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    • 3. 发明申请
    • METHODS FOR FORMING OPTOELECTRONIC DEVICES INCLUDING HETEROJUNCTION
    • 用于形成包括异位的光电器件的方法
    • US20120252159A1
    • 2012-10-04
    • US13451439
    • 2012-04-19
    • Hui NIEBrendan M. KAYESIsik C. KIZILYALLI
    • Hui NIEBrendan M. KAYESIsik C. KIZILYALLI
    • H01L31/0304
    • H01L31/0735H01L31/022441H01L31/1896Y02E10/52Y02E10/544
    • Embodiments generally relate to optoelectronic semiconductor devices such as photovoltaic cells. In one aspect, a method for forming a device includes forming an absorber layer made of gallium arsenide (GaAs) and having one type of doping, and forming an emitter layer made of a different material and having a higher bandgap than the absorber layer. An intermediate layer can be formed between emitter and absorber layers. A heterojunction and p-n junction are formed between the emitter layer and the absorber layer, where the p-n junction is formed at least partially within the different material at a location offset from the heterojunction. A majority of the absorber layer can be outside of a depletion region formed by the p-n junction. The p-n junction causes a voltage to be generated in the cell in response to the cell being exposed to light at a front side.
    • 实施例通常涉及诸如光伏电池的光电半导体器件。 一方面,用于形成器件的方法包括形成由砷化镓(GaAs)制成并具有一种类型的掺杂的吸收层,并形成由不同材料制成并具有比吸收层更高的带隙的发射极层。 可以在发射极和吸收层之间形成中间层。 在发射极层和吸收层之间形成异质结和p-n结,其中在与异质结偏离的位置处至少部分地在不同的材料内形成p-n结。 吸收层的大部分可以在由p-n结形成的耗尽区的外部。 p-n结导致电池响应于电池暴露于正面的光而产生电压。
    • 4. 发明申请
    • OPTOELECTRONIC DEVICES INCLUDING HETEROJUNCTION AND INTERMEDIATE LAYER
    • 光电器件包括异常和中间层
    • US20120204942A1
    • 2012-08-16
    • US13451455
    • 2012-04-19
    • Hui NIEBrendan M. KAYESIsik C. KIZILYALLI
    • Hui NIEBrendan M. KAYESIsik C. KIZILYALLI
    • H01L31/0352
    • H01L31/0735H01L31/022441H01L31/1896Y02E10/52Y02E10/544
    • Embodiments generally relate to optoelectronic semiconductor devices such as solar cells. In one aspect, a device includes an absorber layer made of gallium arsenide (GaAs) and having only one type of doping. An emitter layer is located closer than the absorber layer to a back side of the device and is made of a different material and having a higher bandgap than the absorber layer. A heterojunction is formed between the emitter layer and the absorber layer, and a p-n junction is formed between the emitter layer and the absorber layer and at least partially within the different material at a location offset from the heterojunction. An intermediate layer is located between the absorber layer and the emitter layer and provides the offset of the p-n junction from the heterojunction, and includes a graded layer and an ungraded back window layer.
    • 实施例通常涉及诸如太阳能电池的光电半导体器件。 在一个方面,器件包括由砷化镓(GaAs)制成并且仅具有一种掺杂类型的吸收层。 发射极层位于比器件的背面靠近吸收体层,并且由不同的材料制成并具有比吸收层更高的带隙。 在发射极层和吸收层之间形成异质结,并且在偏离异质结的位置处,在发射极层和吸收层之间形成p-n结,并且至少部分地在不同的材料内形成p-n结。 中间层位于吸收层和发射极层之间,并且提供p-n结与异质结的偏移,并且包括渐变层和未分级的后窗层。
    • 5. 发明申请
    • OPTOELECTRONIC DEVICES INCLUDING HETEROJUNCTION
    • 包括异常的光电器件
    • US20120104460A1
    • 2012-05-03
    • US12939077
    • 2010-11-03
    • Hui NIEBrendan M. KAYESIsik C. KIZILYALLI
    • Hui NIEBrendan M. KAYESIsik C. KIZILYALLI
    • H01L31/109H01L21/04
    • H01L31/0735H01L31/022441H01L31/1896Y02E10/52Y02E10/544
    • Embodiments of the invention generally relate to optoelectronic semiconductor devices such as photovoltaic devices including solar cells. In one aspect, an optoelectronic semiconductor device includes an absorber layer made of gallium arsenide (GaAs) and having only one type of doping. An emitter layer is located closer than the absorber layer to a back side of the device, the emitter layer made of a different material than the absorber layer and having a higher bandgap than the absorber layer. A heterojunction formed between the emitter layer and the absorber layer, and a p-n junction is formed between the emitter layer and the absorber layer and at least partially within the different material at a location offset from the heterojunction. The p-n junction causes a voltage to be generated in the device in response to the device being exposed to light at a front side of the device.
    • 本发明的实施例一般涉及光电半导体器件,例如包括太阳能电池的光伏器件。 在一个方面,光电子半导体器件包括由砷化镓(GaAs)制成并且仅具有一种掺杂类型的吸收层。 发射极层位于比器件的背面靠近吸收体层,发射极层由与吸收层不同的材料制成并具有比吸收层更高的带隙。 在发射极层和吸收层之间形成的异质结和在发射极层和吸收层之间形成p-n结,并且至少部分地在异质结偏离的位置处在不同的材料内。 p-n结导致器件响应于器件暴露于器件正面的光而产生电压。