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1. 发明申请

US20080192215A1 Optical element unit for exposure processes 有权
标题翻译：用于曝光过程的光学元件单元
公开(公告)号：US20080192215A1
公开(公告)日：2008-08-14
申请号：US12008879
申请日：2008-01-15
申请人： Bernhard Gellrich , Jens Kugler , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Dieter Schmerek , Detlev Mueller , Thomas Schletterer
发明人： Bernhard Gellrich , Jens Kugler , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Dieter Schmerek , Detlev Mueller , Thomas Schletterer
IPC分类号： G03B27/52 , G02B7/02
CPC分类号： G02B27/0006 , G02B1/18 , G02B7/023 , G03B27/52 , G03F7/70341 , G03F7/70808 , G03F7/70833 , G03F7/70933
摘要： An optical element unit is provided comprising an optical element group; a housing receiving said optical element group and having an inner housing part and an exit end; and a purge unit connected to said housing and providing a purge medium to said inner housing part. The optical element group comprises an ultimate optical element. The ultimate optical element is located at the exit end of housing and separates the inner housing part from an environment external to the housing. The ultimate optical element and the housing define a sealing gap. The purge unit provides purge medium to the sealing gap to prevent intrusion of contaminants into the inner housing part.
摘要翻译：提供一种光学元件单元，包括光学元件组; 接收所述光学元件组并具有内部壳体部分和出口端的壳体; 以及净化单元，其连接到所述壳体并且向所述内壳体部件提供净化介质。光学元件组包括极限光学元件。最终的光学元件位于壳体的出口端处，并将内部壳体部件与壳体外部的环境分离。最终的光学元件和壳体限定了密封间隙。净化单元向密封间隙提供净化介质以防止污染物侵入内壳体部分。

2. 发明授权

US07545483B2 Optical element unit for exposure processes 有权
标题翻译：用于曝光过程的光学元件单元
公开(公告)号：US07545483B2
公开(公告)日：2009-06-09
申请号：US12008879
申请日：2008-01-15
申请人： Bernhard Gellrich , Jens Kugler , Thomas Schletterer , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Detlev Mueller , Dieter Schmerek
发明人： Bernhard Gellrich , Jens Kugler , Thomas Schletterer , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Detlev Mueller , Dieter Schmerek
IPC分类号： G03B27/54
CPC分类号： G02B27/0006 , G02B1/18 , G02B7/023 , G03B27/52 , G03F7/70341 , G03F7/70808 , G03F7/70833 , G03F7/70933
摘要： An optical element unit is provided comprising an optical element group; a housing receiving said optical element group and having an inner housing part and an exit end; and a purge unit connected to said housing and providing a purge medium to said inner housing part. The optical element group comprises an ultimate optical element. The ultimate optical element is located at the exit end of housing and separates the inner housing part from an environment external to the housing. The ultimate optical element and the housing define a sealing gap. The purge unit provides purge medium to the sealing gap to prevent intrusion of contaminants into the inner housing part.
摘要翻译：提供一种光学元件单元，包括光学元件组; 接收所述光学元件组并具有内部壳体部分和出口端的壳体; 以及净化单元，其连接到所述壳体并且向所述内壳体部件提供净化介质。光学元件组包括极限光学元件。最终的光学元件位于壳体的出口端处，并将内部壳体部件与壳体外部的环境分离。最终的光学元件和壳体限定了密封间隙。净化单元向密封间隙提供净化介质，以防止污染物侵入内壳体部分。

3. 发明授权

US09046795B2 Optical element unit for exposure processes having sealing element 有权
标题翻译：用于具有密封元件的曝光工艺的光学元件单元
公开(公告)号：US09046795B2
公开(公告)日：2015-06-02
申请号：US12046186
申请日：2008-03-11
申请人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
发明人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G02B27/0006 , G03F7/70808 , G03F7/70825 , G03F7/70883 , G03F7/70908 , G03F7/70916 , G03F7/70933 , Y10T29/49
摘要： An optical element unit includes a first optical element module and a sealing arrangement. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially pre-vents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要翻译：光学元件单元包括第一光学元件模块和密封装置。第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。第一部件类型是光学元件，第二部件类型与第一部件类型不同。密封装置将第一模块空间分隔成第一空间和第二空间，并且至少在第一方向上基本上预先将物质从第一空间和第二空间中的一个进入另一个第一空间空间和第二空间。第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。第二模块组件至少部分地接触第二空间。

4. 发明申请

US20080225247A1 OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 有权
标题翻译：光学元件曝光过程
公开(公告)号：US20080225247A1
公开(公告)日：2008-09-18
申请号：US12046186
申请日：2008-03-11
申请人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
发明人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
IPC分类号： G03B27/54 , G03B27/52 , G02B23/16
CPC分类号： G03F7/7015 , G02B27/0006 , G03F7/70808 , G03F7/70825 , G03F7/70883 , G03F7/70908 , G03F7/70916 , G03F7/70933 , Y10T29/49
摘要： An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要翻译：公开了一种包括第一光学元件模块和密封装置的光学元件单元。第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。第一部件类型是光学元件，第二部件类型与第一部件类型不同。密封装置将第一模块空间分隔成第一空间和第二空间，并至少在第一方向上基本上防止物质从第一空间和第二空间中的一个进入第一空间和第二个空间。第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。第二模块组件至少部分地接触第二空间。

