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1. 发明申请

US20070250870A1 System and method for transmitting broadcast contents over DLNA network 有权
标题翻译：通过DLNA网络发送广播内容的系统和方法
公开(公告)号：US20070250870A1
公开(公告)日：2007-10-25
申请号：US11481446
申请日：2006-07-06
申请人： Chul Kim , Ho Shin , Young Bae , Yun Oh , Joon Kim
发明人： Chul Kim , Ho Shin , Young Bae , Yun Oh , Joon Kim
IPC分类号： H04N7/16 , H04N7/18 , H04N7/173
CPC分类号： H04N21/8543 , H04N21/43615 , H04N21/43637 , H04N21/4402 , H04N21/4621
摘要： The present invention relates to a system and method for retransmitting high definition contents broadcasted on a plurality of channels to IP-supported devices such as a digital media player (DMP), a mobile phone, personal computer (PC), etc. which are connected through a DLNA network. The method for retransmitting the broadcasted high definition contents includes the steps of generating a virtual item by converting channel information for a digital TV broadcast into an Extensible Markup Language (XML) file format, transmitting the virtual item to the DMP, determining whether there is a request for a personal TV service (PTS) from the DMP, tuning to a channel corresponding to the PTS if there is the request for the PTS, storing and packetizing a digital TV broadcast stream received through the PTS channel, and transmitting the packetized digital TV broadcast stream to the DMP.
摘要翻译：本发明涉及一种用于将多个频道上广播的高分辨率内容重传到IP连接的诸如数字媒体播放器（DMP），移动电话，个人计算机（PC）等的IP支持的设备的系统和方法通过DLNA网络。重播广播的高分辨率内容的方法包括以下步骤：通过将数字电视广播的频道信息转换为可扩展标记语言（XML）文件格式来生成虚拟物品，将虚拟物品发送到DMP，确定是否存在从DMP请求个人电视服务（PTS），如果存在对PTS的请求，则调谐到与PTS对应的信道，存储和分组通过PTS信道接收的数字TV广播流，并且发送分组数字电视广播流到DMP。

2. 发明申请

US20070237090A1 Method for transforming contents in the DLNA system 失效
标题翻译：用于变换DLNA系统内容的方法
公开(公告)号：US20070237090A1
公开(公告)日：2007-10-11
申请号：US11487770
申请日：2006-07-17
申请人： Chul Kim , Ho Shin , Young Bae , Yun Oh , Joon Kim
发明人： Chul Kim , Ho Shin , Young Bae , Yun Oh , Joon Kim
IPC分类号： H04J1/16 , H04L12/26
CPC分类号： H04L67/16 , H04L12/2803 , H04L12/281 , H04L12/2818 , H04L12/2836 , H04L29/06027 , H04L65/1026 , H04L65/1036 , H04L65/4084 , H04L65/605 , H04L67/2823 , H04L69/24 , H04L2012/2849
摘要： A Digital Living Network Alliance (DLNA) system and method transform multimedia contents in a manner adaptive to the available data processing capability of the digital media renderer (DMR) of the DLNA network. A digital media server (DMS) and a digital media renderer (DMR) are discovered. A list of contents provided by the DMS is obtained. Information on a transport protocol and a data format of the DMR is obtained. Information on available data processing capability of the DMR is obtained. The transport protocol and the data format of the DMS are matched to those of the DMR. Transcoding and transrating schemes of the DMS are adjusted based on the available data processing capability of the DMR. A connection between the DMS and the DMR is established, and content stored in the DMS is transmitted to the DMR.
摘要翻译：数字生活网络联盟（DLNA）系统和方法以适应DLNA网络的数字媒体渲染器（DMR）的可用数据处理能力的方式来变换多媒体内容。发现了数字媒体服务器（DMS）和数字媒体渲染器（DMR）。获得由DMS提供的内容的列表。获得关于传输协议和DMR的数据格式的信息。获得有关DMR可用数据处理能力的信息。 DMS的传输协议和数据格式与DMR的协议和数据格式相匹配。根据DMR的可用数据处理能力调整DMS的转码和转换方案。建立DMS与DMR之间的连接，将存储在DMS中的内容传送到DMR。

