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1. 发明授权

US06558869B1 Pattern formation 有权
标题翻译：图案形成
公开(公告)号：US06558869B1
公开(公告)日：2003-05-06
申请号：US09558110
申请日：2000-04-25
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare , James Laurence Mulligan , John Andrew Hearson , Carole-Anne Smith , Stuart Bayes , Mark John Spowage
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare , James Laurence Mulligan , John Andrew Hearson , Carole-Anne Smith , Stuart Bayes , Mark John Spowage
IPC分类号： G03F7039
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/368 , B41M5/46 , B41M5/465 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e. the “reversible insolubilizer compound”) such that the aqueous alkaline developer solubility of the composition is increased on heating and the aqueous alkaline developer solubility of the composition is not increased by incident UV radiation. The invention provides a solution to the problem of the relatively narrow solubility differential between imaged and non-imaged areas of heat sensitive positive working radiation sensitive compositions.
摘要翻译：本发明涉及通过热模式成像来制备抗蚀剂图案的前体，前体包括热敏组合物，其热溶性在碱性显影剂的水溶液中被设置为增加加热区域，热敏组合物的非加热区域溶解在含水碱性显影剂（“显影剂阻挡装置”）中，其中所述显影剂阻力装置包括一种或多种选自以下的化合物：（A）包括聚（环氧烷）单元;（B）硅氧烷; 和（C）多元醇的酯，醚和酰胺，其中所述热敏组合物包含水性碱性显影剂可溶性聚合物质（即“活性聚合物”）和降低聚合物质的碱性显影剂水溶液的化合物（即“可逆不溶物化合物”），使得组合物的碱性显影剂水溶液在加热时增加，并且组合物的水性碱性显影剂溶解度不会因入射的紫外线辐射而增加。本发明提供了解决热敏感正性辐射敏感组合物的成像区域和非成像区域之间相对窄的溶解度差异的问题的解决方案。

2. 发明授权

US06461795B1 Manufacture of lithographic printing forms 有权
标题翻译：平版印刷版制作
公开(公告)号：US06461795B1
公开(公告)日：2002-10-08
申请号：US09558109
申请日：2000-04-25
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley
IPC分类号： G03F7039
CPC分类号： B41N3/00 , B41M5/368 , H05K3/0082 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： Phenolic resin compositions formulated for use in lithographic exposure processes are given a heat treatment at 40-90° C. for at least 4 hours shortly after their coating onto lithographic substrates, to produce lithographic printing forms. It is found that such a heat treatment improves later exposure processes, in particular by rendering the sensitivity of the compositions less variable, over time.
摘要翻译：配制用于光刻曝光工艺的酚醛树脂组合物在其涂布在平版印刷基材上不久后在40-90℃下进行至少4小时的热处理，以产生平版印刷形式。发现这种热处理改进了后续的曝光过程，特别是通过使组合物的灵敏度随时间变化而变小。

3. 发明授权

US06596469B2 Method of making masks and electronic parts 失效
标题翻译：制作口罩和电子零件的方法
公开(公告)号：US06596469B2
公开(公告)日：2003-07-22
申请号：US09503095
申请日：2000-02-11
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare
IPC分类号： G03C176
CPC分类号： G03F7/2022 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要： A method of making a mask or an electronic part, for example a printed circuit, comprises the steps of delivering heat in a desired pattern to a precursor of the mask or electronic part, the precursor comprising a surface coated with a coating, the coating comprising a heat-sensitive composition itself comprising an aqueous developer soluble polymeric substance and a compound which reduces the aqueous developer solubility of the polymeric substance, wherein the aqueous developer solubility of the composition is not increased by incident UV radiation but is increased by the delivery of heat; then developing the precursor to remove the heat-sensitive composition in regions to which the heat was delivered. In the case of a printed circuit precursor the surface may be then etched in conventional manner to yield the required printed circuit.
摘要翻译：制造掩模或电子部件（例如印刷电路）的方法包括以期望的图案将热量输送到掩模或电子部件的前体的步骤，前体包括涂覆有涂层的表面，该涂层包含包含显影剂可溶性水溶性聚合物的热敏组合物和降低聚合物质的显影剂水溶性的化合物，其中组合物的水性显影剂溶解度不会因入射的紫外线辐射而增加，而是通过传递热而增加 ; 然后展开该前体以在传送热量的区域中除去热敏组合物。在印刷电路前体的情况下，可以以常规方式蚀刻表面以产生所需的印刷电路。

