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1. 发明授权

US07722928B2 Nanolithography methods and products therefor and produced thereby 有权
标题翻译：纳米光刻方法和产品，由此生产
公开(公告)号：US07722928B2
公开(公告)日：2010-05-25
申请号：US11100483
申请日：2005-04-07
申请人： Chad A. Mirkin , Seunghun Hong , Vinayak P. Dravid
发明人： Chad A. Mirkin , Seunghun Hong , Vinayak P. Dravid
IPC分类号： B05D5/00 , B05D1/36 , B05D7/24 , B01J19/08 , C12Q1/68 , C12P19/34
CPC分类号： G03F7/0002 , B05D1/007 , B05D1/185 , B05D1/26 , B82B3/00 , G01Q80/00 , G03F7/165 , Y10S977/85 , Y10S977/857 , Y10S977/86 , Y10S977/862 , Y10S977/863 , Y10S977/878 , Y10S977/882 , Y10S977/884 , Y10S977/885 , Y10S977/886
摘要： In one aspect, a method of nanolithography is provided using a driving force to control the movement of a deposition compound from a scanning probe microscope tip to a substrate. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.
摘要翻译：一方面，使用驱动力来提供纳米光刻的方法，以控制沉积化合物从扫描探针显微镜尖端到基底的移动。本发明的另一方面提供了一种用于纳米光刻的尖端，其具有内腔和限制沉积化合物从尖端到基底的运动的孔。沉积化合物通过孔的运动速度和程度由驱动力控制。

2. 发明授权

US07744963B2 Nanolithography methods and products therefor and produced thereby 有权
标题翻译：纳米光刻方法和产品，由此生产
公开(公告)号：US07744963B2
公开(公告)日：2010-06-29
申请号：US11933181
申请日：2007-10-31
申请人： Chad A. Mirkin , Seunghun Hong , Vinayak P. Dravid
发明人： Chad A. Mirkin , Seunghun Hong , Vinayak P. Dravid
IPC分类号： B05D1/28 , B05D3/14
CPC分类号： G03F7/0002 , B05D1/007 , B05D1/185 , B05D1/26 , B82B3/00 , G01Q80/00 , G03F7/165 , Y10S977/85 , Y10S977/857 , Y10S977/86 , Y10S977/862 , Y10S977/863 , Y10S977/878 , Y10S977/882 , Y10S977/884 , Y10S977/885 , Y10S977/886
摘要： In one aspect, a method of nanolithography is provided, the method comprising providing a substrate; providing a scanning probe microscope tip; coating the tip with a deposition compound; and subjecting said coated tip to a driving force to deliver said deposition compound to said substrate so as to produce a desired pattern. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.
摘要翻译：一方面，提供一种纳米光刻方法，该方法包括提供基底; 提供扫描探针显微镜尖端; 用沉积化合物涂覆尖端; 并使所述涂覆的尖端经受驱动力以将所述沉积化合物输送到所述基底，以产生所需的图案。本发明的另一方面提供了一种用于纳米光刻的尖端，其具有内腔和限制沉积化合物从尖端到基底的运动的孔。沉积化合物通过孔的运动速度和程度由驱动力控制。

3. 发明申请

US20080113099A1 NANOLITHOGRAPHY METHODS AND PRODUCTS THEREFOR AND PRODUCED THEREBY 有权
标题翻译：纳米尺度方法及其生产的产品
公开(公告)号：US20080113099A1
公开(公告)日：2008-05-15
申请号：US11933181
申请日：2007-10-31
申请人： Chad Mirkin , Seunghun Hong , Vinayak P. Dravid
发明人： Chad Mirkin , Seunghun Hong , Vinayak P. Dravid
IPC分类号： B05D5/00
CPC分类号： G03F7/0002 , B05D1/007 , B05D1/185 , B05D1/26 , B82B3/00 , G01Q80/00 , G03F7/165 , Y10S977/85 , Y10S977/857 , Y10S977/86 , Y10S977/862 , Y10S977/863 , Y10S977/878 , Y10S977/882 , Y10S977/884 , Y10S977/885 , Y10S977/886
摘要： In one aspect, a method of nanolithography is provided using a driving force to control the movement of a deposition compound from a scanning probe microscope tip to a substrate. Another aspect of the invention provides a tip for use in nanolithography having an internal cavity and an aperture restricting movement of a deposition compound from the tip to the substrate. The rate and extent of movement of the deposition compound through the aperture is controlled by a driving force.
摘要翻译：一方面，使用驱动力来提供纳米光刻的方法，以控制沉积化合物从扫描探针显微镜尖端到基底的移动。本发明的另一方面提供了一种用于纳米光刻的尖端，其具有内腔和限制沉积化合物从尖端到基底的运动的孔。沉积化合物通过孔的运动速度和程度由驱动力控制。

