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    • 3. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US06717186B2
    • 2004-04-06
    • US10230988
    • 2002-08-30
    • Tsuyoshi FujimotoKiyofumi MuroTakeshi Koiso
    • Tsuyoshi FujimotoKiyofumi MuroTakeshi Koiso
    • H01L3300
    • H01S5/2231H01S5/2077H01S5/222
    • A real index guided semiconductor laser device includes an optical waveguide layer at least on one side of an active layer that has a band gap energy not less than that of the active layer; a cladding layer on an outer side of the optical waveguide layer that has a band gap energy not less than that of the optical waveguide layer; a refractive index control layer having a striped window, buried in the optical waveguide layer by selective growth; and a semiconductor layer formed in the optical waveguide layer by selective growth prior to the selective growth of the refractive index control layer. In a laminated portion including the semiconductor layer and the refractive index control layer, a change in effective refractive index due to a change in thickness of the semiconductor layer is smaller than that of the refractive index control layer.
    • 实际的折射率引导半导体激光器件包括:有源层的至少一侧的光波导层,其具有不小于有源层的带隙能量; 在光波导层的外侧具有不小于光波导层的带隙能量的包层; 折射率控制层,其具有通过选择性生长掩埋在所述光波导层中的条纹窗口; 以及通过在折射率控制层的选择性生长之前的选择性生长而形成在光波导层中的半导体层。 在包括半导体层和折射率控制层的层叠部分中,由于半导体层的厚度变化引起的有效折射率的变化小于折射率控制层的变化。
    • 4. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US6118799A
    • 2000-09-12
    • US817602
    • 1997-06-10
    • Atsushi OkuboYoshikazu YamadaTsuyoshi FujimotoSatoru OkadaYumi NaitoKiyofumi Muro
    • Atsushi OkuboYoshikazu YamadaTsuyoshi FujimotoSatoru OkadaYumi NaitoKiyofumi Muro
    • H01S5/20H01S5/22H01S5/223H01S5/343H01S3/085
    • B82Y20/00H01S5/2231H01S5/2238H01S5/204H01S5/222H01S5/3432
    • A semiconductor device including a buffer layer 32 on n-GaAs, a clad layer 31, a wave guide layer 30 and a carrier block layer 29 of n-AlGaAs, a side barrier layer 28 of non-doped AlGaAs, an active layer 27 which is formed by two non-doped GaAs quantum well layers and a barrier layer of AlGaAs, a side barrier layer 26 of non-doped AlGaAs, a carrier block layer 25, a wave guide layer 23 and a clad layer 22 of p-AlGaAs, and a cap layer 21 of p-GaAs are grown in this order. Inside the wave guide layer 23, current blocking layers 24 having a lower refractive index and higher Al-composition than that of the wave guide layer and sandwich a strip-shaped active region 34. This creates a refractive index difference between the active region 34 and buried regions 33 in which each of the current blocking layers 24 exists, thereby forming a refractive index guide structure. Thus, it is possible to obtain a high-output semiconductor laser device of the refractive index guided type which is easy to manufacture.
    • PCT No.PCT / JP95 / 02118 Sec。 371日期:1997年6月10日 102(e)日期1997年6月10日PCT提交1995年10月16日PCT公布。 WO96 / 12328 PCT出版物 日期:1996年04月25日包括n-GaAs上的缓冲层32,n-AlGaAs的覆盖层31,波导层30和载流子层29的半导体器件,非掺杂AlGaAs的侧面阻挡层28, 由两个非掺杂GaAs量子阱层和AlGaAs的势垒层,非掺杂AlGaAs的侧阻层26,载流子阻挡层25,波导层23和覆盖层22形成的有源层27 的p-AlGaAs,并且p-GaAs的覆盖层21依次生长。 在波导层23内,电流阻挡层24具有比波导层低的折射率和更高的Al组分,并且夹持条形有源区域34.这在活性区域34和 其中存在每个电流阻挡层24的埋入区域33,从而形成折射率引导结构。 因此,可以获得易于制造的折射率导向型的高输出半导体激光器件。
    • 8. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US06822990B2
    • 2004-11-23
    • US10129550
    • 2002-05-08
    • Takeshi KoisoTsuyoshi Fujimoto
    • Takeshi KoisoTsuyoshi Fujimoto
    • H01S500
    • H01S5/16B82Y20/00H01S5/164H01S5/168H01S5/2231H01S5/305H01S5/34313H01S2304/04
    • A semiconductor laser device comprises first current blocking layers formed to define a stripe-shaped current injected region extending in the direction in a front facet from which a laser light is emitted and a rear facet opposing thereto are connected, and a second current blocking layer formed to transverse the stripe-shaped current injected region in the vicinity of the front facet. The first current blocking layers and the second current blocking layer are made of the same layer. Accordingly, a current blocking structure is provided in the vicinity of the facet with the structure which is easily formed, causes no damage on the semiconductor laser device, and minimizes the property degradation, thereby a high facet COD level and high reliability in long-term continuous operations can be achieved.
