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    • 1. 发明授权
    • SRAM-type memory cell
    • SRAM型存储单元
    • US08575697B2
    • 2013-11-05
    • US13039167
    • 2011-03-02
    • Carlos MazureRichard FerrantBich-Yen Nguyen
    • Carlos MazureRichard FerrantBich-Yen Nguyen
    • H01L27/11H01L27/12G11C5/06G11C11/00
    • H01L27/1104G11C11/412H01L21/84H01L27/1203
    • An SRAM-type memory cell that includes a semiconductor on insulator substrate having a thin film of semiconductor material separated from a base substrate by an insulating layer; and six transistors such as two access transistors, two conduction transistors and two charge transistors arranged so as to form with the conduction transistors two back-coupled inverters. Each of the transistors has a back control gate formed in the base substrate below the channel and able to be biased in order to modulate the threshold voltage of the transistor, with a first back gate line connecting the back control gates of the access transistors to a first potential and a second back gate line connecting the back control gates of the conduction transistors and charge transistors to a second potential. The first and second potentials can be modulated according to the type of cell control operation.
    • 一种SRAM型存储单元,包括绝缘体上半导体衬底,其具有通过绝缘层从基底衬底分离的半导体材料薄膜; 以及六个晶体管,例如两个存取晶体管,两个导通晶体管和两个电荷晶体管,其布置成与导通晶体管形成两个反向耦合的反相器。 每个晶体管具有形成在通道下方的基底衬底中的后控制栅极,并且能够被偏置以便调制晶体管的阈值电压,第一背栅极线将存取晶体管的背控制栅极连接到 第一电位和第二背栅极线,其将导通晶体管和电荷晶体管的背控制栅极连接到第二电位。 第一和第二电位可以根据电池控制操作的类型进行调制。
    • 3. 发明授权
    • Pseudo-inverter circuit on SeOI
    • SeOI上的伪逆变电路
    • US08654602B2
    • 2014-02-18
    • US13495632
    • 2012-06-13
    • Carlos MazureRichard FerrantBich-Yen Nguyen
    • Carlos MazureRichard FerrantBich-Yen Nguyen
    • G11C8/00
    • G11C8/08G11C11/4085G11C2211/4016
    • A circuit made on a semiconductor-on-insulator substrate. The circuit includes a first transistor having a first channel, a second transistor having a second channel, with the transistors provided in serial association between first and second terminals for applying a power supply potential, each of the transistors comprising a drain region and a source region in the thin layer, a channel extending between the source region and the drain region, and a front control gate located above the channel. Each transistor has a back control gate formed in the base substrate below the channel of the transistor and capable of being biased in order to modulate the threshold voltage of the transistor. At least one of the transistors is configured for operating in a depletion mode under the action of a back gate signal which will sufficiently modulate its threshold voltage.
    • 在绝缘体上半导体衬底上制成的电路。 该电路包括具有第一通道的第一晶体管,具有第二通道的第二晶体管,晶体管以第一和第二端子串联连接的方式提供,以施加电源电位,每个晶体管包括漏极区域和源极区域 在薄层中,在源极区域和漏极区域之间延伸的沟道以及位于沟道上方的前部控制栅极。 每个晶体管具有形成在晶体管的沟道下方的基底衬底中的背控制栅极,并且能够被偏置以便调制晶体管的阈值电压。 晶体管中的至少一个被配置为在充分调制其阈值电压的背栅信号的作用下以耗尽模式工作。
    • 4. 发明申请
    • PSEUDO-INVERTER CIRCUIT ON SeO1
    • PSO1上的PSEUDO-INVERTER电路
    • US20110242926A1
    • 2011-10-06
    • US12793553
    • 2010-06-03
    • Carlos MazureRichard FerrantBich-Yen Nguyen
    • Carlos MazureRichard FerrantBich-Yen Nguyen
    • G11C8/08G05F1/10
    • G11C8/08G11C11/4085G11C2211/4016
    • A circuit made on a semiconductor-on-insulator substrate. The circuit includes a first transistor having a first channel, a second transistor having a second channel, with the transistors provided in serial association between first and second terminals for applying a power supply potential, each of the transistors comprising a drain region and a source region in the thin layer, a channel extending between the source region and the drain region, and a front control gate located above the channel. Each transistor has a back control gate formed in the base substrate below the channel of the transistor and capable of being biased in order to modulate the threshold voltage of the transistor. At least one of the transistors is configured for operating in a depletion mode under the action of a back gate signal which will sufficiently modulate its threshold voltage.
