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1. 发明申请

US20090022961A1 INTERLAYER FOR LITHOGRAPHIC PLATES 审中-公开
标题翻译：层间隔层
公开(公告)号：US20090022961A1
公开(公告)日：2009-01-22
申请号：US11574022
申请日：2004-09-01
申请人： Bernd Strehmel , Harald Baumann , Eiji Hayakawa , Koji Hayashi , Jianbing Huang , Hideo Sakurai , Saraiya Shashikant , Detlef Pietsch
发明人： Bernd Strehmel , Harald Baumann , Eiji Hayakawa , Koji Hayashi , Jianbing Huang , Hideo Sakurai , Saraiya Shashikant , Detlef Pietsch
IPC分类号： B41M5/00 , G03C1/00 , B05D3/02 , B32B27/30 , G03C1/74
CPC分类号： G03F7/11 , B41N1/086 , B41N1/14 , B41N3/036 , Y10T428/24802 , Y10T428/273 , Y10T428/31515 , Y10T428/31935
摘要： Lithographic substrate comprising (a) a dimensionally stable plate- or foil-shaped support, (b) an aluminum oxide layer provided on at least one side of the support (a), and (c) an interlayer applied onto the aluminum oxide layer comprising a hydrophilic polymer comprising structural units derived from the following compounds: (a1) at least one compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (a2) at least one monomer capable of copolymerizing with the free-radical polymerizable structural unit of (a1) and furthermore comprising at least one acidic functional group with pKs
摘要翻译：平版印刷基材包括（a）尺寸稳定的板状或箔状载体，（b）设置在载体（a）的至少一侧的氧化铝层，和（c）施加到氧化铝层上的中间层，包含衍生自以下化合物的结构单元的亲水性聚合物：（a1）至少一种包含聚环氧烷链和至少一个可自由基聚合的结构单元的化合物，和（a2）至少一种能够与（a1）的自由基可聚合结构单元，还包含至少一个pK <5的酸性官能团，其中酸性官能团可以游离酸基团或盐形式存在。

2. 发明授权

US07615323B2 Lithographic printing plate precursors with oligomeric or polymeric sensitizers 失效
标题翻译：具有低聚物或聚合物敏化剂的平版印刷版前体
公开(公告)号：US07615323B2
公开(公告)日：2009-11-10
申请号：US11718809
申请日：2005-11-11
申请人： Bernd Strehmel , Harald Baumann , Udo Dwars , Detlef Pietsch , Axel Draber , Michael Mursal
发明人： Bernd Strehmel , Harald Baumann , Udo Dwars , Detlef Pietsch , Axel Draber , Michael Mursal
IPC分类号： G03F7/028 , G03F7/029 , G03F7/031 , G03F7/11 , G03F7/38 , G03F7/40 , B41C1/10
CPC分类号： G03F7/029 , G03F7/031 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/123 , Y10S430/127 , Y10S522/904 , Y10S522/913
摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.
摘要翻译：该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物，至少一种可自由基聚合的烯键式不饱和基团，（ii）至少一种敏化剂和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p1是芳族或杂芳族单元或两者的组合，使得共轭的n体系存在于结构（I）中的两个基团Z，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各自 R 3，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或1-4的整数，n的值> 1，AS是脂肪族间隔基。

3. 发明授权

US07955776B2 Photopolymer composition suitable for lithographic printing plates 有权
标题翻译：适用于平版印刷版的光聚合物组合物
公开(公告)号：US07955776B2
公开(公告)日：2011-06-07
申请号：US11995213
申请日：2006-07-03
申请人： Harald Baumann , Bernd Strehmel , Detlef Pietsch , Udo Dwars , Tanja Ebhardt , Axel Draber
发明人： Harald Baumann , Bernd Strehmel , Detlef Pietsch , Udo Dwars , Tanja Ebhardt , Axel Draber
IPC分类号： G03F7/26 , G03F7/00
CPC分类号： G03F7/027 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/368 , B41M5/41 , B41M5/42 , B41M2205/40
摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).
摘要翻译：辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）式（I）的至少一种低聚物A，其中X 1，X 2和X 3独立地选自直链或环状的C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和两个或多个上述更多的R 1，R 2和R 3独立地选自（II）和（III），条件是（1）在R1，R2和R3中的至少一个中n = 0，和（2）n> 2中的至少一个基团R 1，R 2和R 3中的至少一个，和（3）至少一个基团R 6与式（III）中的H不同。

