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1. 发明申请

US20140038849A1 METHOD OF ANALYZING AN ANALYTE USING COMBINATORIAL ARRAYS AND UNIFORM PATTERNS 审中-公开
标题翻译：使用组合阵列和均匀图案分析分析的方法
公开(公告)号：US20140038849A1
公开(公告)日：2014-02-06
申请号：US14000129
申请日：2012-03-17
申请人： Chad A. Mirkin , Louise R. Giam , Matthew D. Massich
发明人： Chad A. Mirkin , Louise R. Giam , Matthew D. Massich
IPC分类号： B01J19/00
CPC分类号： B01J19/0046 , B01J2219/00387 , B01J2219/00527 , B01J2219/00585 , B01J2219/00596 , B01J2219/00612 , B01J2219/0063 , B01J2219/00637 , B01J2219/00659 , B01J2219/0072 , B01J2219/00743 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The disclosure relates to a method of analyzing an analyte that includes forming a combinatorial pattern comprising pattern elements with a plurality of sizes and/or structures on a substrate surface with a tilted pen array, applying an analyte to the combinatorial pattern, and identifying a pattern element size and/or structure having a desired effect on an analyte parameter using the combinatorial pattern. The method further includes forming a uniform pattern comprising pattern elements each having substantially the same size and/or structure corresponding to the identified pattern element size and/or structure, and analyzing the effect of pattern element size and/or structure on the analyte parameter using the uniform pattern.
摘要翻译：本公开涉及一种分析分析物的方法，其包括用倾斜的笔阵列在基底表面上形成包括具有多个尺寸和/或结构的图案元素的组合图案，将分析物施加到组合图案，以及识别图案使用组合图案对分析物参数具有期望效果的元件尺寸和/或结构。该方法还包括形成包含图案元素的均匀图案，每个图案元素具有与所识别的图案元素尺寸和/或结构相对应的基本相同的尺寸和/或结构，并且使用以下方式分析图案元素尺寸和/或结构对分析物参数的影响均匀图案。

2. 发明申请

US20100115672A1 SCANNING PROBE EPITAXY 审中-公开
标题翻译：扫描探头外观
公开(公告)号：US20100115672A1
公开(公告)日：2010-05-06
申请号：US12465615
申请日：2009-05-13
申请人： Chad A. Mirkin , Chang Liu , Yuhuang Wang , Adam B. Braunschweig , Xing Liao , Louise R. Giam , Byung Y. Lee , Shifeng Li
发明人： Chad A. Mirkin , Chang Liu , Yuhuang Wang , Adam B. Braunschweig , Xing Liao , Louise R. Giam , Byung Y. Lee , Shifeng Li
IPC分类号： G01Q60/24
CPC分类号： G03F7/0002 , G01Q20/04 , G01Q40/00 , G01Q70/10 , G01Q70/16 , G01Q80/00
摘要： A dual tip probe for scanning probe epitaxy and a method of forming the dual tip probe are disclosed. The dual tip probe includes first and second tips disposed on a cantilever arm. The first and second tips can be a reader tip and a synthesis tip, respectively. The first tip can remain in contact with a substrate during writing and provide in situ characterization of the substrate and or structures written, while the second tip can perform in non-contact mode to write and synthesis nanostructures. This feature can allow the dual tip probe to detect errors in a printed pattern using the first tip and correct the errors using the second tip.
摘要翻译：公开了一种用于扫描探针外延的双尖端探针和形成双尖端探针的方法。双尖头探针包括设置在悬臂上的第一和第二尖端。第一和第二提示可以分别是读取器尖端和合成尖端。第一尖端可以在书写期间保持与基底接触，并且提供衬底和/或结构的原位表征，而第二尖端可以以非接触模式执行以写入和合成纳米结构。该功能可以允许双尖端探针使用第一个尖端检测印刷图案中的错误，并使用第二个尖端校正错误。

