专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5733479A Positive photoactive compounds based on 2,6-dinitro benzyl groups 失效
标题翻译：基于2,6-二硝基苄基的阳性光活性化合物
公开(公告)号：US5733479A
公开(公告)日：1998-03-31
申请号：US685062
申请日：1996-07-22
申请人： Charles F. Kahle, II , Neil D. McMurdie , Raphael O. Kollah , Daniel E. Rardon , Gregory J. McCollum
发明人： Charles F. Kahle, II , Neil D. McMurdie , Raphael O. Kollah , Daniel E. Rardon , Gregory J. McCollum
IPC分类号： C07C201/08 , A61K9/00 , A61K9/32 , C07C201/12 , C07C205/11 , C07C205/19 , C07C205/23 , C07C205/26 , C07C205/34 , C07C205/42 , C07C215/14 , C07C271/08 , C07C301/00 , C07C309/67 , C07C309/73 , C07C319/14 , C07C323/16 , C07C323/25 , C07C323/29 , C08G18/38 , C08G59/50 , C08G63/685 , C08L101/00 , C09D163/00 , G03F7/00 , G03F7/004 , G03F7/039 , G03F7/16 , C09K15/16
CPC分类号： C07C323/25 , A61K9/0004 , C07C205/11 , C07C205/19 , C07C205/26 , C07C215/14 , C08G18/384 , C08G59/50 , C08G59/504 , C08G63/6856 , C09D163/00 , G03F7/0045 , G03F7/039 , G03F7/164
摘要： Photoreactive compounds are synthesized from 2,5- or 2,6-dinitrobenzyl groups. Also disclosed are methods of synthesizing reactive monomers containing 2,5- or 2,6-dinitrobenzyl groups.
摘要翻译：光反应性化合物由2,5-或2,6-二硝基苄基合成。还公开了合成含有2,5-或2,6-二硝基苄基的反应性单体的方法。

2. 发明授权

US5600035A Positive photoactive compounds based on 2,6-dinitro benzyl groups and 2,5-dinitro benzyl groups 失效
标题翻译：基于2,6-二硝基苄基和2,5-二硝基苄基的阳性光活性化合物
公开(公告)号：US5600035A
公开(公告)日：1997-02-04
申请号：US274614
申请日：1994-07-13
申请人： Charles F. Kahle, II , Neil D. McMurdie , Raphael O. Kollah , Daniel E. Rardon , Gregory J. McCollum
发明人： Charles F. Kahle, II , Neil D. McMurdie , Raphael O. Kollah , Daniel E. Rardon , Gregory J. McCollum
IPC分类号： C07C201/08 , A61K9/00 , A61K9/32 , C07C201/12 , C07C205/11 , C07C205/19 , C07C205/23 , C07C205/26 , C07C205/34 , C07C205/42 , C07C215/14 , C07C271/08 , C07C301/00 , C07C309/67 , C07C309/73 , C07C319/14 , C07C323/16 , C07C323/25 , C07C323/29 , C08G18/38 , C08G59/50 , C08G63/685 , C08L101/00 , C09D163/00 , G03F7/00 , G03F7/004 , G03F7/039 , G03F7/16 , C07C205/00
CPC分类号： C07C323/25 , A61K9/0004 , C07C205/11 , C07C205/19 , C07C205/26 , C07C215/14 , C08G18/384 , C08G59/50 , C08G59/504 , C08G63/6856 , C09D163/00 , G03F7/0045 , G03F7/039 , G03F7/164
摘要： Photoreactive compounds are synthesized from 2,5- or 2,6-dintrobenzyl groups. Also disclosed are methods of synthesizing reactive monomers containing 2,5- or 2,6-dintrobenzyl groups.
摘要翻译：光反应性化合物由2,5-或2,6-二苯甲基合成。还公开了合成含有2,5-或2,6-二苯甲基的反应性单体的方法。

