技术优点以及显着的成本降低和产量增加。

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