3. 发明授权

US08753813B2 Generation of combinatorial patterns by deliberate tilting of a polymer-pen array 有权
标题翻译：通过聚合物笔阵列的有意倾斜来产生组合图案
公开(公告)号：US08753813B2
公开(公告)日：2014-06-17
申请号：US13513618
申请日：2010-12-02
申请人： Chad A. Mirkin , Adam B. Braunschweig , Jinan Chai , Dan J. Eichelsdoerfer , Louise R. Giam , Xing Liao , Lu Shin Wong
发明人： Chad A. Mirkin , Adam B. Braunschweig , Jinan Chai , Dan J. Eichelsdoerfer , Louise R. Giam , Xing Liao , Lu Shin Wong
IPC分类号： C12Q1/68 , C12M1/00 , C12M1/34 , C12M3/00 , B05D3/00
CPC分类号： G03F7/0002 , B01J2219/00387 , B82Y10/00 , B82Y40/00
摘要： The disclosure relates to a method of forming a pattern having pattern elements with a plurality of sizes on a substrate surface with a tilted pen array that includes choosing a tilt geometry for a pen array with respect to a substrate, inducing the tilt geometry between the pen array and the substrate surface, and forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes. For example, the tilt geometry is in reference to the substrate surface and comprises a first angle with respect to a first axis of the substrate and a second angle with respect to a second axis of the substrate, the second axis being perpendicular to the first axis, and at least one of the first and second angles being non-zero.
摘要翻译：本公开涉及一种在衬底表面上形成具有多个尺寸的图案元件的图案的方法，该倾斜笔阵列包括相对于衬底选择笔阵列的倾斜几何形状，从而引起笔之间的倾斜几何形状阵列和衬底表面，并且用标称笔阵列在衬底表面上形成具有图形元素的图案，由此形成的图案元素的尺寸沿着倾斜的轴线或轴线跨越衬底表面变化。例如，倾斜几何形状参考衬底表面并且包括相对于衬底的第一轴线的第一角度和相对于衬底的第二轴线的第二角度，第二轴线垂直于第一轴线并且第一和第二角度中的至少一个是非零。

4. 发明申请

US20100071098A1 SCANNING PROBE EPITAXY 审中-公开
标题翻译：扫描探头外观
公开(公告)号：US20100071098A1
公开(公告)日：2010-03-18
申请号：US12465616
申请日：2009-05-13
申请人： Chad A. Mirkin , Chang Liu , Yuhuang Wang , Adam B. Braunschweig , Xing Liao , Louise R. Giam , Byung Y. Lee , Shifeng Li , Joseph S. Fragala , Albert K. Henning
发明人： Chad A. Mirkin , Chang Liu , Yuhuang Wang , Adam B. Braunschweig , Xing Liao , Louise R. Giam , Byung Y. Lee , Shifeng Li , Joseph S. Fragala , Albert K. Henning
IPC分类号： G01Q60/00
CPC分类号： G03F7/0002 , G01Q20/04 , G01Q40/00 , G01Q70/10 , G01Q70/16 , G01Q80/00
摘要： A dual tip probe for scanning probe epitaxy is disclosed. The dual tip probe includes first and second tips disposed on a cantilever arm. The first and second tips can be a reader tip and a synthesis tip, respectively. The dual tip probe further includes a rib disposed on the cantilever arm between the first and second tips. The dual tip probe can also include a strain gauge disposed along the length of the cantilever arm.
摘要翻译：公开了一种用于扫描探针外延的双尖端探针。双尖头探针包括设置在悬臂上的第一和第二尖端。第一和第二提示可以分别是读取器尖端和合成尖端。双尖头探针还包括设置在第一和第二尖端之间的悬臂上的肋条。双尖头探针还可以包括沿着悬臂的长度设置的应变仪。