4. 发明授权

US07446324B2 Methods utilizing scanning probe microscope tips and products thereof or produced thereby 有权
标题翻译：使用扫描探针显微镜尖端及其产品或由其制造的方法
公开(公告)号：US07446324B2
公开(公告)日：2008-11-04
申请号：US10951031
申请日：2004-09-28
申请人： Chad A. Mirkin , Richard Piner , Seunghun Hong
发明人： Chad A. Mirkin , Richard Piner , Seunghun Hong
IPC分类号： G21G5/00
CPC分类号： B82B3/00 , B05D1/007 , B05D1/185 , B05D1/26 , G01Q80/00 , G03F7/0002 , G03F7/165 , Y10S977/849 , Y10S977/853 , Y10S977/854 , Y10S977/855 , Y10S977/856 , Y10S977/857 , Y10S977/86 , Y10S977/88 , Y10S977/884 , Y10S977/885 , Y10S977/886 , Y10S977/895 , Y10T428/24802
摘要： The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging performed using an uncoated AFM tip. Finally, the invention provides AFM tips coated with the hydrophobic compounds.
摘要翻译：本发明提供了称为“浸笔”纳米光刻（DPN）的光刻方法。 DPN使用扫描探针显微镜（SPM）尖端（例如，原子力显微镜（AFM）尖端）作为“笔”，固态基底（例如，金）作为“纸”，并且具有化学亲和力的分子固态基板为“墨水”。在DPN中使用分子从SPM尖端到固体基质的毛细管传输，以直接写入由亚微米尺寸的相对小的分子集合组成的图案，使得DPN可用于制造各种微尺寸和纳米尺寸的器件。本发明还提供由DPN图案化的衬底，包括亚微米组合阵列，以及用于执行DPN的试剂盒，装置和软件。本发明还提供了一种在空气中进行AFM成像的方法。该方法包括用疏水性化合物涂覆AFM尖端，选择疏水性化合物，使得与使用未涂覆的AFM尖端进行的AFM成像相比，使用涂覆的AFM尖端进行的AFM成像得到改善。最后，本发明提供涂覆有疏水化合物的AFM尖端。

5. 发明授权

US06827979B2 Methods utilizing scanning probe microscope tips and products therefor or produced thereby 有权
标题翻译：方法利用扫描探针显微镜尖端及其产品或由此产生
公开(公告)号：US06827979B2
公开(公告)日：2004-12-07
申请号：US09866533
申请日：2001-05-24
申请人： Chad A. Mirkin , Richard Piner , Seunghun Hong
发明人： Chad A. Mirkin , Richard Piner , Seunghun Hong
IPC分类号： B05D500
CPC分类号： B82B3/00 , B05D1/007 , B05D1/185 , B05D1/26 , G01Q80/00 , G03F7/0002 , G03F7/165 , Y10S977/849 , Y10S977/853 , Y10S977/854 , Y10S977/855 , Y10S977/856 , Y10S977/857 , Y10S977/86 , Y10S977/88 , Y10S977/884 , Y10S977/885 , Y10S977/886 , Y10S977/895 , Y10T428/24802
摘要： The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging performed using an uncoated AFM tip. Finally, the invention provides AFM tips coated with the hydrophobic compounds.
摘要翻译：本发明提供了称为“浸笔”纳米光刻（DPN）的光刻方法。 DPN使用扫描探针显微镜（SPM）尖端（例如，原子力显微镜（AFM）尖端）作为“笔”，固态基底（例如，金）作为“纸”，并且具有化学亲和力的分子固态基板为“墨水”。在DPN中使用分子从SPM尖端到固体基质的毛细管传输，以直接写入由亚微米尺寸的相对小的分子集合组成的图案，使得DPN可用于制造各种微尺寸和纳米尺寸的器件。本发明还提供由DPN图案化的衬底，包括亚微米组合阵列，以及用于执行DPN的试剂盒，装置和软件。本发明还提供了一种在空气中进行AFM成像的方法。该方法包括用疏水性化合物涂覆AFM尖端，选择疏水性化合物，使得与使用未涂覆的AFM尖端进行的AFM成像相比，使用涂覆的AFM尖端进行的AFM成像得到改善。最后，本发明提供涂覆有疏水化合物的AFM尖端。

