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1. 发明授权

US09163135B2 Rubber compositions with filler and ketoxime or ketixmo silane 有权
标题翻译：具有填料和酮肟或酮肟硅烷的橡胶组合物
公开(公告)号：US09163135B2
公开(公告)日：2015-10-20
申请号：US13819815
申请日：2011-08-31
申请人： Chenchy J. Lin , Yaohong Chen , Atsushi Fukushima , William L. Hergenrother , Terrence E. Hogan
发明人： Chenchy J. Lin , Yaohong Chen , Atsushi Fukushima , William L. Hergenrother , Terrence E. Hogan
IPC分类号： C08L9/00 , C08K5/5465 , C08K5/548
CPC分类号： C08K5/5465 , C08K3/04 , C08K5/548 , C08L91/00 , C08L21/00
摘要： A composition includes an elastomer and a ketoximo silane or a ketoxime additive. The ketoximo silane corresponds to Formula I: where D is selected from a C1 to C60 hydrocarbyl group, or when A is 0 or 1 a hydrogen, or the structure in Formula III; and wherein n and j are independently 1, 2, or 3, m and q are independently 0 or 1, z and t are independently 0 or 1 and (n+m+z) is equal to 3 and (j+q+t) is equal to 3; A is 0 or greater than or equal to 1; R1 and R2 are independently Ci to C60 divalent organic groups and may optionally include O, N S, Si, and/or P heteroatoms with the proviso that when A is 0 either of R1 and R2 may be a chemical bond; R3, R4, R8 and R9 are independently a hydrogen, or a C1 to C60 hydrocarbyl or alkoxy group optionally including O, N, S, Si and/or P; R5 and R6 are independently hydrogen or C1 to C60 hydrocarbyl groups and may optionally include O, N S, Si, and/or P heteroatoms, and may optionally be bonded together to form a cyclic ring; R10 and R11 are independently hydrogen or C1 to C60 hydrocarbyl groups and may optionally include O, N S, Si, and/or P heteroatoms, and may optionally be bonded together to form a cyclic ring.
摘要翻译：组合物包括弹性体和酮肟基硅烷或酮肟添加剂。酮肟基硅烷对应于式I：其中D选自C1至C60烃基，或当A为0或1时为氢或式III中的结构; 并且其中n和j独立地为1,2或3，m和q独立地为0或1，z和t独立地为0或1，并且（n + m + z）等于3，并且（j + q + t ）等于3; A为0或大于或等于1; R 1和R 2独立地为C 1至C 60二价有机基团，并且可任选地包括O，N S，Si和/或P杂原子，条件是当A为0时，R 1和R 2可以是化学键; R 3，R 4，R 8和R 9独立地为氢或任选包括O，N，S，Si和/或P的C 1至C 60烃基或烷氧基; R 5和R 6独立地是氢或C 1至C 60烃基，并且可任选地包括O，N S，Si和/或P杂原子，并且可以任选地结合在一起形成环状环; R 10和R 11独立地为氢或C 1至C 60烃基，并且可以任选地包括O，N S，Si和/或P杂原子，并且可以任选地结合在一起形成环状环。

