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1. 发明授权

US09234814B1 Automated re-focusing of interferometric reference mirror 有权
标题翻译：干涉式参考镜自动重新聚焦
公开(公告)号：US09234814B1
公开(公告)日：2016-01-12
申请号：US13925708
申请日：2013-06-24
申请人： Erik Novak , Colin Farrell , Bryan Guenther
发明人： Erik Novak , Colin Farrell , Bryan Guenther
IPC分类号： G01B9/02 , G01M11/02
CPC分类号： G01B9/02063 , G01B9/02067 , G01B9/02072 , G01M11/02
摘要： A reference surface is used to develop an empirical plot between a parameter of interest, such as roughness or modulation, and the position of the reference mirror in an interferometer by repeating measurements of the reference surface at different positions of the reference mirror so as to identify the in-focus position of the reference mirror. Serial quality-control measurements of samples of interest are carried out with the reference mirror in such in-focus position until a predetermined quality-control event triggers an automated system re-calibration by re-measuring the reference surface and, if the result does not correspond to the in-focus position of the reference mirror according to the plot, by finding a new in-focus position for the reference mirror using the same plot or, alternatively, a new similarly produced plot. Sample measurements are then resumed with the mirror placed at that new position.
摘要翻译：参考表面用于通过重复在参考镜的不同位置处的参考表面的测量来形成感兴趣参数（例如粗糙度或调制）与参考镜在干涉仪中的位置之间的经验图，以便识别参考镜的对焦位置。所关注的样本的串行质量控制测量使用参考反射镜在这样的对焦位置进行，直到预定的质量控制事件通过重新测量参考表面触发自动系统重新校准，并且如果结果不对应于根据绘图的参考镜的对焦位置，通过使用相同的曲线找到用于参考镜的新的对焦位置，或者替代地，新的类似产生的图。然后用放置在该新位置的反射镜恢复样品测量。

2. 发明申请

US20060120088A1 Mounting mechanism for compensating optics in interferometer 有权
标题翻译：干涉仪补偿光学元件的安装机构
公开(公告)号：US20060120088A1
公开(公告)日：2006-06-08
申请号：US11061178
申请日：2005-02-18
申请人： Bryan Guenther , Erik Novak
发明人： Bryan Guenther , Erik Novak
IPC分类号： F21V15/00
CPC分类号： G01B11/2441
摘要： An interferometric profiler includes an opening adapted to receive a removable compensating element in the reference arm. The compensating element is mounted on a holder adapted for slidable engagement within the opening. A retaining mechanism keeps the holder firmly in place in the opening. The reference mirror of the profiler is mounted on a slidable stage urged away from the compensating element by a spring-loaded mechanism. A knob is provided to manually push the stage inward to its operating position proximate to the compensating element. A stop ensures that the travel of the stage is limited to a safe distance from the compensating element and a lock is provided to releasably hold the stage in place during use. Multiple objectives with different magnifications may be coupled to the module for alternative use according to the needs of particular applications. An illumination module may also be coupled to the reference-arm module.
摘要翻译：干涉分析器包括适于接收参考臂中的可移除补偿元件的开口。补偿元件安装在适于在开口内可滑动接合的保持器上。保持机构将支架牢固地保持在开口中的适当位置。轮廓仪的参考反射镜安装在通过弹簧加载机构推动远离补偿元件的可滑动平台上。提供旋钮以手动地将平台向内推入其靠近补偿元件的操作位置。止动件确保了台架的行程被限制在与补偿元件的安全距离，并且提供锁以在使用期间可释放地将台架保持在适当位置。可以根据特定应用的需要将具有不同倍率的多个目标耦合到模块以供替代使用。照明模块也可以耦合到参考臂模块。

