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    • 3. 发明授权
    • Method for overlay metrology of low contrast features
    • 低对比度特征叠加测量方法
    • US06724479B2
    • 2004-04-20
    • US09967176
    • 2001-09-28
    • Shoaib Hasan Zaidi
    • Shoaib Hasan Zaidi
    • G01B1100
    • G03F7/70633G01J9/00
    • A wavefront sensing tool, such as a Shack-Hartmann detector, detects alignment features in a semiconductor wafer that might otherwise be undetectable using conventional optical tools, such as a microscope. This is particularly advantageous for alignment features formed in photoresist with a height that is less than one fourth the illuminating light's wavelength. The wavefront sensing tool can be used in conjunction with conventional optical tools and a composite alignment image can be formed from the two tools. For higher sensitivity, the light reflected off the wafer can be magnified, with e.g. a telescopic lens, prior to impinging upon the wavefront sensing tool. The composite image can be generated by one or both of the tools or by a computer coupled to the tools.
    • 诸如Shack-Hartmann检测器的波前感测工具检测半导体晶片中的对准特征,否则可能使用诸如显微镜的常规光学工具不可检测。 这对于具有低于照明光的波长的四分之一的高度的光致抗蚀剂中形成的对准特征是特别有利的。 波前感测工具可以与常规光学工具结合使用,并且可以从两种工具形成复合对准图像。 为了更高的灵敏度,从晶片反射的光可以被放大。 一个伸缩透镜,在撞击波前感测工具之前。 合成图像可以由一个或两个工具或耦合到工具的计算机生成。