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1. 发明申请

US20140192790A1 HIGH PRIORITY SERVICE SENDING AND RECEIVING METHOD AND DEVICE IN DIRECT MODE 有权
标题翻译：高优先级服务发送和接收方法和直接模式下的设备
公开(公告)号：US20140192790A1
公开(公告)日：2014-07-10
申请号：US14238760
申请日：2011-08-15
申请人： Chia Han Siong Samuel , Fan Yang , Yan Xu , Mingjun Chen , Jianliang Liu , Hong Du
发明人： Chia Han Siong Samuel , Fan Yang , Yan Xu , Mingjun Chen , Jianliang Liu , Hong Du
IPC分类号： H04W72/04 , H04J3/16
CPC分类号： H04W72/0446 , H04J3/1694 , H04W72/1247 , H04W76/14 , H04W84/08
摘要： A high priority service sending method and device in a direct mode, and a high priority service receiving method and device in a direct mode. The receiving method includes: after sending a voice frame in a voice call sending state, a user terminal receiving and detecting a priority frame in another time slot with respect to the time slot occupied by the voice call; and if the priority frame is detected, then stopping the voice call and receiving a high priority service frame in the other time slot. Using the present invention can enable an interphone in a transmitting state in a direct mode to send or receive a high priority service as well.
摘要翻译：直接模式的高优先级业务发送方法和装置，以及直接模式的高优先级业务接收方式和装置。接收方法包括：在语音呼叫发送状态发送语音帧之后，用户终端相对于语音呼叫占用的时隙在另一时隙中接收和检测优先级帧; 如果检测到优先级帧，则在另一时隙中停止语音呼叫并接收高优先级服务帧。使用本发明可以使处于处于直接模式的发送状态的对讲机也能够发送或接收高优先级服务。

2. 发明授权

US09781716B2 High priority service sending and receiving method and device in direct mode 有权
公开(公告)号：US09781716B2
公开(公告)日：2017-10-03
申请号：US14238760
申请日：2011-08-15
申请人： Chia Han Siong Samuel , Fan Yang , Yan Xu , Mingjun Chen , Jianliang Liu , Hong Du
发明人： Chia Han Siong Samuel , Fan Yang , Yan Xu , Mingjun Chen , Jianliang Liu , Hong Du
IPC分类号： H04W72/04 , H04J3/16 , H04W72/12 , H04W84/08 , H04W76/02
CPC分类号： H04W72/0446 , H04J3/1694 , H04W72/1247 , H04W76/14 , H04W84/08
摘要： A high priority service sending method and device in a direct mode, and a high priority service receiving method and device in a direct mode. The receiving method includes: after sending a voice frame in a voice call sending state, a user terminal receiving and detecting a priority frame in another time slot with respect to the time slot occupied by the voice call; and if the priority frame is detected, then stopping the voice call and receiving a high priority service frame in the other time slot. Using the present invention can enable an interphone in a transmitting state in a direct mode to send or receive a high priority service as well.

3. 发明授权

US09183846B2 Method and device for adaptively adjusting sound effect 有权
标题翻译：自适应调节声音效果的方法和装置
公开(公告)号：US09183846B2
公开(公告)日：2015-11-10
申请号：US14361367
申请日：2011-12-02
申请人： Chia Han Siong Samuel , Ni Huang , Hong Du
发明人： Chia Han Siong Samuel , Ni Huang , Hong Du
IPC分类号： G10L21/00 , G10L21/0208 , H03G3/32 , H03G5/16 , H04M1/60
CPC分类号： G10L21/0208 , G10L2021/02087 , H03G3/32 , H03G5/165 , H04M1/6016
摘要： A method and device for adaptively adjusting sound effect, and the method comprises: obtaining an energy value of the current ambient noise; receiving a first trigger instruction and adjusting the current output volume based on the energy value of the current ambient noise; while judging that the energy value of the current ambient noise is bigger than a first threshold, processing treble enhancement; while judging that the energy value of the current ambient noise is less than a second a sound threshold, processing bass enhancement. By collecting the voice data and detecting the speech activity on the voice data, when the first trigger instruction is received, the method can adjust the current volume and adjust the frequency response by the treble enhancement or the bass enhancement based on the energy value of the current ambient noise, thereby obtaining the better sound effect and easy to achieve.
摘要翻译：一种用于自适应调节声音效果的方法和装置，所述方法包括：获得当前环境噪声的能量值; 基于当前环境噪声的能量值接收第一触发指令并调整当前输出音量; 同时判断当前环境噪声的能量值大于第一阈值，处理高音增强; 同时判断当前环境噪声的能量值小于一秒钟的声阈值，处理低音增强。通过收集语音数据并检测语音数据上的语音活动，当接收到第一个触发指令时，该方法可以通过高音增强或低音增强来调节当前音量并调节频率响应，基于当前的环境噪声，从而获得更好的声音效果，易于实现。

