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1. 发明申请

US20120156621A1 RADIATION-SENSITIVE RESIN COMPOSITION 审中-公开
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20120156621A1
公开(公告)日：2012-06-21
申请号：US13403036
申请日：2012-02-23
申请人： Atsushi NAKAMURA , Tsutomu Shimokawa , Junichi Takahashi , Takayoshi Abe , Tomoki Nagai , Tomohiro Kakizawa
发明人： Atsushi NAKAMURA , Tsutomu Shimokawa , Junichi Takahashi , Takayoshi Abe , Tomoki Nagai , Tomohiro Kakizawa
IPC分类号： G03F7/004
CPC分类号： G03F7/0392 , G03F7/0035 , G03F7/0397 , G03F7/40 , H01L21/0273 , Y10S430/106
摘要： A radiation-sensitive resin composition includes a resin including a repeating unit shown by a following general formula (1), a photoacid generator and a photodisintegrating base shown by a following general formula (8). R2 represents a hydrogen atom or a methyl group, and each of R2s individually represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof, a linear or branched alkyl group having 1 to 4 carbon atoms, or the like. Each of R18 to R20 individually represents a hydrogen atom, an alkyl group, an alkoxy group, a hydroxyl group or a halogen atom, and Z− represents OH−, R—COO−, R—SO3− or an anion shown by a following formula (10), wherein R represents an alkyl group, an aryl group or an alkaryl group.
摘要翻译：辐射敏感性树脂组合物包括含有下列通式（1）表示的重复单元的树脂，光致酸产生剂和由以下通式（8）表示的光致聚合碱。 R2表示氢原子或甲基，R2各自表示碳原子数为4〜20的一价脂环式烃基或其衍生物，碳原子数为1〜4的直链或支链烷基等。 R 18〜R 20各自独立地表示氢原子，烷基，烷氧基，羟基或卤素原子，Z-表示OH-，R-COO-，R-SO 3 - 或下述式（10），其中R表示烷基，芳基或烷芳基。

2. 发明授权

US08211624B2 Method for pattern formation and resin composition for use in the method 有权
标题翻译：用于图案形成的方法和用于该方法的树脂组合物
公开(公告)号：US08211624B2
公开(公告)日：2012-07-03
申请号：US12601011
申请日：2008-05-21
申请人： Atsushi Nakamura , Tsutomu Shimokawa , Junichi Takahashi , Takayoshi Abe , Tomoki Nagai , Tomohiro Kakizawa
发明人： Atsushi Nakamura , Tsutomu Shimokawa , Junichi Takahashi , Takayoshi Abe , Tomoki Nagai , Tomohiro Kakizawa
IPC分类号： G03F7/00 , G03F7/004 , G03F7/20 , G03F7/26 , G03F7/40
CPC分类号： G03F7/0392 , G03F7/0035 , G03F7/0397 , G03F7/40 , H01L21/0273 , Y10S430/106
摘要： A pattern forming method includes (1) selectively exposing a first resist layer, and developing the exposed first resist layer to form a first pattern, (2) applying a resin composition containing a hydroxyl group-containing resin and a solvent to the first pattern, baking the applied resin composition, and developing the baked resin composition to form a second pattern, the hydroxyl group-containing resin becoming insoluble or scarcely soluble in a developer when baked, and (3) totally or selectively exposing the second pattern to make the second pattern partly soluble in the developer, and developing the exposed second pattern to form a third pattern in which at least a hole or a groove is formed in the second pattern.
摘要翻译：图案形成方法包括：（1）选择性地暴露第一抗蚀剂层，以及使曝光的第一抗蚀剂层显影以形成第一图案;（2）将含有羟基的树脂和溶剂的树脂组合物施加到第一图案，烘烤所施加的树脂组合物，并显影所述烘焙的树脂组合物以形成第二图案，所述含羟基的树脂在烘烤时变得不溶或几乎不溶于显影剂，以及（3）全部或选择性地暴露所述第二图案以制备第二图案图案部分地溶解在显影剂中，并且显影第二图案以形成第三图案，其中至少在第二图案中形成孔或凹槽。

