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    • 3. 发明申请
    • THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    • 薄膜晶体管基板及其制造方法
    • US20100044712A1
    • 2010-02-25
    • US12605647
    • 2009-10-26
    • Seong-Kweon HEOChun-Gi YOU
    • Seong-Kweon HEOChun-Gi YOU
    • H01L33/00
    • H01L27/124H01L27/1255H01L27/1288
    • A thin-film transistor substrate includes a gate line, a capacitor dielectric layer, a gate insulation layer, an active pattern, a data line, a protection layer, and a pixel electrode. The gate wiring including a gate electrode, a lower storage electrode, and a gate metal pad is disposed on a substrate. The capacitor dielectric layer is disposed on the lower storage electrode and the gate insulation layer is disposed on the substrate. The active pattern includes an active layer and a dummy active layer disposed on the gate insulation layer in a gate electrode region and a gate metal pad region, respectively. A portion of the upper storage electrode is disposed on the capacitor dielectric layer exposed through a first contact hole in the gate insulation layer.
    • 薄膜晶体管基板包括栅极线,电容器电介质层,栅极绝缘层,有源图案,数据线,保护层和像素电极。 包括栅电极,下存储电极和栅极金属焊盘的栅极布线设置在基板上。 电容器电介质层设置在下部存储电极上,栅极绝缘层设置在基板上。 有源图案包括分别设置在栅极电极区域和栅极金属焊盘区域中的栅极绝缘层上的有源层和伪有源层。 上部存储电极的一部分设置在通过栅极绝缘层中的第一接触孔露出的电容器电介质层上。
    • 5. 发明申请
    • THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
    • 薄膜晶体管基板及其制造方法
    • US20080135845A1
    • 2008-06-12
    • US11944010
    • 2007-11-21
    • Seong-Kweon HEOChun-Gi YOU
    • Seong-Kweon HEOChun-Gi YOU
    • H01L27/12H01L21/84
    • H01L27/124H01L27/1255H01L27/1288
    • A thin-film transistor substrate includes a gate line, a capacitor dielectric layer, a gate insulation layer, an active pattern, a data line, a protection layer, and a pixel electrode. The gate wiring including a gate electrode, a lower storage electrode, and a gate metal pad is disposed on a substrate. The capacitor dielectric layer is disposed on the lower storage electrode and the gate insulation layer is disposed on the substrate. The active pattern includes an active layer and a dummy active layer disposed on the gate insulation layer in a gate electrode region and a gate metal pad region, respectively. A portion of the upper storage electrode is disposed on the capacitor dielectric layer exposed through a first contact hole in the gate insulation layer.
    • 薄膜晶体管基板包括栅极线,电容器电介质层,栅极绝缘层,有源图案,数据线,保护层和像素电极。 包括栅电极,下存储电极和栅极金属焊盘的栅极布线设置在基板上。 电容器电介质层设置在下部存储电极上,栅极绝缘层设置在基板上。 有源图案包括分别设置在栅极电极区域和栅极金属焊盘区域中的栅极绝缘层上的有源层和伪有源层。 上部存储电极的一部分设置在通过栅极绝缘层中的第一接触孔露出的电容器电介质层上。
    • 7. 发明申请
    • THIN FILM TRANSISTOR ARRAY SUBSTRATE, ORGANIC LIGHT-EMITTING DISPLAY DEVICE INCLUDING THE SAME AND METHOD OF MANUFACTURING THE THIN FILM TRANSISTOR ARRAY SUBSTRATE
    • 薄膜晶体管阵列基板,包括其的有机发光显示装置和制造薄膜晶体管阵列基板的方法
    • US20130200379A1
    • 2013-08-08
    • US13589636
    • 2012-08-20
    • Chun-Gi YOUJoon-Hoo Choi
    • Chun-Gi YOUJoon-Hoo Choi
    • H01L51/50H01L21/336H01L29/786
    • H01L27/1288H01L27/1255H01L27/3262H01L29/4908
    • A thin film transistor (TFT) array substrate includes a TFT including an active layer, a gate electrode, source and drain electrodes, a first insulating layer between the active layer and the gate electrode, and a second insulating layer and a third insulating layer between the gate electrode and the source and drain electrodes, the first insulating layer and the second insulating layer extending in the TFT, a pixel electrode including a transparent conductive oxide material, the pixel electrode being on the first insulating layer and the second insulating layer and being connected to the source or drain electrodes via an opening in the third insulating layer, a capacitor including a first electrode on a same layer as the gate electrode and a second electrode on a same layer as the pixel electrode; and a fourth insulating layer covering the source and drain electrodes and exposing the pixel electrode via an opening.