4. 发明申请

US20130303489A1 MULTIKINASE INHIBITORS FOR USE IN THE TREATMENT OF CANCER 有权
公开(公告)号：US20130303489A1
公开(公告)日：2013-11-14
申请号：US13794635
申请日：2013-03-11
申请人： Sergei Agoulnik , Bruce Decosta , Hong Du , Yimin Jiang , Xiang-Yi Li , Kenichi Nomoto , John (Yuan) Wang , Huiming Zhang
发明人： Sergei Agoulnik , Bruce Decosta , Hong Du , Yimin Jiang , Xiang-Yi Li , Kenichi Nomoto , John (Yuan) Wang , Huiming Zhang
IPC分类号： A61K31/365 , A61K45/06 , A61K31/4178 , A61K31/496 , A61K31/422 , A61K31/5377 , A61K31/4025 , A61K31/4523 , A61K31/665
CPC分类号： A61K31/365 , A61K31/4025 , A61K31/4178 , A61K31/422 , A61K31/4523 , A61K31/496 , A61K31/5377 , A61K31/665 , A61K45/06
摘要： The present invention provides compounds, pharmaceutical compositions and methods for the treatment of specific cancers. Such compositions may generally comprise a compound of formula (I): wherein R1-R3 are as defined herein, or pharmaceutically acceptable salts or esters thereof; and a pharmaceutically acceptable carrier.

5. 发明授权

US08192900B2 Advanced phase shift lithography and attenuated phase shift mask for narrow track width d write pole definition 有权
标题翻译：高级相移光刻和衰减相移掩模，用于窄轨宽d写磁极定义
公开(公告)号：US08192900B2
公开(公告)日：2012-06-05
申请号：US12714159
申请日：2010-02-26
申请人： Hong Du , Douglas J. Werner , Yi Zheng
发明人： Hong Du , Douglas J. Werner , Yi Zheng
IPC分类号： G03F1/00
CPC分类号： G03F1/32 , G03F1/00 , G11B5/1278 , G11B5/3116 , G11B5/3163
摘要： A method for patterning a wafer using a phase shifting photolithography that can produce a critical symmetrical 2-dimensional structure such as a magnetic write pole of a magnetic write head. In one aspect of the invention, a photolithographic mask has an opaque portion with narrow, transparent phase shifting regions at either side of the opaque portion. A non-phase shifted region extends beyond the narrow phase shifted portion at either side of the structure. The phase shifted regions are symmetrical about the opaque region so that the image produced on the wafer is completely symmetrical. In another aspect of the invention, a phase shifted region in formed in a transparent medium with non-phase shifted regions at either side of the phase shifted region. The transition between the phase shifted region and non-phase shifted region alone defines a pattern on the wafer, without the need for an opaque structure on the mask.
摘要翻译：使用可产生关键对称二维结构（诸如磁写头的磁写磁极）的相移光刻法来构图晶片的方法。在本发明的一个方面，光刻掩模具有不透明部分，在不透明部分的任一侧具有窄的透明相移区域。非相移区域在结构的任一侧延伸超过窄相移部分。相移区域关于不透明区域是对称的，使得在晶片上产生的图像是完全对称的。在本发明的另一方面中，形成在相移区域的任一侧上的具有非相移区域的透明介质中的相移区域。相移区域和非相移区域之间的转变仅在晶片上限定了图案，而不需要掩模上的不透明结构。

