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1. 发明申请

US20120080387A1 METHOD FOR TRACKING POLLUTION SOURCE IN PROCESS WATER 有权
标题翻译：跟踪污水处理过程中的污染源的方法
公开(公告)号：US20120080387A1
公开(公告)日：2012-04-05
申请号：US13315112
申请日：2011-12-08
申请人： Chien Hung Chen , Ching Yi Hsu , Chen Hua Chu , Meng Shun Huang
发明人： Chien Hung Chen , Ching Yi Hsu , Chen Hua Chu , Meng Shun Huang
IPC分类号： C02F1/00 , C02F103/04
CPC分类号： C02F1/006 , C02F1/008 , C02F2101/14 , C02F2209/05 , C02F2209/06 , C02F2209/20 , G01N33/18 , G01N33/1846 , Y10T137/0324 , Y10T137/2509
摘要： A method for tracking a pollution source in process water is presented. Firstly, variation curves of drain water drained from different rinsing tanks are respectively obtained, and a water quality concentration of the drain water drained to a buffer tank is detected, so as to output a water quality variation curve. Then, an analytical comparison is performed on each drain water amount variation curve and the water quality variation curve within a same time interval, so as to output an analytical result of each flow of drain water in a range exceeding a predetermined water quality standard. In this manner, the drain water that exceeds the predetermined water quality standard can be tracked in real-time according to the analytical result, thereby quickly improving the process for discharging the drain water.
摘要翻译：提出了一种追踪过程水污染源的方法。首先，分别获得从不同冲洗槽排出的排水的变化曲线，并检测排放到缓冲罐的排水的水质浓度，从而输出水质变化曲线。然后，对各排水量变化曲线和水质变化曲线在同一时间间隔内进行分析比较，从而将排水的每个流量的分析结果输出在超过规定水质标准的范围内。以这种方式，可以根据分析结果实时地跟踪超过预定水质标准的排水，从而快速改进排水的过程。

2. 发明申请

US20100121491A1 METHOD FOR TRACKING POLLUTION SOURCE IN PROCESS WATER 有权
标题翻译：跟踪污水处理过程中的污染源的方法
公开(公告)号：US20100121491A1
公开(公告)日：2010-05-13
申请号：US12615707
申请日：2009-11-10
申请人： Chien Hung Chen , Ching Yi Hsu , Chen Hua Chu , Meng Shun Huang
发明人： Chien Hung Chen , Ching Yi Hsu , Chen Hua Chu , Meng Shun Huang
IPC分类号： G05B21/00 , G01N33/20 , H03K17/042 , C02F1/00
CPC分类号： C02F1/006 , C02F1/008 , C02F2101/14 , C02F2209/05 , C02F2209/06 , C02F2209/20 , G01N33/18 , G01N33/1846 , Y10T137/0324 , Y10T137/2509
摘要： A method for tracking a pollution source in process water is presented. Firstly, variation curves of drain water drained from different rinsing tanks are respectively obtained, and a water quality concentration of the drain water drained to a buffer tank is detected, so as to output a water quality variation curve. Then, an analytical comparison is performed on each drain water amount variation curve and the water quality variation curve within a same time interval, so as to output an analytical result of each flow of drain water in a range exceeding a predetermined water quality standard. In this manner, the drain water that exceeds the predetermined water quality standard can be tracked in real-time according to the analytical result, thereby quickly improving the process for discharging the drain water.
摘要翻译：提出了一种追踪过程水污染源的方法。首先，分别获得从不同冲洗槽排出的排水的变化曲线，并检测排放到缓冲罐的排水的水质浓度，从而输出水质变化曲线。然后，对各排水量变化曲线和水质变化曲线在同一时间间隔内进行分析比较，从而将排水的每个流量的分析结果输出在超过规定水质标准的范围内。以这种方式，可以根据分析结果实时地跟踪超过预定水质标准的排水，从而快速改进排水的过程。

3. 发明授权

US08607171B2 System and method for optical proximity correction of a modified integrated circuit layout 有权
标题翻译：改进的集成电路布局的光学邻近校正系统和方法
公开(公告)号：US08607171B2
公开(公告)日：2013-12-10
申请号：US13091316
申请日：2011-04-21
申请人： Chungte Hsuan , Chao-Lung Lo , Tien-Chu Yang , Tahone Yang , Kuang-Chao Chen , Chien Hung Chen
发明人： Chungte Hsuan , Chao-Lung Lo , Tien-Chu Yang , Tahone Yang , Kuang-Chao Chen , Chien Hung Chen
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A system and method for modifying an integrated circuit (IC) layout includes performing a correction process, such as an optical proximity correction (OPC) process, only on regions within designated blocks that are defined around respective modified structures. An IC layout can be compared to a modified version of the IC layout to detect modified structures. One or more large blocks can then be defined around respective modified structures. A correction process can then be performed on only the one or more large blocks. Small blocks within respective large blocks can then be extracted from the modified IC layout and merged with the original IC layout to generate a final modified and corrected IC layout.
摘要翻译：用于修改集成电路（IC）布局的系统和方法包括仅在围绕各个修改的结构定义的指定块内的区域上执行诸如光学邻近校正（OPC）处理的校正处理。可以将IC布局与IC布局的修改版本进行比较，以检测修改的结构。然后可以围绕相应的修改结构定义一个或多个大块。然后可以仅在一个或多个大块上执行校正处理。然后可以从修改的IC布局中提取相应大块内的小块，并与原始IC布局合并，以产生最终修改和校正的IC布局。