3. 发明授权

US5449834A Method of synthesizing 2,6-dinitro benzyl compounds 失效
标题翻译： 2,6-二硝基苄基化合物的合成方法
公开(公告)号：US5449834A
公开(公告)日：1995-09-12
申请号：US274613
申请日：1994-07-13
申请人： Charles F. Kahle, II , Raphael O. Kollah , Gregory J. McCollum
发明人： Charles F. Kahle, II , Raphael O. Kollah , Gregory J. McCollum
IPC分类号： C07C205/19 , C07C205/35 , C07C205/57 , C07C205/59 , C07C205/61 , C08G18/38 , C07C205/06
CPC分类号： C08G18/384 , C07C201/12
摘要： Described is a method of preparing dinitrobis(hydroxymethyl)benzene, useful as a photoreactive monomer, from a derivative of stilbene. Also disclosed is a novel dinitrocarbomethoxybenzaldehyde compound useful as an intermediate.
摘要翻译：描述了从二苯乙烯的衍生物制备可用作光反应性单体的二硝基苯酚（羟甲基）苯的方法。还公开了可用作中间体的新型二硝基甲氧基苯甲醛化合物。

4. 发明授权

US5489714A Method of synthesizing 2,6-dinitro benzyl compounds 失效
公开(公告)号：US5489714A
公开(公告)日：1996-02-06
申请号：US447300
申请日：1995-05-22
申请人： Charles F. Kahle, II , Raphael O. Kollah , Gregory J. McCollum
发明人： Charles F. Kahle, II , Raphael O. Kollah , Gregory J. McCollum
IPC分类号： C07C205/19 , C07C205/35 , C07C205/57 , C07C205/59 , C07C205/61 , C08G18/38 , C07C205/06
CPC分类号： C08G18/384 , C07C201/12
摘要： Described is a method of preparing dinitrobis(hydroxymethyl)benzene, useful as a photoreactive monomer, from a derivative of stilbene. Also disclosed is a novel dinitrocarbomethoxybenzaldehyde compound useful as an intermediate.

5. 发明授权

US4927969A Preparation of alkyl primary amines 失效
标题翻译：烷基伯胺的制备
公开(公告)号：US4927969A
公开(公告)日：1990-05-22
申请号：US187786
申请日：1988-05-02
申请人： Charles F. Kahle, II , Gregory J. McCollum , Craig A. Wilson
发明人： Charles F. Kahle, II , Gregory J. McCollum , Craig A. Wilson
IPC分类号： C07C209/62 , C07C211/27
CPC分类号： C07C211/27 , C07C209/62
摘要： Alkyl primary amines, e.g., tertiary alkyl primary amines, are prepared by reaction of the corresponding alkyl primary isocyanates with an alkanolamine to form an intermediate area reaction product, followed by heating to decompose the urea reaction product and form the amine product. The amine product can be recovered in high yield by vacuum distillation.
摘要翻译：烷基伯胺，例如叔烷基伯胺通过相应的烷基一级异氰酸酯与链烷醇胺的反应制备形成中间区反应产物，然后加热分解尿素反应产物并形成胺产物。通过真空蒸馏可以高产率回收胺产物。

