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1. 发明授权

US5380471A Aeration apparatus for producing ultrapure water 失效
标题翻译：用于生产超纯水的曝气设备
公开(公告)号：US5380471A
公开(公告)日：1995-01-10
申请号：US203611
申请日：1994-02-28
申请人： Cozy Ban , Motonori Yanagi , Takaaki Fukumoto , Toshiki Manabe , Hiroshi Yanome
发明人： Cozy Ban , Motonori Yanagi , Takaaki Fukumoto , Toshiki Manabe , Hiroshi Yanome
IPC分类号： C02F1/20 , C02F1/42 , C02F1/44 , C02F1/52 , C02F1/72 , C02F3/26 , C02F9/00 , B01F3/04
CPC分类号： C02F1/72 , C02F2103/04 , Y10S261/75
摘要： In an aeration apparatus and method for producing ultrapure water, a device for vigorously mixing an aeration gas with untreated water is attached to a water pipe through which the water is fed to a reaction tank. The device vigorously mixes the aeration gas with the untreated water in the water pipe before the water reaches the reaction tank. The reaction tank can be smaller, an aeration system for producing ultrapure water can be simpler, and the efficiency of the aeration system can be improved.
摘要翻译：在用于制造超纯水的曝气装置和方法中，将曝气气体与未处理水强力混合的装置安装在水被送入反应槽的水管上。在水到达反应槽之前，该装置将曝气气体与未处理水混合在水管中。反应罐可以更小，用于生产超纯水的曝气系统可以更简单，并且可以提高曝气系统的效率。

2. 发明授权

US5344615A Wet-process apparatus 失效
标题翻译：湿法处理装置
公开(公告)号：US5344615A
公开(公告)日：1994-09-06
申请号：US136050
申请日：1993-10-14
申请人： Motonori Yanagi , Cozy Ban , Takaaki Fukumoto
发明人： Motonori Yanagi , Cozy Ban , Takaaki Fukumoto
IPC分类号： B01D53/18 , B01L1/00 , C01B21/04 , H01L21/304 , H01L21/306 , B01D53/34 , B01D50/00
CPC分类号： C01B21/0411 , B01L1/00
摘要： The present invention provides a wet-processing apparatus comprising a chamber having a working space, means for wet processing in the working space, means for supplying nitrogen gas in fluid communication with the chamber, a nitrogen gas outlet located in a wall of the chamber, means for cleaning nitrogen gas by removing contaminants mixed therewith located in an area of the chamber downstream of the working space and upstream of the nitrogen gas outlet and having a contaminated gas inlet and a treated gas outlet in fluid communication with the chamber, means for diverting gas in the chamber located downstream of the treated gas outlet and upstream of the nitrogen gas supplying means, the means for diverting gas having a first position providing egress of treated gas from the chamber through the nitrogen gas outlet while inhibiting fluid communication to other parts of the chamber and a second position permitting fluid communication and recirculation of the treated gas to other parts of the chamber while preventing egress of the treated gas through the nitrogen gas outlet, and means for circulating nitrogen gas in the chamber.
摘要翻译：本发明提供了一种湿式处理装置，包括具有工作空间的室，在工作空间中进行湿处理的装置，用于供应与室流体连通的氮气的装置，位于室壁的氮气出口，用于通过去除位于工作空间下游和氮气出口上游处的室内区域混合的污染物并且具有被污染的气体入口和与室流体连通的处理气体出口来清洁氮气的装置，用于转向的装置位于经处理的气体出口下游和氮气供应装置上游的腔室中的气体，用于转移具有第一位置的气体的装置，该第一位置提供经处理的气体从室通过氮气出口排出，同时抑制与其他部分的流体连通所述腔室和第二位置允许经处理的气体流体连通并再循环到其它部件同时防止处理气体通过氮气出口排出，以及用于在室中循环氮气的装置。

