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1. 发明申请

US20120214273A1 ANGLED MULTI-STEP MASKING FOR PATTERNED IMPLANTATION 有权
标题翻译：用于图形植入的多边形掩模
公开(公告)号：US20120214273A1
公开(公告)日：2012-08-23
申请号：US13029840
申请日：2011-02-17
申请人： Benjamin Riordon , Nicholas Bateman , Atul Gupta
发明人： Benjamin Riordon , Nicholas Bateman , Atul Gupta
IPC分类号： H01L21/265
CPC分类号： H01L21/26586 , H01L21/266 , H01L31/068 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of tilting a mask to perform a pattern implant of a substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. The mask and substrate are tilted at a first angle relative to the incoming ion beam. After the substrate is exposed to the ion beam, the mask and substrate are tilted at a second angle relative to the ion beam and a subsequent implant step is performed. Through the selection of the aperture size and shape, the cross-section of the mask, the distance between the mask and the substrate and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions.
摘要翻译：公开了一种倾斜掩模以执行衬底的图案植入的改进方法。掩模具有多个孔，并且被放置在离子源和基底之间。掩模和基底相对于入射离子束以第一角度倾斜。在衬底暴露于离子束之后，掩模和衬底相对于离子束以第二角度倾斜，并且执行随后的注入步骤。通过选择孔径尺寸和形状，掩模的横截面，掩模和衬底之间的距离以及植入步骤的数量，可以产生各种种植体图案。在一些实施例中，注入图案包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。在一些实施例中，植入模式包括重掺杂区域格栅。

2. 发明申请

US20120083102A1 Integrated Shadow Mask/Carrier for Pattern Ion Implantation 失效
标题翻译：用于图案离子植入的集成阴影掩模/载体
公开(公告)号：US20120083102A1
公开(公告)日：2012-04-05
申请号：US12895927
申请日：2010-10-01
申请人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
发明人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
IPC分类号： H01L21/71 , H01J37/20
CPC分类号： H01L21/677 , H01J37/3171 , H01J2237/31711 , H01L21/68735 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。此外，公开了改进的基板载体。通常用于承载衬底的载体被修改为用作图案化植入物的荫罩。在一些实施例中，可以使用载体创建各种图案，使得可以通过用载体改变载体或位置来在基板上执行不同的工艺步骤。此外，由于基板与载体的对准是关键的，所以载体可以包含对准特征以确保基板正确地定位在载体上。在一些实施例中，使用重力来将衬底保持在载体上，因此，引导离子使得离子束朝向载体的底侧向上移动。

3. 发明申请

US20120244692A1 INTEGRATED SHADOW MASK/CARRIER FOR PATTERN ION IMPLANTATION 审中-公开
标题翻译：集成阴影掩模/载体为模式离子植入
公开(公告)号：US20120244692A1
公开(公告)日：2012-09-27
申请号：US13489031
申请日：2012-06-05
申请人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
发明人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
IPC分类号： H01L21/266
CPC分类号： H01L21/677 , H01J37/3171 , H01J2237/31711 , H01L21/68735 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。此外，公开了改进的基板载体。通常用于承载衬底的载体被修改为用作图案化植入物的荫罩。在一些实施例中，可以使用载体创建各种图案，使得可以通过用载体改变载体或位置来在基板上执行不同的工艺步骤。此外，由于基板与载体的对准是关键的，所以载体可以包含对准特征以确保基板正确地定位在载体上。在一些实施例中，使用重力来将衬底保持在载体上，因此，引导离子使得离子束朝向载体的底侧向上移动。

4. 发明授权

US08765583B2 Angled multi-step masking for patterned implantation 有权
标题翻译：用于图案化植入的角度多步骤掩模
公开(公告)号：US08765583B2
公开(公告)日：2014-07-01
申请号：US13029840
申请日：2011-02-17
申请人： Benjamin Riordon , Nicholas Bateman , Atul Gupta
发明人： Benjamin Riordon , Nicholas Bateman , Atul Gupta
IPC分类号： H01L21/331 , H01L21/425 , H01L21/265
CPC分类号： H01L21/26586 , H01L21/266 , H01L31/068 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of tilting a mask to perform a pattern implant of a substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. The mask and substrate are tilted at a first angle relative to the incoming ion beam. After the substrate is exposed to the ion beam, the mask and substrate are tilted at a second angle relative to the ion beam and a subsequent implant step is performed. Through the selection of the aperture size and shape, the cross-section of the mask, the distance between the mask and the substrate and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions.
摘要翻译：公开了一种倾斜掩模以执行衬底的图案植入的改进方法。掩模具有多个孔，并且被放置在离子源和基底之间。掩模和基底相对于入射离子束以第一角度倾斜。在衬底暴露于离子束之后，掩模和衬底相对于离子束以第二角度倾斜，并且执行随后的注入步骤。通过选择孔径尺寸和形状，掩模的横截面，掩模和衬底之间的距离以及植入步骤的数量，可以产生各种种植体图案。在一些实施例中，注入图案包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。在一些实施例中，植入模式包括重掺杂区域格栅。

