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    • 1. 发明授权
    • Method of making a circuit structure
    • 制作电路结构的方法
    • US08186049B2
    • 2012-05-29
    • US12181556
    • 2008-07-29
    • Chih-Peng FanYen-Ti Chia
    • Chih-Peng FanYen-Ti Chia
    • H05K3/02
    • H05K1/111H01L2224/16225H05K3/108H05K3/243H05K3/3452H05K3/4007H05K2201/0367H05K2201/0989H05K2201/10674H05K2203/0574Y02P70/611Y10T29/49126Y10T29/4913Y10T29/49155Y10T29/49165
    • A manufacturing method of a circuit structure is provided as follows. Firstly, a base conductive layer is formed on the carrier board and a first patterned plating-resistant layer having at least one trench for exposing a part of the base conductive layer is formed on the base conductive layer. A first patterned conductive layer is then formed in the trench and a second patterned plating-resistant layer is formed which covers a part of the first patterned conductive layer and a part of the first patterned plating-resistant layer. A second patterned conductive layer is formed on the exposed first patterned conductive layer. The first and the second patterned plating-resistant layers and the base conductive layer exposed by the first patterned conductive layer are removed. Then, a patterned solder mask is formed for covering a part of the first patterned conductive layer.
    • 电路结构的制造方法如下所述。 首先,在载体板上形成基底导电层,在基底导电层上形成具有至少一个露出基底导电层的一部分的沟槽的第一图案化电镀层。 然后在沟槽中形成第一图案化导电层,并且形成覆盖第一图案化导电层的一部分和第一图案化电镀层的一部分的第二图案化电镀层。 在暴露的第一图案化导电层上形成第二图案化导电层。 去除第一和第二图案化电镀层和由第一图案化导电层暴露的基底导电层。 然后,形成图案化的焊料掩模以覆盖第一图案化导电层的一部分。