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1. 发明授权

US06867415B2 Sample introduction interface for analytical processing 有权
标题翻译：样品介绍界面进行分析处理
公开(公告)号：US06867415B2
公开(公告)日：2005-03-15
申请号：US09938277
申请日：2001-08-23
申请人： Barbara J. Hughey , Paul L. Skipper , John S. Wishnok , Ruth E. Shefer , Naomi A. Fried , John T. Mehl , Steven R. Tannenbaum
发明人： Barbara J. Hughey , Paul L. Skipper , John S. Wishnok , Ruth E. Shefer , Naomi A. Fried , John T. Mehl , Steven R. Tannenbaum
IPC分类号： G01N30/72 , G01N30/84 , H01J49/04 , H01J49/26
CPC分类号： H01J49/0463 , G01N30/7233 , G01N2030/8405 , H01J49/0445
摘要： An interface for introducing a non-gaseous sample as a predetermined gaseous form into an accelerator mass spectrometer which comprises a nebulizer that receives the non-gaseous sample to provide a fine spray of the sample, a converter that receives at least a portion of said fine spray and converts the desired elements to the predetermined gaseous form and a flow line that transports the predetermined gaseous form to the accelerator mass spectrometer.
摘要翻译：用于将非气态样品作为预定气体形式引入加速器质谱仪的界面，该加速器质谱仪包括接收非气态样品以提供样品的细微喷雾的雾化器，接收所述精细的至少一部分的转化器喷雾并将期望的元素转化成预定的气体形式和将预定气体形式输送到加速器质谱仪的流动管线。

2. 发明授权

US06707035B2 Sample introduction interface for analytical processing of a sample placed on a substrate 有权
标题翻译：用于分析处理放置在基板上的样品的样品引入界面
公开(公告)号：US06707035B2
公开(公告)日：2004-03-16
申请号：US09935909
申请日：2001-08-23
申请人： Barbara J. Hughey , Paul L. Skipper , John S. Wishnok , Ruth E. Shefer , John T. Mehl , Steven R. Tannenbaum
发明人： Barbara J. Hughey , Paul L. Skipper , John S. Wishnok , Ruth E. Shefer , John T. Mehl , Steven R. Tannenbaum
IPC分类号： H01J4926
CPC分类号： H01J49/0463 , G01N30/7233 , G01N2030/8405 , H01J49/0445
摘要： An interface system for introducing a non-gaseous sample as a predetermined gaseous form into an analytical instrument which comprises a substrate that receives the non-gaseous sample and a directed energy source that heats at least a portion of said substrate containing the non-gaseous sample to convert the sample to the predetermined gaseous form.
摘要翻译：一种用于将非气态样品作为预定气体形式引入到分析仪器中的界面系统，该分析仪器包括接收非气态样品的基底和加热含有非气态样品的所述基底的至少一部分的定向能量源以将样品转化为预定的气体形式。

3. 发明授权

US5468355A Method for producing radioisotopes 失效
标题翻译：放射性同位素生产方法
公开(公告)号：US5468355A
公开(公告)日：1995-11-21
申请号：US72277
申请日：1993-06-04
申请人： Ruth E. Shefer , Robert E. Klinkowstein , Barbara J. Hughey , Michael J. Welch , Carmen S. Dence
发明人： Ruth E. Shefer , Robert E. Klinkowstein , Barbara J. Hughey , Michael J. Welch , Carmen S. Dence
IPC分类号： G21G1/10 , H05H6/00 , B01D5/00
CPC分类号： G21G1/10 , H05H6/00
摘要： A target is bombarded with high energy particles to generate a radioisotope, and the radioisotope is preferably extracted by one of the following: combusting the target in oxygen, stopping the bombardment and heating the target, or heating the target by induction. Bombardment may take place through a windowless path, and the radioisotope may be used for PET. The particles used may be deuterons or protons, and .sup.13 N may be generated. .sup.11 C may also be generated from either .sup.11 B or .sup.10 B using protons or deuterons. Combustion may be performed by induction heating and may be controlled by the quantity of oxygen available or the temperature. Combustion may be primarily confined to a surface layer and the target may be reused. The beam energy may be 2.2 MeV or less. Another general aspect includes trapping the oxides of .sup.13 N in a trap. The oxides may be converted into .sup.13 N-Ammonia, and this conversion may take place in the trap, which trap may comprise silica gel and sodium hydroxide and may also contain a reducing agent such as Raney-Nickel.
摘要翻译：用高能粒子轰击目标以产生放射性同位素，放射性同位素优选通过以下之一提取：将靶氧气氧化，停止轰击并加热靶，或通过感应加热靶。可以通过无窗路径进行轰炸，并且放射性同位素可用于PET。使用的颗粒可以是氘核或质子，并且可以产生13N。 11C也可以使用质子或氘核从11B或10B产生。燃烧可以通过感应加热进行，并且可以通过可用的氧气量或温度来控制。燃烧可以主要限于表面层，并且靶可以重复使用。光束能量可以是2.2MeV或更小。另一个一般方面包括将13N的氧化物捕获在陷阱中。氧化物可以转化为13N-氨，并且该转化可以在捕集器中进行，该捕集器可以包含硅胶和氢氧化钠，并且还可以含有还原剂如阮内镍。

