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    • 9. 发明授权
    • Method to fabricate a mould for lithography by nano-imprinting
    • 通过纳米压印制造光刻模具的方法
    • US08486514B2
    • 2013-07-16
    • US12715738
    • 2010-03-02
    • Stéfan LandisYves Morand
    • Stéfan LandisYves Morand
    • B32B3/28B32B3/30
    • G03F7/0002B29C33/42B82Y10/00B82Y40/00G03F7/0017Y10T428/24479Y10T428/2457Y10T428/24744
    • A nano-imprint device including at least: a substrate, having a surface, on the substrate, a plurality of nano-trenches parallel two by two, each nano-trench extending in a longitudinal direction and being delimited laterally by side walls, the nano-trenches and the side walls being directed substantially perpendicular to the surface of the substrate, each nano-trench comprising a bottom surface with at least one first and one second level in a direction perpendicular to the substrate, respectively of depth h1 and h2>h1, measured relative to the top of the side walls, and the bottom surfaces of the nano-trenches, of the least deep level (h1) being in a first type of material, the side walls being in a second type of material.
    • 一种纳米压印装置,其至少包括:在所述基板上具有平行两个的多个纳米沟槽的表面的基板,每个纳米沟槽在纵向方向上延伸并由侧壁横向限定,所述纳米沟槽 三角形并且所述侧壁基本上垂直于所述衬底的表面定向,每个纳米沟槽包括底面,所述底表面在垂直于所述衬底的方向上具有至少一个第一和第二水平面,所述方向分别具有深度h1和h2> h1 (h1)处于第一类型的材料中,相对于侧壁的顶部和纳米沟槽的底表面测量的最小深度(h1)的底表面是第二类型的材料。