3. 发明申请

US20070131653A1 Methods and apparatus for processing a substrate 审中-公开
公开(公告)号：US20070131653A1
公开(公告)日：2007-06-14
申请号：US11298555
申请日：2005-12-09
申请人： Gary Ettinger , Erik Wasinger , Sen-Hou Ko , Wui-Yung Hsu , Liang-Yuh Chen , Ho Shin , Donald Olgado
发明人： Gary Ettinger , Erik Wasinger , Sen-Hou Ko , Wui-Yung Hsu , Liang-Yuh Chen , Ho Shin , Donald Olgado
IPC分类号： C03C15/00 , H01L21/306
CPC分类号： B24B9/065 , B24B21/002 , B24B41/002 , H01L21/02021
摘要： Apparatus and methods adapted to polish an edge of a substrate include a polishing film, a frame adapted to tension and load the polishing film so that at least a portion of the film is supported in a plane, and a substrate rotation driver adapted to rotate a substrate against the plane of the polishing film such that the polishing film is adapted to apply force to the substrate, contour to an edge of the substrate, the edge including at least an outer edge and a first bevel, and polish the outer edge and the first bevel as the substrate is rotated. Numerous other aspects are provided.

4. 发明申请

US20050284528A1 Methods and apparatus for providing fluid to a semiconductor device processing apparatus 有权
标题翻译：用于向半导体器件处理装置提供流体的方法和装置
公开(公告)号：US20050284528A1
公开(公告)日：2005-12-29
申请号：US11048106
申请日：2005-01-28
申请人： Sandy Chao , Songjae Lee , Ho Shin
发明人： Sandy Chao , Songjae Lee , Ho Shin
IPC分类号： F16K27/00 , F17D1/00
CPC分类号： C07C43/23 , C07C217/84 , C07C237/04 , C07F9/12 , F16K27/003 , Y10T137/87249 , Y10T137/87885
摘要： In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a first input adapted to receive the chemical; (2) a first output adapted to circulate the chemical to a chemical return; and (3) a second output adapted to output the chemical to the valve assembly output. The valve assembly also includes a second valve positioned downstream from the first valve. The second valve includes (1) an input adapted to receive deionized (DI) water; and (2) an output adapted to output DI water to the valve assembly output. A check valve is coupled between the second output of the first valve and the output of the second valve, and the first valve, second valve and check valve are included in a single manifold.
摘要翻译：在第一方面，提供了一种阀组件，其包括适于输出去离子水和化学品中的至少一种的阀组件输出。阀组件的第一阀包括（1）适于接收化学品的第一输入; （2）适于将化学品循环至化学品返回的第一输出; 和（3）适于将化学品输出到阀组件输出的第二输出。阀组件还包括位于第一阀下游的第二阀。第二阀包括（1）适于接收去离子水（DI）的输入口; 和（2）适于将DI水输出到阀组件输出的输出。止回阀联接在第一阀的第二输出和第二阀的输出之间，并且第一阀，第二阀和止回阀包括在单个歧管中。

5. 发明申请

US20070238393A1 METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE 审中-公开
标题翻译：用于抛光衬底边缘的方法和装置
公开(公告)号：US20070238393A1
公开(公告)日：2007-10-11
申请号：US11693695
申请日：2007-03-29
申请人： Ho Shin , Gary Ettinger , Donald Olgado , Erik Wasinger , Sen-Hou Ko , Charles Dodds , Yufei Chen , Wei-Yung Hsu
发明人： Ho Shin , Gary Ettinger , Donald Olgado , Erik Wasinger , Sen-Hou Ko , Charles Dodds , Yufei Chen , Wei-Yung Hsu
IPC分类号： B24B51/00 , B24B49/00 , B24B7/30
CPC分类号： B24B9/065 , B24B21/002 , B24B41/067 , B24B49/16 , B24B57/02
摘要： Methods of and systems for polishing an edge of a substrate are provided. The invention includes rotating a substrate against a polishing film so as to remove material from the edge of the substrate; and detecting an amount of one of energy and torque exerted in rotating the substrate against the polishing film. The invention may further include determining an amount of material removed from the edge of the substrate based on the detected energy or torque exerted in rotating the substrate against the polishing film; ascertaining a difference between the determined amount of material removed and a preset polish level; and determining an amount of energy or torque to be exerted in rotating the substrate adapted to attain the preset polish level based on the difference between the determined amount of material removed and the preset polish level. Numerous other aspects are provided.
摘要翻译：提供了抛光衬底边缘的方法和系统。本发明包括将衬底旋转抵靠抛光膜，以便从衬底的边缘去除材料; 并且检测在将衬底旋转抛光膜时施加的能量和扭矩中的一个的量。本发明还可以包括基于在将衬底旋转抛光膜时所检测到的能量或扭矩确定从衬底边缘去除的材料量; 确定确定的去除材料量与预设抛光水平之间的差异; 以及基于所确定的所移除的材料量与所述预设的抛光水平之间的差来确定在旋转所述基板时施加的能量或扭矩的量，所述能量或扭矩适于实现预设的抛光水平。提供了许多其他方面。

