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    • 8. 发明申请
    • Method and Apparatus for Measuring a Structure on a Substrate, Computer Program Products for Implementing Such Methods and Apparatus
    • 用于测量基板上的结构的方法和装置,用于实现这种方法和装置的计算机程序产品
    • US20120123748A1
    • 2012-05-17
    • US13101663
    • 2011-05-05
    • Maria Johanna Hendrika AbenHugo Augustinus Joseph CramerNoelle Martina WrightRuben Alvarez SanchezMartijn Jaap Daniel Slob
    • Maria Johanna Hendrika AbenHugo Augustinus Joseph CramerNoelle Martina WrightRuben Alvarez SanchezMartijn Jaap Daniel Slob
    • G06F17/50
    • G03F7/70633G03F7/70483G03F7/70491G03F7/705G03F7/70625
    • Diffraction models and scatterometry are used to reconstruct a model of a microscopic structure on a substrate. A plurality of candidate structures are defined, each represented by a plurality of parameters (p1, p2, etc.)). A plurality of model diffraction signals are calculated by simulating illumination of each of the candidate structures. The structure is reconstructed by fitting one or more of the model diffraction signals to a signal detected from the structure. In the generation of the candidate structures, a model recipe is used in which parameters are designated as either fixed or variable. Among the variable parameters, certain parameters are constrained to vary together in accordance with certain constraints, such as linear constraints. An optimized set of constraints, and therefore an optimized model recipe, is determined by reference to a user input designating one or more parameters of interest for a measurement, and by simulating the reconstruction process reconstruction. The optimized model recipe can be determined automatically by a parameter advisor process that simulates reconstruction of a set of reference structures, using a plurality of candidate model recipes. In the generation of the reference structures, restrictions can be applied to exclude unrealistic parameter combinations.
    • 衍射模型和散射法用于重建基底上微观结构的模型。 定义多个候选结构,每个候选结构由多个参数(p1,p2等)表示)。 通过模拟每个候选结构的照明来计算多个模型衍射信号。 通过将一个或多个模型衍射信号拟合到从结构检测的信号来重构该结构。 在候选结构的生成中,使用模型配方,其中参数被指定为固定的或可变的。 在可变参数中,某些参数被限制为根据某些约束(诸如线性约束)一起变化。 通过参考指定用于测量的感兴趣的一个或多个参数的用户输入以及通过模拟重建过程重建来确定优化的约束集合以及因此优化的模型配方。 优化的模型配方可以由使用多个候选模型配方模拟一组参考结构的重建的参数顾问程序自动确定。 在生成参考结构时,可以应用限制来排除不切实际的参数组合。