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1. 发明授权

US10591825B2 Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography 有权
公开(公告)号：US10591825B2
公开(公告)日：2020-03-17
申请号：US16050161
申请日：2018-07-31
申请人： Carl Zeiss SMT GmbH
发明人： Stephan Andre , Daniel Golde , Toralf Gruner , Johannes Ruoff , Norbert Wabra , Ricarda Schoemer , Sonja Schneider
IPC分类号： G03F7/20
摘要： A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength λ from the extreme ultraviolet range. The projection lens includes a multiplicity of mirrors having mirror surfaces arranged in a projection beam path between the object plane and the image plane so that a pattern of a mask in the object plane is imagable into the image plane via the mirrors. A first imaging scale in a first direction running parallel to a scan direction is smaller in terms of absolute value than a second imaging scale in a second direction perpendicular to the first direction. The projection lens also includes a dynamic wavefront manipulation system for correcting astigmatic wavefront aberration portions caused by reticle displacement.

2. 发明申请

US20140239192A1 ILLUMINATION AND DISPLACEMENT DEVICE FOR A PROJECTION EXPOSURE APPARATUS 有权
标题翻译：投影曝光装置的照明和位移装置
公开(公告)号：US20140239192A1
公开(公告)日：2014-08-28
申请号：US14272982
申请日：2014-05-08
申请人： Carl Zeiss SMT GmbH
发明人： Sonja Schneider , Norbert Wabra , Martin von Hodenberg , Boris Bittner , Ricarda Schneider
IPC分类号： G03F7/20
CPC分类号： G03F7/2002 , G03F7/70191 , G03F7/70558
摘要： An illumination and displacement device for a projection exposure apparatus comprises an illumination optical unit for illuminating an illumination field. An object holder serves for mounting an object in such a way that at least one part of the object can be arranged in the illumination field. An object holder drive serves for displacing the object during illumination in an object displacement direction. A correction device serves for the spatially resolved influencing of an intensity of the illumination at least of sections of the illumination field, wherein there is a spatial resolution of the influencing of the intensity of the illumination of the illumination field at least along the object displacement direction. This results in an illumination and displacement device in which field-dependent imaging aberrations which are present during the projection exposure do not undesirably affect a projection result.
摘要翻译：用于投影曝光装置的照明和位移装置包括用于照明照明场的照明光学单元。物体保持器用于安装物体，使得物体的至少一部分可以布置在照明场中。物体保持器驱动器用于在物体移动方向的照明期间使物体移动。校正装置用于空间分辨影响至少照明场部分的照明强度，其中至少沿物体位移方向存在对照明场照明强度的影响的空间分辨率。这导致照明和位移装置，其中在投影曝光期间存在的场依赖的成像像差不会不期望地影响投影结果。

3. 发明授权

US12025818B2 Optical element having a coating for influencing heating radiation and optical arrangement 有权
公开(公告)号：US12025818B2
公开(公告)日：2024-07-02
申请号：US17393551
申请日：2021-08-04
申请人： Carl Zeiss SMT GmbH
发明人： Boris Bittner , Norbert Wabra , Holger Schmidt , Ricarda Schoemer , Sonja Schneider
IPC分类号： G02B5/08 , G02B5/30 , G02B7/18 , G02B27/00 , G03F7/00 , G21K1/06
CPC分类号： G02B5/0891 , G02B5/0816 , G02B5/3075 , G02B7/1815 , G02B27/0025 , G03F7/70266 , G03F7/70891 , G03F7/70958 , G21K1/067
摘要： The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λEUV) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.

4. 发明授权

US10048592B2 Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography 有权
公开(公告)号：US10048592B2
公开(公告)日：2018-08-14
申请号：US15441441
申请日：2017-02-24
申请人： Carl Zeiss SMT GmbH
发明人： Stephan Andre , Daniel Golde , Toralf Gruner , Johannes Ruoff , Norbert Wabra , Ricarda Schoemer , Sonja Schneider
IPC分类号： G03B27/54 , G03F7/20
摘要： A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength λ from the extreme ultraviolet range. The projection lens includes a multiplicity of mirrors having mirror surfaces arranged in a projection beam path between the object plane and the image plane so that a pattern of a mask in the object plane is imagable into the image plane via the mirrors. A first imaging scale in a first direction running parallel to a scan direction is smaller in terms of absolute value than a second imaging scale in a second direction perpendicular to the first direction. The projection lens also includes a dynamic wavefront manipulation system for correcting astigmatic wavefront aberration portions caused by reticle displacement.