6. 发明授权

US08247032B2 Methods utilizing scanning probe microscope tips and products therefor or produced thereby 有权
标题翻译：方法利用扫描探针显微镜尖端及其产品或由此产生
公开(公告)号：US08247032B2
公开(公告)日：2012-08-21
申请号：US11933275
申请日：2007-10-31
申请人： Chad A. Mirkin , Richard Piner , Seunghun Hong
发明人： Chad A. Mirkin , Richard Piner , Seunghun Hong
IPC分类号： B05D5/00
CPC分类号： B82B3/00 , B05D1/007 , B05D1/185 , B05D1/26 , G01Q80/00 , G03F7/0002 , G03F7/165 , Y10S977/84 , Y10S977/857 , Y10S977/863 , Y10S977/877 , Y10T428/24917 , Y10T436/24
摘要： The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). The method include the following steps: (i) providing a substrate and a scanning probe microscope tip; (ii) coating the tip with a patterning compound and a solvent to form a wet tip; and (iii) contacting the coated tip with the substrate so that the compound is applied to the substrate so as to produce a desired pattern. The invention also provides substrates patterned by DPN and kits for performing DPN.
摘要翻译：本发明提供了称为“浸笔”纳米光刻（DPN）的光刻方法。该方法包括以下步骤：（i）提供基板和扫描探针显微镜尖端; （ii）用图案化化合物和溶剂涂覆尖端以形成湿的尖端; 和（iii）使涂覆的末端与基底接触，使得将化合物施加到基底上以产生所需的图案。本发明还提供由DPN图案化的基材和用于进行DPN的试剂盒。

7. 发明授权

US08187673B2 Methods utilizing scanning probe microscope tips and products thereof or produced thereby 有权
标题翻译：使用扫描探针显微镜尖端及其产品或由其制造的方法
公开(公告)号：US08187673B2
公开(公告)日：2012-05-29
申请号：US11933251
申请日：2007-10-31
申请人： Chad A. Mirkin , Richard Piner , Seunghun Hong
发明人： Chad A. Mirkin , Richard Piner , Seunghun Hong
IPC分类号： B05D3/00
CPC分类号： B82B3/00 , B05D1/007 , B05D1/185 , B05D1/26 , G01Q80/00 , G03F7/0002 , G03F7/165 , Y10S977/849 , Y10S977/853 , Y10S977/854 , Y10S977/855 , Y10S977/856 , Y10S977/857 , Y10S977/86 , Y10S977/88 , Y10S977/884 , Y10S977/885 , Y10S977/886 , Y10S977/895 , Y10T428/24802
摘要： The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging performed using an uncoated AFM tip. Finally, the invention provides AFM tips coated with the hydrophobic compounds.
摘要翻译：本发明提供了称为“浸笔”纳米光刻（DPN）的光刻方法。 DPN使用扫描探针显微镜（SPM）尖端（例如，原子力显微镜（AFM）尖端）作为“笔”，固态基底（例如，金）作为“纸”，并且具有化学亲和力的分子固体底物作为“墨水”。DPN中使用分子从SPM尖端到固体基质的毛细管转运，以直接写入由亚微米尺寸的相对小的分子集合组成的图案，使得DPN可用于制造各种微米级和纳米级器件。本发明还提供由DPN图案化的衬底，包括亚微米组合阵列，以及用于执行DPN的试剂盒，装置和软件。本发明还提供了一种在空气中进行AFM成像的方法。该方法包括用疏水性化合物涂覆AFM尖端，选择疏水性化合物，使得与使用未涂覆的AFM尖端进行的AFM成像相比，使用涂覆的AFM尖端进行的AFM成像得到改善。最后，本发明提供涂覆有疏水化合物的AFM尖端。