2. 发明申请

US20130281588A1 RUBBER COMPOSITIONS WITH FILLER AND KETOXIME OR KETIXMO SILANE 有权
标题翻译：橡胶组合物与填充剂和KETOXIME或KETIXMO硅烷
公开(公告)号：US20130281588A1
公开(公告)日：2013-10-24
申请号：US13819815
申请日：2011-08-31
申请人： Chenchy J. Lin , Yaohong Chen , Atsushi Fukushima , William L. Hergenrother , Terrence E. Hogan
发明人： Chenchy J. Lin , Yaohong Chen , Atsushi Fukushima , William L. Hergenrother , Terrence E. Hogan
IPC分类号： C08K5/5465
CPC分类号： C08K5/5465 , C08K3/04 , C08K5/548 , C08L91/00 , C08L21/00
摘要： A composition includes an elastomer and a ketoximo silane or a ketoxime additive. The ketoximo silane corresponds to Formula I: where D is selected from a C1 to C60 hydrocarbyl group, or when A is 0 or 1 a hydrogen, or the structure in Formula III; and wherein n and j are independently 1, 2, or 3, m and q are independently 0 or 1, z and t are independently 0 or 1 and (n+m+z) is equal to 3 and (j+q+t) is equal to 3; A is 0 or greater than or equal to 1; R1 and R2 are independently Ci to C60 divalent organic groups and may optionally include O, N S, Si, and/or P heteroatoms with the proviso that when A is 0 either of R1 and R2 may be a chemical bond; R3, R4, R8 and R9 are independently a hydrogen, or a C1 to C60 hydrocarbyl or alkoxy group optionally including O, N, S, Si and/or P; R5 and R6 are independently hydrogen or C1 to C60 hydrocarbyl groups and may optionally include O, N S, Si, and/or P heteroatoms, and may optionally be bonded together to form a cyclic ring; R10 and R11 are independently hydrogen or C1 to C60 hydrocarbyl groups and may optionally include O, N S, Si, and/or P heteroatoms, and may optionally be bonded together to form a cyclic ring.
摘要翻译：组合物包括弹性体和酮肟基硅烷或酮肟添加剂。酮肟基硅烷对应于式I：其中D选自C1至C60烃基，或当A为0或1时为氢或式III中的结构; 并且其中n和j独立地为1,2或3，m和q独立地为0或1，z和t独立地为0或1，并且（n + m + z）等于3，并且（j + q + t ）等于3; A为0或大于或等于1; R 1和R 2独立地为C 1至C 60二价有机基团，并且可任选地包括O，N S，Si和/或P杂原子，条件是当A为0时，R 1和R 2可以是化学键; R 3，R 4，R 8和R 9独立地为氢或任选包括O，N，S，Si和/或P的C 1至C 60烃基或烷氧基; R 5和R 6独立地是氢或C 1至C 60烃基，并且可任选地包括O，N S，Si和/或P杂原子，并且可以任选地结合在一起形成环状环; R 10和R 11独立地为氢或C 1至C 60烃基，并且可以任选地包括O，N S，Si和/或P杂原子，并且可以任选地结合在一起形成环状环。

3. 发明授权

US09018290B2 Rubber composition with improved bis-silane reinforcement 有权
标题翻译：橡胶组合物具有改进的双硅烷增强
公开(公告)号：US09018290B2
公开(公告)日：2015-04-28
申请号：US13976217
申请日：2011-12-21
申请人： Chenchy J. Lin , Atsushi Fukushima , Christopher G. Robertson , William L. Hergenrother , Yaohong Chen
发明人： Chenchy J. Lin , Atsushi Fukushima , Christopher G. Robertson , William L. Hergenrother , Yaohong Chen
IPC分类号： C08K3/36 , C08K5/5419 , C08K5/548 , B60C1/00 , C08L7/00 , C08L9/00 , C08L9/06
CPC分类号： C08K3/36 , B60C1/00 , C08K5/5419 , C08K5/548 , C08K2201/014 , C08L7/00 , C08L9/00 , C08L9/06
摘要： The present disclosure is directed to tire rubber compositions containing at least one rubbery polymer (with 10 to 100 weight percent of monomer units derived from conjugated diene monomer having between 4 and 8 carbon atoms and 0 to 90 weight percent of monomer units derived from vinyl aromatic monomer); 0.5 to 100 phr of silica filler; 0.05 to 20 phr of a bi-functional silica coupling agent; and 1 to 30 phr of a non-elastomer reactive filler reinforcing agent capable of interacting with at least two silica particles. The bi-functional silica coupling agent and the filler reinforcing agent are utilized in a weight ratio of from 1:100 to 1:0.2. Also disclosed are methods for preparing the tire rubber compositions.
摘要翻译：本公开涉及含有至少一种橡胶状聚合物（10至100重量％的衍生自具有4至8个碳原子的共轭二烯单体的单体单元和0至90重量％衍生自乙烯基芳族化合物的单体单元的轮胎橡胶组合物）单体）; 0.5〜100phr二氧化硅填料; 0.05〜20phr双功能二氧化硅偶联剂; 和1至30phr的能够与至少两种二氧化硅颗粒相互作用的非弹性体反应性填料增强剂。二官能二氧化硅偶联剂和填料增强剂以1:100至1:0.2的重量比使用。还公开了制备轮胎橡胶组合物的方法。