3. 发明授权

US5554295A Method for producing pure water 失效
标题翻译：纯水生产方法
公开(公告)号：US5554295A
公开(公告)日：1996-09-10
申请号：US439124
申请日：1995-05-11
申请人： Cozy Ban , Motonori Yanagi , Takaaki Fukumoto , Toshiki Manabe , Hiroshi Yanome , Kazuhiko Kawada
发明人： Cozy Ban , Motonori Yanagi , Takaaki Fukumoto , Toshiki Manabe , Hiroshi Yanome , Kazuhiko Kawada
IPC分类号： C02F1/20 , C02F1/32 , C02F1/42 , C02F1/78 , C02F9/00
CPC分类号： C02F1/32 , C02F1/42 , C02F1/78 , C02F9/00 , C02F2103/04 , Y10S210/90
摘要： A method for producing pure water is provided which reduces non-ionic silica in pure or ultrapure water. With the method, non-ionic silica which is contained in water is brought into contact with ozone having a concentration of at least 1 ppm for at least 20 minutes to react therewith and, simultaneously with or after this reaction process, irradiated with ultraviolet rays to undergo ionization and passed through an anion exchange column. The processed water passed through this ion exchange resin column contains practically no non-ionic silica.
摘要翻译：提供了一种生产纯水的方法，其减少纯或超纯水中的非离子二氧化硅。使用该方法，将含在水中的非离子二氧化硅与至少1ppm的浓度的臭氧接触至少20分钟与其反应，并且在该反应过程之后或之后用紫外线照射进行电离并通过阴离子交换柱。通过该离子交换树脂柱的处理水实际上不含有非离子二氧化硅。

4. 发明授权

US5470461A Apparatus for producing pure water 失效
标题翻译：纯水生产设备
公开(公告)号：US5470461A
公开(公告)日：1995-11-28
申请号：US955143
申请日：1992-10-01
申请人： Cozy Ban , Motonori Yanagi , Takaaki Fukumoto , Toshiki Manabe , Hiroshi Yanome , Kazuhiko Kawada
发明人： Cozy Ban , Motonori Yanagi , Takaaki Fukumoto , Toshiki Manabe , Hiroshi Yanome , Kazuhiko Kawada
IPC分类号： C02F1/20 , C02F1/32 , C02F1/42 , C02F1/78 , C02F9/00
CPC分类号： C02F1/32 , C02F1/42 , C02F1/78 , C02F9/00 , C02F2103/04 , Y10S210/90
摘要： An apparatus for producing pure water is provided which includes means for ionizing non-ionic silica which is contained in water comprising a vessel for allowing the water to pass therethrough and stay therein for predetermined lengths of time; means for dissolving ozone in the water in this vessel; means for irradiating the water in which ozone has been dissolved with ultraviolet rays; means for separating gases from liquids located between the means for dissolving ozone and the means for irradiating water; and means for fixing ionized silica in the water to a solid electrolyte by ion exchange.
摘要翻译：提供一种用于生产纯水的设备，其包括用于离子化包含在水中的非离子二氧化硅的装置，该水包含用于允许水通过并容纳预定长度的容器的容器; 用于将臭氧溶解在该容器中的水中的方法; 用紫外线照射臭氧溶解的水的装置; 用于从位于溶解臭氧的装置和用于照射水的装置之间的液体中分离气体的装置; 以及通过离子交换将电离二氧化硅固定在固体电解质中的方法。

5. 发明授权

US5336356A Apparatus for treating the surface of a semiconductor substrate 失效
标题翻译：用于处理半导体衬底的表面的设备
公开(公告)号：US5336356A
公开(公告)日：1994-08-09
申请号：US914326
申请日：1992-07-17
申请人： Cozy Ban , Toshiaki Ohmori , Takaaki Fukumoto
发明人： Cozy Ban , Toshiaki Ohmori , Takaaki Fukumoto
IPC分类号： H01L21/302 , H01L21/304 , H01L21/306 , H01L21/00
CPC分类号： H01L21/02049
摘要： In an apparatus for treating the surface of a semiconductor substrate, hydrogen fluoride is dissolved in a nonaqueous solvent, ionizing anhydrous hydrogen fluoride, and the solution is vaporized. The vapor of the solution is introduced onto the surface of the semiconductor in a reaction chamber to treat this surface. The semiconductor substrate can be subjected to treatments, such as cleaning and etching, without producing reactions products on the surface.
摘要翻译：在用于处理半导体衬底的表面的设备中，将氟化氢溶解在非水溶剂中，使无水氟化氢离子化，并使溶液蒸发。将溶液的蒸气引入到反应室中的半导体表面上以处理该表面。可以对半导体衬底进行诸如清洁和蚀刻的处理，而不会在表面上产生反应产物。

