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1. 发明授权

US06870948B2 Method and apparatus for numerically analyzing grain growth on semiconductor wafer using SEM image 失效
标题翻译：使用SEM图像对半导体晶片上的晶粒生长进行数值分析的方法和装置
公开(公告)号：US06870948B2
公开(公告)日：2005-03-22
申请号：US09977238
申请日：2001-10-16
申请人： Chung-sam Jun , Sang-Mun Chon , Sang-Bong Choi , Kye-Weon Kim , Sang-Hoon Lee , Yu-Sin Yang , Sang-Min Kim , Sang-Kil Lee
发明人： Chung-sam Jun , Sang-Mun Chon , Sang-Bong Choi , Kye-Weon Kim , Sang-Hoon Lee , Yu-Sin Yang , Sang-Min Kim , Sang-Kil Lee
IPC分类号： G01B15/00 , G01B15/08 , G01N15/00 , G01N15/14 , G01N23/20 , G01N23/225 , G06T1/00 , G06T7/00 , H01L21/66 , G06K9/00 , H01L21/8242
CPC分类号： G06T7/0004 , G01N15/1475 , G01N2015/0092 , G06T2207/30148 , H01J2237/2815
摘要： A method and apparatus for numerically analyzing a growth degree of grains grown on a surface of a semiconductor wafer, in which the growth degree of grains is automatically calculated and numerated through a computer by using an image file of the surface of the semiconductor wafer scanned by an SEM. A predetermined portion of a surface of the wafer is scanned using the SEM, and the scanned SEM image is simultaneously stored into a database. An automatic numerical program applies meshes to an analysis screen frame and selects an analysis area on a measured image. Thereafter, a smoothing process for reducing an influence of noise is performed on respective pixels designated by the meshes using an average value of image data of adjacent pixels. A standardization process is then performed, based on respective images in order to remove a brightness difference between the measured images. After comparing standardized image data values of the respective pixels with a predetermined threshold value, the number of pixels whose standardized image data value is greater than the threshold value is counted. The growth degree of grains on the surface of the wafer is calculated by numerating a ratio of the counted number with respect to a total number of the pixels contained within the analysis target image.
摘要翻译：一种用于数值分析生长在半导体晶片的表面上的晶粒的生长度的方法和装置，其中通过使用由半导体晶片的表面扫描的半导体晶片的表面的图像文件自动计算和计算晶粒的生长度 SEM。使用SEM扫描晶片的表面的预定部分，并将扫描的SEM图像同时存储到数据库中。自动数值程序将网格应用于分析屏幕框架，并在测量图像上选择分析区域。此后，使用相邻像素的图像数据的平均值对由网格指定的各个像素执行用于减少噪声的影响的平滑处理。然后基于相应的图像执行标准化处理，以便去除所测量的图像之间的亮度差异。在将各像素的标准化图像数据值与预定阈值进行比较之后，对标准化图像数据值大于阈值的像素数进行计数。通过对计数的数量相对于分析对象图像中包含的像素的总数的比率进行计算来计算晶片表面上的晶粒的生长度。

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