4. 发明申请

US20110012989A1 GUIDING METHOD FOR PHOTOGRAPHING PANORAMA IMAGE 审中-公开
标题翻译：用于拍摄全景图像的指导方法
公开(公告)号：US20110012989A1
公开(公告)日：2011-01-20
申请号：US12565326
申请日：2009-09-23
申请人： Chia Chun Tseng , Chien Hung Chen
发明人： Chia Chun Tseng , Chien Hung Chen
IPC分类号： H04N7/00
CPC分类号： H04N1/3876 , G03B17/20 , G03B37/04 , G03B2217/18
摘要： A guiding method for photographing a panorama image is described. A motion vector between a current position of an alignment image in a real-time image and a joint position of the alignment image in the real-time image, and a direction indicator relative to the motion vector is displayed, such that when the digital camera device displays the real-time image, the digital camera device may display the direction indicator to guide a photographing position of a next image for a user, thereby simplifying the photographing of a panorama image and greatly decreasing an incidence that the user fails to photographing a panorama image.
摘要翻译：描述拍摄全景图像的引导方法。显示实时图像中的对准图像的当前位置与实时图像中的对准图像的关节位置之间的运动矢量以及相对于运动矢量的方向指示符，使得当数字照相机设备显示实时图像，数码相机设备可以显示方向指示器以引导用户的下一图像的拍摄位置，从而简化全景图像的拍摄，并且大大降低了用户不能拍摄的发生率全景图像。

5. 发明申请

US20070246632A1 SUPPORTS 审中-公开
标题翻译：支持
公开(公告)号：US20070246632A1
公开(公告)日：2007-10-25
申请号：US11735408
申请日：2007-04-13
申请人： Chien Hung Chen
发明人： Chien Hung Chen
IPC分类号： F16M11/00
CPC分类号： F16M11/046
摘要： Supports are provided. A support comprises a fixed member, a sliding member movable with respect to the fixed member, a slider movable with respect to the sliding member, and a resilient member connecting the fixed member and the sliding member. The fixed member comprises an engaging portion and a pathway around the engaging portion. When the sliding member moves with respect to the fixed member, the slider moves from an original position to a recess of the engaging portion along the pathway, wherein the slider is engaged with the recess by spring force from the resilient member. When the slider is released from the recess, the slider returns to the original position along the pathway by the spring force.
摘要翻译：提供支持。支撑件包括固定构件，相对于固定构件可移动的滑动构件，可相对于滑动构件移动的滑块以及连接固定构件和滑动构件的弹性构件。固定构件包括接合部分和围绕接合部分的路径。当滑动构件相对于固定构件移动时，滑块沿着路径从原始位置移动到接合部分的凹部，其中滑块通过来自弹性构件的弹簧力与凹部接合。当滑块从凹槽释放时，滑块通过弹簧力返回到沿着路径的原始位置。

6. 发明申请

US20120272195A1 SYSTEM AND METHOD FOR OPTICAL PROXIMITY CORRECTION OF A MODIFIED INTEGRATED CIRCUIT LAYOUT 有权
标题翻译：改进的集成电路布局的光学近似校正系统和方法
公开(公告)号：US20120272195A1
公开(公告)日：2012-10-25
申请号：US13091316
申请日：2011-04-21
申请人： Chungte Hsuan , Chao-Lung Lo , Tien-Chu Yang , Tahone Yang , Kuang-Chao Chen , Chien Hung Chen
发明人： Chungte Hsuan , Chao-Lung Lo , Tien-Chu Yang , Tahone Yang , Kuang-Chao Chen , Chien Hung Chen
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A system and method for modifying an integrated circuit (IC) layout includes performing a correction process, such as an optical proximity correction (OPC) process, only on regions within designated blocks that are defined around respective modified structures. An IC layout can be compared to a modified version of the IC layout to detect modified structures. One or more large blocks can then be defined around respective modified structures. A correction process can then be performed on only the one or more large blocks. Small blocks within respective large blocks can then be extracted from the modified IC layout and merged with the original IC layout to generate a final modified and corrected IC layout.
摘要翻译：用于修改集成电路（IC）布局的系统和方法包括仅在围绕各个修改的结构定义的指定块内的区域上执行诸如光学邻近校正（OPC）处理的校正处理。可以将IC布局与IC布局的修改版本进行比较，以检测修改的结构。然后可以围绕相应的修改结构定义一个或多个大块。然后可以仅在一个或多个大块上执行校正处理。然后可以从修改的IC布局中提取相应大块内的小块，并与原始IC布局合并，以产生最终修改和校正的IC布局。

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