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1. 发明申请

US20090166222A1 ELECTRICAL NANOTRAPS FOR SPECTROSCOPICALLY CHARACTERIZING BIOMOLECULES WITHIN 审中-公开
标题翻译：用于光谱学表征生物分子的电子纳米粒子
公开(公告)号：US20090166222A1
公开(公告)日：2009-07-02
申请号：US12206057
申请日：2008-09-08
申请人： Chad A. Mirkin , Gengfeng Zheng , Lidong Qin
发明人： Chad A. Mirkin , Gengfeng Zheng , Lidong Qin
IPC分类号： C12Q1/68 , G01N27/26
CPC分类号： G01N21/658 , B82Y15/00 , G01N21/6428 , G01N33/54346
摘要： A method that combines on-wire-lithography (OWL) nanogaps, an electric field concentrating technique, and surface enhanced Raman spectroscopy (SERS) is disclosed for sensitive detection of analytes with small sample sizes in a chip format.
摘要翻译：公开了一种组合在线光刻（OWL）纳米片，电场浓缩技术和表面增强拉曼光谱（SERS）的方法，用于以芯片格式的小样品尺寸的分析物的敏感检测。

2. 发明申请

US20110305996A1 Beam Pen Lithography 有权
标题翻译：光笔平版印刷
公开(公告)号：US20110305996A1
公开(公告)日：2011-12-15
申请号：US13202142
申请日：2010-02-18
申请人： Chad A. Mirkin , Gengfeng Zheng , Fengwei Huo
发明人： Chad A. Mirkin , Gengfeng Zheng , Fengwei Huo
IPC分类号： G03F7/20 , B05D3/12 , G03F7/26 , G01N21/01 , G01Q70/06
CPC分类号： G03F7/2051 , G03F7/70291 , G03F7/70383 , G03F7/70466 , G03F7/70525 , G03F7/70958
摘要： The disclosure relates to methods of beam pen lithography using a tip array having a plurality of transparent, elastomeric, reversibly-deformable tips coated with a blocking layer and apertures defined in the blocking layer to expose tip ends of the tips in the array. The tip array can be used to perform a photolithography process in which the tips are illuminated with a radiation that is channeled through the tips and out the apertures to expose a photosensitive substrate. Also disclosed are tip arrays formed of polymers and gels, apparatus including the tip arrays and radiation sources, and related apparatus for selectively masking tips in the tip array from radiation emitted from the radiation source.
摘要翻译：本公开涉及使用具有多个透明，弹性，可逆变形的尖端的尖端阵列的光笔笔光刻方法，所述尖端涂覆有阻挡层和限定在阻挡层中的孔，以暴露阵列中尖端的尖端。尖端阵列可以用于执行光刻工艺，其中尖端被通过尖端引导的辐射照射并且出射孔以暴露感光基底。还公开了由聚合物和凝胶形成的尖端阵列，包括尖端阵列和辐射源的装置以及用于从辐射源发射的辐射中选择性地遮蔽尖端阵列中的尖端的相关装置。

3. 发明授权

US09021611B2 Beam pen lithography 有权
标题翻译：光笔光刻
公开(公告)号：US09021611B2
公开(公告)日：2015-04-28
申请号：US13202142
申请日：2010-02-18
申请人： Chad A. Mirkin , Gengfeng Zheng , Fengwei Huo
发明人： Chad A. Mirkin , Gengfeng Zheng , Fengwei Huo
IPC分类号： G03F7/20
CPC分类号： G03F7/2051 , G03F7/70291 , G03F7/70383 , G03F7/70466 , G03F7/70525 , G03F7/70958
摘要： The disclosure relates to methods of beam pen lithography using a tip array having a plurality of transparent, elastomeric, reversibly-deformable tips coated with a blocking layer and apertures defined in the blocking layer to expose tip ends of the tips in the array. The tip array can be used to perform a photolithography process in which the tips are illuminated with a radiation that is channeled through the tips and out the apertures to expose a photosensitive substrate. Also disclosed are tip arrays formed of polymers and gels, apparatus including the tip arrays and radiation sources, and related apparatus for selectively masking tips in the tip array from radiation emitted from the radiation source.
摘要翻译：本公开涉及使用具有多个透明，弹性，可逆变形的尖端的尖端阵列的光笔笔光刻方法，所述尖端涂覆有阻挡层和限定在阻挡层中的孔，以暴露阵列中尖端的尖端。尖端阵列可以用于执行光刻工艺，其中尖端被通过尖端引导的辐射照射并且出射孔以暴露感光基底。还公开了由聚合物和凝胶形成的尖端阵列，包括尖端阵列和辐射源的装置以及用于从辐射源发射的辐射中选择性地遮蔽尖端阵列中的尖端的相关装置。

