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1. 发明授权

US07139478B2 Nonlinear device comprising a spectrally broadening fiber 有权
标题翻译：包括光谱增宽光纤的非线性装置
公开(公告)号：US07139478B2
公开(公告)日：2006-11-21
申请号：US10275134
申请日：2002-03-13
申请人： Benjamin J. Eggleton , Tsing Hua Her , Stefan Hunsche , Gregory Raybon , John A. Rogers , Paul S. Westbrook
发明人： Benjamin J. Eggleton , Tsing Hua Her , Stefan Hunsche , Gregory Raybon , John A. Rogers , Paul S. Westbrook
IPC分类号： H04B10/08
CPC分类号： H04B10/2569 , H04B10/077 , H04B10/07955 , H04B10/299
摘要： Embodiments of the invention include system for monitoring the effectiveness of pulse shaping in a nonlinear optical fiber (40). The spectral content of the pulse, after passing through the nonlinear fiber (40), provides an indication of how effectively the pulse was regenerated. A portion of the pulse exiting the nonlinear fiber is tapped off and its pulse energy is measured in at least one selected spectral region. The selected spectral region is one in which the pulse tends to gain energy when effective regeneration is taking place. The information concerning the effectiveness of pulse shaping in a nonlinear optical fiber is fed back to dynamically change the residual dispersion at the regenerator input. The spectral measurement leads to a control signal (48) to indicate a level of performance of the system, or to improve the performance of the system by adjusting an operational parameter.
摘要翻译：本发明的实施例包括用于监测非线性光纤（40）中的脉冲整形有效性的系统。通过非线性光纤（40）后脉冲的光谱含量提供脉冲再生的有效指示。离开非线性光纤的脉冲的一部分被分离，并且其脉冲能量在至少一个选定的光谱区域中被测量。所选择的光谱区域是当发生有效再生时脉冲倾向于获得能量的光谱区域。关于非线性光纤中的脉冲整形的有效性的信息被反馈以动态地改变再生器输入端的残余色散。频谱测量导致控制信号（48）以指示系统的性能水平，或通过调整操作参数来提高系统的性能。

2. 发明授权

US08413081B2 Method for process window optimized optical proximity correction 有权
标题翻译：过程窗口优化光学邻近校正方法
公开(公告)号：US08413081B2
公开(公告)日：2013-04-02
申请号：US12709373
申请日：2010-02-19
申请人： Jun Ye , Jiangwei Li , Stefan Hunsche
发明人： Jun Ye , Jiangwei Li , Stefan Hunsche
IPC分类号： G06F17/50
CPC分类号： G06F17/50 , G03F1/144 , G03F1/36
摘要： One embodiment of a method for process window optimized optical proximity correction includes applying optical proximity corrections to a design layout, simulating a lithography process using the post-OPC layout and models of the lithography process at a plurality of process conditions to produce a plurality of simulated resist images. A weighted average error in the critical dimension or other contour metric for each edge segment of each feature in the design layout is determined, wherein the weighted average error is an offset between the contour metric at each process condition and the contour metric at nominal condition averaged over the plurality of process conditions. A retarget value for the contour metric for each edge segment is determined using the weighted average error and applied to the design layout prior to applying further optical proximity corrections.
摘要翻译：用于处理窗口优化的光学邻近校正的方法的一个实施例包括将光学邻近校正应用于设计布局，使用后OPC布局模拟光刻处理和在多个工艺条件下的光刻工艺的模型，以产生多个模拟抵抗图像。确定设计布局中每个特征的每个边缘段的关键尺寸或其他轮廓度量的加权平均误差，其中加权平均误差是在每个处理条件下的轮廓度量与标称条件下的轮廓度量之间的偏移平均在多个工艺条件下。使用加权平均误差确定每个边缘段的轮廓度量的重定向值，并在应用进一步的光学邻近校正之前应用于设计布局。

