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    • 1. 发明授权
    • Memory cell device having vertical channel and double gate structure
    • 具有垂直沟道和双栅结构的存储单元器件
    • US07863643B2
    • 2011-01-04
    • US12309959
    • 2007-09-20
    • Byung Gook ParkIl Han Park
    • Byung Gook ParkIl Han Park
    • H01L29/66
    • H01L27/115H01L27/11568
    • A memory cell device having a vertical channel and a double gate structure is provided. More specifically, a memory cell device having a vertical channel and a double gate structure is characterized by having a pillar active region with a predetermined height, which is including a first semiconductor layer forming a first source/drain region, a second semiconductor layer being placed under the first semiconductor layer with a predetermined distance and forming a second source/drain region, and a third semiconductor layer forming a body region and a channel region between the first semiconductor layer and the second semiconductor layer, and therefore, there is no need for unnecessary contacts when it is used as a unit cell for any type of memory array, not to speak of NOR type flash memory array. And the present invention makes to program/erase more effectively and increase the read speed and the amount of sensing current.
    • 提供具有垂直通道和双栅极结构的存储单元器件。 更具体地说,具有垂直沟道和双栅极结构的存储单元器件的特征在于具有预定高度的柱状有源区,其包括形成第一源极/漏极区的第一半导体层,放置第二半导体层的第二半导体层 在第一半导体层之下具有预定距离并形成第二源极/漏极区域,以及形成第一半导体层和第二半导体层之间的体区域和沟道区域的第三半导体层,因此不需要 当它被用作任何类型的存储器阵列的单位单元时,不用说NOR型闪存阵列就是不必要的接触。 并且本发明使得更有效地编程/擦除并增加读取速度和感测电流的量。