4. 发明申请

US20120167262A1 SILICON PEN NANOLITHOGRAPHY 有权
标题翻译：硅笔笔纳米尺度
公开(公告)号：US20120167262A1
公开(公告)日：2012-06-28
申请号：US13375361
申请日：2010-06-04
申请人： Chad A. Mirkin , Wooyoung Shim , Adam B. Braunschweig , Xing Liao , Jinan Chai , Jong Kuk Lim , Gengfeng Zheng , Zijian Zheng
发明人： Chad A. Mirkin , Wooyoung Shim , Adam B. Braunschweig , Xing Liao , Jinan Chai , Jong Kuk Lim , Gengfeng Zheng , Zijian Zheng
IPC分类号： G01Q70/14 , G01Q70/16
CPC分类号： G03F7/0002 , B81B2203/0361 , B81B2207/056 , B81C1/00111 , B81C1/0046 , B81C2201/0154 , B81C2201/0185 , B82Y10/00 , B82Y40/00 , Y10S977/732
摘要： Disclosed are methods of lithography using a tip array having a plurality of pens attached to a backing layer, where the tips can comprise a metal, metalloid, and/or semi-conducting material, and the backing layer can comprise an elastomeric polymer. The tip array can be used to perform a lithography process in which the tips are coated with an ink (e.g., a patterning composition) that is deposited onto a substrate upon contact of the tip with the substrate surface. The tips can be easily leveled onto a substrate and the leveling can be monitored optically by a change in light reflection of the backing layer and/or near the vicinity of the tips upon contact of the tip to the substrate surface.
摘要翻译：公开了使用具有连接到背衬层的多个笔的尖端阵列的光刻方法，其中尖端可以包括金属，准金属和/或半导电材料，并且背衬层可以包括弹性体聚合物。尖端阵列可用于执行光刻工艺，其中尖端涂覆有当尖端与衬底表面接触时沉积到衬底上的油墨（例如，图案化组合物）。尖端可以容易地平整到基底上，并且可以通过背衬层的光反射的变化和/或在尖端与基底表面接触时靠近尖端附近来光学地监测流平。

5. 发明申请

US20110132220A1 POLYMER PEN LITHOGRAPHY 有权
标题翻译：聚合物平版印刷
公开(公告)号：US20110132220A1
公开(公告)日：2011-06-09
申请号：US12989279
申请日：2009-04-25
申请人： Chad A. Mirkin , Fengwei Huo , Zijian Zheng , Gengfeng Zheng
发明人： Chad A. Mirkin , Fengwei Huo , Zijian Zheng , Gengfeng Zheng
IPC分类号： B41F33/00 , B05D3/00 , C03C25/24
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00 , Y10S977/856 , Y10S977/874 , Y10S977/878 , Y10S977/887 , Y10S977/888 , Y10S977/902
摘要： The disclosure relates to methods of printing indicia on a substrate using a tip array comprised of elastomeric, compressible polymers. The tip array can be prepared using conventional photolithographic methods and can be tailored to have any desired number and/or arrangement of tips. Numerous copies (e.g., greater than 15,000, or greater than 11 million) of a pattern can be made in a parallel fashion in as little as 40 minutes.
摘要翻译：本公开涉及使用由弹性体，可压缩聚合物组成的尖端阵列在基底上印刷标记的方法。尖端阵列可以使用常规光刻方法制备，并且可以被定制成具有任何期望的数量和/或尖端的布置。可以在短短40分钟的时间内以平行的方式制作多种图案（例如，大于15,000，或大于1100万）。