4. 发明申请

US20130281590A1 Rubber Composition With Improved Bis-Silane Reinforcement 有权
标题翻译：改善双硅烷增强橡胶组合物
公开(公告)号：US20130281590A1
公开(公告)日：2013-10-24
申请号：US13976217
申请日：2011-12-21
申请人： Chenchy J. Lin , Atsushi Fukushima , Christopher G. Robertson , William L. Hergenrother , Yaohong Chen
发明人： Chenchy J. Lin , Atsushi Fukushima , Christopher G. Robertson , William L. Hergenrother , Yaohong Chen
IPC分类号： C08K3/36 , C08K5/5419 , C08K5/548
CPC分类号： C08K3/36 , B60C1/00 , C08K5/5419 , C08K5/548 , C08K2201/014 , C08L7/00 , C08L9/00 , C08L9/06
摘要： The present disclosure is directed to tire rubber compositions containing at least one rubbery polymer (with 10 to 100 weight percent of monomer units derived from conjugated diene monomer having between 4 and 8 carbon atoms and 0 to 90 weight percent of monomer units derived from vinyl aromatic monomer); 0.5 to 100 phr of silica filler; 0.05 to 20 phr of a bi-functional silica coupling agent; and 1 to 30 phr of a non-elastomer reactive filler reinforcing agent capable of interacting with at least two silica particles. The bi-functional silica coupling agent and the filler reinforcing agent are utilized in a weight ratio of from 1:100 to 1:0.2. Also disclosed are methods for preparing the tire rubber compositions.
摘要翻译：本公开涉及含有至少一种橡胶状聚合物（10至100重量％的衍生自具有4至8个碳原子的共轭二烯单体的单体单元和0至90重量％衍生自乙烯基芳族化合物的单体单元的轮胎橡胶组合物）单体）; 0.5〜100phr二氧化硅填料; 0.05〜20phr双功能二氧化硅偶联剂; 和1至30phr的能够与至少两种二氧化硅颗粒相互作用的非弹性体反应性填料增强剂。二官能二氧化硅偶联剂和填料增强剂以1:100至1:0.2的重量比使用。还公开了制备轮胎橡胶组合物的方法。

5. 发明授权

US09441289B2 High-purity copper or high-purity copper alloy sputtering target, process for manufacturing the sputtering target, and high-purity copper or high-purity copper alloy sputtered film 有权
标题翻译：高纯度铜或高纯度铜合金溅射靶，溅射靶制造工艺，高纯度铜或高纯度铜合金溅射膜
公开(公告)号：US09441289B2
公开(公告)日：2016-09-13
申请号：US13063050
申请日：2009-09-24
申请人： Atsushi Fukushima , Yuichiro Shindo , Susumu Shimamoto
发明人： Atsushi Fukushima , Yuichiro Shindo , Susumu Shimamoto
IPC分类号： C22C9/00 , C23C14/34 , C23C14/18 , C23C14/56
CPC分类号： C23C14/3414 , C22C9/00 , C23C14/185 , C23C14/564
摘要： Provided is a high-purity copper or high-purity copper alloy sputtering target of which the purity is 6N or higher and in which the content of the respective components of P, S, O and C is 1 ppm or less, wherein the number of nonmetal inclusions having a particle size of 0.5 μm or more and 20 μm or less is 30,000 inclusions/g or less. As a result of using high-purity copper or high-purity copper alloy from which harmful inclusions of P, S, C and O system have been reduced as the raw material and controlling the existence form of nonmetal inclusions, the present invention addresses a reduction in the percent defect of wirings of semiconductor device formed by sputtering a high-purity copper target so as to ensure favorable repeatability.
摘要翻译：提供纯度为6N以上的高纯度铜或高纯度铜合金溅射靶，其中P，S，O和C各成分的含量为1ppm以下，其中，粒径为0.5μm以上且20μm以下的非金属夹杂物为30,000夹杂物/ g以下。作为原料使P，S，C和O系的有害夹杂物作为原料而得到的高纯度铜或高纯度铜合金的结果，本发明的目的在于减少非金属夹杂物的存在形式，在通过溅射高纯度铜靶形成的半导体器件的布线的百分比缺陷中，以确保良好的重复性。

6. 发明申请

US20140318953A1 SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR 有权
标题翻译：溅射目标及其制造方法
公开(公告)号：US20140318953A1
公开(公告)日：2014-10-30
申请号：US14348174
申请日：2012-09-12
申请人： Kenichi Nagata , Tomio Otsuki , Takeo Okabe , Nobuhito Makino , Atsushi Fukushima
发明人： Kenichi Nagata , Tomio Otsuki , Takeo Okabe , Nobuhito Makino , Atsushi Fukushima
IPC分类号： H01J37/34 , B21D53/00
CPC分类号： H01J37/3435 , B21D53/00 , C22C9/05 , C23C14/3407 , C23C14/3414 , H01J37/3414 , H01J37/3426
摘要： A backing plate integrated sputtering target includes a flange part having a Vicker's hardness (Hv) of 90 or more and a 0.2% yield stress of 6.98×107 N/m2 or more. Enhancing the mechanical strength of only the flange part of the target inhibits the target from being deformed during sputtering, and further, does not vary the original sputtering characteristics. Consequently, the target can form a thin film having excellent uniformity. This can improve the yield and the reliability of semiconductor products, which have been progressing in miniaturization and integration.
摘要翻译：背板集成溅射靶包括具有维氏硬度（Hv）为90以上且0.2％屈服应力为6.98×10 7 N / m 2以上的凸缘部。仅提高目标的凸缘部分的机械强度可以抑制靶在溅射过程中变形，而且不改变原始溅射特性。因此，靶可以形成均匀性优异的薄膜。这可以提高半导体产品的产量和可靠性，这在小型化和集成化方面一直在进步。