3. 发明授权

US09303631B1 Fixture for flattening sample in optical metrology 有权
标题翻译：在光学测量中平坦化样品的夹具
公开(公告)号：US09303631B1
公开(公告)日：2016-04-05
申请号：US13798865
申请日：2013-03-13
申请人： Bryan Guenther
发明人： Bryan Guenther
IPC分类号： F04B7/00 , B30B1/38 , G03B27/20
CPC分类号： G01N1/286 , B30B1/007 , B30B1/38 , F04B37/10 , F04B53/14 , G01B5/0004 , G01B9/00 , G01B9/02 , G03B27/20
摘要： A vacuum mechanism for flattening bowed panel samples includes a support structure with coplanar support elements and a fixture with a movable component actuated by a vacuum source. The movable component has a top surface disposed above the support elements when no vacuum is applied and is capable of being drawn to a substantially coplanar position with the support elements when actuated by the vacuum source. The top surface is fluidly connected to the vacuum source and adapted to adhere to the overlaying surface of the sample when vacuum is applied, thereby flattening the sample when the movable component is drawn in by the same vacuum source.
摘要翻译：用于压扁弯曲面板样品的真空机构包括具有共面支撑元件的支撑结构和具有由真空源致动的可移动部件的固定装置。可移动部件在没有施加真空时设置在支撑元件上方的上表面，并且当由真空源致动时能够将支撑元件拉到基本共面的位置。顶表面流体连接到真空源并适于在施加真空时粘附到样品的覆盖表面，从而当可移动部件被相同的真空源吸入时使样品变平。

4. 发明授权

US10006839B2 Method for flattening sample in optical metrology 有权
公开(公告)号：US10006839B2
公开(公告)日：2018-06-26
申请号：US15060385
申请日：2016-03-03
申请人： Bryan Guenther
发明人： Bryan Guenther
IPC分类号： B30B1/38 , G01N1/28 , F04B37/10 , F04B53/14 , G01B9/02 , G03B27/20 , B30B1/00 , G01B9/00
CPC分类号： G01N1/286 , B30B1/007 , B30B1/38 , F04B37/10 , F04B53/14 , G01B5/0004 , G01B9/00 , G01B9/02 , G03B27/20
摘要： A vacuum mechanism for flattening bowed panel samples includes a support structure with coplanar support elements and a fixture with a movable component actuated by a vacuum source. The movable component has a top surface disposed above the support elements when no vacuum is applied and is capable of being drawn to a substantially coplanar position with the support elements when actuated by the vacuum source. The top surface is fluidly connected to the vacuum source and adapted to adhere to the overlaying surface of the sample when vacuum is applied, thereby flattening the sample when the movable component is drawn in by the same vacuum source.

5. 发明授权

US09442133B1 Edge electrode for characterization of semiconductor wafers 有权
标题翻译：用于表征半导体晶片的边缘电极
公开(公告)号：US09442133B1
公开(公告)日：2016-09-13
申请号：US13895654
申请日：2013-05-16
申请人： Dong Chen , Bryan Guenther , Henry Fagg , Jaime Duran
发明人： Dong Chen , Bryan Guenther , Henry Fagg , Jaime Duran
IPC分类号： G01R1/06 , G01R31/44 , G01R31/26 , G01R31/02 , G09G3/00 , G01R1/073
CPC分类号： G01R1/06 , G01R1/06761 , G01R1/073 , G01R3/00 , G01R31/025 , G01R31/2635 , G01R31/2648 , G01R31/2656 , G01R31/44 , G09G3/006
摘要： A conductive conformable braided wire is used as the edge electrode for material characterization of a semiconductor wafer. The braided wire is adapted to contact the perimeter of the n-GaN layer using a retractable support structure that alternately places the electrode in contact with the edge of the n-GaN layer and retracts it during repeated cycles of operation to test a plurality of similar wafers. The braided wire produced a very stable and higher electrical contact than any prior-art edge electrode.
摘要翻译：导电适配编织线被用作用于半导体晶片的材料表征的边缘电极。编织线适于使用可伸缩的支撑结构接触n-GaN层的周边，所述可伸缩的支撑结构交替地使电极与n-GaN层的边缘接触并且在重复的操作周期期间将其退回以测试多个类似的晶圆编织线产生比任何现有技术的边缘电极非常稳定和更高的电接触。

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