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1. 发明授权

US07608542B2 Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method 有权
标题翻译：用于光掩模和制造方法的大尺寸玻璃基板，计算机可读记录介质和母玻璃曝光方法
公开(公告)号：US07608542B2
公开(公告)日：2009-10-27
申请号：US11587902
申请日：2006-06-12
申请人： Shuhei Ueda , Yukio Shibano , Atsushi Watabe , Daisuke Kusabiraki
发明人： Shuhei Ueda , Yukio Shibano , Atsushi Watabe , Daisuke Kusabiraki
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： G11B7/261 , G03F1/60 , G03F7/70791
摘要： A large-size glass substrate, from which a photomask substrate is formed, is prepared by processing a large-size glass substrate stock by (1) a flattening removal quantity based on height data of the substrate stock in the vertical attitude plus a deformation-corrective removal quantity. The deformation-corrective removal quantity is calculated from (2) a deflection of the substrate stock by its own weight in the horizontal attitude, (3) a deformation of the photomask substrate caused by chucking in an exposure apparatus, and (4) an accuracy distortion of a platen for supporting a mother glass.
摘要翻译：通过（1）基于垂直姿态的基板的高度数据的平坦化去除量加上大尺寸玻璃基板原料，形成光掩模基板的大尺寸玻璃基板，纠正清除量。变形矫正去除量是根据（2）基板原料在水平姿态下的自重而产生的挠曲，（3）通过在曝光装置中夹持引起的光掩模基板的变形，（4）精度用于支撑母玻璃的压板的变形。

2. 发明申请

US20050181611A1 Method for preparing large-size substrate 有权
标题翻译：制备大尺寸基材的方法
公开(公告)号：US20050181611A1
公开(公告)日：2005-08-18
申请号：US11059530
申请日：2005-02-17
申请人： Yukio Shibano , Daisuke Kusabiraki , Shuhei Ueda , Atsushi Watabe
发明人： Yukio Shibano , Daisuke Kusabiraki , Shuhei Ueda , Atsushi Watabe
IPC分类号： B24C1/00 , B24C7/00 , H01L29/04
CPC分类号： B24C11/005 , B24C1/00 , B24C7/0038
摘要： A large-size substrate having improved flatness is prepared by measuring the flatness of one surface or opposite surfaces of a large-size substrate having a diagonal length of at least 500 mm, and partially removing raised portions on the one surface or opposite surfaces of the substrate by means of a processing tool on the basis of the measured data. The processing tool is adapted to blast a slurry of microparticulates in water carried on compressed air against the substrate.
摘要翻译：通过测量具有至少500mm的对角线长度的大尺寸基板的一个表面或相对表面的平坦度，并且在一个表面或相对的表面上部分地去除凸起部分来制备具有改善的平坦度的大尺寸基板基于测量数据，通过加工工具进行基底处理。该加工工具适于将承载在压缩空气中的水中的微粒的浆液喷射到衬底上。

3. 发明申请

US20050013972A1 Large-size substrate 有权
标题翻译：大尺寸基板
公开(公告)号：US20050013972A1
公开(公告)日：2005-01-20
申请号：US10891028
申请日：2004-07-15
申请人： Daisuke Kusabiraki , Yukio Shibano
发明人： Daisuke Kusabiraki , Yukio Shibano
IPC分类号： B24D13/10 , B32B1/00 , C03B20/00 , G02F1/13 , G02F1/136 , G03F1/60 , G03F7/20
CPC分类号： B24D13/10 , G03F1/60 , G03F7/70791 , Y10T428/10 , Y10T428/24355 , Y10T428/24777 , Y10T428/315
摘要： A large-size substrate adapted for light exposure is of a plate shape having a diagonal length or diameter of 500-2,000 mm, a thickness of 1-20 mm, and a peripheral surface with a roughness Ra of 0.05-0.4 μm. The number of particles released from the substrate periphery during cleaning is minimized, leading to an improved yield in the cleaning step. The substrate can be manually handled, achieving an improvement in substrate quality without a need for a handling mechanism.
摘要翻译：适用于曝光的大尺寸基板为对角线长度或直径为500〜2000mm，厚度为1-20mm的板状，粗糙度Ra为0.05〜0.4μm的圆周面。在清洁期间从基板周边释放的颗粒的数量被最小化，导致在清洁步骤中提高的产量。可以手动处理基板，在不需要处理机构的情况下实现基板质量的改善。

