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1. 发明授权

US06640024B1 Add-drop wavelength filter using mode discrimination couplers and tilted bragg gratings 失效
标题翻译：使用模式识别耦合器和倾斜布拉格光栅的分散波长滤波器
公开(公告)号：US06640024B1
公开(公告)日：2003-10-28
申请号：US09700245
申请日：2000-11-09
申请人： Byoung Yoon Kim , Hee Su Park , Seok Hyun Yun
发明人： Byoung Yoon Kim , Hee Su Park , Seok Hyun Yun
IPC分类号： G02B628
CPC分类号： G02B6/0208 , G02B6/02085 , G02B6/29334 , G02B6/29344 , G02B6/29353 , G02B6/29383
摘要： An add-drop wavelength filter is described which separates specific wavelength components from optical signals propagating through an optical waveguide or adds specific wavelength components thereto. In general, add-drop wavelength filters serve to separate or add specific channels in channels comprising several different wavelengths in a wavelength division optical communication system, and require good wavelength selectivity, stability and etc. Up to now, several types of add-drop wavelength filters are proposed, however disadvantageously they were not stable or were difficult to fabricate. The add-drop wavelength filter of the present invention comprising a mode discrimination coupler, Bragg gratings in which mode conversion occurs and etc., utilizes mode conversion in a dual mode waveguide and has low loss and stability. Furthermore, devices included in the add-drop wavelength filter are conventionally used, thereby resulting in easy fabrication, and the application fields of the devices can be easily expanded by apodization, chirping, or etc. of the Bragg gratings.
摘要翻译：描述了分离波长滤波器，其将特定波长分量与通过光波导传播的光信号分离或向其中添加特定波长分量。通常，加分波长滤波器用于在波分复用光通信系统中分离或添加包含若干不同波长的信道中的特定信道，并且需要良好的波长选择性，稳定性等。到目前为止，几种类型的添加波长提出了过滤器，但是不利的是它们不稳定或难以制造。包括模式鉴别耦合器，发生模式转换的布拉格光栅等的本发明的分插波长滤波器利用双模波导中的模式转换并且具有低的损耗和稳定性。此外，常规地使用包括在分插波长滤波器中的器件，从而易于制造，并且可以通过布拉格光栅的变迹，啁啾等容易地扩展器件的应用领域。

2. 发明授权

US06343165B1 Optical add drop multiplexer 有权
标题翻译：光分插复用器
公开(公告)号：US06343165B1
公开(公告)日：2002-01-29
申请号：US09577202
申请日：2000-05-23
申请人： Byoung Yoon Kim , Seok Hyun Yun , Hee Su Park , Wayne V. Sorin
发明人： Byoung Yoon Kim , Seok Hyun Yun , Hee Su Park , Wayne V. Sorin
IPC分类号： G02B642
CPC分类号： G02F1/125 , G02B6/02071 , G02F1/0134 , G02F2201/02 , G02F2203/055 , G02F2203/585 , H04J14/0201 , H04J14/0208 , H04J14/0209 , H04J14/0213
摘要： An optical add/drop multiplexer includes a mode converter. A first mode coupler is coupled to an input of the mode converter. A second mode coupler is coupled to an output of the mode converter. The mode converter includes an optical fiber with multiple cladding modes and a single core mode guided along a core. An acoustic wave propagation member is coupled to the optical fiber. The acoustic wave propagation member propagates an acoustic wave from its proximal to its distal end. At least one acoustic wave generator is coupled to the proximal end of the acoustic wave propagation member.
摘要翻译：光分插复用器包括模转换器。第一模式耦合器耦合到模式转换器的输入端。第二模式耦合器耦合到模式转换器的输出端。模式转换器包括具有多个包层模式的光纤和沿核心引导的单个核心模式。声波传播部件耦合到光纤。声波传播部件将声波从其近端传播到其远端。至少一个声波发生器耦合到声波传播构件的近端。

3. 发明授权

US08279400B2 Super-resolution lithography apparatus and method based on multi light exposure method 有权
标题翻译：基于多光曝光方法的超分辨光刻设备及方法
公开(公告)号：US08279400B2
公开(公告)日：2012-10-02
申请号：US12403111
申请日：2009-03-12
申请人： Hee Su Park , Sun Kyung Lee , Jae Yong Lee , Sang-Kyung Choi , Dong-Hoon Lee
发明人： Hee Su Park , Sun Kyung Lee , Jae Yong Lee , Sang-Kyung Choi , Dong-Hoon Lee
IPC分类号： G03B27/42
CPC分类号： G03F7/70408 , G03F7/7005 , G03F7/70466 , G03F7/70575
摘要： Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps. Furthermore, a multiple photon absorber that is difficult to obtain, a medium having a complicated energy level and a high-efficiency quantum optical light are unnecessary, and thus economic efficiency is improved.
摘要翻译：本文公开了一种基于多次曝光方法的超分辨率光刻设备和方法。超分辨光刻设备包括具有第一基态，第二基态，第一激发态，第二激发态和淬灭态的能级的照相介质; 在照相介质的第一基态和第一激发态之间引起能级转变的第一光源; 第二光源，在所述第二基态和所述照相介质的所述第一激发态之间引起能级转变; 以及在照相介质的第二基态和第二激发态之间引起能级跃迁的第三光源。因此，可以简单地通过使用具有简单结构和传统激光束的照相介质并增加曝光步骤的数量来改进光刻的分辨率。此外，难以获得难以获得的多光子吸收体，具有复杂的能级和高效量子光的介质，因而提高了经济效率。

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