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1. 发明申请

US20080164798A1 Electron multiplier electrode and terahertz radiation source using the same 有权
标题翻译：电子倍增器电极和太赫兹辐射源使用相同
公开(公告)号：US20080164798A1
公开(公告)日：2008-07-10
申请号：US12007186
申请日：2008-01-08
申请人： Chan-wook Baik , Yong-wan Jin , Sun-il Kim , Min-jong Bae
发明人： Chan-wook Baik , Yong-wan Jin , Sun-il Kim , Min-jong Bae
IPC分类号： H01J43/04 , G21G4/00
CPC分类号： H01J43/04
摘要： Provided are an electron multiplier electrode using a secondary electron extraction electrode and a terahertz radiation source using the electron multiplier electrode. The electron multiplier electrode includes: a cathode; an emitter disposed on the cathode and extracting electron beams; a gate electrode for switching the electron beams, the gate electrode being disposed on the cathode to surround the emitter; and a secondary electron extraction electrode disposed on the gate electrode and including a secondary electron extraction layer extracting secondary electrons due to collision of the electron beams.
摘要翻译：提供了使用二次电子提取电极和使用电子倍增器电极的太赫兹辐射源的电子倍增器电极。电子倍增器电极包括：阴极; 设置在阴极上并提取电子束的发射器; 用于切换电子束的栅电极，栅电极设置在阴极上以围绕发射极; 以及二次电子提取电极，设置在栅电极上，并且包括由于电子束的碰撞而提取二次电子的二次电子提取层。

2. 发明授权

US07768181B2 Electron multiplier electrode and terahertz radiation source using the same 有权
标题翻译：电子倍增器电极和太赫兹辐射源使用相同
公开(公告)号：US07768181B2
公开(公告)日：2010-08-03
申请号：US12007186
申请日：2008-01-08
申请人： Chan-wook Baik , Yong-wan Jin , Sun-il Kim , Min-jong Bae
发明人： Chan-wook Baik , Yong-wan Jin , Sun-il Kim , Min-jong Bae
IPC分类号： H01J1/62
CPC分类号： H01J43/04
摘要： Provided are an electron multiplier electrode using a secondary electron extraction electrode and a terahertz radiation source using the electron multiplier electrode. The electron multiplier electrode includes: a cathode; an emitter disposed on the cathode and extracting electron beams; a gate electrode for switching the electron beams, the gate electrode being disposed on the cathode to surround the emitter; and a secondary electron extraction electrode disposed on the gate electrode and including a secondary electron extraction layer extracting secondary electrons due to collision of the electron beams.
摘要翻译：提供了使用二次电子提取电极和使用电子倍增器电极的太赫兹辐射源的电子倍增器电极。电子倍增器电极包括：阴极; 设置在阴极上并提取电子束的发射器; 用于切换电子束的栅电极，栅电极设置在阴极上以围绕发射极; 以及二次电子提取电极，设置在栅电极上，并且包括由于电子束的碰撞而提取二次电子的二次电子提取层。

3. 发明申请

US20080111464A1 Field emission device and its method of manufacture 有权
标题翻译：场发射装置及其制造方法
公开(公告)号：US20080111464A1
公开(公告)日：2008-05-15
申请号：US11798612
申请日：2007-05-15
申请人： Deuk-seok Chung , Yong-chul Kim , Yong-wan Jin , Sun-il Kim , Ho-suk Kang , Chan-wook Baik
发明人： Deuk-seok Chung , Yong-chul Kim , Yong-wan Jin , Sun-il Kim , Ho-suk Kang , Chan-wook Baik
IPC分类号： H01J3/02 , H01J9/00
CPC分类号： H01J29/04 , H01J31/127 , H01J2201/30469
摘要： A field emission device and its method of manufacture includes: a substrate; a plurality of cathode electrodes formed on the substrate and having slot shaped cathode holes to expose the substrate; emitters formed on the substrate exposed through each of the cathode holes and separated from both side surfaces of the cathode holes, the emitters being formed along a lengthwise direction of the cathode holes; an insulating layer formed on the substrate to cover the cathode electrodes and having insulating layer holes communicating with the cathode holes; and a plurality of gate electrodes formed on the insulating layer and having gate holes communicating with the insulating layer holes.
摘要翻译：场致发射器件及其制造方法包括：衬底; 多个阴极电极，形成在基板上，并具有用于露出基板的狭槽形阴极孔; 所述发光体形成在所述基板上，通过所述阴极孔露出并从所述阴极孔的两侧面分离，所述发射体沿着所述阴极孔的长度方向形成; 绝缘层，形成在所述基板上以覆盖所述阴极并具有与所述阴极孔连通的绝缘层孔; 以及形成在绝缘层上并具有与绝缘层孔连通的栅极孔的多个栅电极。