7. 发明申请

US20140110849A1 Copper-Titanium Alloy Sputtering Target, Semiconductor Wiring Line Formed Using the Sputtering Target, and Semiconductor Element and Device Each Equipped with the Semiconductor Wiring Line 审中-公开
标题翻译：铜 - 钛合金溅射靶，使用溅射靶形成的半导体接线和每个配备半导体接线的半导体元件和器件
公开(公告)号：US20140110849A1
公开(公告)日：2014-04-24
申请号：US14001975
申请日：2012-02-15
申请人： Tomio Otsuki , Atsushi Fukushima
发明人： Tomio Otsuki , Atsushi Fukushima
IPC分类号： H01L23/532 , C23C14/34
CPC分类号： H01L23/53233 , C22C1/02 , C22C9/00 , C22F1/08 , C23C14/165 , C23C14/3407 , C23C14/3414 , H01L23/53238 , H01L23/53261 , H01L2924/0002 , H01L2924/00
摘要： A copper-titanium alloy sputtering target comprising 3 at % or more and less than 15 at % of Ti and a remainder made up of Cu and unavoidable impurities, wherein a variation (standard deviation) in hardness is within 5.0 and a variation (standard deviation) in electric resistance is within 1.0 in an in-plane direction of the target. Provided are: a sputtering target for forming a copper-titanium alloy wiring line for semiconductors capable of causing the copper alloy wiring line for semiconductors to be equipped with a self-diffusion suppressive function, effectively preventing contamination around the wiring line caused by diffusion of active Cu, improving electromigration (EM) resistance, corrosion resistance and the like, enabling the arbitrary formation of a barrier layer in a simple manner, and uniformizing film properties; a copper-titanium alloy wiring line for semiconductors; and a semiconductor element and a device each equipped with the semiconductor wiring line.
摘要翻译：包含3原子％以上且小于15原子％的Ti的铜 - 钛合金溅射靶，余量由Cu和不可避免的杂质构成，其中硬度的变化（标准偏差）在5.0以内，变化（标准偏差）在目标的面内方向上在1.0以内。提供：用于形成能够使半导体的铜合金布线具有自扩散抑制功能的用于半导体的铜 - 钛合金布线的溅射靶，有效地防止由活性物质的扩散引起的布线周围的污染 Cu，改善电迁移（EM）电阻，耐腐蚀性等，能够以简单的方式任意形成阻挡层，并使膜性能均匀化; 半导体用铜钛合金布线; 以及各自配备有半导体布线的半导体元件和器件。

8. 发明申请

US20130124585A1 FILE PROCESSING APPARATUS AND FILE PROCESSING METHOD 审中-公开
标题翻译：文件处理装置和文件处理方法
公开(公告)号：US20130124585A1
公开(公告)日：2013-05-16
申请号：US13612409
申请日：2012-09-12
申请人： Kenichiro SUZUKI , Kazuhito Shimomura , Yuji Sakai , Atsushi Fukushima , Masaaki Inoue
发明人： Kenichiro SUZUKI , Kazuhito Shimomura , Yuji Sakai , Atsushi Fukushima , Masaaki Inoue
IPC分类号： G06F17/30
CPC分类号： G06F11/1076 , G06F3/0608 , G06F3/0643 , G06F3/0683
摘要： According to one embodiment, a file processing apparatus includes a file group generator, a divided file generator, and a recorder. The file group generator is configured to generate a file group formed by a plurality of first processing target files each having a size less than a threshold size of processing target files. The divided file generator is configured to generate first divided files by dividing the file group, and to generate second divided files by dividing a second processing target file having a size not less than the threshold size of the processing target files. The recorder is configured to record the first and second divided files.
摘要翻译：根据一个实施例，文件处理装置包括文件组生成器，分割文件生成器和记录器。文件组生成器被配置为生成由多个第一处理目标文件形成的文件组，每个第一处理目标文件的尺寸小于处理目标文件的阈值大小。分割文件生成器被配置为通过划分文件组来生成第一分割文件，并且通过划分尺寸不小于处理目标文件的阈值大小的第二处理目标文件来生成第二分割文件。记录器被配置为记录第一和第二分割文件。