5. 发明授权

US08216923B2 Integrated shadow mask/carrier for patterned ion implantation 失效
标题翻译：用于图案化离子注入的集成阴影掩模/载体
公开(公告)号：US08216923B2
公开(公告)日：2012-07-10
申请号：US12895927
申请日：2010-10-01
申请人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
发明人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
IPC分类号： H01L21/425
CPC分类号： H01L21/677 , H01J37/3171 , H01J2237/31711 , H01L21/68735 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。此外，公开了改进的基板载体。通常用于承载衬底的载体被修改为用作图案化植入物的荫罩。在一些实施例中，可以使用载体创建各种图案，使得可以通过用载体改变载体或位置来在基板上执行不同的工艺步骤。此外，由于基板与载体的对准是关键的，所以载体可以包含对准特征以确保基板正确地定位在载体上。在一些实施例中，使用重力来将衬底保持在载体上，因此，引导离子使得离子束朝向载体的底侧向上移动。

6. 发明申请

US20120064661A1 CONTINUOUSLY OPTIMIZED SOLAR CELL METALLIZATION DESIGN THROUGH FEED-FORWARD PROCESS 审中-公开
标题翻译：通过进给前进过程连续优化的太阳能电池金属化设计
公开(公告)号：US20120064661A1
公开(公告)日：2012-03-15
申请号：US13300075
申请日：2011-11-18
申请人： Benjamin Riordon , Russel Low , Atul Gupta , William Weaver
发明人： Benjamin Riordon , Russel Low , Atul Gupta , William Weaver
IPC分类号： H01L31/18
CPC分类号： H01L31/022425 , H01L21/266 , H01L31/022433 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells, is disclosed. The doped regions are created on the substrate, using a mask or without the use of lithography or masks. After the implantation is complete, visual recognition is used to determine the exact region that was implanted. This information can then be used by subsequent process steps to crate a suitable metallization layer and provide alignment information. These techniques can also be used in other ion implanter applications. In another aspect, a dot pattern selective emitter is created, and imaging is used to determine the appropriate metallization layer.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。使用掩模或不使用光刻或掩模在衬底上产生掺杂区域。植入完成后，使用视觉识别来确定植入的确切区域。然后可以通过随后的工艺步骤来使用该信息来对合适的金属化层进行包装并提供对准信息。这些技术也可用于其他离子注入机应用。在另一方面，创建点图案选择性发射器，并且使用成像来确定合适的金属化层。

7. 发明授权

US08084293B2 Continuously optimized solar cell metallization design through feed-forward process 有权
标题翻译：通过前馈过程不断优化太阳能电池金属化设计
公开(公告)号：US08084293B2
公开(公告)日：2011-12-27
申请号：US12754712
申请日：2010-04-06
申请人： Benjamin Riordon , Russell Low , Atul Gupta , William Weaver
发明人： Benjamin Riordon , Russell Low , Atul Gupta , William Weaver
IPC分类号： H01L21/00
CPC分类号： H01L31/022425 , H01L21/266 , H01L31/022433 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells, is disclosed. The doped regions are created on the substrate, using a mask or without the use of lithography or masks. After the implantation is complete, visual recognition is used to determine the exact region that was implanted. This information can then be used by subsequent process steps to crate a suitable metallization layer and provide alignment information. These techniques can also be used in other ion implanter applications. In another aspect, a dot pattern selective emitter is created and imaging is used to determine the appropriate metallization layer.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。使用掩模或不使用光刻或掩模在衬底上产生掺杂区域。植入完成后，使用视觉识别来确定植入的确切区域。然后可以通过随后的工艺步骤来使用该信息来对合适的金属化层进行包装并提供对准信息。这些技术也可用于其他离子注入机应用。在另一方面，产生点图案选择性发射体，并且使用成像来确定合适的金属化层。