4. 发明授权

US07755273B2 Field emission device and its method of manufacture 有权
标题翻译：场发射装置及其制造方法
公开(公告)号：US07755273B2
公开(公告)日：2010-07-13
申请号：US11798612
申请日：2007-05-15
申请人： Deuk-seok Chung , Yong-chul Kim , Yong-wan Jin , Sun-il Kim , Ho-suk Kang , Chan-wook Baik
发明人： Deuk-seok Chung , Yong-chul Kim , Yong-wan Jin , Sun-il Kim , Ho-suk Kang , Chan-wook Baik
IPC分类号： H01J1/62
CPC分类号： H01J29/04 , H01J31/127 , H01J2201/30469
摘要： A field emission device and its method of manufacture includes: a substrate; a plurality of cathode electrodes formed on the substrate and having slot shaped cathode holes to expose the substrate; emitters formed on the substrate exposed through each of the cathode holes and separated from both side surfaces of the cathode holes, the emitters being formed along a lengthwise direction of the cathode holes; an insulating layer formed on the substrate to cover the cathode electrodes and having insulating layer holes communicating with the cathode holes; and a plurality of gate electrodes formed on the insulating layer and having gate holes communicating with the insulating layer holes.
摘要翻译：场致发射器件及其制造方法包括：衬底; 多个阴极电极，形成在基板上，并具有用于露出基板的狭槽形阴极孔; 所述发光体形成在所述基板上，通过所述阴极孔露出并从所述阴极孔的两侧面分离，所述发射体沿着所述阴极孔的长度方向形成; 绝缘层，形成在所述基板上以覆盖所述阴极并具有与所述阴极孔连通的绝缘层孔; 以及形成在绝缘层上并具有与绝缘层孔连通的栅极孔的多个栅电极。

5. 发明授权

US07755272B2 Anode panel and field emission type backlight unit having the same 失效
标题翻译：阳极面板和场发射型背光单元具有相同的功能
公开(公告)号：US07755272B2
公开(公告)日：2010-07-13
申请号：US11987384
申请日：2007-11-29
申请人： Byong-gwon Song , Seung-nam Cha , Sun-il Kim , Ho-suk Kang , Yong-wan Jin , Min-jong Bae
发明人： Byong-gwon Song , Seung-nam Cha , Sun-il Kim , Ho-suk Kang , Yong-wan Jin , Min-jong Bae
IPC分类号： H01J1/62 , H01J5/16
CPC分类号： H01J31/127 , G02F1/133604 , G02F2001/133607 , G02F2001/133625 , H01J29/08 , H01J61/025 , H01J63/06
摘要： Provided is an anode panel of a field emission type backlight unit. The anode panel includes a substrate, an anode formed on a lower surface of the substrate, a phosphor layer coated on a lower surface of the anode and a liquid pack disposed on an upper surface of the substrate, said liquid pack having a transparent cover having cylindrical lens type curved portions and transparent liquid filling in the curved portions.
摘要翻译：提供了场发射型背光单元的阳极面板。所述阳极面板包括基板，形成在所述基板的下表面上的阳极，涂覆在所述阳极的下表面上的荧光体层和设置在所述基板的上表面上的液体组件，所述液体组件具有透明盖，所述透明盖具有柱面透镜型弯曲部分和透明液体填充在弯曲部分中。

6. 发明申请

US20080164805A1 Anode panel and field emission type backlight unit having the same 失效
标题翻译：阳极面板和场发射型背光单元具有相同的功能
公开(公告)号：US20080164805A1
公开(公告)日：2008-07-10
申请号：US11987384
申请日：2007-11-29
申请人： Byong-gwon Song , Seung-nam Cha , Sun-il Kim , Ho-suk Kang , Yong-wan Jin , Min-jong Bae
发明人： Byong-gwon Song , Seung-nam Cha , Sun-il Kim , Ho-suk Kang , Yong-wan Jin , Min-jong Bae
IPC分类号： H01J1/62
CPC分类号： H01J31/127 , G02F1/133604 , G02F2001/133607 , G02F2001/133625 , H01J29/08 , H01J61/025 , H01J63/06
摘要： Provided is an anode panel of a field emission type backlight unit. The anode panel includes a substrate, an anode formed on a lower surface of the substrate, a phosphor layer coated on a lower surface of the anode and a liquid pack disposed on an upper surface of the substrate, said liquid pack having a transparent cover having cylindrical lens type curved portions and transparent liquid filling in the curved portions.
摘要翻译：提供了场发射型背光单元的阳极面板。所述阳极面板包括基板，形成在所述基板的下表面上的阳极，涂覆在所述阳极的下表面上的荧光体层和设置在所述基板的上表面上的液体组件，所述液体组件具有透明盖，所述透明盖具有柱面透镜型弯曲部分和透明液体填充在弯曲部分中。