6. 发明授权

US07799827B2 Macrocyclic compounds useful as pharmaceuticals 有权
标题翻译：用作药物的大环化合物
公开(公告)号：US07799827B2
公开(公告)日：2010-09-21
申请号：US10507067
申请日：2003-03-07
申请人： Roch Boivin , Kenichi Chiba , Jesse Chow , Hong Du , Yoshihito Eguchi , Masanori Fujita , Masaki Goto , Fabian Gusovsky , Jean-Christophe Harmange , Atsushi Inoue , Yimin Jiang , Megumi Kawada , Takatoshi Kawai , Yoshiyuki Kawakami , Akifumi Kimura , Makoto Kotake , Yoshikazu Kuboi , Charles-André Lemelin , Xiang-Yi Li , Tomohiro Matsushima , Yoshiharu Mizui , Kenzo Muramoto , Hideki Sakurai , Yong-Chun Shen , Hiroshi Shirota , Mark Spyvee , Isao Tanaka , John (Yuan) Wang , Satoshi Yamamoto , Naoki Yoneda
发明人： Roch Boivin , Kenichi Chiba , Jesse Chow , Hong Du , Yoshihito Eguchi , Masanori Fujita , Masaki Goto , Fabian Gusovsky , Jean-Christophe Harmange , Atsushi Inoue , Yimin Jiang , Megumi Kawada , Takatoshi Kawai , Yoshiyuki Kawakami , Akifumi Kimura , Makoto Kotake , Yoshikazu Kuboi , Charles-André Lemelin , Xiang-Yi Li , Tomohiro Matsushima , Yoshiharu Mizui , Kenzo Muramoto , Hideki Sakurai , Yong-Chun Shen , Hiroshi Shirota , Mark Spyvee , Isao Tanaka , John (Yuan) Wang , Satoshi Yamamoto , Naoki Yoneda
IPC分类号： A61K31/335 , C07D313/00
CPC分类号： C07D405/12 , A61K31/335 , A61K31/36 , A61K31/395 , C07D231/12 , C07D233/56 , C07D249/08 , C07D313/00 , C07D401/12 , C07D491/04 , C07D491/044 , C07D493/04 , Y02A50/411
摘要： The present invention provides compounds having formula (I): and additionally provides methods for the synthesis thereof and methods for the use thereof in the treatment of various disorders including inflammatory or autoimmune disorders, and disorders involving malignancy or increased angiogenesis, wherein R1-R11, X, Y, Z, and n are as defined herein.
摘要翻译：本发明提供了具有式（I）的化合物：另外提供了其合成方法及其用于治疗各种疾病（包括炎性或自身免疫性疾病以及涉及恶性肿瘤或增加血管发生的疾病）的方法，其中R1-R11， X，Y，Z和n如本文所定义。

7. 发明授权

US06506037B1 Screw machine 有权
标题翻译：螺丝机
公开(公告)号：US06506037B1
公开(公告)日：2003-01-14
申请号：US09607764
申请日：2000-06-30
申请人： James W. Bush , Clark V. Cooper , Ronald T. Drost , Hong Du , Harry E. Eaton , Hussein E. Khalifa , Keshava B. Kumar , Reng Rong Lin , Philip H. McCluskey , Raymond DeBlois
发明人： James W. Bush , Clark V. Cooper , Ronald T. Drost , Hong Du , Harry E. Eaton , Hussein E. Khalifa , Keshava B. Kumar , Reng Rong Lin , Philip H. McCluskey , Raymond DeBlois
IPC分类号： F01C2100
CPC分类号： F01C1/16 , B05D3/12 , F04C18/084 , F04C18/086 , F04C18/16 , F04C2230/602 , F04C2230/91 , F05C2225/00 , F05C2251/10
摘要： A screw machine (10) has a rotor housing (12) defining overlapping bores (12-1, 12-2). Female rotor (14) is located in bore (12-1) and male rotor (16) is located in bore (12-2). A wear resistant coating is deposited on the tips (14-1, 16-1) of the rotors. A conformable coating is deposited on the valleys (14-2, 16-2) of the rotors. A conformable coating is depsoited on the surface of the bores coacting with the rotors.
摘要翻译：螺旋机器（10）具有限定重叠的孔（12-1,12-2）的转子壳体（12）。母转子（14）位于孔（12-1）中，阳转子（16）位于孔（12-2）中。耐磨涂层沉积在转子的尖端（14-1,16-1）上。在转子的凹槽（14-2,16-2）上沉积一层合适的涂层。在与转子共同作用的孔的表面上沉积适形涂层。