8. 发明申请

US20110244625A1 Continuously Optimized Solar Cell Metallization Design through Feed-Forward Process 有权
标题翻译：通过前馈过程持续优化太阳能电池金属化设计
公开(公告)号：US20110244625A1
公开(公告)日：2011-10-06
申请号：US12754712
申请日：2010-04-06
申请人： Benjamin Riordon , Russell Low , Atul Gupta , William Weaver
发明人： Benjamin Riordon , Russell Low , Atul Gupta , William Weaver
IPC分类号： H01L31/18
CPC分类号： H01L31/022425 , H01L21/266 , H01L31/022433 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells, is disclosed. The doped regions are created on the substrate, using a mask or without the use of lithography or masks. After the implantation is complete, visual recognition is used to determine the exact region that was implanted. This information can then be used by subsequent process steps to crate a suitable metallization layer and provide alignment information. These techniques can also be used in other ion implanter applications. In another aspect, a dot pattern selective emitter is created and imaging is used to determine the appropriate metallization layer.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。使用掩模或不使用光刻或掩模在衬底上产生掺杂区域。植入完成后，使用视觉识别来确定植入的确切区域。然后可以通过随后的工艺步骤来使用该信息来对合适的金属化层进行包装并提供对准信息。这些技术也可用于其他离子注入机应用。在另一方面，产生点图案选择性发射体，并且使用成像来确定合适的金属化层。

9. 发明授权

US09190548B2 Method of creating two dimensional doping patterns in solar cells 有权
标题翻译：在太阳能电池中产生二维掺杂图案的方法
公开(公告)号：US09190548B2
公开(公告)日：2015-11-17
申请号：US13270290
申请日：2011-10-11
申请人： John Graff , Nicholas Bateman , Joseph Olson , Benjamin Riordon
发明人： John Graff , Nicholas Bateman , Joseph Olson , Benjamin Riordon
IPC分类号： H01L31/0224 , H01L31/068 , H01L21/266 , H01L31/18
CPC分类号： H01L31/0682 , H01J2237/31711 , H01L21/266 , H01L31/022441 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of fabricating an interdigitated back contact (IBC) solar cell is disclosed. A first mask is used to perform a patterned ion implantation of n-type dopant to create the back surface field. A second mask is then used to create the p-type emitter on the same surface. The second mask may be aligned to the n-type implant, and may be used in a plurality of orientations to create the desired p-type emitter. In some embodiments, a p-type blanket implant is performed as well. In some embodiments, a doping gradient is created.
摘要翻译：公开了一种制造交错背接触（IBC）太阳能电池的改进方法。使用第一掩模来执行n型掺杂剂的图案化离子注入以产生背表面场。然后使用第二个掩模在相同的表面上创建p型发射器。第二掩模可以对准n型植入物，并且可以以多个取向使用以产生所需的p型发射体。在一些实施例中，还执行p型覆盖植入。在一些实施例中，产生掺杂梯度。

10. 发明申请

US20130087189A1 METHOD OF CREATING TWO DIMENSIONAL DOPING PATTERNS IN SOLAR CELLS 有权
标题翻译：在太阳能电池中制造两维DOPING图案的方法
公开(公告)号：US20130087189A1
公开(公告)日：2013-04-11
申请号：US13270290
申请日：2011-10-11
申请人： John Graff , Nicholas Bateman , Joseph Olson , Benjamin Riordon
发明人： John Graff , Nicholas Bateman , Joseph Olson , Benjamin Riordon
IPC分类号： H01L31/0224 , H01L31/18
CPC分类号： H01L31/0682 , H01J2237/31711 , H01L21/266 , H01L31/022441 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of fabricating an interdigitated back contact (IBC) solar cell is disclosed. A first mask is used to perform a patterned ion implantation of n-type dopant to create the back surface field. A second mask is then used to create the p-type emitter on the same surface. The second mask may be aligned to the n-type implant, and may be used in a plurality of orientations to create the desired p-type emitter. In some embodiments, a p-type blanket implant is performed as well. In some embodiments, a doping gradient is created.
摘要翻译：公开了一种制造交错背接触（IBC）太阳能电池的改进方法。使用第一掩模来执行n型掺杂剂的图案化离子注入以产生背表面场。然后使用第二个掩模在相同的表面上创建p型发射器。第二掩模可以对准n型植入物，并且可以以多个取向使用以产生所需的p型发射体。在一些实施例中，还执行p型覆盖植入。在一些实施例中，产生掺杂梯度。

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