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1. 发明授权

US07651736B2 Method of producing a nanohole on a structure by removal of projections and anodic oxidation 失效
标题翻译：通过去除突起和阳极氧化在结构上制造纳米孔的方法
公开(公告)号：US07651736B2
公开(公告)日：2010-01-26
申请号：US11766908
申请日：2007-06-22
申请人： Aya Imada , Toru Den
发明人： Aya Imada , Toru Den
IPC分类号： B05D3/00
CPC分类号： B81C1/00111 , B81B2203/0361 , C25D1/08 , C25D11/04 , C25D11/045 , C25D11/16 , C25D11/18 , C25D11/26
摘要： The present invention provides a method of producing a structure, which is capable of easily obtaining a structure of the nanometer scale by using an anodic oxidation method. A method of producing a structure with a hole includes: forming first projected structures regularly arranged on a substrate; forming a first anodic oxidating layer on the substrate having the first projected structures, thereby forming first recessed structures at center portions of cells formed by the projected structures on the anodic oxidating layer; removing the first projected structures to form holes; and subjecting the first anodic oxidating layer to anodic oxidation to form holes at positions of the first recessed structures.
摘要翻译：本发明提供一种通过使用阳极氧化法容易地得到纳米级结构的结构体的制造方法。制造具有孔的结构的方法包括：形成规则地布置在基板上的第一突出结构; 在具有第一投影结构的基板上形成第一阳极氧化层，从而在由阳极氧化层上的投影结构形成的单元的中心部分形成第一凹陷结构; 移除第一投影结构以形成孔; 以及对所述第一阳极氧化层进行阳极氧化，以在所述第一凹部结构的位置形成孔。

2. 发明申请

US20080023880A1 PROCESS OF PRODUCTION OF PATTERNED STRUCTURE 有权
标题翻译：生产图案结构的过程
公开(公告)号：US20080023880A1
公开(公告)日：2008-01-31
申请号：US11773739
申请日：2007-07-05
申请人： Aya Imada , Toru Den
发明人： Aya Imada , Toru Den
IPC分类号： B28B11/08
CPC分类号： B29C59/022 , B29C2059/023 , Y10S977/887
摘要： A process for producing a patterned structure comprises imprinting a first pattern by pressing a stamper having a projection-depression configuration on the surface against an imprint-work layer, and imprinting a second pattern by displacing relatively the stamper from the position of the first pattern to another position on the imprint-work layer and then pressing the stamper against the imprint-work layer.
摘要翻译：用于制造图案化结构的方法包括：通过将表面上的具有突起 - 凹陷构造的压模压靠在压印工作层上来压印第一图案，并且通过相对地将压模从第一图案的位置移位到第一图案的方式来压印第二图案在压印工作层上的另一位置，然后将压模压靠在压印工作层上。

3. 发明授权

US08293125B2 Method and device for manufacturing structure having pattern, and method for manufacturing mold 有权
标题翻译：具有图案的制造结构的方法和装置，以及用于制造模具的方法
公开(公告)号：US08293125B2
公开(公告)日：2012-10-23
申请号：US11995170
申请日：2006-09-05
申请人： Aya Imada , Toru Den , Takashi Nakamura
发明人： Aya Imada , Toru Den , Takashi Nakamura
IPC分类号： C03C15/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/09
摘要： A structure having a pattern is manufactured. An elastically deformable process target is elastically deformed in an inplane direction from a first state. A first pattern is formed on the process target deformed. The elastically deformed process target is made close to or returned to the first state, thereby to form a second pattern having a size and a shape at least one of which differs from those of the first pattern.
摘要翻译：制造具有图案的结构。弹性变形过程目标从第一状态沿面内方向弹性变形。在变形的过程目标上形成第一图案。使弹性变形的加工对象靠近或返回到第一状态，从而形成具有与第一图案不同的尺寸和形状的第二图案。

4. 发明授权

US07794861B2 Patterned media, method of manufacturing magnetic recording medium, and method of manufacturing a base 有权
标题翻译：图案化介质，制造磁记录介质的方法，以及制造基座的方法
公开(公告)号：US07794861B2
公开(公告)日：2010-09-14
申请号：US11836556
申请日：2007-08-09
申请人： Tatsuya Saito , Takashi Nakamura , Shigeru Ichihara , Toru Den , Aya Imada , Nobuhiro Yasui
发明人： Tatsuya Saito , Takashi Nakamura , Shigeru Ichihara , Toru Den , Aya Imada , Nobuhiro Yasui
IPC分类号： G11B5/66
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/667 , G11B5/743 , G11B5/8404 , G11B5/855
摘要： To provide patterned media having novel structure. Plural convex members 2991 are provided in an array form on a substrate 2990. The convex member has a shape such that the cross section at each plane in parallel to the substrate tapers toward the substrate. Magnetic recording layers 2992 are provided on upper parts 2993 of the convex members so that they are not in contact with each other between the adjacent upper surface parts.
摘要翻译：提供具有新颖结构的图案化介质。多个凸形构件2991以阵列形式设置在基板2990上。凸形构件具有使得平行于基板的每个平面处的横截面朝向基板逐渐变细的形状。磁记录层2992设置在凸部件的上部2993上，使得它们在相邻的上表面部分之间不彼此接触。