8. 发明授权

US06635311B1 Methods utilizing scanning probe microscope tips and products therefor or products thereby 有权
标题翻译：使用扫描探针显微镜尖端及其产品或其产品的方法
公开(公告)号：US06635311B1
公开(公告)日：2003-10-21
申请号：US09477997
申请日：2000-01-05
申请人： Chad A. Mirkin , Richard Piner , Seunghun Hong
发明人： Chad A. Mirkin , Richard Piner , Seunghun Hong
IPC分类号： B05D500
CPC分类号： B82B3/00 , B05D1/007 , B05D1/185 , B05D1/26 , G01Q80/00 , G03F7/0002 , G03F7/165 , Y10S977/84 , Y10S977/857 , Y10S977/863 , Y10S977/877 , Y10T428/24917 , Y10T436/24
摘要： A method of direct-write nanolithography comprising: providing a solid substrate comprising a surface; providing a nanoscopic tip coated with patterning compound; and contacting the coated tip with the substrate, so that the patterning compound is delivered to the substrate so as to produce a desired pattern in submicrometer dimensions. Nanolithographic resolution can be affected by substrate grain size, diffusion rate of the patterning compound, tip-substrate contact time, the rate of transport of the patterning compound from the tip to the substrate, and tip sharpness. The method is a useful tool for fabrication of nanoscale structures.
摘要翻译：一种直写式纳米光刻方法，包括：提供包含表面的固体基质; 提供涂有图案化合物的纳米级尖端; 并使涂覆的末端与基底接触，使得图案化化合物被递送到基底，从而在亚微米尺寸上产生所需的图案。纳米光刻分辨率可能受衬底晶粒尺寸，图形化合物的扩散速率，尖端 - 衬底接触时间，图案化合物从尖端到衬底的传输速率和尖端锐度的影响。该方法是制造纳米级结构的有用工具。

9. 发明申请

US20120295029A1 METHODS UTILIZING SCANNING PROBE MICROSCOPE TIPS AND PRODUCTS THEREFOR OR PRODUCED THEREBY 审中-公开
标题翻译：使用扫描探针显微镜的方法和产品或其生产的产品
公开(公告)号：US20120295029A1
公开(公告)日：2012-11-22
申请号：US13450333
申请日：2012-04-18
申请人： Chad A. Mirkin , Richard Piner , Seunghun Hong
发明人： Chad A. Mirkin , Richard Piner , Seunghun Hong
IPC分类号： B05D5/00 , H01L21/02
CPC分类号： B82B3/00 , B05D1/007 , B05D1/185 , B05D1/26 , G01Q80/00 , G03F7/0002 , G03F7/165 , Y10S977/84 , Y10S977/857 , Y10S977/863 , Y10S977/877 , Y10T428/24917 , Y10T436/24
摘要： The invention provides a nanolithographic method, comprising: (i) providing a substrate; (ii) providing a nanoscopic tip coated with a patterning compound; (iii) contacting the coated tip with the substrate so that the patterning compound is applied to the substrate to produce a desired pattern; and (iv) wherein the patterning compound is anchored to the substrate.
摘要翻译：本发明提供一种纳米光刻方法，包括：（i）提供基底; （ii）提供涂有图形化合物的纳米级尖端; （iii）使涂覆的尖端与基底接触，使得图案化化合物被施加到基底以产生所需的图案; 和（iv）其中图案化化合物锚定到基底上。

10. 发明授权

US08163345B2 Methods utilizing scanning probe microscope tips and products therefor or produced thereby 有权
标题翻译：方法利用扫描探针显微镜尖端及其产品或由此产生
公开(公告)号：US08163345B2
公开(公告)日：2012-04-24
申请号：US12534086
申请日：2009-07-31
申请人： Chad A. Mirkin , Richard Piner , Seunghun Hong
发明人： Chad A. Mirkin , Richard Piner , Seunghun Hong
IPC分类号： B05D5/00
CPC分类号： B82B3/00 , B05D1/007 , B05D1/185 , B05D1/26 , G01Q80/00 , G03F7/0002 , G03F7/165 , Y10S977/84 , Y10S977/857 , Y10S977/863 , Y10S977/877 , Y10T428/24917 , Y10T436/24
摘要： The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN and kits for performing DPN. The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging performed using an uncoated AFM tip. Finally, the invention provides AFM tips coated with the hydrophobic compounds.
摘要翻译：本发明提供了称为“浸笔”纳米光刻（DPN）的光刻方法。在DPN中使用分子从SPM尖端到固体基质的毛细管传输，以直接写入由亚微米尺寸的相对小的分子集合组成的图案，使得DPN可用于制造各种微尺寸和纳米尺寸的器件。本发明还提供由DPN图案化的基材和用于进行DPN的试剂盒。本发明还提供了一种在空气中进行AFM成像的方法。该方法包括用疏水性化合物涂覆AFM尖端，选择疏水性化合物，使得与使用未涂覆的AFM尖端进行的AFM成像相比，使用涂覆的AFM尖端进行的AFM成像得到改善。最后，本发明提供涂覆有疏水化合物的AFM尖端。

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