5. 发明授权

US09910364B2 Projection exposure apparatus including at least one mirror 有权
公开(公告)号：US09910364B2
公开(公告)日：2018-03-06
申请号：US15298323
申请日：2016-10-20
申请人： Carl Zeiss SMT GmbH
发明人： Boris Bittner , Norbert Wabra , Sonja Schneider , Ricarda Schoemer , Stefan Rist
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/7015 , G03F7/70258 , G03F7/705
摘要： A microlithographic projection exposure apparatus includes: a projection lens for imaging mask structures via an exposure radiation including at least one optical element and at least one manipulator; a read-in device for reading in application-specific structure information defining at least one property of an angular distribution of the exposure radiation upon entering the projection lens; and a travel establishing device for establishing a travel command defining a change to be made in an optical effect of the at least one optical element by manipulation of a property of the optical element via the at least one manipulator along a travel. The travel establishing device is configured to establish the travel command in an at least two-stage optimization.

6. 发明授权

US09817316B2 Projection exposure method and projection exposure apparatus for microlithography 有权
公开(公告)号：US09817316B2
公开(公告)日：2017-11-14
申请号：US15083622
申请日：2016-03-29
申请人： Carl Zeiss SMT GmbH
发明人： Boris Bittner , Norbert Wabra , Martin von Hodenberg , Sonja Schneider
IPC分类号： G03F7/20
CPC分类号： G03F7/70083 , G03F7/70258 , G03F7/70525 , G03F7/706 , G03F7/70891
摘要： A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern includes providing the pattern between an illumination system and a projection lens of a projection exposure apparatus so that the pattern is arranged in the region of an object plane of the projection lens and can be imaged via the projection lens into an image plane of the projection lens. The image plane is optically conjugate with respect to the object plane, and imaging-relevant properties of the pattern can be characterized by pattern data. The method also includes illuminating an illumination region of the pattern with an illumination radiation provided by the illumination system in accordance with an illumination setting which is specific to a use case and which can be characterized by illumination setting data.

7. 发明授权

US09709770B2 Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus 有权
公开(公告)号：US09709770B2
公开(公告)日：2017-07-18
申请号：US14584164
申请日：2014-12-29
申请人： Carl Zeiss SMT GmbH
发明人： Boris Bittner , Norbert Wabra , Sonja Schneider , Ricarda Schoemer , Hendrik Wagner , Rumen Iliew , Walter Pauls
IPC分类号： G03F7/20 , G02B7/18 , G21K1/06 , G02B5/08 , B82Y10/00 , G02B7/00 , G02B17/06 , G02B27/00
CPC分类号： G02B7/1815 , B82Y10/00 , G02B5/0891 , G02B7/008 , G02B17/0657 , G02B17/0663 , G02B27/0025 , G03F7/702 , G03F7/70216 , G03F7/70266 , G03F7/706 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/067
摘要： A mirror arrangement for an EUV projection exposure apparatus for microlithography comprises a plurality of mirrors each having a layer which is reflective in the EUV spectral range and to which EUV radiation can be applied, and having a main body. In this case, at least one mirror of the plurality of mirrors has at least one layer comprising a material having a negative coefficient of thermal expansion. Moreover, a method for operating the mirror arrangement and a projection exposure apparatus are described. At least one heat source is arranged, in order to locally apply heat in a targeted manner to the at least one layer having a negative coefficient of thermal expansion of the at least one mirror.