    • 在绝缘体上半导体衬底上制成的电路。 该电路包括具有第一通道的第一晶体管,具有第二通道的第二晶体管,晶体管以第一和第二端子串联连接的方式提供,以施加电源电位,每个晶体管包括漏极区域和源极区域 在薄层中,在源极区域和漏极区域之间延伸的沟道以及位于沟道上方的前部控制栅极。 每个晶体管具有形成在晶体管的沟道下方的基底衬底中的背控制栅极,并且能够被偏置以便调制晶体管的阈值电压。 晶体管中的至少一个被配置为在充分调制其阈值电压的背栅信号的作用下以耗尽模式工作。
    • 8. 发明授权
    • Device comprising a field-effect transistor in a silicon-on-insulator
    • 装置包括绝缘体上硅中的场效应晶体管
    • US08455938B2
    • 2013-06-04
    • US12886421
    • 2010-09-20
    • Bich-Yen NguyenCarlos MazureRichard Ferrant
    • Bich-Yen NguyenCarlos MazureRichard Ferrant
    • H01L29/788H01L27/12
    • H01L21/823462H01L21/823481H01L21/84H01L27/0705H01L27/1203H01L27/1207H01L29/7881
    • The present invention relates to a semiconductor device that has a semiconductor-on-insulator (SeOI) structure, which includes a substrate, an insulating layer such as an oxide layer on the substrate and a semiconductor layer on the insulating layer with a field-effect-transistor (FET) formed in the SeOI structure from the substrate and deposited layers, wherein the FET has a channel region in the substrate, a gate dielectric layer that is made from at least a part of the oxide layer of the SeOI structure; and a gate electrode that is formed at least partially from a part of the semiconductor layer of the SeOI structure. The invention further relates to a method of forming one or more field-effect-transistors or metal-oxide-semiconductor transistors from a semiconductor-on-insulator structure that involves patterning and etching the SeOI structure, forming shallow trench isolations, depositing insulating, metal or semiconductor layers, and removing mask and/or pattern layers.
    • 本发明涉及一种具有绝缘体上半导体(SeOI)结构的半导体器件,其包括衬底,绝缘层如衬底上的氧化物层和具有场效应的绝缘层上的半导体层 - 晶体管(FET),其从所述衬底和沉积层形成在所述SeOI结构中,其中所述FET在所述衬底中具有沟道区;栅极介电层,其由所述SeOI结构的所述氧化物层的至少一部分制成; 以及至少部分地由SeOI结构的半导体层的一部分形成的栅电极。 本发明还涉及从绝缘体上半导体结构形成一个或多个场效应晶体管或金属氧化物半导体晶体管的方法,该方法包括图案化和蚀刻SeOI结构,形成浅沟槽隔离,沉积绝缘金属 或半导体层,以及去除掩模和/或图案层。
    • 9. 发明授权
    • Pseudo-inverter circuit on SeOI
    • SeOI上的伪逆变电路
    • US08223582B2
    • 2012-07-17
    • US12793553
    • 2010-06-03
    • Carlos MazureRichard FerrantBich-Yen Nguyen
    • Carlos MazureRichard FerrantBich-Yen Nguyen
    • G11C8/00
    • G11C8/08G11C11/4085G11C2211/4016
    • A circuit made on a semiconductor-on-insulator substrate. The circuit includes a first transistor having a first channel, a second transistor having a second channel, with the transistors provided in serial association between first and second terminals for applying a power supply potential, each of the transistors comprising a drain region and a source region in the thin layer, a channel extending between the source region and the drain region, and a front control gate located above the channel. Each transistor has a back control gate formed in the base substrate below the channel of the transistor and capable of being biased in order to modulate the threshold voltage of the transistor. At least one of the transistors is configured for operating in a depletion mode under the action of a back gate signal which will sufficiently modulate its threshold voltage.
    • 在绝缘体上半导体衬底上制成的电路。 该电路包括具有第一通道的第一晶体管,具有第二通道的第二晶体管,晶体管以第一和第二端子串联连接的方式提供,以施加电源电位,每个晶体管包括漏极区域和源极区域 在薄层中,在源极区域和漏极区域之间延伸的沟道以及位于沟道上方的前部控制栅极。 每个晶体管具有形成在晶体管的沟道下方的基底衬底中的背控制栅极,并且能够被偏置以便调制晶体管的阈值电压。 晶体管中的至少一个被配置为在充分调制其阈值电压的背栅信号的作用下以耗尽模式工作。