5. 发明授权

US08376559B2 Lens module comprising at least one exchangeable optical element 有权
标题翻译：透镜模块包括至少一个可交换光学元件
公开(公告)号：US08376559B2
公开(公告)日：2013-02-19
申请号：US13346430
申请日：2012-01-09
申请人： Guido Soyez , Stephan Back , Joachim Buechele , Julian Kaller , Guido Limbach , Harald Woelfle
发明人： Guido Soyez , Stephan Back , Joachim Buechele , Julian Kaller , Guido Limbach , Harald Woelfle
IPC分类号： G02B1/00
CPC分类号： G02B27/0006 , G02B7/14 , G03F7/7015 , G03F7/70825 , G03F7/70933
摘要： Disclosed is a lens module, especially a projection lens for semiconductor lithography, comprising at least one replaceable optical element that is disposed in a lens housing. At least one gas exchange device is positioned in an area of the replaceable optical element in such a way that a receiving zone for the replaceable optical element can be flushed when the optical element is replaced.
摘要翻译：公开了一种透镜模块，特别是用于半导体光刻的投影透镜，包括设置在透镜壳体中的至少一个可替换的光学元件。至少一个气体交换装置被定位在可更换光学元件的区域中，使得当更换光学元件时可更换光学元件的接收区域被冲洗。

6. 发明申请

US20080137192A1 Lens Module Comprising at Least One Exchangeable Optical Element 有权
标题翻译：透镜模块包括最少一个可交换光学元件
公开(公告)号：US20080137192A1
公开(公告)日：2008-06-12
申请号：US11722595
申请日：2005-12-23
申请人： Guido Soyez , Stephan Back , Joachim Buechele , Julian Kaller , Guido Limbach , Harald Woelfle
发明人： Guido Soyez , Stephan Back , Joachim Buechele , Julian Kaller , Guido Limbach , Harald Woelfle
IPC分类号： G02B7/14
CPC分类号： G02B27/0006 , G02B7/14 , G03F7/7015 , G03F7/70825 , G03F7/70933
摘要： Disclosed is a lens module, especially a projection lens for semiconductor lithography, comprising at least one replaceable optical element that is disposed in a lens housing. At least one gas exchange device is positioned in an area of the replaceable optical element in such a way that a receiving zone for the replaceable optical element can be flushed when the optical element is replaced.
摘要翻译：公开了一种透镜模块，特别是用于半导体光刻的投影透镜，包括设置在透镜壳体中的至少一个可替换的光学元件。至少一个气体交换装置被定位在可更换光学元件的区域中，使得当更换光学元件时可更换光学元件的接收区域被冲洗。

7. 发明授权

US08092029B2 Lens module comprising at least one exchangeable optical element 有权
标题翻译：透镜模块包括至少一个可交换光学元件
公开(公告)号：US08092029B2
公开(公告)日：2012-01-10
申请号：US11722595
申请日：2005-12-23
申请人： Guido Soyez , Stephan Back , Joachim Buechele , Julian Kaller , Guido Limbach , Harald Woelfle
发明人： Guido Soyez , Stephan Back , Joachim Buechele , Julian Kaller , Guido Limbach , Harald Woelfle
IPC分类号： G02B1/00
CPC分类号： G02B27/0006 , G02B7/14 , G03F7/7015 , G03F7/70825 , G03F7/70933
摘要： Disclosed is a lens module, especially a projection lens for semiconductor lithography, comprising at least one replaceable optical element that is disposed in a lens housing. At least one gas exchange device is positioned in an area of the replaceable optical element in such a way that a receiving zone for the replaceable optical element can be flushed when the optical element is replaced.
摘要翻译：公开了一种透镜模块，特别是用于半导体光刻的投影透镜，包括设置在透镜壳体中的至少一个可替换的光学元件。至少一个气体交换装置被定位在可更换光学元件的区域中，使得当更换光学元件时可更换光学元件的接收区域被冲洗。