4. 发明授权

US06280899B1 Relation to lithographic printing forms 有权
标题翻译：与平版印刷版的关系
公开(公告)号：US06280899B1
公开(公告)日：2001-08-28
申请号：US09483990
申请日：2000-01-18
申请人： Gareth Rhodri Parsons , David Stephen Riley , Richard David Hoare , Alan Stanley Victor Monk
发明人： Gareth Rhodri Parsons , David Stephen Riley , Richard David Hoare , Alan Stanley Victor Monk
IPC分类号： G03C176
CPC分类号： B41M5/368 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： Thermally imageable lithographic printing plate precursors and heat-sensitive compositions for use in these printing plate precursors are disclosed. The compositions contain an aqueous developer soluble polymer, such as a phenolic resin; a compound that reduces the aqueous developer solubility of the polymer; and optionally, and infrared absorber. Examples of compounds that reduce the aqueous developer solubility of the polymer are those that contain at least one quarternized nitrogen atom, such as quinolinium compounds, benzothiazolium compounds, pyridinium compounds, and imidazoline compounds. On thermal imaging, the irradiated areas become more soluble in the aqueous developer and can be removed to form a positive image.
摘要翻译：公开了用于这些印版前体的可热成像的平版印刷版前体和热敏组合物。组合物含有显影剂水溶性聚合物，例如酚醛树脂; 降低聚合物的水性显影剂溶解度的化合物; 和任选地，和红外线吸收剂。降低聚合物的水性显影剂溶解度的化合物的实例是含有至少一个季铵化氮原子的化合物，例如喹啉鎓化合物，苯并噻唑鎓化合物，吡啶鎓化合物和咪唑啉化合物。在热成像中，被照射的区域变得更易溶于含水显影剂，并且可以除去以形成正像。

5. 发明授权

US06485890B2 Lithographic printing forms 失效
公开(公告)号：US06485890B2
公开(公告)日：2002-11-26
申请号：US09860943
申请日：2001-05-18
申请人： Gareth Rhodri Parsons , David Stephen Riley , Richard David Hoare , Alan Stanley Victor Monk
发明人： Gareth Rhodri Parsons , David Stephen Riley , Richard David Hoare , Alan Stanley Victor Monk
IPC分类号： G03F7039
CPC分类号： B41M5/368 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： Thermally imageable lithographic printing plate precursors and heat-sensitive compositions for use in these printing plate precursors are disclosed. The compositions contain an aqueous developer soluble polymer, such as a phenolic resin; a compound that reduces the aqueous developer solubility of the polymer; and optionally, and infrared absorber. Examples of compounds that reduce the aqueous developer solubility of the polymer are those that contain at least one quarternized nitrogen atom, such as quinolinium compounds, benzothiazolium compounds, pyridinium compounds, and imidazoline compounds. On thermal imaging, the irradiated areas become more soluble in the aqueous developer and can be removed to form a positive image.

6. 发明授权

US4098672A Porous diaphragms 失效
标题翻译：多孔隔膜
公开(公告)号：US4098672A
公开(公告)日：1978-07-04
申请号：US657704
申请日：1976-02-12
申请人： David Stephen Riley
发明人： David Stephen Riley
IPC分类号： C25B13/08 , H01J31/36 , C25B13/04 , B29D27/00
CPC分类号： C25B13/08 , H01J31/36
摘要： A process for the manufacture of a porous diaphragm of a synthetic material, especially polytetrafluoroethylene, which comprises forming a sheet of the synthetic material in admixture with a solid particulate additive (eg starch) to be removed therefrom, introducing said sheet into an electrolytic cell, filling the cell with the working electrolyte and removing the solid particulate in situ in the cell by electrolysing the said electrolyte. The porous diaphragms are especially suitable for use in diaphragm cells for the production of chlorine wherein the working electrolyte is sodium chloride brine.
摘要翻译：一种用于制造合成材料，特别是聚四氟乙烯的多孔隔膜的方法，其包括将合成材料的片材与待除去的固体颗粒添加剂（例如淀粉）混合形成，将所述片材引入电解槽中，用工作电解质填充电池并通过电解所述电解质在电池中原位除去固体颗粒。多孔隔膜特别适用于用于生产氯的隔膜电池，其中工作电解质是氯化钠盐水。

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