3. 发明申请

US20100190104A1 METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD 有权
标题翻译：方法中使用的图案形成方法和树脂组合物
公开(公告)号：US20100190104A1
公开(公告)日：2010-07-29
申请号：US12601011
申请日：2008-05-21
申请人： Atsushi Nakamura , Tsutomu Shimokawa , Junichi Takahashi , Takayoshi Abe , Tomoki Nagai , Tomohiro Kakizawa
发明人： Atsushi Nakamura , Tsutomu Shimokawa , Junichi Takahashi , Takayoshi Abe , Tomoki Nagai , Tomohiro Kakizawa
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/0035 , G03F7/0397 , G03F7/40 , H01L21/0273 , Y10S430/106
摘要： A pattern forming method includes (1) selectively exposing a first resist layer, and developing the exposed first resist layer to form a first pattern, (2) applying a resin composition containing a hydroxyl group-containing resin and a solvent to the first pattern, baking the applied resin composition, and developing the baked resin composition to form a second pattern, the hydroxyl group-containing resin becoming insoluble or scarcely soluble in a developer when baked, and (3) totally or selectively exposing the second pattern to make the second pattern partly soluble in the developer, and developing the exposed second pattern to form a third pattern in which at least a hole or a groove is formed in the second pattern.
摘要翻译：图案形成方法包括：（1）选择性地暴露第一抗蚀剂层，以及使曝光的第一抗蚀剂层显影以形成第一图案;（2）将含有羟基的树脂和溶剂的树脂组合物施加到第一图案，烘烤所施加的树脂组合物，并显影所述烘焙的树脂组合物以形成第二图案，所述含羟基的树脂在烘烤时变得不溶或几乎不溶于显影剂，以及（3）全部或选择性地暴露所述第二图案以制备第二图案图案部分地溶解在显影剂中，并且显影第二图案以形成第三图案，其中至少在第二图案中形成孔或凹槽。

4. 发明授权

US08968458B2 Composition for resist underlayer film and process for producing same 有权
标题翻译：抗蚀剂下层膜的组合物及其制造方法
公开(公告)号：US08968458B2
公开(公告)日：2015-03-03
申请号：US12715406
申请日：2010-03-02
申请人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
发明人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
IPC分类号： C07F7/08 , G03F7/075 , G03F7/11 , H01L21/027 , H01L21/033
CPC分类号： G03F7/0752 , G03F7/0751 , G03F7/11 , H01L21/0274 , H01L21/0332 , Y10S430/106 , Y10S430/115 , Y10T428/31515 , Y10T428/31612 , Y10T428/31663
摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
摘要翻译：提供了抗蚀剂下层膜用组合物。该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘合性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐显影用碱性液体和除去抗蚀剂期间的氧气需求。该组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si（OR 3）4-a（A），R 2各自表示氢原子，卤原子或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为 0〜2的整数，条件是a = b + c。

5. 发明授权

US08808446B2 Composition for resist underlayer film and process for producing same 有权
标题翻译：抗蚀剂下层膜的组合物及其制造方法
公开(公告)号：US08808446B2
公开(公告)日：2014-08-19
申请号：US11816642
申请日：2006-02-24
申请人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
发明人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
IPC分类号： C09D4/00 , G03F7/075 , C07F7/08 , H01L21/027 , G03F7/11 , H01L21/033
CPC分类号： G03F7/0752 , G03F7/0751 , G03F7/11 , H01L21/0274 , H01L21/0332 , Y10S430/106 , Y10S430/115 , Y10T428/31515 , Y10T428/31612 , Y10T428/31663
摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen ashing during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
摘要翻译：提供了抗蚀剂下层膜用组合物。该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘附性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐除去抗蚀剂期间用于显影的碱性液体和氧气灰化。该组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si（OR 3）4-a（A），R 2各自表示氢原子，卤原子或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为 0〜2的整数，条件是a = b + c。

6. 发明申请

US20100151384A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME 有权
标题翻译：抗静电膜的组合物及其生产方法
公开(公告)号：US20100151384A1
公开(公告)日：2010-06-17
申请号：US12715406
申请日：2010-03-02
申请人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
发明人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
IPC分类号： G03F7/075 , C07F7/08
CPC分类号： G03F7/0752 , G03F7/0751 , G03F7/11 , H01L21/0274 , H01L21/0332 , Y10S430/106 , Y10S430/115 , Y10T428/31515 , Y10T428/31612 , Y10T428/31663
摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi (OR3)4-a (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
摘要翻译：提供了抗蚀剂下层膜用组合物。该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘合性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐显影用碱性液体和除去抗蚀剂期间的氧气需求。该组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si（OR 3）4-a（A），R 2各自表示氢原子，卤原子或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为 0〜2的整数，条件是a = b + c。

7. 发明申请

US20090050020A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME 有权
标题翻译：抗静电膜的组合物及其生产方法
公开(公告)号：US20090050020A1
公开(公告)日：2009-02-26
申请号：US11816642
申请日：2006-02-24
申请人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
发明人： Keiji Konno , Masato Tanaka , Momoko Ishii , Junichi Takahashi , Tomoki Nagai
IPC分类号： C09D4/00
CPC分类号： G03F7/0752 , G03F7/0751 , G03F7/11 , H01L21/0274 , H01L21/0332 , Y10S430/106 , Y10S430/115 , Y10T428/31515 , Y10T428/31612 , Y10T428/31663
摘要： A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen ashing during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
摘要翻译：提供了抗蚀剂下层膜用组合物。该组合物具有优异的储存稳定性，并且可以形成对抗蚀剂膜具有优异粘附性的抗蚀剂下层膜，可以提高抗蚀剂图案的再现性，并且耐除去抗蚀剂期间用于显影的碱性液体和氧气灰化。组合物包含下式（A）的硅烷化合物的水解产物和/或缩合物，<？在线式描述=“在线式”末端=“铅”→> R1bR2cSi（OR3）4- a（A）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R1是具有至少一个不饱和键的一价有机基团，R2各自表示氢原子，卤素原子或一价有机基团，R 3分别表示一价有机基团，R 1为除OR 3以外的基团，a为1〜3的整数，b为1〜3的整数，c为0〜2的整数，条件是a = b + c。