7. 发明授权

US07609805B2 Mask used for LIGA process, method of manufacturing the mask, and method of manufacturing microstructure using LIGA process 有权
标题翻译：用于LIGA工艺的掩模，制造掩模的方法以及使用LIGA工艺制造微结构的方法
公开(公告)号：US07609805B2
公开(公告)日：2009-10-27
申请号：US11896273
申请日：2007-08-30
申请人： Chan-wook Baik , Yong-wan Jin , Gun-sik Park , Jong-min Kim , Young-min Shin , Jin-kyu So
发明人： Chan-wook Baik , Yong-wan Jin , Gun-sik Park , Jong-min Kim , Young-min Shin , Jin-kyu So
IPC分类号： G21K5/00
CPC分类号： G03F7/00 , G03F1/22 , G03F9/7053 , G03F9/7076
摘要： A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process. The method for manufacturing the microstructure using the LIGA process contemplates forming a substrate for the microstructure, a plurality of photosensitive layers, each photosensitive layer having a plating hole and an aligning pinhole, and an aligning pin capable of being inserted into the aligning pinhole, with the aligning pinholes of the photosensitive layers being formed in corresponding positions, and repeating a process of stacking the photosensitive layer on the substrate for the microstructure and a process of forming a plating layer by plating the plating hole of the stacked photosensitive layer with a metal for a number of times corresponding to the number of the photosensitive layers, and when the photosensitive layers are stacked on the substrate for the structure, the photosensitive layers being aligned with one another by inserting the aligning pin into the aligning pinholes of all the photosensitive layers stacked on the substrate for the microstructure to penetrate all the photosensitive layers.
摘要翻译：用于石版印刷，Galvanofomung和Abformung（LIGA）工艺的掩模，用于制造掩模的方法以及使用LIGA工艺制造微结构的方法。使用LIGA方法制造微结构的方法考虑形成用于微结构的基底，多个感光层，每个感光层具有电镀孔和对准针孔，以及能够插入到对准针孔中的对准销，感光层的对准针孔形成在相应的位置上，并且重复将用于微结构的基板上的感光层层叠的工艺和通过用金属镀覆层叠的感光层的电镀孔来形成镀层的工艺对应于感光层的数量的次数，并且当感光层堆叠在用于结构的基板上时，感光层通过将对准销插入到所有感光层的对准针孔中而彼此对准在基板上用于微结构穿透感光层。

8. 发明申请

US20080166640A1 Mask used for LIGA process, method of manufacturing the mask, and method of manufacturing microstructure using LIGA process 有权
标题翻译：用于LIGA工艺的掩模，制造掩模的方法以及使用LIGA工艺制造微结构的方法
公开(公告)号：US20080166640A1
公开(公告)日：2008-07-10
申请号：US11896273
申请日：2007-08-30
申请人： Chan-wook Baik , Yong-wan Jin , Gun-sik Park , Jong-min Kim , Young-min Shin , Jin-kyu So
发明人： Chan-wook Baik , Yong-wan Jin , Gun-sik Park , Jong-min Kim , Young-min Shin , Jin-kyu So
IPC分类号： G03C5/00 , B05D5/06
CPC分类号： G03F7/00 , G03F1/22 , G03F9/7053 , G03F9/7076
摘要： A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process. The method for manufacturing the microstructure using the LIGA process contemplates forming a substrate for the microstructure, a plurality of photosensitive layers, each photosensitive layer having a plating hole and an aligning pinhole, and an aligning pin capable of being inserted into the aligning pinhole, with the aligning pinholes of the photosensitive layers being formed in corresponding positions, and repeating a process of stacking the photosensitive layer on the substrate for the microstructure and a process of forming a plating layer by plating the plating hole of the stacked photosensitive layer with a metal for a number of times corresponding to the number of the photosensitive layers, and when the photosensitive layers are stacked on the substrate for the structure, the photosensitive layers being aligned with one another by inserting the aligning pin into the aligning pinholes of all the photosensitive layers stacked on the substrate for the microstructure to penetrate all the photosensitive layers.
摘要翻译：用于石版印刷，Galvanofomung和Abformung（LIGA）工艺的掩模，用于制造掩模的方法以及使用LIGA工艺制造微结构的方法。使用LIGA方法制造微结构的方法考虑形成用于微结构的基底，多个感光层，每个感光层具有电镀孔和对准针孔，以及能够插入到对准针孔中的对准销，感光层的对准针孔形成在相应的位置上，并且重复将用于微结构的基板上的感光层层叠的工艺和通过用金属镀覆层叠的感光层的电镀孔来形成镀层的工艺对应于感光层的数量的次数，并且当感光层堆叠在用于结构的基板上时，感光层通过将对准销插入到所有感光层的对准针孔中而彼此对准在基板上用于微结构穿透将感光层。