9. 发明申请

US20120031756A1 Tantalum Sputtering Target 有权
标题翻译：钽溅射靶
公开(公告)号：US20120031756A1
公开(公告)日：2012-02-09
申请号：US13265566
申请日：2010-08-04
申请人： Atsushi Fukushima , Kunihiro Oda , Shinichiro Senda
发明人： Atsushi Fukushima , Kunihiro Oda , Shinichiro Senda
IPC分类号： C23C14/14
CPC分类号： C23C14/3414 , C22C27/02 , C22F1/18
摘要： Provided is a tantalum sputtering target containing 1 mass ppm or more and 100 mass ppm or less of tungsten as an essential component, and having a purity of 99.998% or more excluding tungsten and gas components. Additionally provided is a tantalum sputtering target according to according to the above further containing 0 to 100 mass ppm of molybdenum and/or niobium, excluding 0 mass ppm thereof, wherein the total content of tungsten, molybdenum, and niobium is 1 mass ppm or more and 150 mass ppm or less, and wherein the purity is 99.998% or more excluding tungsten, molybdenum, niobium and gas components. Thereby obtained is a high purity tantalum sputtering target comprising a uniform and fine structure and which enables stable plasma and yields superior film evenness (uniformity).
摘要翻译：提供含有1质量ppm以上且100质量ppm以下的钨作为必要成分的钽溅射靶，纯度为99.998％以上，不包括钨和气体成分。另外提供根据上述的钽溅射靶，其进一步含有0〜100质量ppm的钼和/或铌，不包括0质量ppm，其中钨，钼和铌的总含量为1质量ppm以上和150质量ppm以下，纯度为99.998％以上，不包括钨，钼，铌和气体成分。由此获得的是包含均匀和精细结构的高纯度钽溅射靶，其能够稳定的等离子体并且产生优异的膜均匀性（均匀性）。

10. 发明申请

US20100225072A1 SEAL-RING SHAPE FORMING METHOD, SEAL-RING SHAPE FORMING APPARATUS, AND SEAL RING 有权
标题翻译：密封圈形成方法，密封形状装置和密封圈
公开(公告)号：US20100225072A1
公开(公告)日：2010-09-09
申请号：US12477309
申请日：2009-06-03
申请人： Atsushi Fukushima , Toshiyuki Kido , Toshihiro Amano , Takahiro Saeki
发明人： Atsushi Fukushima , Toshiyuki Kido , Toshihiro Amano , Takahiro Saeki
IPC分类号： F16J15/02 , B29C53/40
CPC分类号： F16J15/328 , B29C53/46 , B29C65/02 , B29C65/18 , B29C65/305 , B29C66/1282 , B29C66/12841 , B29C66/5241 , B29C66/5261 , B29C66/5268 , B29C66/71 , B29C66/73117 , B29C66/91212 , B29C66/91231 , B29C66/91411 , B29C66/91421 , B29C66/91431 , B29C66/91445 , B29C66/91645 , B29C66/961 , B29D99/0085 , B29L2031/265 , B29L2031/7098 , F16J15/3272 , F16J15/441 , Y10T29/49297 , Y10T29/49716 , Y10T29/49748 , Y10T29/4975 , B29C66/128 , B29C65/00 , B29K2027/18 , B29K2071/00 , B29K2077/00 , B29K2079/085 , B29K2081/04
摘要： A seal ring whose abutment joint portion is opened is fitted into an annular gap while the abutment joint portion is substantially closed. The annular gap is formed between an inner circumferential surface of a hole portion provided in an outer circumferential jig and an outer circumferential surface of an inner circumferential jig disposed in the hole portion, and has a heating region and a cooling region. The seal ring is passed through the heating region and then passed through the cooling region in the annular gap. The outer circumferential jig and the inner circumferential jig are maintained at a constant temperature higher than a glass transition temperature of a resin material for the seal ring in the heating region, and maintained at a constant temperature lower than the glass transition temperature of the resin material for the seal ring in the cooling region.
摘要翻译：将邻接接头部分打开的密封环装配到环形间隙中，同时邻接接合部分基本上封闭。环状间隙形成在设置在外周夹具中的孔部的内周面和设置在孔部中的内周夹具的外周面之间，具有加热区域和冷却区域。密封环通过加热区域，然后通过环形间隙中的冷却区域。外周夹具和内周夹具保持在比加热区域中用于密封环的树脂材料的玻璃化转变温度高的恒定温度，并且保持在比树脂材料的玻璃化转变温度低的恒定温度用于冷却区域中的密封环。

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