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    • 6. 发明申请
    • Apparatus and method for detecting hole area
    • 孔面积检测装置及方法
    • US20050254700A1
    • 2005-11-17
    • US11102770
    • 2005-04-11
    • Yasushi NagataHiroshi SanoAtsushi ImamuraEiji Nishihara
    • Yasushi NagataHiroshi SanoAtsushi ImamuraEiji Nishihara
    • G01B11/00G01N21/956G06K9/00G06T1/00G06T7/00
    • G06T7/0004G06T2207/30141
    • A board (9) is placed on a stage part (20) so that the back surface of the board is opposed to the stage part (20). The stage part cuts off light entering a hole penetrating the board (9) from a side of its back surface which is a reverse surface with respect to its pattern formed surface and has a reflection property which is different from that of the pattern formed surface with respect to an illumination light, and the illumination light is emitted from a light source part (31) onto the pattern formed surface (9a). An image pickup part (33) receives light from the pattern formed surface to acquire an inspection image, and a hole-area specifying part implemented by a computer (4) specifies a hole area in the inspection image, which corresponds to a hole of the board (9), by using only the inspection image as image information, in accordance with criteria of pixel values affected by a reflection state of the illumination light entering a hole penetrating the board (9) and being reflected on the stage part (20). Thus, it is possible to detect an area of a hole on the board (9) by using only the inspection image acquired with a reflected light of the illumination light from the light source part (31).
    • 板(9)放置在平台部分(20)上,使得板的后表面与平台部分(20)相对。 舞台部分从其背面的相对于其图案形成表面的反面的一侧切断穿入基板(9)的孔,并具有与图案形成面不同的反射特性, 相对于照明光,照明光从光源部(31)发射到图案形成面(9a)上。 图像拾取部分(33)从图案形成表面接收光以获取检查图像,并且由计算机(4)实现的孔区域指定部分指定检查图像中的与孔的区域相对应的孔面积 (9)中,仅通过仅使用检查图像作为图像信息,根据影响入射穿过基板(9)的孔的照明光的反射状态并被反射在台面部(20)上的像素值的标准, 。 因此,可以通过仅使用由来自光源部分(31)的照明光的反射光获取的检查图像来检测板(9)上的孔的区域。
    • 7. 发明授权
    • Apparatus, method, and program for assisting in selection of pattern element for pattern matching
    • 用于协助选择用于图案匹配的图案元素的装置,方法和程序
    • US07463763B2
    • 2008-12-09
    • US11098388
    • 2005-04-05
    • Hiroshi SanoYumi HayakawaAtsushi ImamuraEiji Nishihara
    • Hiroshi SanoYumi HayakawaAtsushi ImamuraEiji Nishihara
    • G06K9/00
    • G06T7/001G06K9/033G06T2207/30141
    • A pattern-element extractor (51), one of functions implemented by a computer, extracts a plurality of pattern elements from a reference image, a region of which is displayed on a display (45). An input part (46) accepts an operator's selection of one out of the plurality of pattern elements as a reference pattern element, and a distinguishability checker (52) checks whether the selected pattern element is distinguishable from the other pattern elements and usable as the reference pattern element for pattern matching. A result of the check is notified to the operator, and an appropriate one out of the pattern elements in the reference image can be selected as the reference pattern element, by referring to the result of the check made by the distinguishability checker (52). Thus, misrecognition of the reference pattern element used for detecting a position of a target image relative to the reference image in pattern matching is prevented.
    • 由计算机实现的功能之一的图形元素提取器(51)从参考图像中提取多个图案元素,参考图像的区域显示在显示器(45)上。 输入部分(46)接受操作员对多个图案元素中的一个的选择作为参考图案元素,并且可区分性检查器(52)检查所选择的图案元素是否与其他图案元素区分开并可用作参考 图案元素用于模式匹配。 检查结果被通知给操作者,并且可以通过参考可区分性检查器(52)进行的检查的结果,将参考图像中的图案元素中的适当的一个选择为参考图案元素。 因此,防止在模式匹配中用于检测目标图像相对于参考图像的位置的参考图案元素的误识别。
    • 10. 发明授权
    • Particle supply apparatus, imaging apparatus, and particle accommodating unit transporting method
    • 粒子供给装置,成像装置和粒子容纳部输送方法
    • US08000636B2
    • 2011-08-16
    • US12018611
    • 2008-01-23
    • Hiroshi Sano
    • Hiroshi Sano
    • G03G15/08G03G15/00
    • G03G15/0879G03G15/0855G03G15/0865G03G2215/0875
    • A particle supply apparatus for supplying particles to a supply destination is disclosed that includes a particle supply apparatus main frame, a particle accommodating unit that accommodates the particles, a gas spouting unit that is arranged at a bottom portion of the particle accommodating unit and is configured to spout gas toward the particles, and a conveying mechanism that applies suction to the particles accommodated in the particle accommodating unit and conveys the particles toward the supply destination. The particle accommodating unit is installed in the particle supply apparatus main frame and is arranged to rest on a face at the bottom portion side during operation, and the particle accommodating unit is detached from the particle supply apparatus main frame and is arranged to rest on a face other than the face at the bottom portion side during transportation.
    • 公开了一种用于向供应目的地供应颗粒的颗粒供应装置,其包括颗粒供应装置主框架,容纳颗粒的颗粒容纳单元,布置在颗粒容纳单元的底部的气体喷射单元, 将气体喷射到颗粒,以及输送机构,其向容纳在颗粒容纳单元中的颗粒施加吸力,并将颗粒输送到供给目的地。 颗粒容纳单元安装在颗粒供应装置主框架中,并且被布置成在操作期间搁置在底部侧的表面上,并且颗粒容纳单元从颗粒供应装置主框架脱离并且被布置成搁置在 在运输过程中在底部侧的面以外的面。