会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Manufacturing techniques to limit damage on workpiece with varying topographies
    • 制造技术来限制对具有不同形貌的工件的损伤
    • US08623229B2
    • 2014-01-07
    • US13306299
    • 2011-11-29
    • Chun-Chang ChenShih-Chi FuWang-Pen MoHung Chang Hsieh
    • Chun-Chang ChenShih-Chi FuWang-Pen MoHung Chang Hsieh
    • B44C1/22
    • H01L21/32139H01L21/0271H01L27/11541H01L29/66795
    • Some embodiments relate to a method for processing a workpiece. In the method, a first photoresist layer is provided over the workpiece, wherein the first photoresist layer has a first photoresist tone. The first photoresist layer is patterned to provide a first opening exposing a first portion of the workpiece. A second photoresist layer is then provided over the patterned first photoresist layer, wherein the second photoresist layer has a second photoresist tone opposite the first photoresist tone. The second photoresist layer is then patterned to provide a second opening that at least partially overlaps the first opening to define a coincidentally exposed workpiece region. A treatment is then performed on the coincidentally exposed workpiece region. Other embodiments are also disclosed.
    • 一些实施例涉及用于处理工件的方法。 在该方法中,在工件上设置第一光致抗蚀剂层,其中第一光致抗蚀剂层具有第一光致抗蚀剂色调。 图案化第一光致抗蚀剂层以提供暴露工件的第一部分的第一开口。 然后在图案化的第一光致抗蚀剂层上提供第二光致抗蚀剂层,其中第二光致抗蚀剂层具有与第一光致抗蚀剂色调相反的第二光致抗蚀剂色调。 然后对第二光致抗蚀剂层进行图案化以提供与第一开口至少部分重叠的第二开口,以限定重合的工件区域。 然后对同时暴露的工件区域进行处理。 还公开了其他实施例。