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1. 发明授权

US07012672B2 Lithographic apparatus, system, method, computer program, and apparatus for height map analysis 有权
标题翻译：平版印刷设备，系统，方法，计算机程序和高度图分析装置
公开(公告)号：US07012672B2
公开(公告)日：2006-03-14
申请号：US10796309
申请日：2004-03-10
申请人： Tasja Van Rhee , Thomas Josephus Maria Castenmiller , Willem Herman Gertruda Anna Koenen , Alex Van Zon , Michael Broers
发明人： Tasja Van Rhee , Thomas Josephus Maria Castenmiller , Willem Herman Gertruda Anna Koenen , Alex Van Zon , Michael Broers
IPC分类号： G03B27/42 , G03B27/52 , G01N21/00 , G01B11/24
CPC分类号： G03F7/70508 , G03F9/7034
摘要： A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.
摘要翻译：介绍了使用这种设备制造设备的光刻投影设备和方法。该装置包括用于测量多个点中的晶片的高度的液位传感器。高度信息被发送到处理器，处理器被布置成使用来自液位传感器的输入来创建测量的高度图。在本发明的一个实施例中，处理器还被布置为使用所测量的高度图来计算平均管芯拓扑，以便产生衬底的表面的原始高度图，并且检测所述衬底的所述表面上的任何聚焦点使用原始高度图。通过减去平均晶片拓扑，可以比以前更精确地定位焦点。

2. 发明授权

US07655367B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07655367B2
公开(公告)日：2010-02-02
申请号：US11384824
申请日：2006-03-21
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由诸如传输图像传感器的内部传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

3. 发明授权

US07564536B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07564536B2
公开(公告)日：2009-07-21
申请号：US11268777
申请日：2005-11-08
申请人： Joost Jeroen Ottens , Marcus Emile Joannes Boonman , Thomas Josephus Maria Castenmiller , Andre Bernardus Jeunink
发明人： Joost Jeroen Ottens , Marcus Emile Joannes Boonman , Thomas Josephus Maria Castenmiller , Andre Bernardus Jeunink
IPC分类号： G03B27/58 , G03B27/42 , G03B27/62 , B23Q1/00 , B23Q3/00
CPC分类号： G03F7/70783 , G03F7/707 , H01L21/682 , Y10S269/903
摘要： A lithographic apparatus is disclosed that includes an article support constructed to support a first article, capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, in a beam path of the radiation beam or a second article to be placed in a beam path of the patterned radiation beam, the article support having a plurality of supporting protrusions on which the first article or the second article is disposed in use, wherein the plurality of supporting protrusions are constructed to define a support zone to provide a plane of support for the first article or the second article, so that when the first article or the second article is subjected to a thermal load the support zone allows at least a portion of the first article or the second article to expand or contract to reduce the build up of a mechanical stress in the first article or second article, respectively, while maintaining the first article or second article substantially fixed to the article support, and a position sensor configured to determine a position offset, in a direction lying in the plane of the support zone, of the first article or the second article over a period of time, and a projection system configured to project a patterned radiation beam onto a target portion of a second article.
摘要翻译：公开了一种光刻设备，其包括构造成支撑第一制品的物品支撑件，该第一物品能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，在辐射束的光束路径中或第二物品被放置在图案化的辐射束的光束路径中，物品支撑件具有多个支撑突起，第一物品或第二物品在使用中设置在该支撑突起上，其中多个支撑突起构造成限定支撑区域为第一物品或第二物品提供支撑平面，使得当第一物品或第二物品经受热负荷时，支撑区允许第一物品或第二物品的至少一部分膨胀或收缩以分别在第一制品或第二制品中分别减少机械应力的累积，同时保持第一制品或第二制品基本固定以及位置传感器，被配置为在一段时间内确定第一物品或第二物品在位于支撑区域的平面中的方向上的位置偏移;以及投影系统，被配置为投影图案化的辐射束到第二物品的目标部分上。

4. 发明授权

US07595863B2 Lithographic apparatus, excimer laser and device manufacturing method 有权
标题翻译：光刻设备，准分子激光器和器件制造方法
公开(公告)号：US07595863B2
公开(公告)日：2009-09-29
申请号：US11316360
申请日：2005-12-23
申请人： Robertus Cornelis Martinus Kruif , Richard Joseph Bruls , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus De Klerk , Erik Petrus Buurman
发明人： Robertus Cornelis Martinus Kruif , Richard Joseph Bruls , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus De Klerk , Erik Petrus Buurman
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G03F7/70641 , G03F7/70558 , G03F7/70575
摘要： A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and includes a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.
摘要翻译：用于光刻图案印刷工艺的CD间距依赖关系用于投影图案的辐射的光谱强度分布。 CD间距依赖关系可以从一个系统到另一个系统不同。这可能导致系统之间的等密度偏差失配。本发明通过提供一种光刻设备来提供包括用于提供投影辐射束的照明系统的光刻设备，用于将图案化光束投影到基板的目标部分上的投影系统以及用于保持基板的基板台，利用控制器以提供投影光束的辐射强度的光谱分布的调整。光谱强度分布的调整基于与等密度偏差有关的数据，并且包括光谱带宽的扩大或光谱强度分布的形状变化。

5. 发明申请

US20100091260A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100091260A1
公开(公告)日：2010-04-15
申请号：US12644903
申请日：2009-12-22
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
IPC分类号： G03B27/54
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由诸如传输图像传感器的内部传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