6. 发明申请

US20070221256A1 Methods and apparatus for improving edge cleaning of a substrate 审中-公开
标题翻译：改善基材边缘清洁的方法和装置
公开(公告)号：US20070221256A1
公开(公告)日：2007-09-27
申请号：US11389528
申请日：2006-03-24
申请人： Hui Chen , Anne-Douce Coulin , Ho Shin , Donald Olgado
发明人： Hui Chen , Anne-Douce Coulin , Ho Shin , Donald Olgado
IPC分类号： B08B7/00 , B08B3/00
CPC分类号： B08B3/02 , H01L21/67046 , H01L21/67051
摘要： In a first aspect, an apparatus is provided that includes (1) an idler adapted to contact a substrate, to rotate therewith, and to sense rotation of the substrate; and (2) a driving mechanism coupled to the idler and adapted to drive the idler. Numerous other aspects are provided.
摘要翻译：在第一方面中，提供了一种装置，其包括：（1）适于接触衬底以与其一起旋转并且感测衬底的旋转的惰轮; 和（2）联接到惰轮并适于驱动惰轮的驱动机构。提供了许多其他方面。

7. 发明申请

US20060207671A1 Methods and apparatus for providing fluid to a semiconductor device processing apparatus 有权
标题翻译：用于向半导体器件处理装置提供流体的方法和装置
公开(公告)号：US20060207671A1
公开(公告)日：2006-09-21
申请号：US11439783
申请日：2006-05-23
申请人： Sandy Chao , Songjae Lee , Ho Shin
发明人： Sandy Chao , Songjae Lee , Ho Shin
IPC分类号： F17D1/00
CPC分类号： C07C43/23 , C07C217/84 , C07C237/04 , C07F9/12 , F16K27/003 , Y10T137/87249 , Y10T137/87885
摘要： In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a first input adapted to receive the chemical; (2) a first output adapted to circulate the chemical to a chemical return; and (3) a second output adapted to output the chemical to the valve assembly output. The valve assembly also includes a second valve positioned downstream from the first valve. The second valve includes (1) an input adapted to receive deionized (DI) water; and (2) an output adapted to output DI water to the valve assembly output. A check valve is coupled between the second output of the first valve and the output of the second valve, and the first valve, second valve and check valve are included in a single manifold.
摘要翻译：在第一方面，提供了一种阀组件，其包括适于输出去离子水和化学品中的至少一种的阀组件输出。阀组件的第一阀包括（1）适于接收化学品的第一输入; （2）适于将化学品循环至化学品返回的第一输出; 和（3）适于将化学品输出到阀组件输出的第二输出。阀组件还包括位于第一阀下游的第二阀。第二阀包括（1）适于接收去离子水（DI）的输入口; 和（2）适于将DI水输出到阀组件输出的输出。止回阀联接在第一阀的第二输出和第二阀的输出之间，并且第一阀，第二阀和止回阀包括在单个歧管中。

