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1. 发明授权

US08100498B2 Methods and systems for providing print media distortion compensation 有权
标题翻译：提供打印介质失真补偿的方法和系统
公开(公告)号：US08100498B2
公开(公告)日：2012-01-24
申请号：US11860507
申请日：2007-09-24
申请人： Carl E. Picciotto , Jun Gao
发明人： Carl E. Picciotto , Jun Gao
IPC分类号： B41J29/393
CPC分类号： B41J29/393 , G03G15/5062 , G03G2215/0059 , G03G2215/00776 , G03G2215/0158
摘要： A reference image of an area of a print media is captured at approximately a first time by an image acquisition system. A first application of ink is applied onto the print media area by a printing assembly at the first time. A comparison image of the print media area is captured at a second time by the image acquisition system subsequent to the first application of ink onto the print media area. The reference image and the comparison image are processed to determine a relative displacement of a feature pattern on the print media between approximately the first time and the second time. A second application of ink from the printing assembly onto the print media is adjusted based on the determination.
摘要翻译：由图像采集系统在大约第一时间捕获打印介质的区域的参考图像。第一次使用墨水通过印刷组件在印刷介质区域上施加。在将墨水首次施加到打印介质区域之后，由图像采集系统第二次捕获打印介质区域的比较图像。处理参考图像和比较图像以在大约第一时间和第二时间之间确定打印介质上的特征图案的相对位移。基于该确定来调整从打印组件到打印介质的墨水的第二次应用。

2. 发明授权

US07780431B2 Nanoimprint molds and methods of forming the same 失效
标题翻译：纳米压印模具及其形成方法
公开(公告)号：US07780431B2
公开(公告)日：2010-08-24
申请号：US11521235
申请日：2006-09-14
申请人： Zhaoning Yu , Wei Wu , Carl E. Picciotto , Jun Gao
发明人： Zhaoning Yu , Wei Wu , Carl E. Picciotto , Jun Gao
IPC分类号： B29C33/00
CPC分类号： B29C33/42 , B29C33/3842 , B29C43/003 , B29C43/021 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7076 , G03F9/708 , G03F9/7084 , Y10S977/887
摘要： A nanoimprint mold includes a substrate having at least one substantially non-transferable feature and at least one transferable feature defined at different portions thereon. Methods for forming the same are also disclosed.
摘要翻译：纳米压印模具包括具有至少一个基本上不可转移的特征的基底和在其上的不同部分限定的至少一个可转移特征。还公开了其形成方法。

3. 发明授权

US07796800B2 Determining a dimensional change in a surface using images acquired before and after the dimensional change 失效
标题翻译：使用在尺寸变化之前和之后获取的图像来确定表面中的尺寸变化
公开(公告)号：US07796800B2
公开(公告)日：2010-09-14
申请号：US11046146
申请日：2005-01-28
申请人： Carl E. Picciotto , William M. Tong , Jun Gao
发明人： Carl E. Picciotto , William M. Tong , Jun Gao
IPC分类号： G06K9/00
CPC分类号： G01B11/002 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7088 , G03F9/7092
摘要： Determining a dimensional change in a surface of an object is described. At a first time, a first image of the surface is acquired at a first spatial window thereon having a first known position relative to a frame of reference. At a second time, a second image of the surface is acquired at a second spatial window thereon having a second known position relative to the frame of reference. The first image and the second image are processed according to an image displacement sensing algorithm to determine a relative translation of a first point on the surface between the first and second times. The relative translation of the first point, the first known position, and the second known position are used to determine the dimensional change in the surface between the first and second times.
摘要翻译：描述确定物体表面中的尺寸变化。在第一时间，在其上具有相对于参照系的第一已知位置的第一空间窗口处获取表面的第一图像。在第二时间，在其上具有相对于参考框架的第二已知位置的第二空间窗口处获取表面的第二图像。根据图像位移检测算法处理第一图像和第二图像，以确定第一次和第二次之间表面上的第一点的相对平移。使用第一点，第一已知位置和第二已知位置的相对平移来确定第一次和第二次之间的表面中的尺寸变化。