    • 一种半导体激光器件包括:第一电流阻挡层,其形成为限定沿着前面的方向延伸的条状电流注入区域,激光从该方向发射,并且与之相对的后端面连接,形成第二电流阻挡层 横向前端附近的条纹电流注入区域。 第一电流阻挡层和第二电流阻挡层由相同的层制成。因此,在小面附近提供电流阻挡结构,其结构易于形成,不会对半导体激光器件造成损坏,并且 降低性能下降,从而可以实现高端的COD水平和长期连续操作的高可靠性。
    • 9. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US06285699B1
    • 2001-09-04
    • US09163395
    • 1998-09-30
    • Yumi NaitoSatoru OkadaTsuyoshi Fujimoto
    • Yumi NaitoSatoru OkadaTsuyoshi Fujimoto
    • H01S500
    • B82Y20/00H01S5/12H01S5/2231H01S5/3432
    • On an n-GaAs substrate are sequentially formed an n-GaAs buffer layer, an n-AlGaAs cladding layer, a non-doped InGaAs active layer, a p-AlxGa1−xAs cladding layer, a p-GaAs contact layer, and further an n-AlGaAs current blocking layer having a stripe-like window is embedded in the cladding layer. At the active layer side interface of the current blocking layer, a diffraction grating of cyclic bumps and dips shape is formed, but the diffraction grating is not formed in a region of the stripe-like window where the current blocking layer is not present, i.e., a current injection region. In this way, a semiconductor laser device of low oscillation threshold, high oscillation efficiency, high reliability, long life time, and stabilized oscillation wavelength can be realized.
    • 在n-GaAs衬底上依次形成n-GaAs缓冲层,n-AlGaAs覆层,非掺杂InGaAs有源层,p-Al x Ga 1-x As包层,p-GaAs接触层, 具有条状窗口的n-AlGaAs电流阻挡层嵌入包层中。 在电流阻挡层的有源层侧界面,形成了循环凸起和凹陷形状的衍射光栅,但是衍射光栅不形成在不存在电流阻挡层的条状窗口的区域中,即 ,电流注入区域。 以这种方式,可以实现低振荡阈值,高振荡效率,高可靠性,长寿命和稳定的振荡波长的半导体激光器件。
    • 10. 发明授权
    • Semiconductor laser device, semiconductor laser module, rare-earth-element-doped optical fiber amplifier and fiber laser
    • 半导体激光器件,半导体激光器模块,稀土元素掺杂光纤放大器和光纤激光器
    • US06477191B1
    • 2002-11-05
    • US09538728
    • 2000-03-30
    • Satoru OkadaTsuyoshi FujimotoYasuo Oeda
    • Satoru OkadaTsuyoshi FujimotoYasuo Oeda
    • H01S500
    • H01S5/12
    • A semiconductor laser device includes: an active layer; upper waveguide layers and a lower waveguide layer sandwiching the active layer therebetween; upper and lower cladding layers sandwiching the active layer and the upper and lower waveguide layers therebetween; and a current-narrowing layer defining a current-injection region for injecting current to the active layer, wherein a diffraction grating having a periodical structure in a resonance cavity direction is buried in any one of the waveguide layers, the diffraction grating being present in at least a part of the current-injection region; and the waveguide layer in which the diffraction grating is buried and the cladding layer adjoining to that waveguide layer forms an interface which is substantially flat in the resonance cavity direction. With the constitution, a waveguide structure which has a diffraction grating offering a higher flexibility in design and manufacture in terms of the coupling efficiency is realized, thereby easily providing a dynamic single-mode semiconductor laser device with higher reproducibility, yield and reliability.
    • 半导体激光器件包括:有源层; 上波导层和夹在其间的有源层的下波导层; 夹层有源层和上下波导层的上下包层; 以及限定用于向有源层注入电流的电流注入区域的电流变窄层,其中在谐振腔方向上具有周期性结构的衍射光栅被掩埋在任何一个波导层中,衍射光栅存在于 电流注入区域的至少一部分; 并且其中掩埋衍射光栅的波导层和与该波导层相邻的包层形成在谐振腔方向上基本上平坦的界面。 利用该结构,实现了在耦合效率方面具有在设计和制造中具有较高灵活性的衍射光栅的波导结构,由此容易地提供具有更高再现性,产率和可靠性的动态单模半导体激光器件。