8. 发明申请

US20170115576A1 PROJECTION EXPOSURE APPARATUS INCLUDING AT LEAST ONE MIRROR 有权
公开(公告)号：US20170115576A1
公开(公告)日：2017-04-27
申请号：US15298323
申请日：2016-10-20
申请人： Carl Zeiss SMT GmbH
发明人： Boris Bittner , Norbert Wabra , Sonja Schneider , Ricarda Schoemer , Stefan Rist
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/7015 , G03F7/70258 , G03F7/705
摘要： A microlithographic projection exposure apparatus includes: a projection lens for imaging mask structures via an exposure radiation including at least one optical element and at least one manipulator; a read-in device for reading in application-specific structure information defining at least one property of an angular distribution of the exposure radiation upon entering the projection lens; and a travel establishing device for establishing a travel command defining a change to be made in an optical effect of the at least one optical element by manipulation of a property of the optical element via the at least one manipulator along a travel. The travel establishing device is configured to establish the travel command in an at least two-stage optimization.

9. 发明授权

US09372411B2 Projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影目标
公开(公告)号：US09372411B2
公开(公告)日：2016-06-21
申请号：US14199932
申请日：2014-03-06
申请人： Carl Zeiss SMT GmbH
发明人： Johannes Zellner , Boris Bittner , Norbert Wabra , Martin von Hodenberg , Sonja Schneider , Ricarda Schoemer , Arne Schob , Guenter Rudolph , Alexander Gratzke , Bryce Anton Moffat
IPC分类号： G03B27/52 , G03B27/54 , G03F7/20 , H01S5/00 , H01S5/40
CPC分类号： G03F7/70308 , G03F7/70891 , H01S5/005 , H01S5/0064 , H01S5/4025
摘要： A projection objective of a microlithographic projection exposure apparatus includes a wavefront correction device including a refractive optical element that has two opposite optical surfaces, through which projection light passes, and a circumferential rim surface extending between the two optical surfaces. A first and a second optical system are configured to direct first and second heating light to different portions of the rim surface such that at least a portion of the first and second heating light enters the refractive optical element. A temperature distribution caused by a partial absorption of the heating light results in a refractive index distribution inside the refractive optical element that corrects a wavefront error. At least the first optical system includes a focusing optical element that focuses the first heating light in a focal area such that the first heating light emerging from the focal area impinges on the rim surface.
摘要翻译：微光刻投影曝光装置的投影物镜包括具有折射光学元件的波前校正装置，所述折射光学元件具有投影光通过的两个相对的光学表面和在两个光学表面之间延伸的圆周边缘表面。第一和第二光学系统被配置为将第一和第二加热光引导到边缘表面的不同部分，使得第一和第二加热光的至少一部分进入折射光学元件。由加热光的部分吸收引起的温度分布导致折射光学元件内的折射率分布，其校正波前误差。至少第一光学系统包括聚焦光学元件，其将第一加热光聚焦在焦点区域中，使得从焦点区域射出的第一加热光照射在边缘表面上。

10. 发明授权

US09134613B2 Illumination and displacement device for a projection exposure apparatus 有权
标题翻译：用于投影曝光装置的照明和位移装置
公开(公告)号：US09134613B2
公开(公告)日：2015-09-15
申请号：US14272982
申请日：2014-05-08
申请人： Carl Zeiss SMT GmbH
发明人： Sonja Schneider , Norbert Wabra , Martin von Hodenberg , Boris Bittner , Ricarda Schneider
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/2002 , G03F7/70191 , G03F7/70558
摘要： An illumination and displacement device for a projection exposure apparatus comprises an illumination optical unit for illuminating an illumination field. An object holder serves for mounting an object in such a way that at least one part of the object can be arranged in the illumination field. An object holder drive serves for displacing the object during illumination in an object displacement direction. A correction device serves for the spatially resolved influencing of an intensity of the illumination at least of sections of the illumination field, wherein there is a spatial resolution of the influencing of the intensity of the illumination of the illumination field at least along the object displacement direction. This results in an illumination and displacement device in which field-dependent imaging aberrations which are present during the projection exposure do not undesirably affect a projection result.
摘要翻译：用于投影曝光装置的照明和位移装置包括用于照明照明场的照明光学单元。物体保持器用于安装物体，使得物体的至少一部分可以布置在照明场中。物体保持器驱动器用于在物体移动方向的照明期间使物体移动。校正装置用于空间分辨影响至少照明场部分的照明强度，其中至少沿物体位移方向存在对照明场照明强度的影响的空间分辨率。这导致照明和位移装置，其中在投影曝光期间存在的场依赖的成像像差不会不期望地影响投影结果。

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