5. 发明申请

US20090120904A1 METHOD AND DEVICE FOR MANUFACTURING STRUCTURE HAVING PATTERN, AND METHOD FOR MANUFACTURING MOLD 有权
标题翻译：用于制造具有图案的结构的方法和装置，以及用于制造模具的方法
公开(公告)号：US20090120904A1
公开(公告)日：2009-05-14
申请号：US11995170
申请日：2006-09-05
申请人： Aya Imada , Toru Den , Takashi Nakamura
发明人： Aya Imada , Toru Den , Takashi Nakamura
IPC分类号： B44C1/22 , B29C69/00 , C23F1/08 , B29C33/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/09
摘要： A structure having a pattern is manufactured. An elastically deformable process target is elastically deformed in an inplane direction from a first state. A first pattern is formed on the process target deformed. The elastically deformed process target is made close to or returned to the first state, thereby to form a second pattern having a size and a shape at least one of which differs from those of the first pattern.
摘要翻译：制造具有图案的结构。弹性变形过程目标从第一状态沿面内方向弹性变形。在变形的过程目标上形成第一图案。使弹性变形的加工对象靠近或返回到第一状态，从而形成具有与第一图案不同的尺寸和形状的第二图案。

6. 发明申请

US20080050526A1 METHOD OF PRODUCING A STRUCTURE HAVING A HOLE 失效
标题翻译：生产具有孔的结构的方法
公开(公告)号：US20080050526A1
公开(公告)日：2008-02-28
申请号：US11766908
申请日：2007-06-22
申请人： Aya Imada , Toru Den
发明人： Aya Imada , Toru Den
IPC分类号： B05D5/00
CPC分类号： B81C1/00111 , B81B2203/0361 , C25D1/08 , C25D11/04 , C25D11/045 , C25D11/16 , C25D11/18 , C25D11/26
摘要： The present invention provides a method of producing a structure, which is capable of easily obtaining a structure of the nanometer scale by using an anodic oxidation method. A method of producing a structure with a hole includes: forming first projected structures regularly arranged on a substrate; forming a first anodic oxidating layer on the substrate having the first projected structures, thereby forming first recessed structures at center portions of cells formed by the projected structures on the anodic oxidating layer; removing the first projected structures to form holes; and subjecting the first anodic oxidating layer to anodic oxidation to form holes at positions of the first recessed structures.
摘要翻译：本发明提供一种通过使用阳极氧化法容易地得到纳米级结构的结构体的制造方法。制造具有孔的结构的方法包括：形成规则地布置在基板上的第一突出结构; 在具有第一投影结构的基板上形成第一阳极氧化层，从而在由阳极氧化层上的投影结构形成的单元的中心部分形成第一凹陷结构; 移除第一投影结构以形成孔; 以及对所述第一阳极氧化层进行阳极氧化，以在所述第一凹部结构的位置形成孔。

7. 发明申请

US20080037173A1 PATTERNED MEDIA, METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM, AND METHOD OF MANUFACTURING A BASE 有权
标题翻译：图形介质，制造磁记录介质的方法及其制造方法
公开(公告)号：US20080037173A1
公开(公告)日：2008-02-14
申请号：US11836556
申请日：2007-08-09
申请人： Tatsuya Saito , Takashi Nakamura , Shigeru Ichihara , Toru Den , Aya Imada , Nobuhiro Yasui
发明人： Tatsuya Saito , Takashi Nakamura , Shigeru Ichihara , Toru Den , Aya Imada , Nobuhiro Yasui
IPC分类号： G11B5/82
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/667 , G11B5/743 , G11B5/8404 , G11B5/855
摘要： To provide patterned media having novel structure. Plural convex members 2991 are provided in an array form on a substrate 2990. The convex member has a shape such that the cross section at each plane in parallel to the substrate tapers toward the substrate. Magnetic recording layers 2992 are provided on upper parts 2993 of the convex members so that they are not in contact with each other between the adjacent upper surface parts.
摘要翻译：提供具有新颖结构的图案化介质。多个凸形构件2991以阵列形式设置在基板2990上。凸形构件具有使得平行于基板的每个平面处的横截面朝向基板逐渐变细的形状。磁记录层2992设置在凸部件的上部2993上，使得它们在相邻的上表面部分之间不彼此接触。

