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    • 1. 发明申请
    • PLASMA ENHANCED ATOMIC LAYER DEPOSITION SYSTEM
    • 等离子体增强原子层沉积系统
    • US20130125815A1
    • 2013-05-23
    • US13412675
    • 2012-03-06
    • Bo-Heng LiuChi-Chung KeiMeng-Yen TsaiWen-Hao ChoChih-Chieh YuChien-Nan HsiaoDa-Ren Liu
    • Bo-Heng LiuChi-Chung KeiMeng-Yen TsaiWen-Hao ChoChih-Chieh YuChien-Nan HsiaoDa-Ren Liu
    • C23C16/455
    • C23C16/45536C23C16/45548
    • A plasma enhanced atomic layer deposition (PEALD) system used to form thin films on substrates includes a plasma chamber, a processing chamber, two or more ring units and a control piece. The plasma chamber includes an outer and an inner quartz tubular units, whose central axes are aligned with each other. Therefore, plasma is held and concentrated in a cylindrical space formed between the outer and outer quartz tubular units. Due to the first and second through holes, the plasma flow may be more evenly distributed on most of the surface of the substrate to form evenly distributed thin films and nano particles on the substrate. In addition, due to the alignment and misalignment between the first and second through holes, the plasma generated in the plasma chamber may be swiftly allowed or disallowed to enter to the processing chamber to prevent the precursor from forming a CVD.
    • 用于在衬底上形成薄膜的等离子体增强原子层沉积(PEALD)系统包括等离子体室,处理室,两个或多个环形单元和控制件。 等离子体室包括外部和内部石英管状单元,其中心轴彼此对准。 因此,等离子体被保持并集中在形成在外部和外部石英管状单元之间的圆柱形空间中。 由于第一和第二通孔,等离子体流可以更均匀地分布在基板的大部分表面上,以在基板上形成均匀分布的薄膜和纳米颗粒。 此外,由于第一和第二通孔之间的对准和不对准,可以迅速地允许或禁止在等离子体室中产生的等离子进入处理室以防止前体形成CVD。
    • 2. 发明授权
    • Plasma enhanced atomic layer deposition system
    • 等离子体增强原子层沉积系统
    • US09404181B2
    • 2016-08-02
    • US13412675
    • 2012-03-06
    • Bo-Heng LiuChi-Chung KeiMeng-Yen TsaiWen-Hao ChoChih-Chieh YuChien-Nan HsiaoDa-Ren Liu
    • Bo-Heng LiuChi-Chung KeiMeng-Yen TsaiWen-Hao ChoChih-Chieh YuChien-Nan HsiaoDa-Ren Liu
    • C23C16/00C23C16/455
    • C23C16/45536C23C16/45548
    • A plasma enhanced atomic layer deposition (PEALD) system used to form thin films on substrates includes a plasma chamber, a processing chamber, two or more ring units and a control piece. The plasma chamber includes an outer and an inner quartz tubular units, whose central axes are aligned with each other. Therefore, plasma is held and concentrated in an annular space formed between the outer and outer quartz tubular units. Due to the first and second through holes, the plasma flow may be more evenly distributed on most of the surface of the substrate to form evenly distributed thin films and nano particles on the substrate. In addition, due to the alignment and misalignment between the first and second through holes, the plasma generated in the plasma chamber may be swiftly allowed or disallowed to enter to the processing chamber to prevent the precursor from forming a CVD.
    • 用于在衬底上形成薄膜的等离子体增强原子层沉积(PEALD)系统包括等离子体室,处理室,两个或多个环形单元和控制件。 等离子体室包括外部和内部石英管状单元,其中心轴彼此对准。 因此,等离子体被保持并集中在形成在外部和外部石英管状单元之间的环形空间中。 由于第一和第二通孔,等离子体流可以更均匀地分布在基板的大部分表面上,以在基板上形成均匀分布的薄膜和纳米颗粒。 此外,由于第一和第二通孔之间的对准和不对准,可以迅速地允许或禁止在等离子体室中产生的等离子进入处理室以防止前体形成CVD。