4. 发明申请

US20080090312A1 LITHOGRAPHY ALIGNMENT SYSTEM AND METHOD USING nDSE-BASED FEEDBACK CONTROL 审中-公开
标题翻译： LITHOGRAPHY对准系统和使用基于nDSE的反馈控制的方法
公开(公告)号：US20080090312A1
公开(公告)日：2008-04-17
申请号：US11550372
申请日：2006-10-17
申请人： Inkyu Park , Wei Wu , Jun Gao , Carl E. Picciotto
发明人： Inkyu Park , Wei Wu , Jun Gao , Carl E. Picciotto
IPC分类号： H01L21/66
CPC分类号： G03F9/7038 , G03F9/7088 , G03F9/7092 , G03F9/7096
摘要： A contact lithography alignment system and method use nanoscale displacement sensing and estimation (nDSE) to maintain an alignment and compensate for a disturbance of one or more objects during contact lithography. A method of maintaining an alignment includes establishing an initial alignment of one or more objects and employing nDSE-based feedback control of relative positions of more or more of the objects to maintain the alignment during contact lithography. A method of disturbance compensation includes acquiring a first image, acquiring a second image, estimating an alignment error using nDSE applied to the first and second image, and adjusting a relative position to reduce the alignment error. A contact lithography system includes an optical sensor, a feedback processor providing nDSE and a position controller that adjusts relative positions of one or more objects to reduce an alignment error determined using the nDSE.
摘要翻译：接触光刻对准系统和方法使用纳米尺度位移感测和估计（nDSE）来保持对准并补偿接触光刻期间一个或多个物体的干扰。保持对准的方法包括建立一个或多个对象的初始对准，并且采用基于nDSE的多个对象的相对位置的反馈控制来保持接触光刻期间的对准。干扰补偿的方法包括获取第一图像，获取第二图像，使用施加到第一和第二图像的nDSE来估计对准误差，以及调整相对位置以减小对准误差。接触光刻系统包括光学传感器，提供nDSE的反馈处理器和调整一个或多个对象的相对位置以减少使用nDSE确定的对准误差的位置控制器。

5. 发明申请

US20080067721A1 Nanoimprint molds and methods of forming the same 失效
标题翻译：纳米压印模具及其形成方法
公开(公告)号：US20080067721A1
公开(公告)日：2008-03-20
申请号：US11521235
申请日：2006-09-14
申请人： Zhaoning Yu , Wei Wu , Carl E. Picciotto , Jun Gao
发明人： Zhaoning Yu , Wei Wu , Carl E. Picciotto , Jun Gao
IPC分类号： B29C43/00 , B29C33/38
CPC分类号： B29C33/42 , B29C33/3842 , B29C43/003 , B29C43/021 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7076 , G03F9/708 , G03F9/7084 , Y10S977/887
摘要： A nanoimprint mold includes a substrate having at least one substantially non-transferable feature and at least one transferable feature defined at different portions thereon. Methods for forming the same are also disclosed.
摘要翻译：纳米压印模具包括具有至少一个基本上不可转移的特征的基底和在其上的不同部分限定的至少一个可转移特征。还公开了其形成方法。

6. 发明申请

US20080028360A1 Methods and systems for performing lithography, methods for aligning objects relative to one another, and nanoimprinting molds having non-marking alignment features 审中-公开
标题翻译：用于执行光刻的方法和系统，用于将物体相对于彼此对准的方法以及具有非标记对准特征的纳米压印模具
公开(公告)号：US20080028360A1
公开(公告)日：2008-01-31
申请号：US11496368
申请日：2006-07-31
申请人： Carl E. Picciotto , Jun Gao , Wei Wu , Zhaoning Yu
发明人： Carl E. Picciotto , Jun Gao , Wei Wu , Zhaoning Yu
IPC分类号： G06F17/50 , G03F9/00
CPC分类号： G03F9/7092 , G03F9/7038 , G03F9/7042 , G03F9/7088
摘要： Methods of performing lithography include calculating a displacement vector for a lithography tool using an image of a portion of the lithography tool and a portion of a substrate and an additional image of a portion of an additional lithography tool and a portion of the substrate. Methods of aligning objects include positioning a second object proximate a first object and acquiring a first image illustrating a feature on a surface of the second object and a feature on a surface of the first object. An additional object is positioned proximate the first object, and an additional image is acquired that illustrates a feature on a surface of the additional object and the feature on the surface of the first object. The additional image is compared with the first image. Imprint molds include at least one non-marking reference feature on an imprinting surface of a mode base.
摘要翻译：进行光刻的方法包括使用光刻工具的一部分的图像和基板的一部分以及附加光刻工具的一部分和基板的一部分的附加图像来计算光刻工具的位移矢量。对准对象的方法包括定位靠近第一对象的第二对象并且获取示出第二对象的表面上的特征的第一图像和第一对象的表面上的特征。附加对象被定位在第一对象附近，并且获取附加图像，其示出附加对象的表面上的特征和第一对象的表面上的特征。将附加图像与第一图像进行比较。压印模具包括在模式底座的压印表面上的至少一个非标记参考特征。

7. 发明授权

US07650029B2 Multiple layer alignment sensing 失效
标题翻译：多层对齐检测
公开(公告)号：US07650029B2
公开(公告)日：2010-01-19
申请号：US10995840
申请日：2004-11-23
申请人： Carl E. Picciotto , Jun Gao
发明人： Carl E. Picciotto , Jun Gao
IPC分类号： G06K9/00
CPC分类号： G03F9/7003 , G03F9/7038 , G03F9/7088
摘要： Using an imaging system in relation to a plurality of material layers is described, the material layers being separated by a distance greater than a depth of field of the imaging system. A focal plane of the imaging system and a first of the plurality of material layers are brought into correspondence. A first image including at least a portion of the first material layer having a first feature of interest thereon is stored. The focal plane of the imaging system and a second of the plurality of material layers are brought into correspondence. A second image including at least a portion of the second material layer having a second feature of interest thereon is acquired. The first and second images are processed for automatic computation of an alignment measurement between the first and second features of interest.
摘要翻译：描述了相对于多个材料层使用成像系统，材料层被分离大于成像系统的景深的距离。使成像系统的焦平面和多个材料层中的第一个成对准。存储包括其上具有感兴趣的第一特征的第一材料层的至少一部分的第一图像。使成像系统的焦平面和多个材料层中的第二个成对应。获取包括具有第二特征的第二材料层的至少一部分的第二图像。处理第一和第二图像以自动计算感兴趣的第一和第二特征之间的对准测量。

