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    • 10. 发明授权
    • Low capacitance X-ray radiation detector
    • 低电容X射线辐射探测器
    • US5187380A
    • 1993-02-16
    • US865515
    • 1992-04-09
    • Gerald J. MichonDale M. BrownMarvin GarfinkelDominic A. Cusano
    • Gerald J. MichonDale M. BrownMarvin GarfinkelDominic A. Cusano
    • A61B6/03G01T1/24H01L27/14H01L27/144H01L31/0232H01L31/0352H01L31/09H01L31/115H01L31/118
    • H01L31/115H01L27/1443H01L31/02322H01L31/03529H01L31/1185Y02E10/50
    • A low capacitance radiation detector comprises a monocrystalline silicon substrate heavily doped to N type conductivity with a more lightly doped N type conductivity epitaxial layer formed on the substrate. A plurality of heavily doped N type upper surface layer segments are formed in the epitaxial layer. A patterned region of the epitaxial layer, heavily doped to P type conductivity and in the shape of parallel stripes joined at each end by a respective stripe perpendicular to the parallel stripes, is formed in the epitaxial layer and situated between adjacent ones of the upper surface layer segments, with each stripe extending into the epitaxial layer deeper than, and separated from, the upper surface layer segments so as to form a minority charge carrier-collecting PN junction with the epitaxial layer. The parallel stripes are spaced apart from each other by a distance smaller than or comparable to the minority charge carrier recombination diffusion length for the epitaxial layer, and the epitaxial layer thickness is smaller than or comparable to the minority charge carrier recombination diffusion length. In a second embodiment, the epitaxial layer has beveled edges and the heavily doped N type upper surface layer segments formed in the epitaxial layer extend over the beveled edges.
    • 低电容辐射检测器包括重掺杂到N型导电性的单晶硅衬底,在衬底上形成更轻掺杂的N型导电外延层。 在外延层中形成多个重掺杂的N型上表面层段。 在外延层中形成外延层的图案化区域,其重掺杂为P型导电性,并且在每一端由垂直于平行条纹的相应条带连接的平行条形状,并且位于相邻的上表面之间 每个条带延伸到外延层中比上表面层段更深且分离,以便与外延层形成少数电荷载流子收集PN结。 平行条纹彼此间隔开距离外延层的少数电荷载流子复合扩散长度的距离或相当于外延层厚度小于或与少数电荷载流子复合扩散长度相当的距离。 在第二实施例中,外延层具有倾斜边缘,并且形成在外延层中的重掺杂N型上表面层段在倾斜边缘上延伸。