4. 发明授权

US08012563B2 Large-size substrate 有权
标题翻译：大尺寸基板
公开(公告)号：US08012563B2
公开(公告)日：2011-09-06
申请号：US10891028
申请日：2004-07-15
申请人： Daisuke Kusabiraki , Yukio Shibano
发明人： Daisuke Kusabiraki , Yukio Shibano
IPC分类号： B32B1/00
CPC分类号： B24D13/10 , G03F1/60 , G03F7/70791 , Y10T428/10 , Y10T428/24355 , Y10T428/24777 , Y10T428/315
摘要： A large-size substrate adapted for light exposure is of a plate shape having a diagonal length or diameter of 500-2,000 mm, a thickness of 1-20 mm, and a peripheral surface with a roughness Ra of 0.05-0.4 μm. The number of particles released from the substrate periphery during cleaning is minimized, leading to an improved yield in the cleaning step. The substrate can be manually handled, achieving an improvement in substrate quality without a need for a handling mechanism.
摘要翻译：适用于曝光的大尺寸基板为对角线长度或直径为500〜2000mm，厚度为1-20mm，粗糙度Ra为0.05〜0.4μm的圆周面的板状。在清洁期间从基板周边释放的颗粒的数量被最小化，导致在清洁步骤中提高的产量。可以手动处理基板，在不需要处理机构的情况下实现基板质量的改善。

5. 发明申请

US20080261119A1 Large-Size Glass Substrate For Photomask and Making Method, Computer-Readable Recording Medium, and Mother Glass Exposure Method 有权
标题翻译：用于光掩模和制作方法的大尺寸玻璃基板，计算机可读记录介质和母玻璃曝光方法
公开(公告)号：US20080261119A1
公开(公告)日：2008-10-23
申请号：US11587902
申请日：2006-06-12
申请人： Shuhei Ueda , Yukio Shibano , Atsushi Watabe , Daisuke Kusabiraki
发明人： Shuhei Ueda , Yukio Shibano , Atsushi Watabe , Daisuke Kusabiraki
IPC分类号： G03F1/00 , G03F7/20 , G11B7/16
CPC分类号： G11B7/261 , G03F1/60 , G03F7/70791
摘要： A large-size glass substrate, from which a photomask substrate is formed, is prepared by processing a large-size glass substrate stock by (1) a flattening removal quantity based on height data of the substrate stock in the vertical attitude plus a deformation-corrective removal quantity. The deformation-corrective removal quantity is calculated from (2) a deflection of the substrate stock by its own weight in the horizontal attitude, (3) a deformation of the photomask substrate caused by chucking in an exposure apparatus, and (4) an accuracy distortion of a platen for supporting a mother glass.
摘要翻译：通过（1）基于垂直姿态的基板的高度数据的平坦化去除量加上大尺寸玻璃基板原料，形成光掩模基板的大尺寸玻璃基板，纠正清除量。变形矫正去除量是根据（2）基板原料在水平姿态下的自重而产生的挠曲，（3）通过在曝光装置中夹持引起的光掩模基板的变形，（4）精度用于支撑母玻璃的压板的变形。

6. 发明授权

US07183210B2 Method for preparing large-size substrate 有权
标题翻译：制备大尺寸基材的方法
公开(公告)号：US07183210B2
公开(公告)日：2007-02-27
申请号：US11059530
申请日：2005-02-17
申请人： Yukio Shibano , Daisuke Kusabiraki , Shuhei Ueda , Atsushi Watabe
发明人： Yukio Shibano , Daisuke Kusabiraki , Shuhei Ueda , Atsushi Watabe
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： B24C11/005 , B24C1/00 , B24C7/0038
摘要： A large-size substrate having improved flatness is prepared by measuring the flatness of one surface or opposite surfaces of a large-size substrate having a diagonal length of at least 500 mm, and partially removing raised portions on the one surface or opposite surfaces of the substrate by means of a processing tool on the basis of the measured data. The processing tool is adapted to blast a slurry of microparticulates in water carried on compressed air against the substrate.
摘要翻译：通过测量具有至少500mm的对角线长度的大尺寸基板的一个表面或相对表面的平坦度，并且在一个表面或相对的表面上部分地去除凸起部分来制备具有改善的平坦度的大尺寸基板基于测量数据，通过加工工具进行基底处理。该加工工具适于将承载在压缩空气中的水中的微粒的浆液喷射到衬底上。