3. 发明申请

US20070061772A1 SYSTEM AND METHOD FOR MASK VERIFICATION USING AN INDIVIDUAL MASK ERROR MODEL 有权
标题翻译：使用个人掩码错误模型进行掩蔽验证的系统和方法
公开(公告)号：US20070061772A1
公开(公告)日：2007-03-15
申请号：US11530402
申请日：2006-09-08
申请人： Jun Ye , Stefan Hunsche
发明人： Jun Ye , Stefan Hunsche
IPC分类号： G06F17/50 , G03F1/00 , G21K5/00
CPC分类号： G06F17/5081 , G03F1/36 , G03F1/84 , G03F7/70441 , G03F7/705
摘要： Methods and systems are disclosed to inspect a manufactured lithographic mask, to extract physical mask data from mask inspection data, to determine systematic mask error data based on differences between the physical mask data and mask layout data, to generate systematic mask error parameters based on the systematic mask error data, to create an individual mask error model with systematic mask error parameters, to predict patterning performance of the lithographic process using a particular mask and/or a particular projection system, and to predict process corrections that optimize patterning performance and thus the final device yield.
摘要翻译：公开了用于检查制造的光刻掩模的方法和系统，以从掩模检查数据提取物理掩模数据，以基于物理掩模数据和掩模布局数据之间的差异来确定系统掩模误差数据，以基于系统掩模误差数据，以产生具有系统掩模误差参数的单独掩模误差模型，以预测使用特定掩模和/或特定投影系统的光刻工艺的图案化性能，以及预测优化图案化性能的工艺校正，最终装置产量。

4. 发明授权

US06867852B2 Method and apparatus for channel detection 有权
标题翻译：用于信道检测的方法和装置
公开(公告)号：US06867852B2
公开(公告)日：2005-03-15
申请号：US10454914
申请日：2003-06-05
申请人： Stefan Hunsche
发明人： Stefan Hunsche
IPC分类号： H04B10/08 , H04J14/02 , G01N21/00
CPC分类号： H04B10/07955 , H04B10/077 , H04J14/02
摘要： A method and apparatus for the detection of optical channels in an optical signal and their reliable discrimination against optical amplifier noise includes splitting an input optical signal into two replicas separated by a delay and adjusting the delay such that a periodicity of the optical filter substantially matches the channel spacing of the input optical signal, such that the optical channels within the input optical signal are directed to a first output and noise within the input optical signal is divided between the first output and a second output. The method and apparatus further include determining a difference in power between the first output and the second output wherein the difference in power is an indication of the presence or absence of optical channels within the input optical signal.
摘要翻译：用于检测光信号中的光信道的方法和装置及其对光放大器噪声的可靠辨别包括将输入光信号分为两个由延迟分隔的副本，并调整延迟，使得滤光器的周期基本上与输入光信号的通道间隔，使得输入光信号内的光通道被引导到第一输出，并且在输入光信号内的噪声在第一输出和第二输出之间被划分。所述方法和装置还包括确定第一输出和第二输出之间的功率差，其中功率差是输入光信号内存在或不存在光信道的指示。

5. 发明授权

US07749666B2 System and method for measuring and analyzing lithographic parameters and determining optimal process corrections 有权
标题翻译：用于测量和分析光刻参数并确定最佳过程校正的系统和方法
公开(公告)号：US07749666B2
公开(公告)日：2010-07-06
申请号：US11462022
申请日：2006-08-02
申请人： Michael J. Gassner , Stefan Hunsche , Yu Cao , Jun Ye , Moshe E. Preil
发明人： Michael J. Gassner , Stefan Hunsche , Yu Cao , Jun Ye , Moshe E. Preil
IPC分类号： G03C5/00 , G01B9/00 , G01B9/08 , G01B11/00 , G01N21/00
CPC分类号： G03F7/70666 , G03F7/70641
摘要： A method of using an in-situ aerial image sensor array is disclosed to separate and remove the focal plane variations caused by the image sensor array non-flatness and/or by the exposure tool by collecting sensor image data at various nominal focal planes and by determining best focus at each sampling location by analysis of the through-focus data. In various embodiments, the method provides accurate image data at best focus anywhere in the exposure field, image data covering an exposure-dose based process window area, and a map of effective focal plane distortions. The focus map can be separated into contributions from the exposure tool and contributions due to topography of the image sensor array by suitable calibration or self-calibration procedures. The basic method enables a wide range of applications, including for example qualification testing, process monitoring, and process control by deriving optimum process corrections from analysis of the image sensor data.
摘要翻译：公开了一种使用原位空间图像传感器阵列的方法，以分离和去除由图像传感器阵列非平坦度引起的焦平面变化和/或通过曝光工具通过在各种标称焦平面处收集传感器图像数据，并且通过通过分析焦点数据确定每个采样位置的最佳焦点。在各种实施例中，该方法在曝光区域的任何地方提供最佳焦点上的精确图像数据，覆盖基于曝光剂量的过程窗口区域的图像数据和有效焦平面失真的映射。焦点图可以通过适当的校准或自校准程序分为曝光工具的贡献和由于图像传感器阵列的形貌造成的贡献。基本方法可以通过从图像传感器数据分析中得出最佳的过程校正，实现广泛的应用，包括例如鉴定测试，过程监控和过程控制。