5. 发明申请

US20130040856A1 Generation of Combinatorial Patterns by Deliberate Tilting of a Polymer-Pen Array 有权
标题翻译：通过有意图倾斜聚合物笔阵列来产生组合模式
公开(公告)号：US20130040856A1
公开(公告)日：2013-02-14
申请号：US13513618
申请日：2010-12-02
申请人： Chad A. Mirkin , Adam B. Braunschweig , Jinan Chai , Dan J. Eichelsdoerfer , Louise R. Giam , Xing Liao , Lu Shin Wong
发明人： Chad A. Mirkin , Adam B. Braunschweig , Jinan Chai , Dan J. Eichelsdoerfer , Louise R. Giam , Xing Liao , Lu Shin Wong
IPC分类号： C40B50/14 , C40B50/18 , C40B40/18 , C40B40/04 , C40B30/08 , C40B40/00 , B82Y5/00
CPC分类号： G03F7/0002 , B01J2219/00387 , B82Y10/00 , B82Y40/00
摘要： The disclosure relates to a method of forming a pattern having pattern elements with a plurality of sizes on a substrate surface with a tilted pen array that includes choosing a tilt geometry for a pen array with respect to a substrate, inducing the tilt geometry between the pen array and the substrate surface, and forming a pattern having pattern elements on the substrate surface with the titled pen array, whereby the size of the formed pattern elements varies across the substrate surface along the tilted axis or axes. For example, the tilt geometry is in reference to the substrate surface and comprises a first angle with respect to a first axis of the substrate and a second angle with respect to a second axis of the substrate, the second axis being perpendicular to the first axis, and at least one of the first and second angles being non-zero.
摘要翻译：本公开涉及一种在衬底表面上形成具有多个尺寸的图案元件的图案的方法，该倾斜笔阵列包括相对于衬底选择笔阵列的倾斜几何形状，从而引起笔之间的倾斜几何形状阵列和衬底表面，并且用标称笔阵列在衬底表面上形成具有图形元素的图案，由此形成的图案元素的尺寸沿着倾斜的轴线或轴线跨越衬底表面变化。例如，倾斜几何形状参考衬底表面并且包括相对于衬底的第一轴线的第一角度和相对于衬底的第二轴线的第二角度，第二轴线垂直于第一轴线并且第一和第二角度中的至少一个是非零。

6. 发明授权

US07954166B2 Independently-addressable, self-correcting inking for cantilever arrays 失效
标题翻译：用于悬臂阵列的独立寻址，自校正上墨
公开(公告)号：US07954166B2
公开(公告)日：2011-05-31
申请号：US12222464
申请日：2008-08-08
申请人： Chad A. Mirkin , Yuhuang Wang , Louise R. Giam , Matthew Park
发明人： Chad A. Mirkin , Yuhuang Wang , Louise R. Giam , Matthew Park
IPC分类号： G01Q60/38
CPC分类号： G03F7/0002 , B01L3/0255 , B01L2200/12 , B01L2400/0484 , B41M5/00 , G01Q80/00
摘要： An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.
摘要翻译：用于沉积的图案化组合物或油墨加载尖端和其它表面的改进方法。描述了一种图案化方法，该方法包括：（i）提供至少一个尖端阵列; （ii）提供多个图案化组合物; （iii）将至少一些图案化组合物喷墨印刷到一些尖端上; 和（iv）将至少一些所述图案化组合物沉积到基底表面上; 其中喷墨印刷适于防止图案化组合物在尖端上的显着交叉污染。可以实现良好的打印再现性和打印速度的控制。可以处理进行喷墨印刷的表面以促进墨水在尖端处的定位。该方法对于高密度阵列特别重要。

