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    • 5. 发明授权
    • Substrate tester having shorting pad actuator method and apparatus
    • 基板测试仪具有短路板执行器方法和装置
    • US5917329A
    • 1999-06-29
    • US840836
    • 1997-04-17
    • Robert H. CadwalladerThomas MorrisonKlaus ProbstBrian J. WojszynskiWilliam A. Yager
    • Robert H. CadwalladerThomas MorrisonKlaus ProbstBrian J. WojszynskiWilliam A. Yager
    • G01R31/28G01R31/02
    • G01R31/2886
    • An electrical contacting apparatus for testing a substrate (54) and having a principal axis includes an electrical contact pad, a guide plate (106), a supporting bridge (132), and a mechanism for providing a contact actuation force. The guide plate includes side edges with guide pins (108) extending radially outward from a center of each side edge. The electrical contact pad (114) is mounted and centered upon a top surface of the guide plate (106). The support bridge supports the guide plate to enable a pivotal movement of the guide plate about a point on the principal axis. Lastly, the contact actuation force mechanism provides a contact actuation force to a center of the bottom surface of the guide plate to maintain an equal force across the electrical contact pad in a direction of the principal axis, whereby the electrical contact pad provides a desired contacting force equally balanced across an entire contact area defined by an area of contact between the electrical contact pad and a substrate being contacted. The substrate (54) is to be clamped between test probes (52) and the contact pad (114).
    • 用于测试基板(54)并具有主轴的电接触装置包括电接触焊盘,引导板(106),支撑桥(132)和用于提供接触致动力的机构。 引导板包括具有从每个侧边缘的中心径向向外延伸的引导销(108)的侧边缘。 电接触垫(114)被安装并且位于引导板(106)的顶表面上。 支撑桥支撑引导板,以使得引导板围绕主轴上的点枢转运动。 最后,接触致动力机构向引导板的底表面的中心提供接触致动力,以在主轴线的方向上在电接触焊盘上保持相等的力,由此电接触垫提供期望的接触 在由电接触焊盘和正在接触的基板之间的接触区域限定的整个接触区域上的力均匀平衡。 衬底(54)被夹在测试探针(52)和接触垫(114)之间。
    • 10. 发明授权
    • Locator actuation apparatus
    • 定位器致动装置
    • US5873566A
    • 1999-02-23
    • US840833
    • 1997-04-17
    • Robert H. CadwalladerMichael J. FisherThomas Morrison
    • Robert H. CadwalladerMichael J. FisherThomas Morrison
    • B23Q3/18B25B5/06B25B5/14H01L21/68B23Q3/08
    • H01L21/68B23Q3/18B25B5/06B25B5/142Y10S269/902Y10T29/49998
    • An apparatus for locating a workpiece on a processing surface includes a first locator arm assembly, a second locator arm assembly, and a pivotal member. The first locator arm assembly includes a first surface disposed for lateral movement and mating engagement with a first portion of the workpiece. The second locator arm assembly includes a second surface disposed for lateral movement parallel to the first surface, the second surface further for mating engagement with a second, opposite side, portion of the workpiece. Lastly, pivotal member is disposed for pivotal movement about a pivot point and symmetrically coupled, with a zero tolerance buildup, between the first locator arm assembly and the second locator arm assembly for inducing an equal but opposite lateral movement in the first and second mating engagement surfaces of the first and second locator arm assemblies, respectively, whereby the workpiece is accurately located on the processing surface between respective first and second mating engagement surfaces as the surfaces are moved towards one another.
    • 用于在加工表面上定位工件的装置包括第一定位臂组件,第二定位臂组件和枢转构件。 第一定位臂组件包括设置成横向移动的第一表面和与工件的第一部分配合接合。 第二定位臂组件包括设置成平行于第一表面横向移动的第二表面,第二表面还用于与工件的第二相对侧部配合接合。 最后,枢转构件设置成围绕枢转点枢转运动,并且在第一定位臂组件和第二定位臂组件之间对称耦合并具有零容差积分,用于在第一和第二配合接合中引起相等但相反的侧向运动 分别表示第一和第二定位臂组件,由此当表面相互移动时,工件精确地位于相应的第一和第二配合接合表面之间的处理表面上。