8. 发明申请

US20070131654A1 Methods and apparatus for processing a substrate 有权
标题翻译：用于处理衬底的方法和设备
公开(公告)号：US20070131654A1
公开(公告)日：2007-06-14
申请号：US11299295
申请日：2005-12-09
申请人： Erik Wasinger , Gary Ettinger , Sen-Hou Ko , Wei-Yung Hsu , Liang-Yuh Chen , Ho Shin , Donald Olgado
发明人： Erik Wasinger , Gary Ettinger , Sen-Hou Ko , Wei-Yung Hsu , Liang-Yuh Chen , Ho Shin , Donald Olgado
IPC分类号： C03C15/00 , H01L21/306
CPC分类号： C03C19/00 , B24B1/04 , B24B9/065 , B24B21/004 , H01L21/02021
摘要： Apparatus and methods adapted to polish an edge of a substrate include a polishing film, a frame adapted to tension and load the polishing film so that at least a portion of the film is supported in a plane, and a substrate rotation driver adapted to rotate a substrate against the plane of the polishing film such that the polishing film is adapted to apply force to the substrate, contour to an edge of the substrate, the edge including at least an outer edge and a first bevel, and polish the outer edge and the first bevel as the substrate is rotated. Numerous other aspects are provided.
摘要翻译：适于抛光衬底边缘的装置和方法包括抛光膜，适于张紧和加载抛光膜的框架，使得膜的至少一部分被支撑在平面中，以及基板旋转驱动器，其适于旋转衬底抵靠抛光膜的平面，使得抛光膜适于对衬底施加力，轮廓到衬底的边缘，边缘至少包括外边缘和第一斜面，并且抛光外边缘和第一斜面作为基底旋转。提供了许多其他方面。

9. 发明申请

US20060264160A1 Methods and apparatus for providing fluid to a semiconductor device processing apparatus 审中-公开
公开(公告)号：US20060264160A1
公开(公告)日：2006-11-23
申请号：US11497408
申请日：2006-07-31
申请人： Sandy Chao , Songjae Lee , Ho Shin
发明人： Sandy Chao , Songjae Lee , Ho Shin
IPC分类号： B24B29/00
CPC分类号： C07C43/23 , C07C217/84 , C07C237/04 , C07F9/12 , F16K27/003 , Y10T137/87249 , Y10T137/87885
摘要： In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a first input adapted to receive the chemical; (2) a first output adapted to circulate the chemical to a chemical return; and (3) a second output adapted to output the chemical to the valve assembly output. The valve assembly also includes a second valve positioned downstream from the first valve. The second valve includes (1) an input adapted to receive deionized (DI) water; and (2) an output adapted to output DI water to the valve assembly output. A check valve is coupled between the second output of the first valve and the output of the second valve, and the first valve, second valve and check valve are included in a single manifold.

10. 发明申请

US20080011325A1 METHODS AND APPARATUS FOR SUPPORTING A SUBSTRATE IN A HORIZONTAL ORIENTATION DURING CLEANING 审中-公开
标题翻译：在清洗期间支撑水平方向底板的方法和装置
公开(公告)号：US20080011325A1
公开(公告)日：2008-01-17
申请号：US11757850
申请日：2007-06-04
申请人： Donald Olgado , Roy Nangoy , Shesraj Tulshibagwale , Hui Chen , Ho Shin
发明人： Donald Olgado , Roy Nangoy , Shesraj Tulshibagwale , Hui Chen , Ho Shin
IPC分类号： B08B7/04 , A46B13/00 , B24B51/00 , B08B3/10
CPC分类号： H01L21/67046 , B08B1/04 , B08B11/02
摘要： In one or more aspects, an apparatus for cleaning a substrate includes (1) a plurality of rollers adapted to contact and support the substrate in a horizontal orientation, and (2) at least one brush adapted to contact a major surface of the substrate while the substrate is supported by the plurality of rollers to clean the major surface of the substrate. At least one of the plurality of rollers is adapted to move between an opened position allowing the substrate to be loaded onto or unloaded from the plurality of rollers and a closed position in which the substrate is supported by the plurality of rollers. Numerous other aspects are provided.
摘要翻译：在一个或多个方面中，用于清洁基底的装置包括（1）多个辊，其适于以水平取向接触和支撑基底;以及（2）至少一个刷子，其适于接触基底的主表面，同时基板由多个辊支撑以清洁基板的主表面。所述多个辊中的至少一个适于在允许所述基底装载到所述多个辊子上或从所述多个辊子上卸载的打开位置和所述基板被所述多个辊支撑的关闭位置之间移动。提供了许多其他方面。

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