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1. 发明申请

US20060216649A1 Reduced pitch multiple exposure process 有权
标题翻译：减少沥青多次曝光过程
公开(公告)号：US20060216649A1
公开(公告)日：2006-09-28
申请号：US11086664
申请日：2005-03-23
申请人： Theodore Paxton , Todd Davis , Todd Hiar , Cassandra Owen , Steven Hansen
发明人： Theodore Paxton , Todd Davis , Todd Hiar , Cassandra Owen , Steven Hansen
IPC分类号： G03F7/00
CPC分类号： G03F7/0035 , G03F7/70466
摘要： A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form a patterned image having enhanced resolution.
摘要翻译：一种用于使用多个投影来增强在光刻照相丛中的图像分辨率的光刻方法，以及用于投影多个图案以形成图像以形成具有增强的分辨率的图案图像的图像的光刻簇。

2. 发明申请

US20070003878A1 Reduced pitch multiple exposure process 有权
标题翻译：减少沥青多次曝光过程
公开(公告)号：US20070003878A1
公开(公告)日：2007-01-04
申请号：US11177490
申请日：2005-07-11
申请人： Theodore Paxton , Todd Davis , Todd Hiar , Cassandra Owen , Steven Hansen , James Hunter
发明人： Theodore Paxton , Todd Davis , Todd Hiar , Cassandra Owen , Steven Hansen , James Hunter
IPC分类号： G03C5/00
CPC分类号： G03F7/70466 , G03F7/0035
摘要： A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.
摘要翻译：一种光刻方法，用于使用多个投影和用于投影多个图案的光刻聚集体来增强在光刻集群中的图像分辨率，以形成图像以组合以形成具有增强的分辨率的图像。

3. 发明申请

US20060262287A1 Lithographic attribute enhancement 有权
标题翻译：光刻属性增强
公开(公告)号：US20060262287A1
公开(公告)日：2006-11-23
申请号：US11134625
申请日：2005-05-23
申请人： Todd Hiar , Theodore Paxton , Todd Davis , Cassandra Owen
发明人： Todd Hiar , Theodore Paxton , Todd Davis , Cassandra Owen
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/70616
摘要： A method, computer program product, and apparatus configured to improve attribute uniformity of a substrate is disclosed. In an embodiment, the method involves calculating corrective data based on measured values of an attribute of a substrate processed by a lithographic exposure apparatus, the corrective data configured to at least partially correct non-uniformity of the values of the substrate attribute by controlling the temperature generated by a zone of a thermal plate used to heat or cool the substrate, and making the corrective data available to the thermal plate.
摘要翻译：公开了一种被配置为改善基板的属性均匀性的方法，计算机程序产品和装置。在一个实施例中，该方法包括基于由光刻曝光设备处理的基板的属性的测量值来计算校正数据，校正数据被配置为通过控制温度来至少部分地校正基板属性的值的不均匀性由用于加热或冷却基板的热板的区域产生，并且使校正数据可用于热板。

4. 发明申请

US20060216653A1 Reduced pitch multiple exposure process 有权
标题翻译：减少沥青多次曝光过程
公开(公告)号：US20060216653A1
公开(公告)日：2006-09-28
申请号：US11387047
申请日：2006-03-23
申请人： Theodore Paxton , Steven Hansen , Cassandra Owen , Todd Davis , Todd Hiar , James Hunter
发明人： Theodore Paxton , Steven Hansen , Cassandra Owen , Todd Davis , Todd Hiar , James Hunter
IPC分类号： G03F7/00
CPC分类号： G03F7/0035 , G03F7/091 , G03F7/70466
摘要： A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.
摘要翻译：一种光刻方法，用于使用多个投影和用于投影多个图案的光刻聚集体来增强在光刻集群中的图像分辨率，以形成图像以组合以形成具有增强的分辨率的图像。

5. 发明申请

US20060012760A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060012760A1
公开(公告)日：2006-01-19
申请号：US10889066
申请日：2004-07-13
申请人： Cassandra Owen
发明人： Cassandra Owen
IPC分类号： G03B27/52
CPC分类号： G03F7/70916
摘要： A lithographic apparatus is provided with a charged object on a projection system of the lithographic apparatus, a substrate table of the lithographic apparatus, or both that is configured to have an electric charge to attract particles thereto.
摘要翻译：光刻设备在光刻设备的投影系统，光刻设备的基板台或两者上设置带电物体，其被配置为具有电荷以吸引颗粒。

6. 发明申请

US20050140956A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20050140956A1
公开(公告)日：2005-06-30
申请号：US10748751
申请日：2003-12-31
申请人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
发明人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70983 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.
摘要翻译：公开了一种光刻设备。该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。图形结构被配置为根据期望的图案对辐射束进行图案化。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。投影系统包括具有光束入射区域的光学元件和具有通过图案化光束通过的每一个的光束出射区域的光学元件。该装置还包括与投影系统相关联的成核表面，其上设置有多个成核位置。表面远离光束入射区域和光束出射区域中的至少一个设置。