6. 发明授权

US5246586A Apparatus and method for producing ultrapure water and method of controlling the apparatus 失效
标题翻译：用于生产超滤水的装置和方法以及控制装置的方法
公开(公告)号：US5246586A
公开(公告)日：1993-09-21
申请号：US897042
申请日：1992-06-11
申请人： Cozy Ban , Takaaki Fukumoto
发明人： Cozy Ban , Takaaki Fukumoto
IPC分类号： B01D61/04 , B01D61/02 , B01J39/04 , B01J47/14 , C02F1/42 , C02F1/44 , C02F1/52 , C02F1/72 , C02F9/00 , G05D21/02
CPC分类号： G05D21/02 , B01D61/022 , B01J39/04 , B01J47/145 , C02F1/42 , C02F1/441 , C02F2103/04
摘要： An apparatus for producing ultrapure water includes a cation exchange resin tower, a decarbonation tower, an anion exchange resin tower, and a pH adjustor for changing the zeta potential of the impurities contained in water. The pH value is adjusted to aggregate or ionize the impurities. The apparatus can be controlled so that the treated water is introduced into a reverse osmosis unit or an oxidation tower and an after reverse osmosis unit according to the quality of the treated water.
摘要翻译：用于生产超纯水的设备包括阳离子交换树脂塔，脱碳塔，阴离子交换树脂塔和用于改变水中杂质的ζ电位的pH调节剂。调整pH值以使杂质聚集或电离。可以控制该装置，使处理后的水根据处理水的质量被引入反渗透装置，氧化塔和反渗透装置。

7. 发明授权

US5216890A Device for and method of producing hyperfine frozen particles 失效
标题翻译：制造高温冷冻颗粒的装置和方法
公开(公告)号：US5216890A
公开(公告)日：1993-06-08
申请号：US846010
申请日：1992-03-04
申请人： Cozy Ban , Itaru Kanno , Takaaki Fukumoto
发明人： Cozy Ban , Itaru Kanno , Takaaki Fukumoto
IPC分类号： B01D7/02 , F25C1/00
CPC分类号： B01D7/02 , F25C1/00
摘要： A device for and a method of producing hyperfine frozen particles reduces the quantity of impurity particles in the hyperfine frozen particles produced and stabilizes the generation of hyperfine frozen particles. A hopper includes a heat exchanger through which a coolant, such as nitrogen gas or liquid nitrogen, is circulated. A nitrogen gas inlet through which low temperature nitrogen gas as a coolant is supplied includes a filter to produce a laminar flow of the gas.
摘要翻译：用于制造超细冷冻颗粒的装置和方法减少了产生的超细冷冻颗粒中的杂质颗粒的数量，并且稳定了超细冷冻颗粒的产生。料斗包括热交换器，诸如氮气或液氮的冷却剂通过该热交换器循环。供给作为冷却剂的低温氮气的氮气入口包括产生气体层流的过滤器。

8. 发明授权

US5935314A Inorganic filler, epoxy resin composition, and semiconductor device 失效
标题翻译：无机填料，环氧树脂组合物和半导体器件
公开(公告)号：US5935314A
公开(公告)日：1999-08-10
申请号：US919344
申请日：1997-08-28
申请人： Noriaki Higuchi , Takaaki Fukumoto , Toshio Shiobara , Eiichi Asano , Kazutoshi Tomiyoshi
发明人： Noriaki Higuchi , Takaaki Fukumoto , Toshio Shiobara , Eiichi Asano , Kazutoshi Tomiyoshi
IPC分类号： C08K3/00 , C08K7/16 , C08K7/18 , C08L63/00 , C09C1/30 , C09C3/04 , H01L23/29 , H01L23/31 , C04B14/00
CPC分类号： H01L23/295 , C08K7/18 , C09C1/3009 , C09C3/04 , C01P2004/32 , C01P2004/61 , C01P2006/12 , C01P2006/22 , C01P2006/80 , H01L2924/0002 , Y10T428/12528
摘要： By removing a fraction of fine particles having a particle size of less than 2 .mu.m from starting inorganic filler particles having a mean particle size of 10-50 .mu.m and adding thereto particles having a mean particle size of 0.1-2 .mu.m and a specific surface area of 3-10 m.sup.2 /g (BET), there is obtained a particulate inorganic filler having a mean particle size of 5-40 .mu.m. When a large amount of the inorganic filler is loaded in an epoxy resin composition, the composition maintains a low melt viscosity enough to mold and is effective for encapsulating a semiconductor device without causing die pad deformation and wire deformation. The encapsulated semiconductor device is highly reliable.
摘要翻译：通过从平均粒径为10-50μm的起始无机填料颗粒中除去一小部分粒径小于2μm的细颗粒，并加入平均粒度为0.1-2μm的颗粒和比表面积为3-10m2 / g（BET），得到平均粒径为5-40μm的颗粒状无机填料。当大量的无机填料装载在环氧树脂组合物中时，该组合物保持足够低的熔体粘度以成型，并且对于封装半导体器件而言不会引起芯片焊盘的变形和焊丝变形。封装的半导体器件是高度可靠的。