8. 发明授权

US08329742B2 Macrocyclic compounds useful as pharmaceuticals 有权
标题翻译：用作药物的大环化合物
公开(公告)号：US08329742B2
公开(公告)日：2012-12-11
申请号：US12839873
申请日：2010-07-20
申请人： Roch Boivin , Kenichi Chiba , Jesse Chow , Hong Du , Yoshihito Eguchi , Masanori Fujita , Masaki Goto , Fabian Gusovsky , Jean-Christophe Harmange , Atsushi Inoue , Yimin Jiang , Megumi Kawada , Takatoshi Kawai , Yoshiyuki Kawakami , Akifumi Kimura , Makoto Kotake , Yoshikazu Kuboi , Charles-André Lemelin , Xiang-Yi Li , Tomohiro Matsushima , Yoshiharu Mizui , Kenzo Muramoto , Hideki Sakurai , Yong-Chun Shen , Hiroshi Shirota , Mark Spyvee , Isao Tanaka , John (Yuan) Wang , Satoshi Yamamoto , Naoki Yoneda
发明人： Roch Boivin , Kenichi Chiba , Jesse Chow , Hong Du , Yoshihito Eguchi , Masanori Fujita , Masaki Goto , Fabian Gusovsky , Jean-Christophe Harmange , Atsushi Inoue , Yimin Jiang , Megumi Kawada , Takatoshi Kawai , Yoshiyuki Kawakami , Akifumi Kimura , Makoto Kotake , Yoshikazu Kuboi , Charles-André Lemelin , Xiang-Yi Li , Tomohiro Matsushima , Yoshiharu Mizui , Kenzo Muramoto , Hideki Sakurai , Yong-Chun Shen , Hiroshi Shirota , Mark Spyvee , Isao Tanaka , John (Yuan) Wang , Satoshi Yamamoto , Naoki Yoneda
IPC分类号： A61K31/355 , C07D313/00
CPC分类号： C07D405/12 , A61K31/335 , A61K31/36 , A61K31/395 , C07D231/12 , C07D233/56 , C07D249/08 , C07D313/00 , C07D401/12 , C07D491/04 , C07D491/044 , C07D493/04 , Y02A50/411
摘要： The present invention provides methods for the use of compounds having formula (I) in the treatment of various disorders including inflammatory or autoimmune disorders, and disorders involving malignancy or increased angiogenesis, wherein R1-R11, t, X, Y, Z, and n are as defined herein.
摘要翻译：本发明提供了使用具有式（I）的化合物在治疗各种疾病（包括炎性或自身免疫性疾病）以及涉及恶性肿瘤或增加血管发生的疾病的方法，其中R1-R11，t，X，Y，Z和n 如本文所定义。