8. 发明授权

US08248578B2 Projection exposure method and projection exposure system therefor 有权
标题翻译：投影曝光方法和投影曝光系统
公开(公告)号：US08248578B2
公开(公告)日：2012-08-21
申请号：US12410640
申请日：2009-03-25
申请人： Julian Kaller , Toralf Gruner
发明人： Julian Kaller , Toralf Gruner
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70191 , G03F7/70575 , G03F7/70941
摘要： In a projection exposure method, primary radiation having a center wavelength λ is generated and guided through an illumination system along an illumination path and through a projection system along a projection path. The center wavelength is varied within a wavelength variation range Δλ having a lower limit λMIN≦λ and an upper limit λMAX≧λ. A specific absorption coefficient k(λ) of at least one gaseous absorbent species selected from the group consisting of oxygen (O2), ozone (O3) and water vapor (H2O) present in at least one gas-filled space along at least one of the illumination path and the projection path varies between a minimum absorption coefficient kMIN and a maximum absorption coefficient kMAX within the wavelength variation range such that an absorption ratio (kMAX/kMIN) exceeds 10. A concentration of the absorbent species within the gas-filled space is controlled such that an overall absorption variation effected by the absorbent species for all rays running along differing ray paths towards the image field is maintained below a predetermined absorption variation threshold value.
摘要翻译：在投影曝光方法中，产生具有中心波长λ的一次辐射并沿着照明路径通过照明系统并沿着投影路径通过投影系统。中心波长在具有下限λMIN＆nlE;λ和上限λMAX≥λ的波长变化范围＆Dgr;λ内变化。至少一种选自氧（O 2），臭氧（O 3）和水蒸汽（H 2 O）的气体吸收物质的比吸收系数k（λ）存在于至少一个气体填充空间中，照射路径和投影路径在波长变化范围内的最小吸收系数kMIN和最大吸收系数kMAX之间变化，使得吸收比（kMAX / kMIN）超过10。气体填充空间内的吸收物质的浓度被控制为使得沿着沿着不同光线路朝着图像场行进的所有射线的吸收物质的整体吸收变化保持在预定吸收变化阈值以下。

9. 发明授权

US07443500B2 Apparatus for scattered light inspection of optical elements 有权
标题翻译：用于光学元件的散射光检查的装置
公开(公告)号：US07443500B2
公开(公告)日：2008-10-28
申请号：US10886717
申请日：2004-07-09
申请人： Julian Kaller
发明人： Julian Kaller
IPC分类号： G01N21/00
CPC分类号： G01M11/025 , G01M11/0242
摘要： An apparatus for scattered light inspection of optical elements, having a light-generating unit (2) for generating light that is irradiated onto the optical element (9) respectively to be inspected, and a detector (4) for detecting scattered light (14) that is emitted by the optical element during irradiation. At least a portion of the components (2 to 8, 12) of the inspection apparatus are arranged on or in a housing/holding unit (1) that is dimensioned such that it can be held by a reticle holder of a lithography exposure machine, or all the components of the inspection apparatus are arranged on or in a common housing/holding unit that is portable and/or mobile. The apparatus may be used, e.g., for scattered light inspection of the surface of a lens, closest to the field, of a projection objective of a microlithography projection exposure machine.
摘要翻译：一种用于光学元件的散射光检查的装置，具有用于产生照射到要检查的光学元件（9）上的光的发光单元（2）和用于检测散射光的检测器（4）在照射期间由光学元件发射。检查装置的部件（2至8,12）的至少一部分布置在外壳/保持单元（1）上或外壳/保持单元（1）中，外壳/保持单元（1）的尺寸使得其可被光刻曝光机的掩模版保持器保持，或者检查装置的所有部件被布置在便携式和/或移动式的公共外壳/保持单元上或其中。该装置可以用于例如微光投影曝光机的投影物镜的最靠近场的透镜的表面的散射光检查。

10. 发明申请

US20050046832A1 Apparatus for scattered light inspection of optical elements 有权
标题翻译：用于光学元件的散射光检查的装置
公开(公告)号：US20050046832A1
公开(公告)日：2005-03-03
申请号：US10886717
申请日：2004-07-09
申请人： Julian Kaller
发明人： Julian Kaller
IPC分类号： G01M11/02 , G01N21/88
CPC分类号： G01M11/025 , G01M11/0242
摘要： An apparatus for scattered light inspection of optical elements, having a light-generating unit (2) for generating light that is irradiated onto the optical element (9) respectively to be inspected, and a detector (4) for detecting scattered light (14) that is emitted by the optical element during irradiation. At least a portion of the components (2 to 8, 12) of the inspection apparatus are arranged on or in a housing/holding unit (1) that is dimensioned such that it can be held by a reticule holder of a lithography exposure machine, or all the components of the inspection apparatus are arranged on or in a common housing/holding unit that is portable and/or mobile. The apparatus may be used, e.g., for scattered light inspection of the surface of a lens, closest to the field, of a projection objective of a microlithography projection exposure machine.
摘要翻译：一种用于光学元件的散射光检查的装置，具有用于产生照射到要检查的光学元件（9）上的光的发光单元（2）和用于检测散射光的检测器（4）在照射期间由光学元件发射。检查装置的部件（2至8,12）的至少一部分布置在外壳/保持单元（1）上或外壳/保持单元（1）中，外壳/保持单元（1）的尺寸使得其可以由光刻曝光机的网状保持器保持，或者检查装置的所有部件被布置在便携式和/或移动式的公共外壳/保持单元上或其中。该装置可以用于例如微光投影曝光机的投影物镜的最靠近场的透镜的表面的散射光检查。

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