4. 发明申请

US20080248424A1 Photopolymer Composition Suitable for Lithographic Printing Plates 有权
标题翻译：适用于平版印刷版的光聚合物组合物
公开(公告)号：US20080248424A1
公开(公告)日：2008-10-09
申请号：US11995213
申请日：2006-07-03
申请人： Harald Baumann , Bernd Strehmel , Detlef Pietsch , Udo Dwars , Tanja Ebhardt , Axel Draber
发明人： Harald Baumann , Bernd Strehmel , Detlef Pietsch , Udo Dwars , Tanja Ebhardt , Axel Draber
IPC分类号： G03F7/004 , G03F7/26
CPC分类号： G03F7/027 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/24 , B41M5/368 , B41M5/41 , B41M5/42 , B41M2205/40
摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).
摘要翻译：辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）至少一种式（I）的低聚物A，其中X 1，X 2和X 3 3独立地选自直链或环C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和上述两个或多个的组合，R 1，R 2和R 3独立地选自（II）和（III ），条件是在基团R 1，R 2和R 3 3中的至少一个中（1）n = 0，和（ 2）在R 1，R 2和R 3中的至少一个中n≥2，和（3）至少一个基团 R 6不同于式（III）中的H。

5. 发明申请

US20070269745A1 Lithographic Printing Plate Precursors with Oligomeric Or Polymeric Sensitizers 失效
标题翻译：具有低聚物或聚合物敏化剂的平版印刷版前体
公开(公告)号：US20070269745A1
公开(公告)日：2007-11-22
申请号：US11718809
申请日：2005-11-11
申请人： Bernd Strehmel , Harald Baumann , Udo Dwars , Detlef Pietsch , Axel Draber , Michael Mursal
发明人： Bernd Strehmel , Harald Baumann , Udo Dwars , Detlef Pietsch , Axel Draber , Michael Mursal
IPC分类号： G03C1/00
CPC分类号： G03F7/029 , G03F7/031 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/123 , Y10S430/127 , Y10S522/904 , Y10S522/913
摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer
摘要翻译：该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物，至少一种可自由聚合的烯属不饱和基团，（ii）至少一种敏化剂，和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于，所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p 1是芳族或杂芳族单元或两者的组合，使得在结构（I）中的两个基团Z之间存在共轭n系，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各R R 4，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或 1〜4的整数，n的值为1，AS为脂肪族间隔物

6. 发明申请

US20070254238A1 Method for Making a Lithographic Plate 失效
标题翻译：制作平版印刷版的方法
公开(公告)号：US20070254238A1
公开(公告)日：2007-11-01
申请号：US11573916
申请日：2005-08-23
申请人： Bernd Strehmel , Harald Baumann , Ulrich Fiebag , Tanja Ebhradt , Detlef Pietsch
发明人： Bernd Strehmel , Harald Baumann , Ulrich Fiebag , Tanja Ebhradt , Detlef Pietsch
IPC分类号： G03C1/00
CPC分类号： B41N3/08
摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs
摘要翻译：一种成像的平版印刷版的后处理方法，包括：（a）在平版印刷基板上提供包括图像区域和非图像区域的平版印刷版; （b）使步骤（a）的平版印刷版与包含亲水聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个自由基的结构单元的化合物 - 可聚合的，和（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个具有pK <5的酸性官能团的单体，其中酸性官能团可以作为游离酸基团或以盐的形式存在; （c）干燥。

7. 发明授权

US07829261B2 Method for making a lithographic plate 失效
标题翻译：用于生产平版印刷版的方法
公开(公告)号：US07829261B2
公开(公告)日：2010-11-09
申请号：US11573916
申请日：2005-08-23
申请人： Bernd Strehmel , Harald Baumann , Ulrich Fiebag , Tanja Ebhardt , Detlef Pietsch
发明人： Bernd Strehmel , Harald Baumann , Ulrich Fiebag , Tanja Ebhardt , Detlef Pietsch
IPC分类号： B41N1/00 , G03F7/00 , G03F7/26
CPC分类号： B41N3/08
摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs
摘要翻译：一种成像的平版印刷版的后处理方法，包括：（a）在平版印刷基板上提供包括图像区域和非图像区域的平版印刷版; （b）使步骤（a）的平版印刷版与包含亲水聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个自由基的结构单元的化合物 - 可聚合的，和（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个pK <5的酸性官能团的单体，其中酸性官能团可以作为游离基酸基或盐的形式; （c）干燥。

