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1. 发明授权

US08791440B1 Target for extreme ultraviolet light source 有权
标题翻译：瞄准极紫外光源
公开(公告)号：US08791440B1
公开(公告)日：2014-07-29
申请号：US13830380
申请日：2013-03-14
申请人： Cymer, Inc.
发明人： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J. W. Brown , Daniel J. Golich
IPC分类号： H01S3/10 , H01S3/13
CPC分类号： H05G2/008 , G21K5/02 , H01S3/10 , H05G2/005
摘要： Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
摘要翻译：用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。

2. 发明授权

US08653492B1 Target for laser produced plasma extreme ultraviolet light source 有权
标题翻译：激光产生等离子体极光紫外光源的目标
公开(公告)号：US08653492B1
公开(公告)日：2014-02-18
申请号：US13830461
申请日：2013-03-14
申请人： Cymer, Inc.
发明人： Robert J. Rafac , Yezheng Tao
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , G03F7/70033 , G21K5/00 , H05G2/005
摘要： Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
摘要翻译：用于产生EUV光的技术包括将第一辐射脉冲引导到目标材料液滴以形成修改的液滴，所述第一辐射脉冲具有足以改变目标材料液滴形状的能量; 将第二脉冲的辐射引向修饰的液滴以形成吸收材料，第二脉冲的辐射具有足以改变改性液滴的性质的能量，该性质与辐射的吸收有关; 并且将放大的光束引向吸收材料，放大的光束具有足以将吸收材料的至少一部分转化成极紫外（EUV）光的能量。

3. 发明授权

US08680495B1 Extreme ultraviolet light source 有权
标题翻译：极紫外光源
公开(公告)号：US08680495B1
公开(公告)日：2014-03-25
申请号：US13843626
申请日：2013-03-15
申请人： Cymer, Inc.
发明人： Yezheng Tao , Robert Jay Rafac , Igor V. Fomenkov , Daniel J. W. Brown
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.
摘要翻译：描述了一种技术，其通过来自在进入目标位置之前被修改为目标分布或扩展目标的目标材料的反馈来增强来自极端紫外光源的功率。来自空间扩展的目标分布的反馈提供了非共振光学腔，因为发生反馈的路径的几何形状，例如往返行程长度和方向，可以在时间上改变，或空间扩展目标分布的形状可能不能提供足够光滑的反射率。然而，如果克服上述几何和物理约束，来自空间扩展的目标分布的反馈可能提供谐振和相干光学腔。在任何情况下，可以使用从非振荡器增益介质产生的自发发射的光来产生反馈。

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