6. 发明授权

US5721088A Electrodepositable photoimageable compositions with improved edge coverage 失效
标题翻译：具有改善的边缘覆盖的可电沉积的可光成像组合物
公开(公告)号：US5721088A
公开(公告)日：1998-02-24
申请号：US580017
申请日：1995-12-20
申请人： James W. Martin , Charles F. Kahle, II
发明人： James W. Martin , Charles F. Kahle, II
IPC分类号： G03F7/032 , G03F7/039 , G03F7/16 , H05K3/00 , G03F7/004
CPC分类号： G03F7/032 , G03F7/039 , G03F7/164 , H05K3/0076 , Y10S430/136
摘要： This invention provides an improved electrodepositable photoimageable resist composition which includes a photosensitive composition and a microgel. The photosensitive composition can be either a negative-acting or a positive-acting photoresist. Moreover, with regard to each of these, the photoresist component can be either cationic or anionic. The microgel includes a plurality of crosslinked organic particles which can form a stable aqueous dispersion. Moreover, the microgel is present in an amount ranging from between about 0.1 to about 30 weight percent. These weight percentages are based upon the total weight of the resin solids in the photoimageable resist composition. At these concentrations, the microgels promote edge coverage, but do not significantly reduce the photosensitivity and developability properties of the photosensitive composition with which they are combined.
摘要翻译：本发明提供一种改进的可电沉积光致成像抗蚀剂组合物，其包括光敏组合物和微凝胶。光敏组合物可以是负性作用或正性光致抗蚀剂。此外，关于这些中的每一个，光致抗蚀剂组分可以是阳离子或阴离子的。微凝胶包括可以形成稳定的水分散体的多个交联的有机颗粒。此外，微凝胶以约0.1至约30重量％的量存在。这些重量百分数是基于光致成像抗蚀剂组合物中的树脂固体的总重量。在这些浓度下，微凝胶促进边缘覆盖，但不会显着降低与它们组合的光敏组合物的光敏性和显影性。

7. 发明授权

US5674660A Non-tacky photoimageable electrodepositable photoresist composition 失效
标题翻译：非粘性可光成像电沉积光致抗蚀剂组合物
公开(公告)号：US5674660A
公开(公告)日：1997-10-07
申请号：US268778
申请日：1994-06-30
申请人： Kurt G. Olson , Michael G. Sandala , Steven R. Zawacky , Charles F. Kahle, II , Masayuki Nakajima
发明人： Kurt G. Olson , Michael G. Sandala , Steven R. Zawacky , Charles F. Kahle, II , Masayuki Nakajima
IPC分类号： G03F7/027 , G03F7/031 , G03F7/038 , G03F7/16 , H01L21/027 , H01L21/30 , H05K3/06 , G03C1/73
CPC分类号： G03F7/0388 , G03F7/164 , Y10S430/107 , Y10S430/136
摘要： An electrodepositable photoresist composition comprising an aqueous dispersion of: (a) a water-dispersible neutralized cationic polymeric material having a pendant unsaturation, (b) a nonionic unsaturated material and (c) a photoinitiator; characterized in that it can form smooth, thin and pinhole free coatings and further characterized in that the film is capable of being selectively insolubilized by patterned radiation exposure such that the unexposed portion of the film is soluble in dilute aqueous acid and the exposed portion is insoluble in said aqueous acid.
摘要翻译：一种电沉积光致抗蚀剂组合物，其包含以下水分散体：（a）具有侧不饱和度的水分散性中和阳离子聚合物材料，（b）非离子不饱和材料和（c）光引发剂; 其特征在于其可以形成光滑，薄且无针孔的涂层，并且其特征还在于该膜能够通过图案化曝光曝光选择性地不溶，使得该膜的未曝光部分可溶于稀酸水溶液中，并且暴露部分不溶在所述含水酸中。

8. 发明授权

US5091451A Reaction products of alpha-aminomethylene phosphonic acids and epoxy compounds and their use in coating compositions 失效
标题翻译： α-氨基亚甲基膦酸和环氧化合物的反应产物及其在涂料组合物中的应用
公开(公告)号：US5091451A
公开(公告)日：1992-02-25
申请号：US663354
申请日：1991-03-04
申请人： Charles F. Kahle, II , Kurt G. Olson , James A. Claar , Paul H. Pettit, Jr. , Paul R. Kerr
发明人： Charles F. Kahle, II , Kurt G. Olson , James A. Claar , Paul H. Pettit, Jr. , Paul R. Kerr
IPC分类号： C07F9/40 , C07F9/38 , C08G59/40 , C09D5/00 , C09D5/02 , C09D5/03 , C09D5/38 , C09D5/46 , C09D7/12 , C09D163/00
CPC分类号： C09D163/00 , C07F9/3817 , C08G59/4071 , C09D5/024 , C09D5/033 , C09D5/38 , C09D7/1233 , C08K5/06 , C08K5/5313
摘要： The disclosure is directed to a compound which is a reaction product of at least one phosphonic acid group of an alpha-aminomethylene phosphonic acid containing at least one group corresponding to the formula, ##STR1## with an epoxy group of a compound containing at least one epoxy group. The disclosure is also directed to waterborne coating compositions, organic solvent-borne coating compositions, and powder coating compositions containing the aforesaid reaction product.
摘要翻译：本发明涉及一种化合物，其是至少一种含有至少一个对应于下式的基团的α-氨基亚甲基膦酸的膦酸基团的反应产物，其中所述化合物含有至少一个环氧基。本公开还涉及水性涂料组合物，有机溶剂型涂料组合物和含有上述反应产物的粉末涂料组合物。