9. 发明授权

US5283989A Apparatus for polishing an article with frozen particles 失效
标题翻译：用冷冻颗粒抛光物品的装置
公开(公告)号：US5283989A
公开(公告)日：1994-02-08
申请号：US577536
申请日：1990-09-05
申请人： Akiko Hisasue , Itaru Kanno , Takaaki Fukumoto
发明人： Akiko Hisasue , Itaru Kanno , Takaaki Fukumoto
IPC分类号： B24C1/00 , B24C7/00 , B24C11/00 , H01L21/304 , B24R7/00
CPC分类号： B24C1/003 , B24C11/00 , B24C7/00
摘要： A novel and improved polishing apparatus is disclosed which employs ice particles as an abrasive material, the hardness of which can be changed so as to match that of an article being polished for performing polishing operation in a most efficient manner without impairing or marring the polished surface of the article. To this end, the polishing apparatus includes a freezing vessel defining therein an ice particle producing chamber, a coolant supply nozzle mounted on the freezing vessel and connected with a coolant source through a coolant supply line for spraying a coolant into the ice particle producing chamber to form a freezing atmosphere, a liquid supply nozzle mounted on the freezing vessel and connected with a liquid supply for spraying a liquid into the ice particle producing chamber so that the liquid thus sprayed is cooled and freezed by the freezing atmosphere to produce superfine ice particles, a particle hardness adjuster for adjusting the hardness of the ice particles to be produced so as to match the hardness of an article being polished, and an injection nozzle for injecting the ice particles towards a surface of the article for polishing thereof. Preferably, the particle hardness adjuster comprises a flow control valve which is disposed on the coolant supply line between the coolant supply nozzle and the coolant source for adjusting and changing the amount of coolant sprayed therefrom into the ice particle producing chamber so as to control the temperature therein.
摘要翻译：公开了一种新颖且改进的抛光装置，其使用冰颗粒作为研磨材料，其硬度可以改变，以便与被抛光的制品的硬度相匹配，以最有效的方式进行抛光操作，而不损害或磨损抛光表面的文章。为此，抛光装置包括在其中限定冰颗粒产生室的冷冻机，安装在冷冻容器上的冷却剂供应喷嘴，并通过冷却剂供应管线与冷却剂源连接，用于将冷却剂喷射到冰颗粒产生室中形成冷冻气氛，安装在冷冻容器上的液体供应喷嘴，并与用于将液体喷射到冰粒产生室中的液体供应源连接，使得如此喷射的液体被冷冻气氛冷却并冷冻以产生超细冰颗粒，粒子硬度调节器，用于调节要制造的冰颗粒的硬度以匹配待抛光的制品的硬度;以及喷嘴，用于将冰颗粒注射到制品的表面以进行抛光。优选地，颗粒硬度调节器包括流量控制阀，该流量控制阀设置在冷却剂供应喷嘴和冷却剂源之间的冷却剂供应管线上，用于调节和改变从其喷射到冰颗粒产生室中的冷却剂的量，以便控制温度其中。

10. 发明授权

US5186907A Apparatus for treating organic waste gas 失效
标题翻译：用于处理有机废气的装置
公开(公告)号：US5186907A
公开(公告)日：1993-02-16
申请号：US149155
申请日：1988-01-27
申请人： Motonori Yanagi , Masaharu Hama , Takaaki Fukumoto , Miki Tsukaguchi
发明人： Motonori Yanagi , Masaharu Hama , Takaaki Fukumoto , Miki Tsukaguchi
IPC分类号： B01D53/72 , B01J19/12 , C01B13/10
CPC分类号： C01B13/10 , B01D53/72 , B01J19/123
摘要： An apparatus for treating an organic waste gas has an oxidizing means for contacting the waste gas with an oxidizing agent to effect primary oxidation and form a primary oxidation product. An ultraviolet wave generator inadiates the primary reaction product with UV light in the near UV range to effect secondary oxidation of the primary reaction product.
摘要翻译：一种用于处理有机废气的设备具有用于使废气与氧化剂接触以实现初级氧化并形成初级氧化产物的氧化装置。紫外线发生器在近紫外范围内用紫外线照射初级反应产物，以使初级反应产物二次氧化。

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