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    • 10. 发明申请
    • Techniques for Improving the Performance and Extending the Lifetime of an Ion Source with Gas Mixing
    • 提高气体混合性能和延长离子源寿命的技术
    • US20080237496A1
    • 2008-10-02
    • US11693308
    • 2007-03-29
    • Atul Gupta
    • Atul Gupta
    • G21K5/10
    • H01J37/08H01J37/3171H01J2237/022
    • Techniques improving the performance and extending the lifetime of an ion source with gas mixing are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for improving performance and extending lifetime of an ion source in an ion implanter. The method may comprise introducing a predetermined amount of dopant gas into an ion source chamber. The dopant gas may comprise a dopant species. The method may also comprise introducing a predetermined amount of diluent gas into the ion source chamber. The diluent gas may dilute the dopant gas to improve the performance and extend the lifetime of the ion source. The diluent gas may further comprise a co-species that is the same as the dopant species.
    • 公开了通过气体混合改善离子源的性能和延长寿命的技术。 在一个特定的示例性实施例中,可以将技术实现为用于改善离子注入机中的离子源的性能和延长寿命的方法。 该方法可以包括将预定量的掺杂剂气体引入到离子源室中。 掺杂剂气体可以包括掺杂剂物质。 该方法还可以包括将预定量的稀释气体引入离子源室。 稀释气体可以稀释掺杂气体以改善性能并延长离子源的寿命。 稀释气体还可以包含与掺杂剂物质相同的共同物质。