7. 发明申请

US20120097058A1 Multiplexed Biomolecule Arrays Made By Polymer Pen Lithography 审中-公开
标题翻译：由聚合物笔平版印刷制成的复用生物分子阵列
公开(公告)号：US20120097058A1
公开(公告)日：2012-04-26
申请号：US13263760
申请日：2010-04-23
申请人： Chad A. Mirkin , Fengwei Huo , Zijian Zheng , Louise R. Giam , Weston L. Daniel
发明人： Chad A. Mirkin , Fengwei Huo , Zijian Zheng , Louise R. Giam , Weston L. Daniel
IPC分类号： B41F33/00 , B42D15/00
CPC分类号： B01J19/0046 , B01J2219/00387 , B01J2219/00533 , B01J2219/00576 , B01J2219/00585 , B01J2219/00596 , B01J2219/00626 , B01J2219/00637 , B01J2219/00662 , B01J2219/00725 , B81C1/00206
摘要： Methods of patterning multiple biomolecules on a surface are disclosed. The method includes inking a polymer pen array, where tips are inked with selected inks comprising the biomolecules, and transferring the biomolecules to a surface using a polymer pen lithography technique. Methods of using the multiple patterned biomolecules on a surface are also disclosed.
摘要翻译：公开了在表面上构图多个生物分子的方法。该方法包括着墨聚合物笔阵列，其中尖端用包含生物分子的所选油墨着墨，并使用聚合物笔光刻技术将生物分子转移到表面。还公开了在表面上使用多个图案化的生物分子的方法。

8. 发明申请

US20110165341A1 BLOCK COPOLYMER-ASSISTED NANOLITHOGRAPHY 审中-公开
标题翻译：嵌段共聚物辅助纳米尺度
公开(公告)号：US20110165341A1
公开(公告)日：2011-07-07
申请号：US12959105
申请日：2010-12-02
申请人： Chad A. Mirkin , Jinan Chai , Fengwei Huo , Zijian Zheng , Louise R. Giam
发明人： Chad A. Mirkin , Jinan Chai , Fengwei Huo , Zijian Zheng , Louise R. Giam
IPC分类号： B05D5/00 , B05D1/28 , B05D3/10 , B82Y40/00 , B82Y99/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： In accordance with an embodiment of the disclosure, a method for forming submicron size nanostructures on a substrate surface includes contacting a substrate with a tip coated with an ink comprising a block copolymer matrix and a nanostructure precursor to form a printed feature comprising the block copolymer matrix and the nanostructure precursor on the substrate, and reducing the nanostructure precursor of the printed feature to form a nanostructure having a diameter (or line width) of less than 1 μm.
摘要翻译：根据本公开的实施例，用于在衬底表面上形成亚微米级纳米结构的方法包括使基底与涂覆有包含嵌段共聚物基质和纳米结构前体的油墨的末端接触，以形成包含嵌段共聚物基质和纳米结构前体，并且还原印刷特征的纳米结构前体以形成直径（或线宽）小于1μm的纳米结构。

9. 发明申请

US20090133169A1 Independently-addressable, self-correcting inking for cantilever arrays 失效
标题翻译：用于悬臂阵列的独立寻址，自校正上墨
公开(公告)号：US20090133169A1
公开(公告)日：2009-05-21
申请号：US12222464
申请日：2008-08-08
申请人： Chad A. Mirkin , Yuhuang Wang , Louise R. Giam , Matthew Park
发明人： Chad A. Mirkin , Yuhuang Wang , Louise R. Giam , Matthew Park
IPC分类号： G12B21/08 , G12B21/02
CPC分类号： G03F7/0002 , B01L3/0255 , B01L2200/12 , B01L2400/0484 , B41M5/00 , G01Q80/00
摘要： An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.
摘要翻译：用于沉积的图案化组合物或油墨加载尖端和其它表面的改进方法。描述了一种图案化方法，该方法包括：（i）提供至少一个尖端阵列; （ii）提供多个图案化组合物; （iii）将至少一些图案化组合物喷墨印刷到一些尖端上; 和（iv）将至少一些所述图案化组合物沉积到基底表面上; 其中喷墨印刷适于防止图案化组合物在尖端上的显着交叉污染。可以实现良好的打印再现性和打印速度的控制。可以处理进行喷墨印刷的表面以促进墨水在尖端处的定位。该方法对于高密度阵列特别重要。

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