6. 发明授权

US07675607B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07675607B2
公开(公告)日：2010-03-09
申请号：US11486379
申请日：2006-07-14
申请人： Andre Bernardus Jeunink , Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Thomas Josephus Maria Castenmiller
发明人： Andre Bernardus Jeunink , Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Thomas Josephus Maria Castenmiller
IPC分类号： G03B27/62 , G03B27/58
CPC分类号： G03F7/70783 , G03F7/707
摘要： A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a support clamp constructed to clamp the patterning device to the support, and a bending mechanism constructed to apply a bending torque to the clamped patterning device, the bending mechanism comprising a force/torque actuator configured to act on the clamped patterning device without substantially reducing the clamping force exerted on the patterning device by the support clamp.
摘要翻译：公开了一种光刻设备，其具有构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，所述支撑件包括构造成夹紧以及弯曲机构，其构造成将弯曲扭矩施加到夹持的图案形成装置上，所述弯曲机构包括力/转矩致动器，所述力/力矩致动器构造成作用在夹持的图案形成装置上，而基本上不会降低施加在图案形成装置上的夹紧力由支撑夹。

7. 发明授权

US07525638B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07525638B2
公开(公告)日：2009-04-28
申请号：US11086667
申请日：2005-03-23
申请人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Mare Antonius Maria Haast
发明人： Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Mare Antonius Maria Haast
IPC分类号： G03B27/52 , G03B27/42 , G03B27/54 , G03B27/74
CPC分类号： G03F7/70575 , G03F7/70641 , G03F9/7026
摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
摘要翻译：一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。在第二方面，变化数据用于校正例如由透射图像传感器测量的焦平面位置数据。这两个方面可以组合在单个装置中或者可以单独使用。

8. 发明申请

US20080013068A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20080013068A1
公开(公告)日：2008-01-17
申请号：US11486379
申请日：2006-07-14
申请人： Andre Bernardus Jeunink , Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Thomas Josephus Maria Castenmiller
发明人： Andre Bernardus Jeunink , Marcel Koenraad Marie Baggen , Dirk-Jan Bijvoet , Thomas Josephus Maria Castenmiller
IPC分类号： G03B27/62
CPC分类号： G03F7/70783 , G03F7/707
摘要： A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a support clamp constructed to clamp the patterning device to the support, and a bending mechanism constructed to apply a bending torque to the clamped patterning device, the bending mechanism comprising a force/torque actuator configured to act on the clamped patterning device without substantially reducing the clamping force exerted on the patterning device by the support clamp.
摘要翻译：公开了一种光刻设备，其具有构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，所述支撑件包括构造成夹紧以及弯曲机构，其构造成将弯曲扭矩施加到夹持的图案形成装置上，所述弯曲机构包括力/转矩致动器，所述力/力矩致动器构造成作用在夹持的图案形成装置上，而基本上不会降低施加在图案形成装置上的夹紧力由支撑夹。

9. 发明授权

US06856376B2 Lithographic apparatus, apparatus cleaning method, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷设备，设备清洁方法，装置制造方法和由此制造的装置
公开(公告)号：US06856376B2
公开(公告)日：2005-02-15
申请号：US10342322
申请日：2003-01-15
申请人： Gert-Jan Heerens , Sjoerd Nicolaas Lambertus Donders , Franciscus Andreas Cornelis Johannes Spanjers , Aschwin Lodewijk Hendricus Johannes Van Meer , Thomas Josephus Maria Castenmiller
发明人： Gert-Jan Heerens , Sjoerd Nicolaas Lambertus Donders , Franciscus Andreas Cornelis Johannes Spanjers , Aschwin Lodewijk Hendricus Johannes Van Meer , Thomas Josephus Maria Castenmiller
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/707 , G03F7/70925
摘要： In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool. A laser may also be used for in situ cleaning of components of a lithographic projection apparatus.
摘要翻译：在低压环境中，在靠近表面和该表面的工具尖端之间施加电压。表面上的污染物被吸引并粘附到工具上。激光也可用于原位清洁光刻投影装置的部件。

10. 发明授权

US06563564B2 Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：操作光学成像系统的方法，光刻投影装置，装置制造方法以及由此制造的装置
公开(公告)号：US06563564B2
公开(公告)日：2003-05-13
申请号：US09878182
申请日：2001-06-12
申请人： Christianus Gerardus Maria de Mol , Thomas Josephus Maria Castenmiller , Marcel van Dijk , Franciscus Antonius Chrysogonus Marie Commissaris , Simon de Groot , Catharina Johanna Lucia Maria van den Enden
发明人： Christianus Gerardus Maria de Mol , Thomas Josephus Maria Castenmiller , Marcel van Dijk , Franciscus Antonius Chrysogonus Marie Commissaris , Simon de Groot , Catharina Johanna Lucia Maria van den Enden
IPC分类号： G03B2752
CPC分类号： G03F7/706 , G03F7/70216 , G03F7/70891
摘要： The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic projection apparatus to compensate for the calculated change in aberration effect. The parameters are obtained by a calibration operation, which may comprise a coarse calibration followed by at least one fine calibration. The coarse calibration yields a first estimate of at least a subset of the parameters. The estimate can be used as an input for a subsequent fine calibration. The calibration may also comprise a single fine calibration.
摘要翻译：本发明提供了一种操作光刻投影设备的方法，包括：基于至少一组预定参数，根据加热效应，计算投影系统中的像差效应的变化，作为时间的函数; 以及调整光刻投影装置以补偿计算出的像差效应的变化。参数通过校准操作获得，该校准操作可以包括粗校准，随后进行至少一次精细校准。粗校准产生至少一个参数子集的第一估计。该估计可用作后续精细校准的输入。校准也可以包括单次精细校准。

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