7. 发明申请

US20050057733A1 Adaptive thermal control of lithographic chemical processes 有权
公开(公告)号：US20050057733A1
公开(公告)日：2005-03-17
申请号：US10660646
申请日：2003-09-12
申请人： Cassandra Owen , Wim Tel , Stephan Sinkwitz
发明人： Cassandra Owen , Wim Tel , Stephan Sinkwitz
IPC分类号： G03F7/00 , G03F7/20 , G03F7/30 , G03F7/38 , H01L21/00 , G03B27/52
CPC分类号： G03F7/38 , G03F7/3028 , G03F7/70875 , G03F7/70991 , H01L21/67098
摘要： A system, apparatus, and method for thermally controlling lithographic chemical processes is disclosed herein. The thermal control system includes a multi-zone thermal sensing unit containing a plurality of thermal sensor elements. These thermal elements are configured to detect the temperature of a plurality of pre-defined zones on the substrates. The system also includes a multi-zone thermal adjustment unit that contains a plurality of thermal coupler elements, which are configured to adjust the temperature of the pre-defined zones. The system further includes a thermal controller unit, operatively and communicatively coupled to the multi-zone thermal sensing unit and the multi-zone thermal adjustment unit. The thermal controller unit receives the detected temperature from the multi-zone thermal sensing unit, processes the detected temperature information, generates temperature control information based on the processed temperature information, and communicates the temperature control information to the multi-zone thermal adjustment unit to adjust the temperatures of the pre-defined zones.

8. 发明申请

US20070046917A1 Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU 审中-公开
标题翻译：平版印刷设备和器件制造方法，用于补偿标线片诱导的CDU
公开(公告)号：US20070046917A1
公开(公告)日：2007-03-01
申请号：US11215123
申请日：2005-08-31
申请人： Wim Tel , Hans Van Der Laan , Cassandra Owen , Todd Davis , Todd Hiar , Theodore Paxton
发明人： Wim Tel , Hans Van Der Laan , Cassandra Owen , Todd Davis , Todd Hiar , Theodore Paxton
IPC分类号： G03B27/54
CPC分类号： G03F7/70375 , G03F7/70666
摘要： A lithographic apparatus operable in a substrate exposing configuration to expose a substrate with a pattern of radiation and a radiation beam inspection configuration in which the pattern of radiation that would be exposed on the substrate if the lithographic apparatus was in the substrate exposing configuration is inspected by a radiation beam inspection device. In the radiation beam inspecting configuration, the operation of the lithographic apparatus is modified in order to minimize the difference between the pattern of radiation exposed on the substrate and the required pattern of radiation to be exposed on the substrate.
摘要翻译：一种光刻设备，其可在基板曝光配置中工作以用辐射图案和辐射束检查结构曝光基板，其中如果光刻设备处于基板曝光配置中将暴露在基板上的辐射图案将被辐射束检查装置。在辐射束检查配置中，修改光刻设备的操作，以便使暴露在基板上的辐射图案与要暴露在基板上的所需辐射图案之间的差异最小化。

9. 发明申请

US20060215132A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060215132A1
公开(公告)日：2006-09-28
申请号：US11373503
申请日：2006-03-13
申请人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
发明人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
IPC分类号： G03B27/52
CPC分类号： G03F7/70983 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.
摘要翻译：光刻设备包括提供辐射束的辐射系统和支撑图案化结构的支撑结构。图形结构被配置为根据期望的图案对辐射束进行图案化。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。投影系统包括光学元件，该光学元件具有通过图案化光束通过的每一个的光束出射区域。该装置还包括清洁被引入到光学元件和基板之间的区域中的流体的流体清洁系统。流体清洁系统包括流体入口，流体出口和布置在入口和出口之间的清洁区域。清洁区包括具有多个成核位点的成核表面。

10. 发明申请

US20060176463A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20060176463A1
公开(公告)日：2006-08-10
申请号：US11345316
申请日：2006-02-02
申请人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
发明人： Mark Kroon , Michael Van Beek , Peter Dirksen , Ralph Kurt , Cassandra Owen
IPC分类号： G03B27/72
CPC分类号： G03F7/70983 , G03F7/70808 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.
摘要翻译：公开了一种光刻设备。该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。图形结构被配置为根据期望的图案对辐射束进行图案化。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。投影系统包括具有光束入射区域的光学元件和具有通过图案化光束通过的每一个的光束出射区域的光学元件。该装置还包括与投影系统相关联的成核表面，其上设置有多个成核位置。表面远离光束入射区域和光束出射区域中的至少一个设置。

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