6. 发明申请

US20070035712A1 SYSTEM AND METHOD FOR MEASURING AND ANALYZING LITHOGRAPHIC PARAMETERS AND DETERMINING OPTIMAL PROCESS CORRECTIONS 有权
标题翻译：用于测量和分析光刻参数的系统和方法以及确定最佳过程校正
公开(公告)号：US20070035712A1
公开(公告)日：2007-02-15
申请号：US11462022
申请日：2006-08-02
申请人： Michael Gassner , Stefan Hunsche , Yu Cao , Jun Ye , Moshe Preil
发明人： Michael Gassner , Stefan Hunsche , Yu Cao , Jun Ye , Moshe Preil
IPC分类号： G03B27/52
CPC分类号： G03F7/70666 , G03F7/70641
摘要： A method of using an in-situ aerial image sensor array is disclosed to separate and remove the focal plane variations caused by the image sensor array non-flatness and/or by the exposure tool by collecting sensor image data at various nominal focal planes and by determining best focus at each sampling location by analysis of the through-focus data. In various embodiments, the method provides accurate image data at best focus anywhere in the exposure field, image data covering an exposure-dose based process window area, and a map of effective focal plane distortions. The focus map can be separated into contributions from the exposure tool and contributions due to topography of the image sensor array by suitable calibration or self-calibration procedures. The basic method enables a wide range of applications, including for example qualification testing, process monitoring, and process control by deriving optimum process corrections from analysis of the image sensor data.
摘要翻译：公开了一种使用原位空间图像传感器阵列的方法，以分离和去除由图像传感器阵列非平坦度引起的焦平面变化和/或通过曝光工具通过在各种标称焦平面处收集传感器图像数据，并且通过通过分析焦点数据确定每个采样位置的最佳焦点。在各种实施例中，该方法在曝光区域的任何地方提供最佳焦点上的精确图像数据，覆盖基于曝光剂量的过程窗口区域的图像数据和有效焦平面失真的映射。焦点图可以通过适当的校准或自校准程序分为曝光工具的贡献和由于图像传感器阵列的形貌造成的贡献。基本方法可以通过从图像传感器数据分析中得出最佳的过程校正，实现广泛的应用，包括例如鉴定测试，过程监控和过程控制。

7. 发明申请

US20060273242A1 System and method for characterizing aerial image quality in a lithography system 有权
公开(公告)号：US20060273242A1
公开(公告)日：2006-12-07
申请号：US11437587
申请日：2006-05-19
申请人： Stefan Hunsche , Jun Ye
发明人： Stefan Hunsche , Jun Ye
IPC分类号： H01L27/00
CPC分类号： G03F7/70666
摘要： While a high-resolution 2-dimensional image reconstruction is expected to give the maximum possible amount of information on the aerial image in a projection system, relevant information regarding image quality can be derived from a statistical evaluation of image values. Relevant statistical image data can be derived by sampling at a multitude of non-adjacent locations across a large area, rather than by scanning over many adjacent locations on a small area. Examples of the benefits of the present invention include: (1) it generally does not rely on very precise, repeatable fine alignment of the image sensor array with respect to the mask and/or the projected image; (2) a large number of individual sensor elements are utilized, and image data is generated from a large set of signal values; and (3) it can generate relevant data to assess aerial image quality in a very short data acquisition time.

