专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130146134A1 SOLAR CELL WITH NANOLAMINATED TRANSPARENT ELECTRODE AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：具有纳米ZnO透明电极的太阳能电池及其制造方法
公开(公告)号：US20130146134A1
公开(公告)日：2013-06-13
申请号：US13402823
申请日：2012-02-22
申请人： CHIEN-NAN HSIAO , Chih-Chieh Yu , Po-Kai Chiu , Chi-Chung Kei , Don-Yau Chiang
发明人： CHIEN-NAN HSIAO , Chih-Chieh Yu , Po-Kai Chiu , Chi-Chung Kei , Don-Yau Chiang
IPC分类号： H01L31/0224 , H01L31/18
CPC分类号： H01L31/022466 , H01L31/022483
摘要： The present invention discloses a solar cell with a nanolaminated transparent electrode and a method of manufacturing the same. The solar cell comprises a substrate, a first electrode layer deposited on the substrate, a photovoltaic layer deposited on the first electrode layer, and a second electrode layer deposited on the photovoltaic layer. Wherein, at least one of the first and second electrode layers is a nanolaminated transparent electrode prepared by using atomic layer deposition (ALD). The nanolaminated transparent electrode may serve as both of the transparent electrode and the anti-reflective layer and is able to maintain good transmittance in infrared wavelength.
摘要翻译：本发明公开了一种具有纳米层压透明电极的太阳能电池及其制造方法。太阳能电池包括衬底，沉积在衬底上的第一电极层，沉积在第一电极层上的光伏层和沉积在光伏层上的第二电极层。其中，第一和第二电极层中的至少一个是通过使用原子层沉积（ALD）制备的纳米级的透明电极。纳米层压透明电极可以用作透明电极和抗反射层两者，并且能够在红外波长中保持良好的透射率。

2. 发明申请

US20130125815A1 PLASMA ENHANCED ATOMIC LAYER DEPOSITION SYSTEM 有权
标题翻译：等离子体增强原子层沉积系统
公开(公告)号：US20130125815A1
公开(公告)日：2013-05-23
申请号：US13412675
申请日：2012-03-06
申请人： Bo-Heng Liu , Chi-Chung Kei , Meng-Yen Tsai , Wen-Hao Cho , Chih-Chieh Yu , Chien-Nan Hsiao , Da-Ren Liu
发明人： Bo-Heng Liu , Chi-Chung Kei , Meng-Yen Tsai , Wen-Hao Cho , Chih-Chieh Yu , Chien-Nan Hsiao , Da-Ren Liu
IPC分类号： C23C16/455
CPC分类号： C23C16/45536 , C23C16/45548
摘要： A plasma enhanced atomic layer deposition (PEALD) system used to form thin films on substrates includes a plasma chamber, a processing chamber, two or more ring units and a control piece. The plasma chamber includes an outer and an inner quartz tubular units, whose central axes are aligned with each other. Therefore, plasma is held and concentrated in a cylindrical space formed between the outer and outer quartz tubular units. Due to the first and second through holes, the plasma flow may be more evenly distributed on most of the surface of the substrate to form evenly distributed thin films and nano particles on the substrate. In addition, due to the alignment and misalignment between the first and second through holes, the plasma generated in the plasma chamber may be swiftly allowed or disallowed to enter to the processing chamber to prevent the precursor from forming a CVD.
摘要翻译：用于在衬底上形成薄膜的等离子体增强原子层沉积（PEALD）系统包括等离子体室，处理室，两个或多个环形单元和控制件。等离子体室包括外部和内部石英管状单元，其中心轴彼此对准。因此，等离子体被保持并集中在形成在外部和外部石英管状单元之间的圆柱形空间中。由于第一和第二通孔，等离子体流可以更均匀地分布在基板的大部分表面上，以在基板上形成均匀分布的薄膜和纳米颗粒。此外，由于第一和第二通孔之间的对准和不对准，可以迅速地允许或禁止在等离子体室中产生的等离子进入处理室以防止前体形成CVD。

3. 发明授权

US09404181B2 Plasma enhanced atomic layer deposition system 有权
标题翻译：等离子体增强原子层沉积系统
公开(公告)号：US09404181B2
公开(公告)日：2016-08-02
申请号：US13412675
申请日：2012-03-06
申请人： Bo-Heng Liu , Chi-Chung Kei , Meng-Yen Tsai , Wen-Hao Cho , Chih-Chieh Yu , Chien-Nan Hsiao , Da-Ren Liu
发明人： Bo-Heng Liu , Chi-Chung Kei , Meng-Yen Tsai , Wen-Hao Cho , Chih-Chieh Yu , Chien-Nan Hsiao , Da-Ren Liu
IPC分类号： C23C16/00 , C23C16/455
CPC分类号： C23C16/45536 , C23C16/45548
摘要： A plasma enhanced atomic layer deposition (PEALD) system used to form thin films on substrates includes a plasma chamber, a processing chamber, two or more ring units and a control piece. The plasma chamber includes an outer and an inner quartz tubular units, whose central axes are aligned with each other. Therefore, plasma is held and concentrated in an annular space formed between the outer and outer quartz tubular units. Due to the first and second through holes, the plasma flow may be more evenly distributed on most of the surface of the substrate to form evenly distributed thin films and nano particles on the substrate. In addition, due to the alignment and misalignment between the first and second through holes, the plasma generated in the plasma chamber may be swiftly allowed or disallowed to enter to the processing chamber to prevent the precursor from forming a CVD.
摘要翻译：用于在衬底上形成薄膜的等离子体增强原子层沉积（PEALD）系统包括等离子体室，处理室，两个或多个环形单元和控制件。等离子体室包括外部和内部石英管状单元，其中心轴彼此对准。因此，等离子体被保持并集中在形成在外部和外部石英管状单元之间的环形空间中。由于第一和第二通孔，等离子体流可以更均匀地分布在基板的大部分表面上，以在基板上形成均匀分布的薄膜和纳米颗粒。此外，由于第一和第二通孔之间的对准和不对准，可以迅速地允许或禁止在等离子体室中产生的等离子进入处理室以防止前体形成CVD。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式