9. 发明授权

US5595859A Process for preparing an article having deposited thereon a photoimageable electrodepositable photoresist composition 失效
标题翻译：用于制备其上沉积有可光成像的可电沉积光致抗蚀剂组合物的制品的方法
公开(公告)号：US5595859A
公开(公告)日：1997-01-21
申请号：US478151
申请日：1995-06-07
申请人： Kurt G. Olson , Michael G. Sandala , Steven R. Zawacky , Charles F. Kahle, II , Masayuki Nakajima
发明人： Kurt G. Olson , Michael G. Sandala , Steven R. Zawacky , Charles F. Kahle, II , Masayuki Nakajima
IPC分类号： G03F7/027 , G03F7/031 , G03F7/038 , G03F7/16 , H01L21/027 , H01L21/30 , H05K3/06 , G03C5/00
CPC分类号： G03F7/0388 , G03F7/164 , Y10S430/107 , Y10S430/136
摘要： An electrodepositable photoresist composition comprising an aqueous dispersion of: (a) a water-dispersible neutralized cationic polymeric material having a pendant unsaturation, (b) a nonionic unsaturated material and (c) a photoinitiator; characterized in that it can form smooth, thin and pinhole free coatings and further characterized in that the film is capable of being selectively insolubilized by patterned radiation exposure such that the unexposed portion of the film is soluble in dilute aqueous acid and the exposed portion is insoluble in said aqueous acid.
摘要翻译：一种电沉积光致抗蚀剂组合物，其包含以下水分散体：（a）具有侧不饱和度的水分散性中和阳离子聚合物材料，（b）非离子不饱和材料和（c）光引发剂; 其特征在于其可以形成光滑，薄且无针孔的涂层，并且其特征还在于该膜能够通过图案化曝光曝光选择性地不溶，使得该膜的未曝光部分可溶于稀酸水溶液中，并且暴露部分不溶在所述含水酸中。

10. 发明授权

US5034556A Reaction products of alpha-aminomethylene phosphonic acids and epoxy compounds and their use in coating compositions 失效
标题翻译： α-氨基亚甲基膦酸和环氧化合物的反应产物及其在涂料组合物中的应用
公开(公告)号：US5034556A
公开(公告)日：1991-07-23
申请号：US333355
申请日：1989-04-03
申请人： Charles F. Kahle, II
发明人： Charles F. Kahle, II
IPC分类号： C07F9/40 , C07F9/38 , C08G59/40 , C09D5/00 , C09D5/02 , C09D5/03 , C09D5/38 , C09D5/46 , C09D7/12 , C09D163/00
CPC分类号： C09D163/00 , C07F9/3817 , C08G59/4071 , C09D5/024 , C09D5/033 , C09D5/38 , C09D7/1233 , C08K5/06 , C08K5/5313
摘要： The disclosure is directed to a compound which is a reaction product of at least one phosphonic acid group of an alpha-aminomethylene phosphonic acid containing at least one group corresponding to the formula, ##STR1## with an epoxy group of a compound containing at least one epoxy group. The disclosure is also directed to waterborne coating compositions, organic solvent-borne coating compositions, and powder coating compositions containing the aforesaid reaction product.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式