8. 发明申请

US20140079375A1 ELECTRIC HEATING DEVICE AND ELECTRIC VEHICLE 审中-公开
标题翻译：电加热装置和电动车
公开(公告)号：US20140079375A1
公开(公告)日：2014-03-20
申请号：US14122624
申请日：2012-05-25
申请人： Hiroaki Katayama , Mitsuyoshi Oba , Hisashi Takumi , Junichi Takahashi
发明人： Hiroaki Katayama , Mitsuyoshi Oba , Hisashi Takumi , Junichi Takahashi
IPC分类号： F24H3/04 , B60H1/22
CPC分类号： F24H3/0429 , B60H1/2215 , B60H1/2225 , B60H2001/229 , F04D17/16 , F04D25/0653 , F04D29/582 , H05B6/108 , H05B6/109
摘要： An electric heating device suitable for heating an electric vehicle and having a novel structure is provided. The electric heating device includes: an electric motor that includes a stator having a plurality of stator coils arranged along the circumferential direction to generate a rotating magnetic field and a disk-shaped rotor that includes a plurality of one-turn coils disposed correspondingly to the stator coils and a soft magnetic metal plate supporting the one-turn coils; and a fan secured to the soft magnetic metal plate on a side thereof opposite from the one-turn coils and including a vane wheel that has a plurality of vanes and rotates integrally with the rotor.
摘要翻译：提供一种适用于加热电动车辆并具有新颖结构的电加热装置。电加热装置包括：电动机，其包括定子，该定子具有沿圆周方向布置的多个定子线圈以产生旋转磁场;以及盘形转子，其包括相应于定子设置的多个单匝线圈线圈和支撑单匝线圈的软磁金属板; 以及在与所述单匝线圈相对的一侧固定到所述软磁金属板的风扇，并且包括具有多个叶片并与所述转子一体旋转的叶轮。

9. 发明授权

US08301208B2 Receiver and receiving method of the receiver 失效
标题翻译：接收机的接收和接收方法
公开(公告)号：US08301208B2
公开(公告)日：2012-10-30
申请号：US12472741
申请日：2009-05-27
申请人： Yusaku Katsube , Masaaki Yamada , Junichi Takahashi
发明人： Yusaku Katsube , Masaaki Yamada , Junichi Takahashi
IPC分类号： H04M1/00 , H04B1/38
CPC分类号： H04L27/3854 , H04L7/041 , H04L27/0014
摘要： The receiver includes a low noise amplifier, a local signal generator, a first mixer, a second mixer, a first amplifier, a second amplifier, a first A/D converter, a second A/D converter, and a signal level detection unit. A detection signal from at least one terminal of the first A/D converter is supplied to an input terminal of the signal level detection unit, thereby generating a reception start signal from the output terminal. Before an RF reception signal is received, a first signal processing unit containing the first mixer, the first amplifier, and the first A/D converter is controlled to an active state, and a second signal processing unit containing the second mixer, the second amplifier, and the second A/D converter is controlled to a low power consumption state. After the RF reception signal is received, the second signal processing unit is controlled to the active state.
摘要翻译：接收机包括低噪声放大器，本地信号发生器，第一混频器，第二混频器，第一放大器，第二放大器，第一A / D转换器，第二A / D转换器和信号电平检测单元。来自第一A / D转换器的至少一个端子的检测信号被提供给信号电平检测单元的输入端，从而从输出端产生接收开始信号。在接收到RF接收信号之前，将包含第一混频器，第一放大器和第一A / D转换器的第一信号处理单元控制为有效状态，以及包含第二混频器的第二信号处理单元，第二放大器并且第二A / D转换器被控制到低功耗状态。在RF接收信号被接收之后，第二信号处理单元被控制到活动状态。

10. 发明申请

US20120228918A1 Vehicle Seat With Function of Absorbing Volatile Substances 审中-公开
公开(公告)号：US20120228918A1
公开(公告)日：2012-09-13
申请号：US13477451
申请日：2012-05-22
申请人： Junichi Takahashi , Takako Fukuda , Hideyuki Yanagita , Harutomi Nishide , Yoshiyuki Ito , Tetsushi Yamada
发明人： Junichi Takahashi , Takako Fukuda , Hideyuki Yanagita , Harutomi Nishide , Yoshiyuki Ito , Tetsushi Yamada
IPC分类号： B60N2/68
CPC分类号： A47C27/12 , B60H3/00 , B60N2/70 , B60N2/90
摘要： A vehicle seat with a function of absorbing volatile substances in an interior of a vehicle with the seat is disclosed. The vehicle seat comprises a seat frame structure, a cushioned padding member supported on the seat frame structure, and a volatile substances-absorbing member provided on a surface of the cushioned padding member which faces the seat frame structure.

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