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1. 发明授权

US10139733B2 Diaphragm changing device 有权
公开(公告)号：US10139733B2
公开(公告)日：2018-11-27
申请号：US15060257
申请日：2016-03-03
申请人： CARL ZEISS SMT GMBH
发明人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Patrick Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muehlbeyer
IPC分类号： G03F7/20 , G02B5/00 , G02B13/14 , G02B17/02 , G21K1/04 , G21K1/06
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.

2. 发明申请

US20140022658A1 FACET MIRROR DEVICE 有权
公开(公告)号：US20140022658A1
公开(公告)日：2014-01-23
申请号：US14047192
申请日：2013-10-07
申请人： Carl Zeiss SMT GmbH
发明人： Gerhard-Wilhelm Ziegler , Thomas Bischoff
IPC分类号： G02B26/08
CPC分类号： G02B26/0816 , G02B7/1822 , G02B26/0833 , G03F7/70058 , Y10T29/49826
摘要： There is provided a facet mirror device comprising a facet element and a support unit, the support unit supporting the facet element. The support unit comprises a first support element and a second support element, the second support element being connected to the facet element to support the facet element. The first support element is connected to the second support element to support the second support element, the first support element being connected to the second support element via at least one flexure unit, the flexure unit comprising at least one flexure.
摘要翻译：提供了一种小面镜装置，其包括小面元件和支撑单元，支撑单元支撑小面元件。支撑单元包括第一支撑元件和第二支撑元件，第二支撑元件连接到小面元件以支撑小平面元件。所述第一支撑元件连接到所述第二支撑元件以支撑所述第二支撑元件，所述第一支撑元件经由至少一个挠曲单元连接到所述第二支撑元件，所述挠曲单元包括至少一个挠曲。

3. 发明授权

US10078270B2 Support for a component of an optical device 有权
公开(公告)号：US10078270B2
公开(公告)日：2018-09-18
申请号：US14929614
申请日：2015-11-02
申请人： Carl Zeiss SMT GmbH
发明人： Thomas Bischoff , Joachim Feucht , Jochen Wieland , Stefan Mueller
IPC分类号： G02B7/02 , G03F7/20
CPC分类号： G03F7/7015 , G02B7/025 , G03F7/70141 , G03F7/70258 , G03F7/70825
摘要： The disclosure provides an arrangement for an optical device including a component of the optical device and a support structure supporting the component. The support structure includes at least one locking device connected to the component and including a first fixation device and an associated second fixation device. The first fixation device and the second fixation device are adapted to be, in a movable state, movable with respect to each other along a first degree of freedom and a second degree of freedom into a final position. The first fixation device and the second fixation device are further adapted to be, in a locked state, fixed in the final position by at least one locking device contacting the first fixation device and the second fixation device. In the movable state, the first fixation device and the second fixation device are movable, up to the final position, in a manner free from a mutual pre-stress resulting from a restoring force exerted by at least a part of one of the first fixation device and the second fixation device.

4. 发明授权

US09645388B2 Facet mirror device 有权
公开(公告)号：US09645388B2
公开(公告)日：2017-05-09
申请号：US14047192
申请日：2013-10-07
申请人： Carl Zeiss SMT GmbH
发明人： Gerhard-Wilhelm Ziegler , Thomas Bischoff
IPC分类号： G02B26/08 , G02B7/182 , G03F7/20
CPC分类号： G02B26/0816 , G02B7/1822 , G02B26/0833 , G03F7/70058 , Y10T29/49826
摘要： There is provided a facet mirror device comprising a facet element and a support unit, the support unit supporting the facet element. The support unit comprises a first support element and a second support element, the second support element being connected to the facet element to support the facet element. The first support element is connected to the second support element to support the second support element, the first support element being connected to the second support element via at least one flexure unit, the flexure unit comprising at least one flexure.

5. 发明授权

US10088754B2 Illumination system for microlithography 有权
公开(公告)号：US10088754B2
公开(公告)日：2018-10-02
申请号：US15464899
申请日：2017-03-21
申请人： Carl Zeiss SMT GmbH
发明人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
IPC分类号： G02B27/64 , G03F7/20 , G02B3/00
摘要： A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.

6. 发明申请

US20170192361A1 ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY 审中-公开
公开(公告)号：US20170192361A1
公开(公告)日：2017-07-06
申请号：US15464899
申请日：2017-03-21
申请人： Carl Zeiss SMT GmbH
发明人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
IPC分类号： G03F7/20 , G02B3/00
CPC分类号： G03F7/70191 , G02B3/0043 , G03F7/70058 , G03F7/70075 , G03F7/70083
摘要： A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.

7. 发明授权

US09606441B2 Illumination system for microlithography 有权
公开(公告)号：US09606441B2
公开(公告)日：2017-03-28
申请号：US15012087
申请日：2016-02-01
申请人： Carl Zeiss SMT GmbH
发明人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70191 , G02B3/0043 , G03F7/70058 , G03F7/70075 , G03F7/70083
摘要： A microlithography illumination system includes a first raster arrangement including a first plurality of bundle-forming raster elements arranged in or adjacent a first plane of the illumination system. The first plurality of bundle-forming raster elements is configured to generate a raster arrangement of secondary light sources. The illumination system also includes a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field. The transmission optics includes a second raster arrangement comprising a second plurality of bundle-forming raster elements. The illumination system further includes a displacement device configured to displace a displaceable segment of the first raster arrangement relative to the second raster arrangement. The displaceable segment includes exactly one of the raster elements, a group of several raster elements, a raster column, a raster area, or several groups of raster elements.

8. 发明申请

US20160282724A1 DIAPHRAGM CHANGING DEVICE 审中-公开
标题翻译：膜片改变装置
公开(公告)号：US20160282724A1
公开(公告)日：2016-09-29
申请号：US15060257
申请日：2016-03-03
申请人： CARL ZEISS SMT GMBH
发明人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Patrick Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muehlbeyer
IPC分类号： G03F7/20 , G02B17/02 , G21K1/06 , G02B5/00 , G21K1/04
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。

9. 发明授权

US09280060B2 Illumination system for microlithography 有权
标题翻译：微光刻照明系统
公开(公告)号：US09280060B2
公开(公告)日：2016-03-08
申请号：US14496689
申请日：2014-09-25
申请人： Carl Zeiss SMT GmbH
发明人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70191 , G02B3/0043 , G03F7/70058 , G03F7/70075 , G03F7/70083
摘要： A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.
摘要翻译：光栅装置包括具有不同束影响效应的第一和第二类型的光栅元件。在第一光栅区域和第二光栅区域之间存在距离步长。第一光栅区域包括第一光栅元素类型的光栅元素。第二光栅区域包括第二光栅元素类型的光栅元素。光栅布置被配置为在微光刻照明系统中使用。

10. 发明申请

US20160161858A1 ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY 有权
标题翻译：微观照明系统
公开(公告)号：US20160161858A1
公开(公告)日：2016-06-09
申请号：US15012087
申请日：2016-02-01
申请人： Carl Zeiss SMT GmbH
发明人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B3/0043 , G03F7/70058 , G03F7/70075 , G03F7/70083
摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.
摘要翻译：用于微光刻的照明系统用于利用一次光源的照明光照射照明场。第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。第一光栅布置用于产生二次光源的光栅布置。传输光学器件用于将次级光源的照明光的叠加传输到照明场中。传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III）这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

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