会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明授权
    • Method of texture by in-situ masking and etching for thin film magnetic
recording medium
    • 通过原位掩蔽和蚀刻薄膜磁记录介质的纹理方法
    • US5635037A
    • 1997-06-03
    • US101456
    • 1993-08-02
    • Jau-Jier ChuChung-Yu TingOliver J. HorngJye-Yen ChengCharles C. LinMei-Rurng Tseng
    • Jau-Jier ChuChung-Yu TingOliver J. HorngJye-Yen ChengCharles C. LinMei-Rurng Tseng
    • G11B5/84C23C14/00
    • G11B5/8404G11B5/8408
    • A magnetic recording medium controllably textured by performing sputter etching or reactive ion etching either on the surface of a smooth substrate, which can be nickel-phosphorous/aluminum-magnesium (Al--Mg) substrate, or on the surface of a protective layer, such as a carbon overcoat. Both types of etching processes described above are carried out in a sputtering apparatus and have an etching mask of discrete hemi-spherical structures formed by the agglomeration of a low melting point metal or alloy such as indium or Pb--Sn, which has been deposited on a non-wetting surface such as the oxidized surface of NiP layer or the protective carbon overcoat prior to etching. The morphology of the textured surface can be controlled by adjusting the average thickness of the deposited masking materials, the gas composition, as well as the base pressure during etching. An optimum texture created by either sputter etching or reactive ion etching on a magnetic recording medium provides better wear resistance and a lower flying height of a magnetic head as compared to conventional mechanical texturing techniques. In addition, the manufacturing processes of the magnetic recording medium thus defined including the deposition of underlayer, magnetic layer and protective overcoat and the creation of surface texture can be successively performed within a single vacuum system without breaking vacuum; the present invention thus possesses the advantages of process automation, improving quality, and lowering manufacturing cost.
    • 通过在可以是镍 - 磷/铝 - 镁(Al-Mg)衬底的光滑衬底的表面上或在保护层的表面上执行溅射蚀刻或反应离子蚀刻来控制地纹理的磁记录介质,例如 作为碳外套。 上述两种类型的蚀刻工艺在溅射装置中进行,并具有通过低熔点金属或诸如铟或Pb-Sn的合金(例如铟或Pb-Sn)的聚集而形成的离散半球形结构的蚀刻掩模,其已沉积在 非浸润表面,例如NiP层的氧化表面或蚀刻前的保护性碳外涂层。 纹理表面的形态可以通过调节沉积的掩模材料的平均厚度,气体组成以及蚀刻期间的基底压力来控制。 与常规机械纹理技术相比,通过溅射蚀刻或反应离子蚀刻在磁记录介质上产生的最佳纹理提供了更好的耐磨性和较低的磁头飞行高度。 此外,可以在单个真空系统内连续地进行包括底层沉积,磁性层和保护外涂层的磁记录介质的制造过程,而不破坏真空; 因此本发明具有过程自动化,提高质量和降低制造成本的优点。
    • 10. 发明授权
    • Process to form narrow write track for magnetic recording
    • 形成用于磁记录的窄写轨的过程
    • US06821717B2
    • 2004-11-23
    • US10210955
    • 2002-08-02
    • Charles C. LinKochan JuJeiwei Chang
    • Charles C. LinKochan JuJeiwei Chang
    • G11B531
    • C25D5/022Y10T29/49032
    • As the recording density of magnetic disk drives approaches 100 Gbits/in2, write track lengths of about 0.10 microns will be required. This cannot be accomplished using conventional photolithography. The present invention solves this problem by first forming on the bottom pole of the write head a cavity in a layer of photoresist, using conventional means. A seed layer of non-magnetic material is electrolessly laid down, following which a second layer of photoresist is deposited and patterned to form a second cavity that symmetrically surrounds the first one, thereby forming a mold around it. Ferromagnetic metal is then electro-deposited in this mold to form the top magnetic pole. Following the removal of all photoresist and a brief selective etch of the bottom pole, an extremely narrow write head is obtained.
    • 由于磁盘驱动器的记录密度接近100G比特/英寸,所以需要大约0.10微米的写入磁道长度。 这不能用常规的光刻法来实现。 本发明通过使用常规方法首先在写入头的底极上形成光致抗蚀剂层中的空腔来解决这个问题。 非磁性材料的籽晶层被无电镀敷,随后沉积第二层光致抗蚀剂并图案化以形成对称地围绕第一腔的第二腔,从而在其周围形成模具。 然后将铁磁金属电沉积在该模具中以形成顶部磁极。 除去所有光致抗蚀剂和对底极进行短暂的选择性蚀刻之后,获得极窄的写入头。