    • 薄膜晶体管(TFT)阵列基板包括:TFT,包括有源层,栅电极,源电极和漏电极,有源层和栅电极之间的第一绝缘层,以及第二绝缘层和第三绝缘层, 所述栅电极和所述源极漏极,所述第一绝缘层和在所述TFT中延伸的所述第二绝缘层,包括透明导电氧化物材料的像素电极,所述像素电极在所述第一绝缘层和所述第二绝缘层上,并且为 通过所述第三绝缘层中的开口连接到所述源电极或漏电极;电容器,包括与所述栅电极相同的层上的第一电极和与所述像素电极相同的层上的第二电极; 以及覆盖所述源电极和漏极的第四绝缘层,并且经由开口暴露所述像素电极。
    • 8. 发明申请
    • THIN FILM TRANSISTOR ARRAY SUBSTRATE, ORGANIC LIGHT EMITTING DISPLAY DEVICE COMPRISING THE SAME, AND METHOD OF MANUFACTURING THE SAME
    • 薄膜晶体管阵列基板,包含该基板的有机发光显示装置及其制造方法
    • US20130126882A1
    • 2013-05-23
    • US13480746
    • 2012-05-25
    • Chun-Gi YOUJoon-Hoo Choi
    • Chun-Gi YOUJoon-Hoo Choi
    • H01L51/50H01L21/336H01L29/786
    • H01L27/1255H01L27/124H01L27/3248H01L27/326H01L27/3276H01L51/5206H01L51/5215H01L2227/323
    • A thin film transistor array substrate includes a thin film transistor including an activation layer, a gate electrode, source and drain electrodes, a first insulation layer between the activation layer and the gate electrode, and a second insulation layer between the gate electrode and the source and drain electrodes, a pixel electrode including a transparent conductive oxide, the pixel electrode being on a portion of the first insulation layer extending from the thin film transistor and being connected to one of the source and drain electrodes via an opening in the second insulation layer, a capacitor including a first electrode and a second electrode, the first electrode being on a same layer as the activation layer and including a transparent conductive oxide, and the second electrode being between the first and second insulation layers, and a third insulation layer covering the source and drain electrodes and exposing the pixel electrode.
    • 薄膜晶体管阵列基板包括薄膜晶体管,其包括激活层,栅电极,源极和漏极,激活层和栅电极之间的第一绝缘层,以及栅电极和源极之间的第二绝缘层 和漏电极,包括透明导电氧化物的像素电极,所述像素电极在所述第一绝缘层的从所述薄膜晶体管延伸的部分上并且经由所述第二绝缘层中的开口连接到所述源极和漏极之一 包括第一电极和第二电极的电容器,所述第一电极位于与所述活化层相同的层上并且包括透明导电氧化物,所述第二电极位于所述第一绝缘层和所述第二绝缘层之间,并且所述第三绝缘层覆盖 源电极和漏极,并暴露像素电极。
    • 9. 发明申请
    • ORGANIC LIGHT-EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS
    • 有机发光显示装置及制造有机发光显示装置的方法
    • US20130161632A1
    • 2013-06-27
    • US13592508
    • 2012-08-23
    • Chun-Gi YOUJoon-Hoo Choi
    • Chun-Gi YOUJoon-Hoo Choi
    • H01L29/786H01L33/62
    • H01L27/3276H01L27/1244H01L2227/323
    • An OLED apparatus including a thin film transistor including an activation layer, a gate electrode insulated from the activation layer and including a lower gate electrode and an upper gate electrode, an interlayer insulation film covering the gate electrode, and a source and drain electrode on the insulation film and contacting the activation layer; an OLED including a pixel electrode electrically connected to the thin film transistor, an intermediate layer including an emissive layer, and an opposite electrode; a blister prevention layer on a same level as the activation layer; a gate insulation layer covering the activation layer and the blister prevention layer and insulating the activation layer from the gate electrode; and an interconnection unit including first and second layers on a portion of the gate insulation layer overlying the blister prevention layer, wherein the blister prevention layer protects the interconnection unit on the gate insulation layer from blistering.
    • 一种OLED装置,包括:薄膜晶体管,其包括激活层,与所述激活层绝缘并且包括下栅电极和上栅电极的栅电极,覆盖所述栅电极的层间绝缘膜以及所述栅极电极和漏电极 绝缘膜并与活化层接触; 包括与薄膜晶体管电连接的像素电极的OLED,包括发光层的中间层和相对电极; 与激活层在同一水平上的防泡层; 覆盖所述活化层和所述起泡防止层并将所述活化层与所述栅电极绝缘的栅极绝缘层; 以及互连单元,其包括覆盖在防泡层上的栅极绝缘层的一部分上的第一层和第二层,其中防泡层保护栅极绝缘层上的互连单元不起泡。
    • 10. 发明申请
    • THIN FILM TRANSISTOR AND METHOD OF FABRICATING THE SAME
    • 薄膜晶体管及其制造方法
    • US20110084276A1
    • 2011-04-14
    • US12753732
    • 2010-04-02
    • Jin-Hee KANGChun-Gi YOUSun PARKJong-Hyun PARKYul-Kyu LEE
    • Jin-Hee KANGChun-Gi YOUSun PARKJong-Hyun PARKYul-Kyu LEE
    • H01L29/786H01L21/336
    • H01L29/78609H01L29/78618
    • A thin film transistor (TFT) and a method of fabricating the same are disclosed. The TFT includes a substrate, a gate electrode disposed over the substrate, a gate insulating layer disposed over the gate electrode, a semiconductor layer disposed over the gate insulating layer and including a polycrystalline silicon (poly-Si) layer, an ohmic contact layer disposed over a predetermined region of the semiconductor layer, an insulating interlayer disposed over substantially an entire surface of the substrate including the ohmic contact layer, and source and drain electrodes electrically connected to the ohmic contact layer through contact holes formed in the interlayer insulating layer. A barrier layer is interposed between the semiconductor layer and the ohmic contact layer. Thus, when an off-current of a bottom-gate-type TFT is controlled, degradation of characteristics due to a leakage current may be prevented using a simple process.
    • 公开了一种薄膜晶体管(TFT)及其制造方法。 TFT包括衬底,设置在衬底上的栅电极,设置在栅电极上的栅极绝缘层,设置在栅极绝缘层上方并包括多晶硅(poly-Si)层的半导体层,设置的欧姆接触层 超过半导体层的预定区域,设置在包括欧姆接触层的基板的基本上整个表面上的绝缘夹层,以及通过形成在层间绝缘层中的接触孔与欧姆接触层电连接的源极和漏极。 阻挡层介于半导体层和欧姆接触层之间。 因此,当控制底栅型TFT的截止电流时,可以通过简单的处理来防止由漏电流引起的特性的劣化。