6. 发明授权

US09372397B2 Polymer pen lithography 有权
标题翻译：聚合物笔光刻
公开(公告)号：US09372397B2
公开(公告)日：2016-06-21
申请号：US12989279
申请日：2009-04-25
申请人： Chad A. Mirkin , Fengwei Huo , Zijian Zheng , Gengfeng Zheng
发明人： Chad A. Mirkin , Fengwei Huo , Zijian Zheng , Gengfeng Zheng
IPC分类号： G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00 , Y10S977/856 , Y10S977/874 , Y10S977/878 , Y10S977/887 , Y10S977/888 , Y10S977/902
摘要： The disclosure relates to methods of printing indicia on a substrate using a tip array comprised of elastomeric, compressible polymers. The tip array can be prepared using conventional photolithographic methods and can be tailored to have any desired number and/or arrangement of tips. Numerous copies (e.g., greater than 15,000, or greater than 11 million) of a pattern can be made in a parallel fashion in as little as 40 minutes.
摘要翻译：本公开涉及使用由弹性体，可压缩聚合物组成的尖端阵列在基底上印刷标记的方法。尖端阵列可以使用常规光刻方法制备，并且可以被定制成具有任何期望的数量和/或尖端的布置。可以在短短40分钟的时间内以平行的方式制作多种图案（例如，大于15,000，或大于1100万）。

7. 发明授权

US08961853B2 Silicon pen nanolithography 有权
标题翻译：硅笔纳米光刻
公开(公告)号：US08961853B2
公开(公告)日：2015-02-24
申请号：US13375361
申请日：2010-06-04
申请人： Chad A. Mirkin , Wooyoung Shim , Adam B. Braunschweig , Xing Liao , Jinan Chai , Jong Kuk Lim , Gengfeng Zheng , Zijian Zheng
发明人： Chad A. Mirkin , Wooyoung Shim , Adam B. Braunschweig , Xing Liao , Jinan Chai , Jong Kuk Lim , Gengfeng Zheng , Zijian Zheng
IPC分类号： B29C59/02 , G03F7/00 , B81C1/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B81B2203/0361 , B81B2207/056 , B81C1/00111 , B81C1/0046 , B81C2201/0154 , B81C2201/0185 , B82Y10/00 , B82Y40/00 , Y10S977/732
摘要： Disclosed are methods of lithography using a tip array having a plurality of pens attached to a backing layer, where the tips can comprise a metal, metalloid, and/or semi-conducting material, and the backing layer can comprise an elastomeric polymer. The tip array can be used to perform a lithography process in which the tips are coated with an ink (e.g., a patterning composition) that is deposited onto a substrate upon contact of the tip with the substrate surface. The tips can be easily leveled onto a substrate and the leveling can be monitored optically by a change in light reflection of the backing layer and/or near the vicinity of the tips upon contact of the tip to the substrate surface.
摘要翻译：公开了使用具有连接到背衬层的多个笔的尖端阵列的光刻方法，其中尖端可以包括金属，准金属和/或半导电材料，并且背衬层可以包括弹性体聚合物。尖端阵列可用于执行光刻工艺，其中尖端涂覆有当尖端与衬底表面接触时沉积到衬底上的油墨（例如，图案化组合物）。尖端可以容易地平整到基底上，并且可以通过背衬层的光反射的变化和/或在尖端与基底表面接触时靠近尖端附近来光学地监测流平。