4. 发明授权

US5825038A Large area uniform ion beam formation 失效
标题翻译：大面积均匀的离子束形成
公开(公告)号：US5825038A
公开(公告)日：1998-10-20
申请号：US756656
申请日：1996-11-26
申请人： Julian G. Blake , Kenneth H. Purser , Adam A. Brailove , Peter H. Rose , Barbara J. Hughey
发明人： Julian G. Blake , Kenneth H. Purser , Adam A. Brailove , Peter H. Rose , Barbara J. Hughey
IPC分类号： H01J37/30 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/3007 , H01J2237/083
摘要： A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion chamber generating a stream of ions, a plasma electrode having an elongated slot with a high aspect ratio for shaping the stream of ions into a ribbon beam, and an electrode assembly for directing the stream of ions towards a workpiece. The plasma electrode can include a split extraction system having a plurality of elongated slots oriented substantially parallel to each other. The ion implantation system can also have a diffusing system for homogenizing the ion stream. Various exemplary diffusing systems include an apertured plate having an array of openings, diffusing magnets, diffusing electrodes, and dithering magnets.
摘要翻译：快速有效地处理大量平板显示器的高通量离子注入系统。离子注入系统具有产生离子流的离子室，具有用于将离子流成形为带状束的高纵横比的细长槽的等离子体电极，以及用于将离子流引向工件的电极组件。等离子体电极可以包括具有基本上彼此平行取向的多个细长狭缝的分离提取系统。离子注入系统还可以具有用于使离子流均匀化的扩散系统。各种示例性扩散系统包括具有开口阵列，扩散磁体，扩散电极和抖动磁体的有孔板。

5. 发明授权

US5793050A Ion implantation system for implanting workpieces 失效
公开(公告)号：US5793050A
公开(公告)日：1998-08-11
申请号：US756133
申请日：1996-11-26
申请人： Peter H. Rose , Julian G. Blake , Adam A. Brailove , Zhongmin Yang , Richard F. McRay , Barbara J. Hughey
发明人： Peter H. Rose , Julian G. Blake , Adam A. Brailove , Zhongmin Yang , Richard F. McRay , Barbara J. Hughey
IPC分类号： H01J27/14 , H01J37/08 , H01J37/18 , H01J37/30 , H01J37/304 , H01J37/317 , H01L21/00 , H01L21/677 , H01L21/683
CPC分类号： H01L21/67109 , H01J27/14 , H01J37/08 , H01J37/18 , H01J37/3002 , H01J37/3007 , H01J37/304 , H01J37/3171 , H01L21/67069 , H01L21/67745 , H01L21/67748 , H01L21/67751 , H01L21/67778 , H01L21/6838 , H01J2237/022 , H01J2237/083 , H01J2237/184 , H01J2237/2001 , H01J2237/2007 , H01J2237/20228 , H01J2237/204 , H01J2237/31701 , H01J2237/31705
摘要： An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system. According to one practice, the scanning direction and the longitudinal axis form an angle therebetween that is less than or equal to about 85 degrees.