8. 发明授权

US07976761B2 Process of production of patterned structure 有权
标题翻译：图案结构生产工艺
公开(公告)号：US07976761B2
公开(公告)日：2011-07-12
申请号：US11773739
申请日：2007-07-05
申请人： Aya Imada , Toru Den
发明人： Aya Imada , Toru Den
IPC分类号： B29C59/02
CPC分类号： B29C59/022 , B29C2059/023 , Y10S977/887
摘要： A process for producing a patterned structure comprises imprinting a first pattern by pressing a stamper having a projection-depression configuration on the surface against an imprint-work layer, and imprinting a second pattern by displacing relatively the stamper from the position of the first pattern to another position on the imprint-work layer and then pressing the stamper against the imprint-work layer.
摘要翻译：用于制造图案化结构的方法包括：通过将表面上的具有突起 - 凹陷构造的压模压靠在压印工作层上来压印第一图案，并且通过相对地将压模从第一图案的位置移位到第一图案的方式来压印第二图案在压印工作层上的另一位置，然后将压模压靠在压印工作层上。

9. 发明授权

US08718228B2 Phase grating used for X-ray phase imaging, imaging apparatus for X-ray phase contrast image using phase grating, and X-ray computed tomography system 失效
标题翻译：用于X射线相位成像的相位光栅，使用相位光栅的X射线相位对比图像的成像装置和X射线计算机断层摄影系统
公开(公告)号：US08718228B2
公开(公告)日：2014-05-06
申请号：US12922145
申请日：2009-03-12
申请人： Takashi Nakamura , Aya Imada , Hidenosuke Itoh
发明人： Takashi Nakamura , Aya Imada , Hidenosuke Itoh
IPC分类号： G21K1/00
CPC分类号： G21K1/06 , A61B6/06 , A61B6/4291 , A61B6/484 , G02B5/1814 , G02B5/1871 , G21K2207/005
摘要： A phase grating used for X-ray phase imaging is provided, in which a pitch can be narrowed by using a diffraction grating with a low aspect ratio. A phase grating used for X-ray phase imaging, characterized in that the phase grating includes a first diffraction grating in which a first projection part whose thickness is formed so that an in-coming X-ray transmits with a phase π-shifted, and a first aperture part with the same aperture width as a width of the first projection part are cyclically arranged, and a second diffraction grating in which a second projection part with the same width as a width of the first projection part, and a second aperture part with the same aperture width as the aperture width of the first aperture part are cyclically arranged, and the second diffraction grating is formed as displaced on the first diffraction grating.
摘要翻译：提供了用于X射线相位成像的相位光栅，其中可以通过使用具有低纵横比的衍射光栅来缩小间距。一种用于X射线相位成像的相位光栅，其特征在于，所述相位光栅包括第一衍射光栅，其中第一突出部分的厚度形成为使得入射X射线以相位移动的方式透射，并且具有与第一突出部分的宽度相同的孔径宽度的第一开口部分循环地布置;以及第二衍射光栅，其中具有与第一突出部分的宽度相同的宽度的第二突出部分和第二孔径具有与第一孔部分的孔径宽度相同的孔径宽度的部分循环地布置，并且第二衍射光栅在第一衍射光栅上形成为位移。

10. 发明授权

US07591641B2 Mold and process of production thereof 失效
标题翻译：模具及其生产工艺
公开(公告)号：US07591641B2
公开(公告)日：2009-09-22
申请号：US11367343
申请日：2006-03-06
申请人： Tatsuya Saito , Aya Imada , Tohru Den
发明人： Tatsuya Saito , Aya Imada , Tohru Den
IPC分类号： B29C59/00 , B28B7/38
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/855
摘要： A novel mold is provided. The mold is prepared through steps of forming a concavo-convex pattern on a substrate, forming a film by embedding a material of a composition having shape-memory in the concavo-convex pattern, and forming a mold having the concavo-convex pattern by separating the film from the concavo-convex pattern after the film formation in the film formation step.
摘要翻译：提供了一种新颖的模具。通过在基板上形成凹凸图案的步骤来制备模具，通过将具有形状记忆的组合物的材料嵌入凹凸图案中形成膜，并通过分离形成具有凹凸图案的模具在成膜步骤中成膜后的凹凸图案的膜。

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