8. 发明授权

US08652759B2 Processing of lithographic printing plates with a developer solution containing a hydrophilic polymer 有权
标题翻译：用含有亲水性聚合物的显影液处理平版印刷版
公开(公告)号：US08652759B2
公开(公告)日：2014-02-18
申请号：US12669064
申请日：2008-08-21
申请人： Bernd Strehmel , Christopher D. Simpson , Oliver Plestert , Harald Baumann
发明人： Bernd Strehmel , Christopher D. Simpson , Oliver Plestert , Harald Baumann
IPC分类号： G03F7/00 , G03F7/32 , B41N1/08 , B41M5/00
CPC分类号： G03F7/322
摘要： A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer which comprises (m1) primary, secondary and/or tertiary amino groups, and (m2) acid groups selected from —COOH, —SO3H, —PO2H and —PO3H2, and (m3) optionally alkylene oxide units —(CHR1—CH2—O)p—, wherein R1 is H or —CH3 and p is an integer from 1 to 50.
摘要翻译：描述了一种用于生产成像平版印刷版的方法，其中显影剂包括亲水性聚合物，其包含（m1）伯，仲和/或叔氨基，和（m2）选自-COOH，-SO3H，-PO2H 和-PO 3 H 2，和（m 3）任选的环氧烷单元 - （CHR 1 -CH 2 -O）p - ，其中R 1是H或-CH 3，p是1至50的整数。

9. 发明申请

US20080092763A1 Method for Making a Lithographic Plate 失效
标题翻译：制作平版印刷版的方法
公开(公告)号：US20080092763A1
公开(公告)日：2008-04-24
申请号：US11573901
申请日：2005-08-25
申请人： Bernd Strehmel , Ulrich Fiebag , Tanja Ebhardt , Harald Baumann
发明人： Bernd Strehmel , Ulrich Fiebag , Tanja Ebhardt , Harald Baumann
IPC分类号： G03F7/26 , B41N3/00
CPC分类号： B41C1/10 , B41C1/1008 , B41C1/1016 , B41C1/1058 , B41C1/1066 , B41C1/1091 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41N3/08 , G03F7/405
摘要： A process for the post-treatment of an imaged lithographic printing plate comprises (a) Contacting a lithographic printing plate having image areas and non-image areas on a lithographic substrate with a solution comprising at least one phosphono-substituted siloxane of the following general formula (I) that is defined herein and (b) drying.
摘要翻译：用于后成像平版印刷版的后处理的方法包括（a）在平版印刷基底上与包含至少一种以下通式的膦酰取代的硅氧烷的溶液接触在平版印刷基底上具有图像区域和非图像区域的平版印刷版（I），（b）干燥。

10. 发明授权

US08119331B2 Photopolymer composition usable for lithographic plates 有权
标题翻译：可用于平版印刷版的光聚合物组合物
公开(公告)号：US08119331B2
公开(公告)日：2012-02-21
申请号：US12159287
申请日：2007-01-02
申请人： Harald Baumann , Bernd Strehmel , Udo Dwars , Ursula Muller
发明人： Harald Baumann , Bernd Strehmel , Udo Dwars , Ursula Muller
IPC分类号： G03F7/09 , G03F7/30 , G03F7/004
CPC分类号： G03F7/027 , B41C1/1008 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41M5/368
摘要： Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.
摘要翻译：辐射敏感元件包括基材和辐射敏感涂层，其包含（a）选自光引发剂和敏化剂/共引发剂体系中的至少一种成分，其吸收波长在250-1200nm范围内的辐射; （b）由三异氰酸酯与（i）至少一种丙烯酸或甲基丙烯酸单体与两个游离OH基团反应得到的至少一种平均分子量在3,500-9,000范围内的可自由基聚合的低聚物A，至少一种（甲基）丙烯酸基和（ii）分子中至少一种含有一个OH基，至少一个（甲基）丙烯酸基和至少一个聚（环氧烷）链的化合物，其中（甲基）丙烯酸单体基于具有OH官能度的（甲基）丙烯酸酯化合物的总量，i）的存在量为2至20摩尔％。

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