6. 发明授权

US06414327B1 Method and apparatus for ion beam generation 有权
标题翻译：用于离子束产生的方法和装置
公开(公告)号：US06414327B1
公开(公告)日：2002-07-02
申请号：US09395580
申请日：1999-09-14
申请人： Robert E. Klinkowstein , Ruth Shefer , Barbara J. Hughey
发明人： Robert E. Klinkowstein , Ruth Shefer , Barbara J. Hughey
IPC分类号： H01J3730
CPC分类号： G21K1/14 , H01J37/3007 , H01J2237/047 , H01J2237/31701
摘要： A method and apparatus for ion beam generation in which acceleration of an ion beam in a first accelerating tube to a high voltage terminal, followed by transport of the beam through the terminal without significant charge changing, and deceleration of the beam substantially to ground potential in a second accelerating tube. Since the terminal is maintained at high voltage, the beam optical characteristics between the ion source and the terminal are identical to those of normal tandem operation. The optical elements of the injector and accelerator beamline can therefore be adjusted to produce an focused beam envelope in the high voltage terminal, allowing the beam to propagate efficiently through an empty stripper canal. Since the beam, does not undergo a charge change in the terminal, it is decelerated in the second tandem accelerating tube. Since the beam propagates through the accelerator at energies higher than the injection energy, expansion of the beam due to space charge and emittance is reduced.
摘要翻译：一种用于离子束产生的方法和装置，其中将第一加速管中的离子束加速到高压端子，随后通过端子传输光束而没有显着的电荷变化，并且将光束的减速基本上接地电位第二加速管。由于端子保持高电压，离子源和端子之间的光束特性与正常串联操作相同。因此，可以调节注射器和加速器束线的光学元件以在高压端子中产生聚焦束包络，允许光束有效地传播通过空的剥离管。由于光束在端子中不会发生电荷变化，所以在第二串联加速管中减速。由于光束以高于注入能量的能量传播通过加速器，所以减小了由于空间电荷和发射率引起的光束的膨胀。

7. 发明授权

US6148061A Miniature x-ray unit 失效
标题翻译：微型x射线单元
公开(公告)号：US6148061A
公开(公告)日：2000-11-14
申请号：US67874
申请日：1998-04-28
申请人： Ruth Shefer , Robert E. Klinkowstein , Barbara J. Hughey
发明人： Ruth Shefer , Robert E. Klinkowstein , Barbara J. Hughey
IPC分类号： A61N5/10 , H01J35/32 , H01J35/00
CPC分类号： A61N5/1001 , H01J35/32 , A61N5/1002
摘要： A miniature x-ray unit includes a first electrical node, a second electrical node and an insulating material. The first and second nodes are separated by a vacuum gap. The first node includes a base portion and a projecting portion, wherein the projecting portion and the second node are surrounded by an x-ray transmissive window through which x-rays exit the unit. The insulating material coaxially surrounds the base portion of the first node such that the insulating material is recessed from the vacuum gap, and the insulator does not extend into the vacuum gap. Recessing the insulating material from the vacuum gap decreases the likelihood that the insulator will electrically break down due to the accumulation of electrical charge, and/or the accumulation of other materials on the surface of the insulator. In a preferred embodiment, the first node is an anode and the second node is a cathode. Alternatively, the first node may be the cathode and the second node may be the anode. The cathode is preferably a cold gated field emitter array (FEA) which provides a electron current having a magnitude that is sufficient to satisfy the time constraints on x-ray dose delivery.
摘要翻译：微型x射线单元包括第一电节点，第二电节点和绝缘材料。第一和第二节点由真空间隙隔开。第一节点包括基部和突出部分，其中突出部分和第二节点由x射线透射窗围绕，X射线透过该X射线从该单元离开。绝缘材料同轴地围绕第一节点的基部，使得绝缘材料从真空间隙凹陷，并且绝缘体不延伸到真空间隙中。将真空间隙中的绝缘材料嵌入减少绝缘体由于电荷的累积而电分解的可能性，和/或其他材料在绝缘体表面上的累积。在优选实施例中，第一节点是阳极，第二节点是阴极。或者，第一节点可以是阴极，第二节点可以是阳极。阴极优选是冷门控场发射器阵列（FEA），其提供具有足以满足x射线剂量递送的时间限制的量级的电子电流。