8. 发明申请

US20090155587A1 Multicomponent Nanorods 审中-公开
标题翻译：多组分纳米棒
公开(公告)号：US20090155587A1
公开(公告)日：2009-06-18
申请号：US12196960
申请日：2008-08-22
申请人： Chad A. Mirkin , Lidong Qin , Sungho Park , Ling Huang , Sung-Wook Chung
发明人： Chad A. Mirkin , Lidong Qin , Sungho Park , Ling Huang , Sung-Wook Chung
IPC分类号： B32B5/02 , B29D11/00
CPC分类号： H01C17/06513 , B82Y5/00 , B82Y10/00 , B82Y20/00 , G01N33/531 , H01L29/0665 , H01L29/0673 , H01L29/068 , H01L29/861 , Y10S977/762 , Y10S977/81 , Y10S977/849 , Y10S977/856 , Y10S977/857 , Y10T428/2938 , Y10T428/2982
摘要： Multicomponent nanorods having segments with differing electronic and/or chemical properties are disclosed. The nanorods can be tailored with high precision to create controlled gaps within the nanorods or to produce diodes or resistors, based upon the identities of the components making up the segments of the nanorods. Macrostructural composites of these nanorods also are disclosed.
摘要翻译：公开了具有不同电子和/或化学性质的多组分纳米棒。纳米棒可以以高精度进行定制，以在纳米棒内产生可控制的间隙，或者基于组成纳米棒段的部件的特性来产生二极管或电阻器。还公开了这些纳米棒的宏观结构复合材料。

9. 发明申请

US20080225287A1 ANALYTE DETECTION USING NANOWIRES PRODUCED BY ON-WIRE LITHOGRAPHY 有权
标题翻译：使用线形图生成的纳米分析分析检测
公开(公告)号：US20080225287A1
公开(公告)日：2008-09-18
申请号：US11372583
申请日：2006-03-10
申请人： Chad A. Mirkin , Lidong Qin , Can Xue , Sungho Park , Ling Huang
发明人： Chad A. Mirkin , Lidong Qin , Can Xue , Sungho Park , Ling Huang
IPC分类号： G01J3/44
CPC分类号： G01J3/44 , B82Y15/00 , G01N21/658 , Y10S977/762
摘要： The present invention relates to methods of detecting analytes using nanowires having nanodisk arrays. In particular, the present invention discloses methods of detecting analytes via surface enhanced Raman scattering (SERS) and employing nanowires prepared using on-wire lithography (OWL).
摘要翻译：本发明涉及使用具有纳米盘阵列的纳米线检测分析物的方法。特别地，本发明公开了通过表面增强拉曼散射（SERS）检测分析物并使用在线光刻（OWL）制备的纳米线的方法。

10. 发明申请

US20120006674A1 ENERGY TRANSFER THROUGH SURFACE PLASMON RESONANCE EXCITATION ON MULTISEGMENTED NANOWIRES 审中-公开
标题翻译：通过表面等离子体共振激发在多种纳米级纳米粒子上的能量转移
公开(公告)号：US20120006674A1
公开(公告)日：2012-01-12
申请号：US13037942
申请日：2011-03-01
申请人： Chad A. Mirkin , Wei Wei , Lidong Qin , Can Xue , Jill E. Millstone , Xiaoyang Xu
发明人： Chad A. Mirkin , Wei Wei , Lidong Qin , Can Xue , Jill E. Millstone , Xiaoyang Xu
IPC分类号： C01B21/36 , C01B13/00 , C07D301/03 , C01B31/18 , C01B31/20
CPC分类号： B01J35/004 , B01J23/42 , B01J23/48 , B01J23/50 , B01J23/52 , B01J35/06 , B82Y20/00 , B82Y30/00 , B82Y40/00 , C01B3/042 , Y02E60/364 , Y02P20/134
摘要： Disclosed herein is energy transfer on multisegmented nanowires via surface plasmon resonance excitation of visible light, such as solar energy, absorbed by metals sensitive to visible light and transferred to metals insensitive to visible light. The nanowires are prepared with controllable gap sizes between different segments by on-wire lithography (OWL).
摘要翻译：本文公开的是通过对可见光的表面等离子体共振激发（例如由对可见光敏感的金属吸收的太阳能）转移到对可见光不敏感的金属的多分段纳米线的能量转移。通过在线光刻（OWL）在不同的片段之间制备具有可控的间隙尺寸的纳米线。

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