7. 发明授权

US06855908B2 Glass substrate and leveling thereof 有权
标题翻译：玻璃基板及其平整度
公开(公告)号：US06855908B2
公开(公告)日：2005-02-15
申请号：US10125519
申请日：2002-04-19
申请人： Masaki Takeuchi , Yukio Shibano
发明人： Masaki Takeuchi , Yukio Shibano
IPC分类号： C03C15/00 , C03C19/00 , C03C23/00 , G03F1/60 , H01L21/027 , B23K9/00
CPC分类号： C03C19/00 , C03C15/00 , C03C23/006 , C03C2204/08
摘要： A glass substrate having a surface which has been leveled, preferably to a flatness of 0.04-1.3 nm/cm2 of the surface, by local plasma etching is provided. A glass substrate whose surface carries microscopic peaks and valleys is leveled by measuring the height of peaks and valleys on the substrate surface, and plasma etching the substrate surface while controlling the amount of plasma etching in accordance with the height of peaks.
摘要翻译：提供了通过局部等离子体蚀刻已经被平整化，优选地达到表面的0.04-1.3nm / cm 2的平坦度的玻璃基板。通过测量衬底表面上的峰和谷的高度，以及等离子体蚀刻衬底表面，同时根据峰的高度控制等离子体蚀刻的量，来对其表面携带微小峰和谷的玻璃衬底进行平整。

8. 发明申请

US20110143267A1 PHOTOMASK-FORMING GLASS SUBSTRATE AND MAKING METHOD 有权
标题翻译：光致发光玻璃基板和制作方法
公开(公告)号：US20110143267A1
公开(公告)日：2011-06-16
申请号：US12964762
申请日：2010-12-10
申请人： Daijitsu Harada , Mamoru Morikawa , Masaki Takeuchi , Yukio Shibano
发明人： Daijitsu Harada , Mamoru Morikawa , Masaki Takeuchi , Yukio Shibano
IPC分类号： G03F1/00
CPC分类号： G03F1/60 , G03F1/14 , Y10T428/24488
摘要： A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 μm.
摘要翻译：提供了具有正方形主表面的光掩模形成玻璃基板，其中在一对相对侧附近的主表面上限定两个条带区域，使得每个区域跨越侧面向内延伸2mm至10mm，并且不包括延伸2 从侧面的相对端向内mm，对于两个条带区域中的每一个计算最小二乘平面，包括在两个条带区域的最小二乘平面的法线之间的角度在10秒内，并且两个区域之间的高度差条带区域高达0.5μm。

9. 发明申请

US20080145770A1 Recycling of large-size photomask substrate 有权
标题翻译：回收大尺寸光掩模基板
公开(公告)号：US20080145770A1
公开(公告)日：2008-06-19
申请号：US12000542
申请日：2007-12-13
申请人： Shuhei Ueda , Yukio Shibano
发明人： Shuhei Ueda , Yukio Shibano
IPC分类号： G03F1/00
CPC分类号： G03F1/68 , Y02P20/582
摘要： A used large-size photomask substrate having a patterned light-shielding film is recycled by (i) removing the light-shielding film from the used substrate to provide a photomask-forming glass substrate stock, (ii) resurfacing the glass substrate stock by sand blasting, (iii) repolishing the resurfaced glass substrate stock to yield a regenerated glass substrate stock, (iv) applying a light-shielding film onto the regenerated glass substrate stock to yield a regenerated photomask-forming blank, and (v) processing the light-shielding film of the blank into a pattern corresponding to the desired exposure of a mother glass, yielding a regenerated photomask substrate.
摘要翻译：通过（i）从使用的基板上除去遮光膜，提供形成光掩模的玻璃基板原料，（ii）通过砂覆盖玻璃基板原料，再循环使用具有图案化遮光膜的已使用的大尺寸光掩模基板（iii）重新铺上重铺玻璃基板原料以产生再生的玻璃基板原料，（iv）将光屏蔽膜施加到再生的玻璃基板原料上以产生再生的光掩模形成坯料，（v）加工光将该坯料的屏蔽膜变成对应于母玻璃所需曝光的图案，产生再生的光掩模基板。

10. 发明申请

US20070045232A1 WAFER POLISHING METHOD AND POLISHED WAFER 有权
标题翻译：波浪抛光方法和抛光波形
公开(公告)号：US20070045232A1
公开(公告)日：2007-03-01
申请号：US11468570
申请日：2006-08-30
申请人： Toshinari MURAI , Yukio Shibano
发明人： Toshinari MURAI , Yukio Shibano
IPC分类号： C23F1/00 , H01L21/302 , B44C1/22
CPC分类号： B24B37/28 , B24B37/30
摘要： A wafer substrate is polished by disposing the wafer substrate between an abrasive cloth on a polishing platen and a plate, and relatively rotating the polishing platen and the plate for mirror polishing the surface of the wafer substrate with the abrasive cloth. A liquid is fed onto the plate side surface of the wafer substrate so that the wafer substrate is directly held to the plate by the adsorption force of the liquid, while performing the mirror polishing.
摘要翻译：通过将晶片衬底设置在研磨台板上的研磨布与板之间，并相对旋转研磨台板和板，用研磨布对晶片基板的表面进行镜面抛光来研磨晶片基板。将液体供给到晶片基板的板侧表面，从而通过液体的吸附力将晶片基板直接固定在板上，同时进行镜面抛光。

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