8. 发明授权

US6025602A Ion implantation system for implanting workpieces 失效
标题翻译：用于植入工件的离子植入系统
公开(公告)号：US6025602A
公开(公告)日：2000-02-15
申请号：US66180
申请日：1998-04-23
申请人： Peter H. Rose , Julian G. Blake , Adam A. Brailove , Zhongmin Yang , Richard F. McRay , Barbara J. Hughey
发明人： Peter H. Rose , Julian G. Blake , Adam A. Brailove , Zhongmin Yang , Richard F. McRay , Barbara J. Hughey
IPC分类号： H01J27/14 , H01J37/08 , H01J37/18 , H01J37/30 , H01J37/304 , H01J37/317 , H01L21/00 , H01L21/677 , H01L21/683 , H01J37/20
CPC分类号： H01L21/67109 , H01J27/14 , H01J37/08 , H01J37/18 , H01J37/3002 , H01J37/3007 , H01J37/304 , H01J37/3171 , H01L21/67069 , H01L21/67745 , H01L21/67748 , H01L21/67751 , H01L21/67778 , H01L21/6838 , H01J2237/022 , H01J2237/083 , H01J2237/184 , H01J2237/2001 , H01J2237/2007 , H01J2237/20228 , H01J2237/204 , H01J2237/31701 , H01J2237/31705
摘要： An ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The ion implantation system includes a high vacuum process chamber that mounts an ion source, a single workpiece translating stage, and a loadlock. The single workpiece handling assembly mounted within the process chamber both removes the workpiece from the loadlock and supports the workpiece during implantation by the ion beam generated by the ion source. The process chamber is in selective fluid communication with a loadlock assembly, which in turn is mechanically integrated with a workpiece loading or end station. Additionally, the workpiece handling assembly includes a translation stage or element for translating the workpiece in a linear scanning direction during implantation. This linear scanning direction extends along a path transverse or orthogonal to the horizontal longitudinal axis of the implantation system. According to one practice, the scanning direction and the longitudinal axis form an angle therebetween that is less than or equal to about 85 degrees.
摘要翻译：一种快速有效地处理大量工件的离子注入系统，如平板显示器。离子注入系统包括安装离子源的高真空处理室，单个工件平移台和负载锁。安装在处理室内的单个工件处理组件都将工件从装载锁上移除，并通过由离子源产生的离子束在植入期间支撑工件。处理室与负载锁组件选择性地流体连通，负载锁组件又与工件加载或终端机械地集成。另外，工件处理组件包括用于在植入期间沿线性扫描方向平移工件的平移台或元件。该线性扫描方向沿着与植入系统的水平纵向轴线横向或正交的路径延伸。根据一个实践，扫描方向和纵向轴线之间形成小于或等于约85度的角度。

9. 发明授权

US5235239A Window construction for a particle accelerator 失效
标题翻译：窗口构造的粒子加速器
公开(公告)号：US5235239A
公开(公告)日：1993-08-10
申请号：US712200
申请日：1991-06-07
申请人： Jonah H. Jacob , Allen M. Flusberg , Barbara J. Hughey , Ruth Shefer , Robert Klinkowstein
发明人： Jonah H. Jacob , Allen M. Flusberg , Barbara J. Hughey , Ruth Shefer , Robert Klinkowstein
IPC分类号： G21K1/10 , G21K5/04
CPC分类号： G21K5/04 , G21K1/10
摘要： Window constructions for use in particle accelerators to separate an evacuated accelerator beam chamber from a gas or liquid filled target area, which window structure enhances cooling of the foil covering the window opening and reduces stresses on the foil. For preferred embodiments, the window opening is shaped and dimensioned to provide high length-to-width aspect ratio and a rectangular shape with rounded corners. The openings should generally be as narrow as possible while still being wide enough to assure efficient transmission of the ion beam. Stresses in the foil is reduced by providing controlled bowing of the portions of the foil covering the window. This may be accomplished by providing some slack in the foil, at least in one dimension, but is preferably accomplished by pressing the foil between mating curved surfaces selectively extending from the edges of the window openings, resulting in the desired bow in the foil in the window area. With a rectangular opening, the bow is preferably a generally cylindrical bow about an axis parallel to the length dimension of the window. A generally spherical bow may also be utilized. A plurality of adjacent generally rectangular openings separated by struts are also utilized for some embodiments.
摘要翻译：窗口结构用于粒子加速器以将抽真空的加速器光束室与气体或液体填充的目标区域分离，该窗口结构增强了覆盖窗口的箔的冷却并减少了箔上的应力。对于优选实施例，窗口的形状和尺寸被设计成提供高的长宽比纵横比和具有圆角的矩形形状。开口通常应尽可能窄，同时仍然足够宽以确保离子束的有效传输。通过提供覆盖窗户的箔的部分的受控弯曲来减少箔中的应力。这可以通过在箔中至少在一个维度上提供一些松弛来实现，但是优选地通过在从窗口的边缘选择性地延伸的匹配弯曲表面之间压制箔来实现箔，从而在箔中的期望的弓窗口区域。对于矩形开口，弓形件优选地是围绕平行于窗口的长度尺寸的轴线的大致圆柱形的弓形。也可以使用大致球形的弓形。通过支柱分开的多个相邻的大致矩形的开口也用于一些实施例。

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