9. 发明申请

US20110212388A1 ADVANCED PHASE SHIFT LITHOGRAPHY AND ATTENUATED PHASE SHIFT MASK FOR NARROW TRACK WIDTH D WRITE POLE DEFINITION 有权
标题翻译：先进的相位移动平移和衰减相位切换掩码用于窄轨道宽度D写入点定义
公开(公告)号：US20110212388A1
公开(公告)日：2011-09-01
申请号：US12714159
申请日：2010-02-26
申请人： Hong Du , Douglas J. Werner , Yi Zheng
发明人： Hong Du , Douglas J. Werner , Yi Zheng
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/32 , G03F1/00 , G11B5/1278 , G11B5/3116 , G11B5/3163
摘要： A method for patterning a wafer using a phase shifting photolithography that can produce a critical symmetrical 2-dimensional structure such as a magnetic write pole of a magnetic write head. In one aspect of the invention, a photolithographic mask has an opaque portion with narrow, transparent phase shifting regions at either side of the opaque portion. A non-phase shifted region extends beyond the narrow phase shifted portion at either side of the structure. The phase shifted regions are symmetrical about the opaque region so that the image produced on the wafer is completely symmetrical. In another aspect of the invention, a phase shifted region in formed in a transparent medium with non-phase shifted regions at either side of the phase shifted region. The transition between the phase shifted region and non-phase shifted region alone defines a pattern on the wafer, without the need for an opaque structure on the mask.
摘要翻译：使用可产生关键对称二维结构（诸如磁写头的磁写磁极）的相移光刻法来构图晶片的方法。在本发明的一个方面，光刻掩模具有不透明部分，在不透明部分的任一侧具有窄的透明相移区域。非相移区域在结构的任一侧延伸超过窄相移部分。相移区域关于不透明区域是对称的，使得在晶片上产生的图像是完全对称的。在本发明的另一方面中，形成在相移区域的任一侧上的具有非相移区域的透明介质中的相移区域。相移区域和非相移区域之间的转变仅在晶片上限定了图案，而不需要掩模上的不透明结构。

10. 发明申请

US20110144101A1 MACROCYCLIC COMPOUNDS USEFUL AS PHARMACEUTICALS 有权
标题翻译：大环化合物作为药物有用
公开(公告)号：US20110144101A1
公开(公告)日：2011-06-16
申请号：US12839873
申请日：2010-07-20
申请人： Roch Boivin , Kenichi Chiba , Jesse Chow , Hong Du , Yoshihito Eguchi , Masanori Fujita , Masaki Goto , Fabian Gusovsky , Jean-Christophe Harmange , Atsushi Inoue , Yimin Jiang , Megumi Kawada , Takatoshi Kawai , Yoshiyuki Kawakami , Akifumi Kimura , Makoto Kotake , Yoshikazu Kuboi , Charles-André Lemelin , Xiang-Yi Li , Tomohiro Matsushima , Yoshiharu Mizui , Kenzo Muramoto , Hideki Sakurai , Yong-Chun Shen , Hiroshi Shirota , Mark Spyvee , Isao Tanaka , John (Yuan) Wang , Satoshi Yamamoto , Naoki Yoneda
发明人： Roch Boivin , Kenichi Chiba , Jesse Chow , Hong Du , Yoshihito Eguchi , Masanori Fujita , Masaki Goto , Fabian Gusovsky , Jean-Christophe Harmange , Atsushi Inoue , Yimin Jiang , Megumi Kawada , Takatoshi Kawai , Yoshiyuki Kawakami , Akifumi Kimura , Makoto Kotake , Yoshikazu Kuboi , Charles-André Lemelin , Xiang-Yi Li , Tomohiro Matsushima , Yoshiharu Mizui , Kenzo Muramoto , Hideki Sakurai , Yong-Chun Shen , Hiroshi Shirota , Mark Spyvee , Isao Tanaka , John (Yuan) Wang , Satoshi Yamamoto , Naoki Yoneda
IPC分类号： A61K31/5377 , A61K31/335 , A61K31/4184 , A61P29/00 , A61P37/00 , A61P17/06 , A61P11/06 , A61P35/00 , A61P1/00
CPC分类号： C07D405/12 , A61K31/335 , A61K31/36 , A61K31/395 , C07D231/12 , C07D233/56 , C07D249/08 , C07D313/00 , C07D401/12 , C07D491/04 , C07D491/044 , C07D493/04 , Y02A50/411
摘要： The present invention provides methods for the use of compounds having formula (I) in the treatment of various disorders including inflammatory or autoimmune disorders, and disorders involving malignancy or increased angiogenesis, wherein R1-R11, t, X, Y, Z, and n are as defined herein.
摘要翻译：本发明提供了使用具有式（I）的化合物在治疗各种疾病（包括炎性或自身免疫性疾病）以及涉及恶性肿瘤或增加血管发生的疾病的方法，其中R1-R11，t，X，Y，Z和n 如本文所定义。

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