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    • 3. 发明授权
    • Field emission device and method for the conditioning thereof
    • 场致发射装置及其调理方法
    • US06573642B1
    • 2003-06-03
    • US09491357
    • 2000-01-26
    • Paul VonAllmenBernard F. CollAlbert Alec Talin
    • Paul VonAllmenBernard F. CollAlbert Alec Talin
    • H01J1304
    • H01J1/3044H01J2201/30426
    • A field emission device (100) includes an electron emitter structure (105) having a deuteride layer (108), which defines a surface (109) of electron emitter structure (105). Deuteride layer (108) is disposed upon an electron emitter (106), which is made from a metal. Deuteride layer (108) is a deuteride of the metal from which electron emitter (106) is made. A method for conditioning field emission device (100) includes the step of providing a contaminated cathode structure (137), which has a contaminated emitter structure (138). The method further includes the step of causing deuterium to react with a metal oxide layer (140) of emitter structure (138), so that the deuterium replaces the oxygen of metal oxide layer (140).
    • 场发射器件(100)包括具有限定电子发射器结构(105)的表面(109)的氘化层(108)的电子发射器结构(105)。 氘化层(108)设置在由金属制成的电子发射器(106)上。 氘化层(108)是制造电子发射体(106)的金属的氘化物。一种用于调节场发射装置(100)的方法包括提供污染的阴极结构(137)的步骤,该污染阴极结构具有污染的发射体结构 (138)。 该方法还包括使氘与发射极结构(138)的金属氧化物层(140)反应的步骤,使得氘代替金属氧化物层(140)的氧。
    • 8. 发明授权
    • Method for fabricating an electron-emissive film
    • 电子发射膜的制造方法
    • US06290564B1
    • 2001-09-18
    • US09408699
    • 1999-09-30
    • Albert Alec TalinBernard F. CollKenneth A. DeanJames E. JaskieEmmett Howard
    • Albert Alec TalinBernard F. CollKenneth A. DeanJames E. JaskieEmmett Howard
    • H01J902
    • H01J9/025B82Y10/00H01J2201/30469
    • A method for fabricating an electron-emissive film (100) includes the steps of providing a powder (124), which has a plurality of carbon nanotubes (104); providing a substrate (102), a surface (103) of which defines a plurality of interstices (107); and dry spraying powder (124) onto surface (103) of substrate (102). The adjustable parameters of the dry spraying step include a separation distance of a spray nozzle (120) from surface (103), a spray angle between a spray (121) and surface (103), and a nozzle pressure at an opening (123) of spray nozzle (120). The separation distance, spray angle, and nozzle pressure are selected to achieve, for example, uniformity of electron-emissive film (100) and adhesion of carbon nanotubes (104) to substrate (102). They can also be selected to achieve a perpendicular orientation of a length-wise axis (105) of each of carbon nanotubes (104) with respect to surface (103) and to achieve the break down of aggregates of carbon nanotubes (104), so that carbon nanotubes (104) are deposited on substrate (102) substantially as individually isolated carbon nanotubes (104).
    • 制造电子发射膜(100)的方法包括提供具有多个碳纳米管(104)的粉末(124)的步骤。 提供衬底(102),其表面(103)限定多个间隙(107); 和将喷雾粉末(124)喷涂到基材(102)的表面(103)上。 干喷涂步骤的可调节参数包括喷嘴(120)与表面(103)的间隔距离,喷雾(121)和表面(103)之间的喷射角度以及开口处的喷嘴压力(123) 选择分离距离,喷雾角度和喷嘴压力,以实现例如电子发射膜(100)的均匀性和碳纳米管(104)与基底(102)的粘附。 还可以选择它们以实现碳纳米管(104)中每个碳纳米管(104)相对于表面(103)的纵向轴线(105)的垂直取向,并且实现碳纳米管(104)的聚集体的分解,因此 基本上作为单独分离的碳纳米管(104)将碳纳米管(104)沉积在基板(102)上。