8. 发明授权

US07085673B2 Displacement estimation system and method 失效
标题翻译：位移估计系统和方法
公开(公告)号：US07085673B2
公开(公告)日：2006-08-01
申请号：US10930614
申请日：2004-08-31
申请人： Carl E. Picciotto , Jun Gao , Wei Wu
发明人： Carl E. Picciotto , Jun Gao , Wei Wu
IPC分类号： G01B21/02 , G06K9/32
CPC分类号： G06T7/20 , G06T7/70
摘要： A displacement estimation system including a data acquisition system and a processing system is provided. The data acquisition system is configured to capture a first frame from a first substrate including a first pattern and a second substrate including a second pattern at a first time and capture a second frame from a third substrate including a third pattern and a fourth substrate including a fourth pattern at a second time subsequent to the first time. The first pattern and the third pattern are substantially identical, and the second pattern and the fourth pattern are substantially identical. The processing system is configured to calculate a first displacement between the first pattern and the third pattern using the first frame and the second frame and calculate a second displacement between the second pattern and the fourth pattern using the first frame and the second frame.
摘要翻译：提供了包括数据采集系统和处理系统的位移估计系统。数据采集系统被配置为在第一时间从包括第一图案的第一基板和包括第二图案的第二基板捕获第一帧，并从包括第三图案的第三基板和包括第三图案的第四基板捕获第二帧第四模式在第一次之后的第二时间。第一图案和第三图案基本相同，第二图案和第四图案基本相同。处理系统被配置为使用第一帧和第二帧来计算第一图案和第三图案之间的第一位移，并且使用第一帧和第二帧计算第二图案和第四图案之间的第二位移。

9. 发明授权

US07082378B2 Displacement sensing by comparing matrices of pointwise measurements 失效
公开(公告)号：US07082378B2
公开(公告)日：2006-07-25
申请号：US10994055
申请日：2004-11-18
申请人： Carl E. Picciotto , Jun Gao , Neal W. Meyer
发明人： Carl E. Picciotto , Jun Gao , Neal W. Meyer
IPC分类号： G01B7/00 , G06F15/00
CPC分类号： G01D5/347 , G06T7/246 , G06T7/70
摘要： Determining a displacement of a substantially rigid item relative to a frame of reference between a first time and a second time is described. At the first time, a first set of pointwise measurements of a physical property of the item taken at a plurality of fixed locations relative to the frame of reference is acquired. At the second time, a second set of pointwise measurements of the physical property taken at the plurality of fixed locations is acquired. A first matrix derived from the first set of pointwise measurements is compared to a second matrix derived from the second set of pointwise measurements to determine the displacement.

10. 发明授权

US07609858B2 Displacement measurements using phase changes 失效
标题翻译：使用相位变化进行位移测量
公开(公告)号：US07609858B2
公开(公告)日：2009-10-27
申请号：US10931414
申请日：2004-08-31
申请人： Jun Gao , Carl E. Picciotto
发明人： Jun Gao , Carl E. Picciotto
IPC分类号： G06K9/00
CPC分类号： G01B11/002 , G06T7/262 , G06T7/37
摘要： A measurement process or system transforms image data corresponding to images of an object to the frequency domain and analyzes the frequency domain data to determine a displacement of the object occurring between first and second images. Analysis in the frequency domain simplifies identification and handling of data expected to be noisy. In particular, frequencies corresponding to modes of vibration, lighting variation, or sensor error characteristic of a measurement system or frequencies corresponding to small magnitude frequency-domain data can be given little or no weighting in analysis that provides the displacement measurement. In one embodiment, Fourier transforms of shifted and unshifted images differ by a phase delay. A least square fit slope of the phase values associated with the phase delay can indicate displacements to accuracies less than 1% of a pixel width, thereby providing nanometer scale precision using imaging systems having a pixel width of about 1 μm.
摘要翻译：测量过程或系统将对应于对象的图像的图像数据变换到频域，并分析频域数据以确定在第一和第二图像之间发生的对象的位移。频域分析简化了预计嘈杂的数据的识别和处理。特别地，对应于测量系统的振动模式，照明变化或传感器误差特性的频率或与小幅度频域数据相对应的频率的频率，在提供位移测量的分析中可以很少或没有加权。在一个实施例中，移位和未移位图像的傅里叶变换相位延迟。与相位延迟相关的相位值的最小平方拟合斜率可以指示小于像素宽度的1％的精度位移，从而使用具有约1um的像素宽度的成像系统提供纳米级精度。

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