8. 发明授权

US06859306B2 Method, apparatus and system for reducing gain ripple in a raman-amplified WDM system 有权
标题翻译：用于降低拉曼放大WDM系统中增益波动的方法，装置和系统
公开(公告)号：US06859306B2
公开(公告)日：2005-02-22
申请号：US10357646
申请日：2003-02-04
申请人： Daniel A. Fishman , Stefan Hunsche , Xiang Liu , Mahan Movassaghi , Chunhui Xu
发明人： Daniel A. Fishman , Stefan Hunsche , Xiang Liu , Mahan Movassaghi , Chunhui Xu
IPC分类号： H01S3/00 , H04B10/17
CPC分类号： H04B10/2916 , H04B2210/003
摘要： A method, apparatus and system for reducing gain ripple in a Raman-amplified WDM system includes determining a gain profile of an optical signal transported via a first Raman amplification span in a Raman-amplified WDM system, comparing the determined gain profile to a gain profile of an optical signal transported via a second Raman amplification span, determining, from the comparison, an amount of wavelength adjustment required for a plurality of Raman pumps comprising at least one Raman pump block of the second Raman amplification span to alter the gain profile of an optical signal transported via the second Raman amplification span, such that a cumulative gain profile of an optical signal transported via the first and the second Raman amplification spans approaches a desired gain profile, and generating a control signal suitable for adjusting the wavelengths of the plurality of Raman pumps of the at least one Raman pump block an amount consistent with the determined amount.
摘要翻译：用于减少拉曼放大WDM系统中的增益波动的方法，装置和系统包括确定经拉曼放大WDM系统中的第一拉曼放大范围传输的光信号的增益分布，将所确定的增益分布与增益曲线进行比较通过第二拉曼放大范围传输的光信号，从比较中确定多个拉曼泵所需的波长调节量，该多个拉曼泵包括第二拉曼放大跨度的至少一个拉曼泵浦块，以改变第经由第二拉曼放大范围传输的光信号，使得经由第一和第二拉曼放大跨度传送的光信号的累积增益分布接近所需增益分布，并产生适于调整多个波长的波长的控制信号至少一个拉曼泵的拉曼泵阻止与所确定的量一致的量。

9. 发明授权

US08909038B2 Method and apparatus providing transient control in optical add-drop nodes 有权
标题翻译：在光分插节点中提供瞬态控制的方法和装置
公开(公告)号：US08909038B2
公开(公告)日：2014-12-09
申请号：US10338097
申请日：2003-01-07
申请人： Cristina Barbosa Cannon , Stefan Hunsche
发明人： Cristina Barbosa Cannon , Stefan Hunsche
IPC分类号： H04B10/00 , H04J14/02 , H04B10/296
CPC分类号： H04J14/0221 , H04B10/296 , H04J14/0204 , H04J14/0212
摘要： A method and apparatus for determining if an optical input signals has been interrupted and responsively replacing an interrupted optical input signal with a replacement optical signal having a similar optical profile (e.g., such as a loopback between OADMs within a backbone network), thereby insuring that transient-induced high speed optical amplifier adjustments are avoided.
摘要翻译：一种用于确定光输入信号是否已经中断的方法和装置，并且用具有相似光学轮廓的替换光信号（例如，诸如骨干网内的OADM之间的环回）来响应地替换中断的光输入信号，从而确保避免了瞬态诱发的高速光放大器调整。

10. 发明授权

US07617477B2 Method for selecting and optimizing exposure tool using an individual mask error model 有权
标题翻译：使用单独的掩模误差模型选择和优化曝光工具的方法
公开(公告)号：US07617477B2
公开(公告)日：2009-11-10
申请号：US11530409
申请日：2006-09-08
申请人： Jun Ye , Stefan Hunsche
发明人： Jun Ye , Stefan Hunsche
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/36 , G03F1/84 , G03F7/70441 , G03F7/705
摘要： Methods are disclosed for selecting and optimizing an exposure tool using an individual mask error model. In one embodiment, a method includes selecting a model of a lithography process including an optical model of an exposure tool and a resist model, creating an individual mask error model representing a mask manufactured using mask layout data, simulating the lithography process using the model of the lithography process and the individual mask error model to produce simulated patterns, determining differences between the simulated patterns and a design target, and optimizing settings of the exposure tool based on the differences between the simulated patterns and the design target.
摘要翻译：公开了使用单独的掩模误差模型来选择和优化曝光工具的方法。在一个实施例中，一种方法包括选择包括曝光工具和抗蚀剂模型的光学模型的光刻工艺的模型，创建表示使用掩模布局数据制造的掩模的单独掩模误差模型，使用模型光刻过程和单个掩模误差模型，以产生模拟图案，确定模拟图案与设计目标之间的差异，并且基于模拟图案和设计目标之间的差异优化曝光工具的设置。

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