9. 发明授权

US08888244B2 Inkjet printing apparatus and method of forming nozzles 有权
标题翻译：喷墨打印装置和喷嘴形成方法
公开(公告)号：US08888244B2
公开(公告)日：2014-11-18
申请号：US13477383
申请日：2012-05-22
申请人： Sung-gyu Kang , Young-ki Hong , Joong-hyuk Kim , Seung-ho Lee , Jae-woo Chung , Yong-wan Jin
发明人： Sung-gyu Kang , Young-ki Hong , Joong-hyuk Kim , Seung-ho Lee , Jae-woo Chung , Yong-wan Jin
IPC分类号： B41J2/14
CPC分类号： B41J2/14209 , B41J2/162 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631
摘要： A printing apparatus includes a first nozzle substrate having a first tapered nozzle unit aligned with a pressure chamber and a second nozzle substrate having a second tapered nozzle unit aligned with the first tapered nozzle unit and attached to the bottom of the first nozzle substrate.
摘要翻译：打印装置包括：第一喷嘴基板，具有与压力室对准的第一锥形喷嘴单元和具有与第一锥形喷嘴单元对准并附接到第一喷嘴基板的底部的第二锥形喷嘴单元的第二喷嘴基板。

10. 发明授权

US08259260B2 Reflective display devices and methods of manufacturing the same 有权
标题翻译：反射型显示装置及其制造方法
公开(公告)号：US08259260B2
公开(公告)日：2012-09-04
申请号：US12662573
申请日：2010-04-23
申请人： Joo-young Kim , Byong-gwon Song , Jae-eun Jang , Yong-wan Jin , Jung-woo Kim
发明人： Joo-young Kim , Byong-gwon Song , Jae-eun Jang , Yong-wan Jin , Jung-woo Kim
IPC分类号： G02F1/1334
CPC分类号： G02F1/1334 , G02F1/133553 , G02F1/134336 , G02F1/136227 , G02F2001/136222
摘要： A reflective display device may include pixels. Each pixel may include sub-pixels. Each sub-pixel may include first and second substrates spaced apart from each other; a driving unit formed on a top surface of the first substrate; a reflective layer, acting as a first electrode to which a voltage is applied by the driving unit, disposed above the driving unit; a second electrode formed on a bottom surface of the second substrate; a color filter layer disposed between the reflective layer and the second electrode; and a polymer dispersed liquid crystal (PDLC) layer. If the color filter layer is formed on the reflective layer; then the PDLC layer may be disposed between the second electrode and color filter layer. If the color filter layer is formed on a bottom surface of the second electrode, then the PDLC layer may be disposed between the reflective layer and color filter layer.
摘要翻译：反射式显示装置可以包括像素。每个像素可以包括子像素。每个子像素可以包括彼此间隔开的第一和第二基底; 驱动单元，形成在所述第一基板的顶表面上; 反射层，用作设置在驱动单元上方的由驱动单元施加电压的第一电极; 形成在所述第二基板的底面上的第二电极; 布置在所述反射层和所述第二电极之间的滤色器层; 和聚合物分散液晶（PDLC）层。如果滤色器层形成在反射层上; 则PDLC层可以设置在第二电极和滤色器层之间。如果滤色器层形成在第二电极的底表面上，则PDLC层可以设置在反射层和滤色器层之间。

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